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1. 发明授权

US10908503B2 Apparatus for treating substrate 有权
公开(公告)号：US10908503B2
公开(公告)日：2021-02-02
申请号：US16565661
申请日：2019-09-10
申请人： SEMES CO., LTD.
发明人： Kihoon Choi , Chan Young Heo , Do Heon Kim , Hae-Won Choi , Jaeseong Lee , Anton Koriakin , Ji Soo Jeong
IPC分类号： G03D3/00 , G03F7/16 , B08B3/04 , G03F7/32 , G03F7/30
摘要： An apparatus for treating a substrate includes a developing chamber that performs a developing process on the substrate by supplying a developing solution, a supercritical chamber that treats the substrate by supplying a supercritical fluid, and a transfer chamber having a transfer unit that transfers the substrate W between the developing chamber and the supercritical chamber.

2. 发明授权

US09110381B2 Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method 有权
标题翻译：基板输送装置及基板输送方法，曝光装置及曝光方法，装置的制造方法
公开(公告)号：US09110381B2
公开(公告)日：2015-08-18
申请号：US13067845
申请日：2011-06-29
申请人： Atsushi Ohta , Takashi Horiuchi
发明人： Atsushi Ohta , Takashi Horiuchi
IPC分类号： G03F7/20 , G03B27/42 , G03D3/00
CPC分类号： G03F7/70341 , G03B27/42 , G03D3/00 , G03F7/2041 , G03F7/7075
摘要： A lithographic projection apparatus includes a substrate table configured to hold a substrate, a projection system arranged to project a patterned beam of radiation onto the substrate, a liquid supply system configured to supply liquid to a space between the projection system and the substrate, and a residual liquid detector configured to detect liquid remaining on the substrate and/or the substrate table after an exposure is completed. A device manufacturing method includes projecting, using a projection system of a lithographic apparatus, a patterned beam of radiation through a liquid onto a substrate, the substrate being held by a substrate table, and, after the projecting is complete, detecting residual liquid on the substrate and/or the substrate table.
摘要翻译：光刻投影装置包括：被配置为保持基板的基板台;布置成将图案化的辐射束投射到基板上的投影系统;配置成将液体供应到投影系统和基板之间的空间的液体供应系统;以及剩余液体检测器被配置为在曝光完成之后检测残留在基板和/或基板台上的液体。一种器件制造方法包括使用光刻设备的投影系统将图案化的辐射束通过液体投影到衬底上，衬底由衬底台保持，并且在突出完成之后，检测残留液体衬底和/或衬底台。

3. 发明申请

US20150023657A1 Instant photography with ordinary shell film 审中-公开
标题翻译：普通外壳即时摄影
公开(公告)号：US20150023657A1
公开(公告)日：2015-01-22
申请号：US13987361
申请日：2013-07-16
申请人： Robert J. Crowley
发明人： Robert J. Crowley
IPC分类号： G03D3/00 , G03D13/08
CPC分类号： G03C3/00 , G03C8/42
摘要： An improved light sensitive film and processing packet permits the production of rapidly processed, high quality negative films and a positive proof print using a simplified set of components. The reduced components afford more economical manufacture of a sheet type instant film article, with the further advantage that less residual waste material is produced. Integrated functions of negative, processing pod, and receiver sheet provide fast, simplified, yet highly detailed black and white and color photographs to be produced on conventional equipment.
摘要翻译：改进的光敏膜和处理包允许使用简化的组件来生产快速处理的高质量负片和正版印刷品。减少的部件提供了更经济地制造薄片型速溶薄膜制品，其另外的优点是产生更少的残留废料。负片，处理盒和接收片的集成功能可提供快速，简化但高度细致的黑色和白色和彩色照片，可在常规设备上生产。

4. 发明申请

US20110096304A1 DEVELOPING APPARATUS, DEVELOPING METHOD AND STORAGE MEDIUM 有权
标题翻译：开发设备，开发方法和存储介质
公开(公告)号：US20110096304A1
公开(公告)日：2011-04-28
申请号：US12904458
申请日：2010-10-14
申请人： Hirofumi TAKEGUCHI , Tomohiro Iseki , Yuichi Yoshida , Kousuke Yoshihara
发明人： Hirofumi TAKEGUCHI , Tomohiro Iseki , Yuichi Yoshida , Kousuke Yoshihara
IPC分类号： G03B27/52 , G03D3/00
CPC分类号： G03F7/3021
摘要： A pretreatment process, carried out prior to a developing process, spouts pure water, namely, a diffusion-assisting liquid for assisting the spread of a developer over the surface of a wafer, through a cleaning liquid spouting nozzle onto a central part of the wafer to form a puddle of pure water. The developer is spouted onto the central part of the wafer for prewetting while the wafer is rotated at a high rotating speed to spread the developer over the surface of the wafer. The developer dissolves the resist film partly and produces a solution. The rotation of the wafer is reversed, for example, within 7 s in which the solution is being produced to reduce the water-repellency of the wafer by spreading the solution over the entire surface of the wafer. Then, the developer is spouted onto the rotating wafer to spread the developer on the surface of the wafer.
摘要翻译：在显影过程之前进行的预处理过程，喷出纯水，即用于辅助显影剂在晶片表面上的扩散的扩散辅助液体，通过清洗液喷射喷嘴到达晶片的中心部分形成一个纯净的水坑。将显影剂喷射到晶片的中心部分以进行预润湿，同时晶片以高转速旋转以将显影剂铺展在晶片的表面上。显影剂部分地溶解抗蚀剂膜并产生溶液。晶片的旋转例如在7秒内相反，其中产生溶液以通过在晶片的整个表面上扩散溶液来降低晶片的拒水性。然后，将显影剂喷射到旋转的晶片上，以将显影剂铺展在晶片的表面上。

