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1. 发明授权

US09261787B1 Conductive element precursor and conductive pattern formation 有权
标题翻译：导电元件前体和导电图案形成
公开(公告)号：US09261787B1
公开(公告)日：2016-02-16
申请号：US14468626
申请日：2014-08-26
申请人： Eastman Kodak Company
发明人： Kenneth James Lushington
IPC分类号： H05K1/09 , G03F7/06 , G03C1/06 , G03C1/825 , G03C1/815
CPC分类号： G03F7/06 , G03C1/06 , G03C1/46 , G03C1/815 , G03C1/825 , G03C2001/7635 , G03C2007/3025 , G03F7/091 , G03F7/0957 , G03F7/11
摘要： Black-and-white silver halide conductive film element precursors have, on one or both sides and in order, a UV filter layer, non-color hydrophilic photosensitive layer comprising a silver halide, and a hydrophilic overcoat as an outer layer. The one or two UV filter layers individually contains one or more UV absorbing agents in an amount of up 0.5 mmol/m2 and the total amount in the precursor is up to 1 mmol/m2 to prevent crosstalk during imagewise exposure. These precursors can be imagewise exposed and processed to provide conductive film elements with various conductive silver patterns (or grids) with narrow conductive silver lines on one or both sides. Such conductive film elements can be prepared with reduced yellowness as evidenced by reduced b* values. The resulting conductive film elements are highly transparent and can be used in various devices such as display devices.
摘要翻译：黑白卤化银导电膜元件前体在一侧或两侧依次具有UV滤光层，包含卤化银的非彩色亲水感光层和作为外层的亲水外涂层。一个或两个UV过滤层分别含有一种或多种上述量为0.5mmol / m 2的UV吸收剂，并且前体中的总量高达1mmol / m 2，以防止成像曝光期间的串扰。这些前体可以成像曝光和加工，以在一侧或两侧上提供具有窄导电银线的各种导电银图案（或网格）的导电膜元件。这样的导电膜元件可以通过减少的b *值来证明具有降低的黄度。所得到的导电膜元件是高度透明的，并且可以用于诸如显示装置的各种装置中。

2. 发明授权

US08206893B2 Photoimageable branched polymer 有权
标题翻译：可光成像支化聚合物
公开(公告)号：US08206893B2
公开(公告)日：2012-06-26
申请号：US12261971
申请日：2008-10-30
申请人： Hao Xu , Ramil-Marcelo L. Mercado , Douglas J. Guerrero , Jim D. Meador
发明人： Hao Xu , Ramil-Marcelo L. Mercado , Douglas J. Guerrero , Jim D. Meador
IPC分类号： G03F7/20 , G03F7/30 , G03F7/38 , G03C1/825 , G03C1/835
CPC分类号： G03F7/091 , C08L25/18 , Y10S430/151
摘要： Novel, developer-soluble anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a multi-functional acid reacted with a multi-functional vinyl ether to form a branched polymer or oligomer. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light and post-exposure baking, the cured polymers/oligomers will decrosslink and depolymerize, rendering the layer soluble in typical photoresist developing solutions (e.g., alkaline developers).
摘要翻译：提供了新颖的显影剂可溶性抗反射涂层组合物和使用这些组合物的方法。组合物包含与多官能乙烯基醚反应形成支链聚合物或低聚物的多官能酸。在使用中，将组合物施加到基底上并进行热交联。在曝光和曝光后烘烤时，固化的聚合物/低聚物将脱链和解聚，使得该层可溶于典型的光致抗蚀剂显影溶液（例如碱性显影剂）。

