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1. 发明申请

US20210358777A1 TEMPERATURE-CONTROLLABLE PROCESS CHAMBERS, ELECTRONIC DEVICE PROCESSING SYSTEMS, AND MANUFACTURING METHODS 有权
公开(公告)号：US20210358777A1
公开(公告)日：2021-11-18
申请号：US17389201
申请日：2021-07-29
申请人： Applied Materials, Inc.
发明人： Paul Z. Wirth
IPC分类号： H01L21/67 , F27D3/00 , F27D5/00 , F27D11/02 , F27D21/00 , H01L21/324 , F27D19/00
摘要： A process chamber includes one or more vertical walls at least partially defining a chamber portion of the process chamber, and multiple zones located about a periphery of the one or more vertical walls, wherein one or more of the multiple zones extends from a top to a bottom of the one or more vertical walls. The process chamber further includes a plurality of temperature control devices, each thermally coupled to the one or more vertical walls in one of the multiple zones, and a controller coupled to the plurality of temperature control devices and configured to set temperatures of one or more of the plurality of temperature control devices to obtain temperature uniformity within 2% across a substrate located in the chamber portion.

2. 发明申请

US20210254894A1 HEATING FURNACE 有权
公开(公告)号：US20210254894A1
公开(公告)日：2021-08-19
申请号：US17275876
申请日：2019-04-11
申请人： NIPPON STEEL TEXENG. CO., LTD.
发明人： Shinjiro KUWAYAMA , Tetsuya IRIE
IPC分类号： F27D11/02 , F27B17/00
摘要： This heating furnace includes a housing having a pair of side walls, a workpiece support material configured to support a workpiece having a flat plate shape in a horizontal posture between the pair of side walls, a planar heater configured to heat the workpiece supported by the workpiece support material from above or below, a power feeding device configured to feed power to the planar heater, and a heater support material configured to support the planar heater in a horizontal posture. The planar heater has a plurality of heating bodies disposed side by side in a conveyance direction and in a left-right direction orthogonal to the conveyance direction in a plan view, the plurality of heating bodies each have a heating wire and a sintered body configured to accommodate the heating wire, include two or more kinds of heating bodies having different dimensions or shapes, and include an intermediate heating body alongside which other heating bodies are disposed at both end portions in the left-right direction, and the power feeding device has a feeding unit configured to feed power to each of the heating bodies from the side wall.

3. 发明申请

US20210180867A1 REFLOW FURNACE 有权
公开(公告)号：US20210180867A1
公开(公告)日：2021-06-17
申请号：US17115435
申请日：2020-12-08
申请人： ILLINOIS TOOL WORKS INC.
发明人： Yuwei WANG , Yuexin CHEN
IPC分类号： F27D21/04 , F27B9/30 , F27D11/02 , B23K1/008
摘要： The present disclosure discloses a reflow oven, comprising a heating zone, a cooling zone, a barrier and exhaust zone, a gas exhaust passage, a gas exhaust power device, and a detection device. The heating zone comprises a heating zone inlet and a heating zone outlet. The cooling zone comprises a cooling zone inlet and a cooling zone outlet. The barrier and exhaust zone is located between the heating zone outlet and the cooling zone inlet. An inlet of the gas exhaust passage is communicated with the barrier and exhaust zone. The gas exhaust power device is disposed on the gas exhaust passage. The detection device is disposed on the gas exhaust passage and used for detecting parameters of gas in the gas exhaust passage, wherein the parameters of the gas reflect a blockage condition of the gas exhaust power device. The reflow oven according to the present disclosure can ensure that the gas containing soldering flux is sufficiently drawn out from the barrier and exhaust zone, thereby ensuring the production quality of a circuit board and improving the qualified rate of the circuit board.

4. 发明授权

US10781130B2 Heat treatment apparatus 有权
公开(公告)号：US10781130B2
公开(公告)日：2020-09-22
申请号：US15443379
申请日：2017-02-27
申请人： SHIN-ETSU CHEMICAL CO., LTD.
发明人： Kazuya Uchida , Takashi Koshigai
IPC分类号： C03B32/02 , C03B37/014 , C03B37/10 , F27B1/00 , F27B1/12 , F27B9/14 , F27D11/02
摘要： A heat treatment apparatus includes: a furnace core tube made of silica glass; a heater provided adjacent to the furnace core tube, the heater heating a heating region; and a moving mechanism supporting a porous glass base material and relatively moving the porous glass base material with respect to the heater in the furnace core tube in a state where the heating region is heated by the heater to make the porous glass base material pass through the heating region. The heat treatment apparatus includes a thin-walled part provided in a region adjacent to a portion located in the heating region in the furnace core tube, the thin-walled part having a thickness of glass less than that of the portion located in the heating region.

5. 发明申请

US20200243354A1 TEMPERATURE-CONTROLLABLE PROCESS CHAMBERS, ELECTRONIC DEVICE PROCESSING SYSTEMS, AND MANUFACTURING METHODS 审中-公开
公开(公告)号：US20200243354A1
公开(公告)日：2020-07-30
申请号：US16261763
申请日：2019-01-30
申请人： Applied Materials, Inc.
发明人： Paul Z. Wirth
IPC分类号： H01L21/67 , F27D3/00 , F27D5/00 , F27D11/02 , F27D19/00 , F27D21/00 , H01L21/324
摘要： A temperature-controllable process chamber configured to process substrates may include one or more vertical walls at least partially defining a chamber portion of the process chamber. Multiple zones may be located about a periphery of the one or more vertical walls and multiple temperature control devices are thermally coupled to the periphery of the one or more vertical walls in each of the multiple zones. A controller coupled to the temperature control devices may be configured to individually control temperatures of the multiple temperature control devices to obtain substantial temperature uniformity across a substrate located in the chamber portion. Other systems and methods of manufacturing substrates are disclosed.