5. 发明授权

US07887323B2 Method and apparatus for manufacturing semiconductor device 失效
标题翻译：用于制造半导体器件的方法和装置
公开(公告)号：US07887323B2
公开(公告)日：2011-02-15
申请号：US11936224
申请日：2007-11-07
申请人： Hak Joon Kim , Jun Hyung Park
发明人： Hak Joon Kim , Jun Hyung Park
IPC分类号： G03D3/00 , G03D7/00 , F27D13/00
CPC分类号： G03F7/70341 , G03F7/70425
摘要： A method and apparatus for manufacturing a semiconductor device is disclosed. In particular, the application discloses a method that performs a lithography process using a material capable of increasing a depth of focus so as to prevent efficiency of the lithography process from being degraded due to high integration of a semiconductor device, and a pressure-type bake oven as an apparatus for forming a high refractive material on a semiconductor substrate, having advantages of reducing manufacturing costs of a semiconductor manufacturing process and increasing efficiency of the lithography process.
摘要翻译：公开了一种用于制造半导体器件的方法和装置。特别地，本申请公开了一种使用能够增加焦深的材料进行光刻处理的方法，以防止由于半导体器件的高度集成而使光刻工艺的效率劣化，并且压力式烘烤烘箱作为在半导体衬底上形成高折射材料的装置，具有降低半导体制造工艺的制造成本和提高光刻工艺的效率的优点。

6. 发明授权

US07874748B2 Photo development apparatus and method for fabricating a color filter substrate using the same 有权
标题翻译：照相显影装置及使用其的彩色滤光片基板的制造方法
公开(公告)号：US07874748B2
公开(公告)日：2011-01-25
申请号：US12616571
申请日：2009-11-11
申请人： Seung Han Paek
发明人： Seung Han Paek
IPC分类号： G03D3/00 , G03D5/00
CPC分类号： G03F7/0007 , G02F1/133516 , G03F7/023 , G03F7/3071 , G03F7/3078
摘要： A photo development apparatus for use in fabricating a color filter substrate for a display panel is disclosed. The disclosed photo apparatus includes a development solution supplier to supply a negative development solution. The photo apparatus also includes a first photo apparatus to form a positive photo-resist pattern to be used in forming a black matrix, wherein the positive photo-resist pattern is formed by patterning a light shielding layer formed on a substrate using the negative development solution and a positive photo-resist.
摘要翻译：公开了一种用于制造显示面板用滤色器基板的照相显影装置。所公开的照相装置包括提供负显影解决方案的开发解决方案供应商。该照相装置还包括形成用于形成黑矩阵的正光刻胶图案的第一照相装置，其中正光致抗蚀剂图案通过使用负显影液图案化形成在基板上的遮光层而形成和正光致抗蚀剂。

7. 发明授权

US07498124B2 Sacrificial surfactanated pre-wet for defect reduction in a semiconductor photolithography developing process 失效
标题翻译：在半导体光刻显影工艺中用于缺陷还原的牺牲表面活性预湿法
公开(公告)号：US07498124B2
公开(公告)日：2009-03-03
申请号：US10675419
申请日：2003-09-30
申请人： John M. Kulp
发明人： John M. Kulp
IPC分类号： G03C5/00 , G03D3/00 , B08B9/04
CPC分类号： G03F7/322
摘要： A method and apparatus for developing a resist on a substrate in which a sacrificial surfactant-containing liquid is first applied to a resist as a pretreatment to reduce developing process defects and to improve the development process time and the uniformity of the resist. The pretreatment is followed by supplying a developing solution to the resist and thereafter developing the resist.
摘要翻译：首先在基材上形成抗蚀剂的方法，其中先将含牺牲表面活性剂的液体施加到抗蚀剂上作为预处理，以减少显影工艺缺陷并改善显影处理时间和抗蚀剂的均匀性。预处理之后，向抗蚀剂供给显影液，然后显影抗蚀剂。