3. 发明授权

US08034287B2 Radiation sterilization of medical devices 有权
标题翻译：医疗器械辐射灭菌
公开(公告)号：US08034287B2
公开(公告)日：2011-10-11
申请号：US11803829
申请日：2007-05-15
申请人： Abigail Freeman , Gregory S. Simmons , Brian D. Riggs , Robert Harrison , Dan Castro , Bin Huang
发明人： Abigail Freeman , Gregory S. Simmons , Brian D. Riggs , Robert Harrison , Dan Castro , Bin Huang
IPC分类号： A61L2/00 , G03C5/04 , G03C1/815 , G03C1/825
CPC分类号： A61L2/08 , A61L2/081 , A61L2/087 , A61L2202/24
摘要： Methods and systems for selection radiation exposure in sterilization of medical devices are disclosed.
摘要翻译：公开了用于在医疗装置灭菌中选择辐射照射的方法和系统。

4. 发明授权

US07320855B2 Silicon containing TARC/barrier layer 有权
标题翻译：含硅的TARC /阻挡层
公开(公告)号：US07320855B2
公开(公告)日：2008-01-22
申请号：US10980365
申请日：2004-11-03
申请人： Wu-Song S. Huang , Sean D. Burns , Pushkara Rao Varanasi
发明人： Wu-Song S. Huang , Sean D. Burns , Pushkara Rao Varanasi
IPC分类号： G03F7/36 , G03F7/20 , G03F7/09 , G03C1/825
CPC分类号： G03F7/091 , G03F7/0046 , G03F7/0752 , G03F7/2041
摘要： A top anti-reflective coating material (TARC) and barrier layer, and the use thereof in lithography processes, is disclosed. The TARC/barrier layer may be especially useful for immersion lithography using water as the imaging medium. The TARC/barrier layer comprises a polymer which comprises at least one silicon-containing moiety and at least one aqueous base soluble moiety. Suitable polymers include polymers having a silsesquioxane (ladder or network) structure, such as polymers containing monomers having the structure: where R1 comprises an aqueous base soluble moiety, and x is from about 1 to about 1.95, more preferably from about 1 to about 1.75.
摘要翻译：公开了一种顶部抗反射涂层材料（TARC）和阻挡层，以及其在光刻工艺中的用途。 TARC /阻挡层可能特别适用于使用水作为成像介质的浸没式光刻技术。 TARC /阻挡层包含含有至少一个含硅部分和至少一个水溶性碱可溶部分的聚合物。合适的聚合物包括具有倍半硅氧烷（梯形或网络）结构的聚合物，例如含有具有以下结构的单体的聚合物：其中R 1包含碱水溶性部分，x为约1至约1.95，更优选约1至约1.75。

5. 发明授权

US07166420B2 Protection of transient documents using a photochromic protective layer 有权
标题翻译：使用光致变色保护层保护瞬态文件
公开(公告)号：US07166420B2
公开(公告)日：2007-01-23
申请号：US11139890
申请日：2005-05-27
申请人： Naveen Chopra , Hadi Mahabadi , Peter M. Kazmaier , Gabriel Iftime
发明人： Naveen Chopra , Hadi Mahabadi , Peter M. Kazmaier , Gabriel Iftime
IPC分类号： G03C1/675 , G03C1/685 , G03C1/73 , G03C1/815 , G03C1/825
CPC分类号： G03C1/73 , Y10S430/163
摘要： A protective, switchable layer adapted for use in transient imageable documents is disclosed. The protective layer can be disposed on an underlying photochromic layer and enables writing or imaging the underlying layer. The protective layer prevents unintentional writing on the photochromic layer, such as can otherwise occur from exposure to certain wavelengths of light.
摘要翻译：公开了一种适用于瞬态可成像文件的保护性可切换层。保护层可以设置在下面的光致变色层上，并且能够对下层进行写入或成像。保护层防止在光致变色层上的无意写入，例如否则可能由于暴露于某些波长的光而发生。

