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    • 10. 发明授权
    • Estimation of sidewall skew angles of a structure
    • 一种结构侧壁倾斜角的估计
    • US09316665B2
    • 2016-04-19
    • US13867720
    • 2013-04-22
    • FREESCALE SEMICONDUCTOR, INC.
    • Aaron A. GeisbergerKemiao Jia
    • G01N3/20G01P15/08G01C19/5656G01C19/5663G01C25/00G01B5/24B81C99/00
    • G01P15/0888B81C99/004B81C2201/0132G01B5/24G01C19/5656G01C19/5663G01C25/005
    • An apparatus (36) includes a motion amplification structure (52), an actuator (54), and a sense electrode (50) in proximity to the structure (52). The actuator (54) induces an axial force (88) upon the structure (52), which causes a relatively large amount of in-plane motion (108) in one or more beams (58, 60) of the structure (52). When sidewalls (98) of the beams (58, 60) exhibit a skew angle (28), the in-plane motion (108) of the beams (58, 60) produces out-of-plane motion (110) of a paddle element (62) connected to the end of the beams (58, 60). The skew angle (28), which results from an etch process, defines a degree to which the sidewalls (98) of beams (58, 60) are offset or tilted from their design orientation. The out-of-plane motion (110) of element (62) is sensed at the electrode (50), and is utilized to determine an estimated skew angle (126).
    • 装置(36)包括靠近结构(52)的运动放大结构(52),致动器(54)和感测电极(50)。 致动器(54)在结构(52)上引起轴向力(88),其在结构(52)的一个或多个梁(58,60)中引起相对大量的平面内运动(108)。 当梁(58,60)的侧壁(98)呈现偏斜角(28)时,梁(58,60)的平面内运动(108)产生桨叶的平面外运动(110) 元件(62)连接到梁(58,60)的端部。 由蚀刻工艺产生的偏斜角(28)限定了梁(58,60)的侧壁(98)从其设计取向偏移或倾斜的程度。 在电极(50)处感测元件(62)的平面外运动(110),并用于确定估计的倾斜角(126)。