8. 发明申请

US20060104634A1 Mechanical interface using single stroke opener for multi-container chemical cartridge 失效
公开(公告)号：US20060104634A1
公开(公告)日：2006-05-18
申请号：US10988654
申请日：2004-11-15
申请人： Jeffrey Hall , Craig LeFevre , Ralph Piccinino , Kevin Blakely , Stacy Burris , Eduard Kaminker
发明人： Jeffrey Hall , Craig LeFevre , Ralph Piccinino , Kevin Blakely , Stacy Burris , Eduard Kaminker
IPC分类号： G03D3/00
CPC分类号： G03D3/06
摘要： A waste container is received in a photographic processing machine along with a chemical supply container. The supply container is oriented at an angle to horizontal. Ports are provided into the containers with an associated snap cap oriented such that the neck extends vertically when received in the processing machine. A shipping cassette system includes two stacked upper and lower cassettes, each having a plurality of vertical walls that laterally surround an interior volume. A processing machine includes a cap opening bar and a mounting mechanism with a pivot point aligning the bar with the caps of a chemical delivery container assembly along a side of the caps opposite to the side along which the hinges are aligned such that rotation of the cap opening bar about the pivot point simultaneously opens the fluid supply ports by rotating the caps about their hinges.

9. 发明申请

US20050133533A1 Package for photographic processing chemicals 审中-公开
标题翻译：摄影处理化学品包装
公开(公告)号：US20050133533A1
公开(公告)日：2005-06-23
申请号：US11019055
申请日：2004-12-21
申请人： Ralf Wichmann , Gustav Tappe , Tibor Candel-Delic , Boze Marsic
发明人： Ralf Wichmann , Gustav Tappe , Tibor Candel-Delic , Boze Marsic
IPC分类号： B65D1/04 , B65D51/28 , B65D81/32 , G03C5/26 , G03D3/00 , B67D5/60
CPC分类号： G03C5/267 , B65D1/04 , B65D81/3283
摘要： A package for storing photographic processing chemicals and for filling a tank of a processing apparatus with the processing chemicals, which package contains at least two different chemicals spatially separated in chambers, characterized in that the chemicals belong to the same processing step and the package is constructed such that the various chemicals are brought into contact with one another within the package before the tank is filled with them and/or are brought into contact with one another while the tank is filled with them, is distinguished in that it offers the handling advantage of one-component concentrates without the disadvantages thereof and leads to a better reproducibility of the processing compared with the known multi-component formulations.
摘要翻译：一种用于存储摄影处理化学品并用处理化学品填充处理设备的罐的包装，该包装包含在室内空间分离的至少两种不同的化学品，其特征在于，化学品属于相同的处理步骤，并且包装被构造使得各种化学品在罐被填充之前在包装内彼此接触和/或在罐被填充的情况下彼此接触，区别在于它提供了处理优点单组分浓缩物没有其缺点，并且与已知的多组分配方相比导致加工更好的再现性。

10. 发明授权

US06903800B2 Film-processing method and film-processing apparatus 失效
标题翻译：胶片处理方法和胶片处理装置
公开(公告)号：US06903800B2
公开(公告)日：2005-06-07
申请号：US10739019
申请日：2003-12-19
申请人： Tadashi Onishi , Manabu Hama
发明人： Tadashi Onishi , Manabu Hama
IPC分类号： H01L21/312 , G03B27/42 , G03C5/16 , G03D3/00 , H01J7/24 , H01J37/304 , H01L21/30 , H01L21/66 , H01L21/768
CPC分类号： H01L22/26 , H01J37/304 , H01J37/317 , H01J2237/2482 , H01J2237/30466 , H01J2237/3156
摘要： A film-processing method according to the present invention includes: a processing step of irradiating electron beams onto a film on a surface of an object to be processed to conduct a process to the film; an electric-current measuring step of capturing the electron beams in a vicinity of the object to be processed to measure an electric-current value during the processing step; and a detecting step of detecting an end point of the process to the film, based on an amount of electron obtained by means of a time integration of the electric-current value. According to the present invention, a suitable irradiation of the electron beams onto the film on a surface of the object to be processed can be realized. Thus, a suitable film quality can be obtained.
摘要翻译：根据本发明的膜处理方法包括：将电子束照射到待处理物体表面上的膜以对膜进行处理的处理步骤; 电流测量步骤，用于在所述处理步骤期间捕获所述待处理对象附近的电子束以测量电流值; 以及基于通过电流值的时间积分获得的电子量来检测对膜的处理的终点的检测步骤。根据本发明，可以实现将电子束适当地照射到待处理物体的表面上的膜上。因此，可以获得合适的膜质量。

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