6. 发明授权

US10699883B2 Plasma processing apparatus, method of operating plasma processing apparatus, and power supply device 有权
公开(公告)号：US10699883B2
公开(公告)日：2020-06-30
申请号：US15309399
申请日：2015-06-01
申请人： TOKYO ELECTRON LIMITED
发明人： Satoru Teruuchi
IPC分类号： H01J37/32 , H05H1/46 , H01L21/02 , H01L21/3065 , H01L21/67 , H05B3/28 , F27D11/02 , H01L21/683 , H05B3/62
摘要： A plasma processing apparatus according to an embodiment includes a processing container, a mounting table, a plurality of heaters, and a power supply device. The mounting table is provided in the processing container. The plurality of heaters are provided in the mounting table. The power supply device supplies electric power to the plurality of heaters. The power supply device includes a plurality of transformers and a plurality of zero-cross control type solid state relays (SSRs). The plurality of transformers are configured to step down a voltage from an alternating-current power source. Each of the plurality of transformers includes a primary coil and a secondary coil. The primary coil is connected to the alternating-current power source. Each of the plurality of SSRs is provided between one corresponding heater among the plurality of heaters and the secondary coil of one corresponding transformer among the plurality of transformers.

7. 发明授权

US10591214B2 Simplified and improved thermal efficiency vaccum furnace hot zone with prefabricated insulation assembly 有权
公开(公告)号：US10591214B2
公开(公告)日：2020-03-17
申请号：US15732228
申请日：2017-10-10
申请人： Real Fradette , Benjamin Isaak
发明人： Real Fradette , Benjamin Isaak
IPC分类号： F27D1/00 , F27D1/14 , F27D7/06 , F27D9/00 , F27D11/02
摘要： A high temperature vacuum furnace including a prefabricated tongue-and-groove, low-mass insulation ring assembly hot zone, resulting in decreased energy costs and increased energy efficiency, faster heating and cooling cycles, and expedited maintenance capability resulting in lower maintenance costs. Decreased time of a workpiece in the furnace improves production turnaround and lowers energy costs for each heat treating cycle. Furnace manufacturing is also easier and less expensive compared to prior art vacuum furnaces. A bottom support structure replaces the prior art metal support ring resulting in an approximately 80-85% weight saving in the furnace hot zone. This reduces the time and energy required to heat and cool the furnace components and workpiece.

8. 发明授权

US10309725B2 Immersion heater for molten metal 有权
公开(公告)号：US10309725B2
公开(公告)日：2019-06-04
申请号：US15332163
申请日：2016-10-24
申请人： Molten Metal Equipment Innovations, LLC
发明人： Paul V. Cooper
IPC分类号： B22D41/015 , F27D11/02 , F27D99/00 , F27D17/00 , F27D19/00 , F27D27/00 , H05B3/00 , H05B3/62 , H05B3/82 , F27B3/08 , F27B3/10 , F27B3/20 , F27D3/00
摘要： The invention relates to a device for heating molten metal by the use of a heater that can be immersed into the molten metal. This immersion heater includes an outer cover formed of one or more materials resistant to the molten metal in which the immersion heater is to be used, and a heating element inside of the outer cover, where the heating element is protected from contacting the molten metal.

9. 发明授权

US10240870B2 Method for operating a power-compensated fusion furnace 有权
公开(公告)号：US10240870B2
公开(公告)日：2019-03-26
申请号：US14604947
申请日：2015-01-26
申请人： SPEX Sample Prep LLC
发明人： Pierre-Emmanuel LeMay , Marc Boivin
IPC分类号： F27D19/00 , F27B21/00 , F27D11/02 , F27B17/02
摘要： A method for operating a power-compensated fusion furnace that includes a power control system having one switching device per heating element, power measurement circuitry, a master temperature sensor, and a controller. Each switching device is electrically connected to a respective heating element. The controller, in conjunction with the switching devices, is able to individually control the electrical energy flowing to each heating element, thereby controlling the duty cycle of each heating element. The duty cycles are corrected for one or more of variations in the electrical resistance of each heating element and position-dependent variations in furnace cavity temperature.

10. 发明授权

US10107552B2 Holding device for a heating element, and heater 有权
公开(公告)号：US10107552B2
公开(公告)日：2018-10-23
申请号：US14771268
申请日：2014-02-27
申请人： PLANSEE SE
发明人： Bernd Kleinpass , Peter Mallaun
IPC分类号： H05B3/03 , F27D11/02 , F27D99/00 , F27D11/10 , H05B3/08 , H05B3/66 , F27D1/00
摘要： A holding device for a heating element and a heater with at least one such holding device. The holding device is produced from a refractory metal or from an alloy on the basis of refractory metal, has at least two holding elements which are arranged perpendicularly or at least substantially perpendicularly to each other. A first holding element is at least partially arranged in an opening of a second holding element.

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