6. 发明授权

US07160668B2 Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same 失效
标题翻译：用于有机抗反射涂层的光吸收剂聚合物，其制备方法和包含其的有机抗反射涂料组合物
公开(公告)号：US07160668B2
公开(公告)日：2007-01-09
申请号：US10962847
申请日：2004-10-12
申请人： Jae-chang Jung , Keun Kyu Kong , Young-sik Kim
发明人： Jae-chang Jung , Keun Kyu Kong , Young-sik Kim
IPC分类号： G03F7/20 , G03F7/30 , G03F7/36 , G03F7/38 , G03C1/825 , C08F22/06
CPC分类号： G03F7/091 , Y10S430/106
摘要： Disclosed are a light absorbent agent polymer for organic anti-reflective coating which can prevent diffused light reflection of bottom film layer or substrate and reduce standing waves caused by variation of thickness of the photoresist itself, thereby, increasing uniformity of the photoresist pattern, in a process for forming ultra-fine patterns of photoresist for photolithography by using 193 nm ArF among processes for manufacturing semiconductor device, and its preparation method. Also, the present invention discloses an organic anti-reflective coating composition comprising the light absorbent agent polymer for the organic anti-reflective coating and a pattern formation process using the coating composition.
摘要翻译：公开了一种用于有机抗反射涂层的光吸收剂聚合物，其可以防止底部薄膜层或基底的扩散光反射，并减少由光致抗蚀剂本身的厚度变化引起的驻波，从而增加光致抗蚀剂图案的均匀性通过在制造半导体器件的工艺中使用193nm的ArF，形成用于光刻的超精细图案的光刻工艺及其制备方法。此外，本发明公开了一种有机抗反射涂层组合物，其包含用于有机抗反射涂层的光吸收剂聚合物和使用该涂料组合物的图案形成方法。

7. 发明授权

US07132217B2 Organic anti-reflective coating composition and pattern forming method using the same 失效
标题翻译：有机防反射涂料组合物及使用其的图案形成方法
公开(公告)号：US07132217B2
公开(公告)日：2006-11-07
申请号：US10891568
申请日：2004-07-15
申请人： Geun Su Lee , Sam Young Kim
发明人： Geun Su Lee , Sam Young Kim
IPC分类号： G03C1/825 , G03F7/20 , G03F7/30
CPC分类号： G03F7/091 , Y10S430/106 , Y10S430/151 , Y10S430/162
摘要： Disclosed are an organic anti-reflective coating composition which is introduced to top portion of a photoresist and a pattern forming method using the same, in a process for forming ultra-fine patterns of photoresist for photolithography by using 193 nm ArF or 157 nm VUV light source, and more particularly to, an organic anti-reflective coating composition which can protect photoresist from atmospheric amine to minimize a post exposure delay effect, and minimize pattern distortion caused by diffused reflection, i.e., a swing phenomenon, with the improvement of a notching phenomenon and the reduction of reflection rate, and a patterning forming method using the same.
摘要翻译：公开了一种有机抗反射涂层组合物，其被引入到光致抗蚀剂的顶部和使用其的图案形成方法中，在用于通过使用193nm ArF或157nm VUV光形成用于光刻的光刻胶的超精细图案的工艺中来源，更具体地涉及一种有机抗反射涂料组合物，其可以保护光致抗蚀剂免受大气胺以最小化后曝光延迟效应，并且使扩散反射（即摆动现象）引起的图案失真最小化，同时改善切口现象和反射率的降低，以及使用其的图案形成方法。

8. 发明授权

US07132216B2 Non-aromatic chromophores for use in polymer anti-reflective coatings 有权
公开(公告)号：US07132216B2
公开(公告)日：2006-11-07
申请号：US10689482
申请日：2003-10-20
申请人： Xie Shao , Robert Cox , Shreeram V. Deshpande , Tony D. Flaim , Rama Puligadda
发明人： Xie Shao , Robert Cox , Shreeram V. Deshpande , Tony D. Flaim , Rama Puligadda
IPC分类号： G03C1/825 , G03C1/83 , G03C1/815 , G03C1/73
CPC分类号： G03F7/091 , Y10S430/106 , Y10S430/108
摘要： An improved light attenuating compound for use in the production of microdevices is provided. Broadly, the light attenuating compound is non-aromatic and can be directly incorporated (either physically or chemically) into photolithographic compositions such as bottom anti-reflective coatings (BARC) and contact or via hole fill materials. The preferred non-aromatic compounds of the invention are conjugated aliphatic and alicyclic compounds which greatly enhance the plasma etch rate of the composition. Furthermore, the light attenuating compounds are useful for absorbing light at shorter wavelengths. In one embodiment, the inventive compounds can be polymerized so as to serve as both the polymer binder of the composition as well as the light absorbing constituent.

