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    • 5. 发明授权
    • Lithography projection objective, and a method for correcting image defects of the same
    • 平版印刷投影物镜,以及用于校正图像缺陷的方法
    • US09316922B2
    • 2016-04-19
    • US14315577
    • 2014-06-26
    • Carl Zeiss SMT GmbH
    • Ulrich LoeringVladan BlahnikWilhelm UlrichDaniel KraehmerNorbert Wabra
    • G02B3/00G03B27/42G03C1/00G03F7/20
    • G03F7/70341G03F7/7015
    • A lithography projection objective for imaging a pattern in an object plane onto a substrate in an image plane. The projection objective comprises a multiplicity of optical elements along an optical axis. The optical elements comprise a first group of optical elements following the object plane, and a last optical element, following the first group and next to the image plane. The projection objective is tunable or tuned with respect to aberrations for the case that the volume between the last optical element and the image plane is filled by an immersion medium with a refractive index substantially greater than 1. The position of the last optical element is adjustable in the direction of the optical axis. A positioning device is provided that positions at least the last optical element during immersion operation such that aberrations induced by disturbance are at least partially compensated.
    • 一种用于将物平面中的图案成像到图像平面中的基板上的光刻投影物镜。 投影物镜包括沿着光轴的多个光学元件。 光学元件包括跟随物平面的第一组光学元件和最后一个光学元件,跟随第一组并且靠近图像平面。 投影物镜相对于像差是可调谐的或调谐的,在最后的光学元件和像面之间的体积由折射率基本上大于1的浸没介质填充的情况下。最后一个光学元件的位置是可调节的 沿光轴的方向。 提供了一种定位装置,其在浸入操作期间至少定位最后一个光学元件,使得由干扰引起的像差至少部分地被补偿。