9. 发明授权

US07029835B2 Photothermographic element comprising improved base precursors and methods for their use 失效
标题翻译：光热成像元件包括改进的碱前体及其使用方法
公开(公告)号：US07029835B2
公开(公告)日：2006-04-18
申请号：US10765340
申请日：2004-01-27
申请人： Ramanuj Goswami , David H. Levy
发明人： Ramanuj Goswami , David H. Levy
IPC分类号： G03C1/815 , G03C1/825
CPC分类号： C07D207/404 , B41M3/003 , C07D207/452 , C07D209/48 , C07D221/14 , C07D231/52 , C07D239/60 , C07D239/62 , C07D401/06 , C07D403/06 , C07D413/06 , C07D417/06 , C07D473/30 , C07D487/04 , G03C1/43 , G03C1/49845 , G03C1/615 , G03C8/4086 , Y10S430/156 , Y10S430/16 , Y10S430/165
摘要： Photothermographic elements employing improved base precursors that undergo thermal decomposition are disclosed. Thermal-dye-bleach agents, and in particular, a novel class of salts of arylsulfonylacetic acids as bleaching agents for photothermographic use are disclosed. Photothermographic elements employing these thermal-dye-bleach agents are suitable for use as acutance and antihalation systems, bleachable filter dye materials, and in promoting unblocking of various components such as blocked developers, especially in photothermographic elements.
摘要翻译：公开了使用经历热分解的改进的碱性前体的光热敏成像元件。公开了热染料漂白剂，特别是作为光热照相用漂白剂的新一类芳基磺酰基乙酸盐。使用这些热染料漂白剂的光热敏成像元件适合用作吸收和防晕系统，可漂白的过滤染料材料，以及促进各种组分如阻挡显影剂，特别是光热敏成像元件的阻挡。

10. 发明申请

US20050191589A1 Radiographic silver halide photographic material having a good developing speed, an excellent image tone and low residual color after processing 失效
标题翻译：具有良好的显影速度，优异的图像色调和处理后的低残留颜色的放射照相卤化银照相材料
公开(公告)号：US20050191589A1
公开(公告)日：2005-09-01
申请号：US10872182
申请日：2004-06-18
申请人： Johan Loccufier , Dirk Bollen
发明人： Johan Loccufier , Dirk Bollen
IPC分类号： G03C1/34 , G03C1/46 , G03C1/76 , G03C1/825 , G03C5/16 , G03C1/00
CPC分类号： G03C5/16 , G03C1/346 , G03C1/46 , G03C1/7614 , G03C1/8255 , G03C2001/0055 , G03C2001/7635 , G03C2007/3025 , G03C2007/3032
摘要： A green-sensitized black-and-white silver halide negative working photographic material comprising a support having thereon at least one light-sensitive silver halide emulsion layer containing tabular silver halide grains, further comprising in said emulsion layer or in a layer adjacent thereto, a heteroatomic sulfinic acid compound, a disulfide compound or a combination thereof, wherein each of said compounds has a solubilizing group having a pKa-value of 10 or less.
摘要翻译：一种绿色敏化的黑白卤化银负性照相材料，其包括在其上具有至少一种含有片状卤化银颗粒的感光卤化银乳剂层的载体，其还包含在所述乳剂层中或与其相邻的层中，杂原子亚磺酸化合物，二硫化物或其组合，其中每个所述化合物具有pK值为10或更小的增溶基团。

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