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1. 发明申请

US20170235238A1 IMMERSION EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD WITH MEASURING DEVICE 审中-公开
公开(公告)号：US20170235238A1
公开(公告)日：2017-08-17
申请号：US15585664
申请日：2017-05-03
申请人： NIKON CORPORATION
发明人： Kenichi SHIRAISHI
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03B27/42 , G03F7/70875 , G03F7/70916
摘要： An exposure apparatus is capable of accurately performing an exposure process and a measurement process based on a liquid immersion method. The exposure apparatus, which forms a liquid immersion area of a liquid on an image surface side of a projection optical system, and exposes a substrate via the projection optical system and the liquid of the immersion area, includes a measuring device which measures at least one of a property and composition of the liquid for forming the liquid immersion area. The measuring device includes a resistivity meter to obtain information on a specific resistance value of the immersion liquid.

2. 发明授权

US09460604B1 Multifunctional modular system for sensing and utilizing corporal dynamics and impact related forces 有权
标题翻译：多功能模块化系统，用于感知和利用体力动力学和冲击相关力量
公开(公告)号：US09460604B1
公开(公告)日：2016-10-04
申请号：US13925717
申请日：2013-06-24
申请人： Isaac S. Daniel , Jon Oswaks , Vinh T. Nguyen , Gary D. Amundson , Alberto Interian, III
发明人： Isaac S. Daniel , Jon Oswaks , Vinh T. Nguyen , Gary D. Amundson , Alberto Interian, III
IPC分类号： G09B21/00 , G08B21/18
CPC分类号： G08B21/18 , G03B21/26 , G03B27/42 , G03B27/54 , G03B27/58
摘要： A sensor module that includes an outer casing configured to be removably inserted into a receptacle in an article of wear or sports equipment, a processor positioned within the outer casing, an accelerometer connected to the processor, a communications module connected to the processor, a proximity sensor connected to the processor, an identifier sensor connected to the processor, wherein the identifier sensor is configured to read an identifier connected to or embedded in an article of wear or sports equipment, and an alert module connected to the processor.
摘要翻译：一种传感器模块，包括外壳，其被配置为可拆卸地插入到磨损或运动设备的物品中的容器中，位于外壳内的处理器，连接到处理器的加速度计，连接到处理器的通信模块，接近传感器连接到处理器，连接到处理器的标识符传感器，其中标识符传感器被配置为读取连接到或嵌入在磨损或运动设备的物品中的标识符，以及连接到处理器的警报模块。

3. 发明授权

US09460260B2 Enhanced stitching by overlap dose and feature reduction 有权
标题翻译：通过重叠剂量和特征降低增强缝合
公开(公告)号：US09460260B2
公开(公告)日：2016-10-04
申请号：US14622983
申请日：2015-02-16
申请人： Marco Jan-Jaco Wieland
发明人： Marco Jan-Jaco Wieland
IPC分类号： H01L21/263 , G06F17/50 , G03F1/78 , G03F7/20 , H01J37/317 , G03B27/42 , H01J37/302
CPC分类号： G06F17/5081 , G03B27/42 , G03F1/78 , G03F7/2059 , G03F7/70475 , H01J37/3026 , H01J37/3177 , H01J2237/31769 , H01L21/263
摘要： A method for processing exposure data (40) for exposing a pattern on a target (30) using a plurality of charged particle beams (24), the exposure data comprising pattern data (42) representing one or more features (60) to be written on the target (30) and exposure dose data (52) describing exposure dose of the charged particle beams. The method comprises setting one or more dose values of the exposure dose data (52) such that a sum of dose values corresponding to a position in an overlap area (36) of the target exceeds a maximum dose value for the non-overlap areas (38) of the target where adjacent sub-areas (34) do not overlap, and dividing the pattern data (42) into a plurality of sub-sections (44), each of the sub-sections comprising pattern data describing a part of the pattern to be written in a corresponding sub-area (34) of the target (30), wherein the pattern data (42) comprises overlap pattern data (46) describing a part of the pattern to be written in a corresponding overlap area (36) of the target where adjacent sub-areas (34) overlap, and processing the overlap pattern data (46) to reduce a size of one or more features described by the overlap pattern data.
摘要翻译：一种用于处理曝光数据（40）的方法，用于使用多个带电粒子束（24）对目标（30）上的图案进行曝光，所述曝光数据包括表示待写入的一个或多个特征（60）的图案数据（42）（30）和描述带电粒子束的曝光剂量的曝光剂量数据（52）。该方法包括设置曝光剂量数据（52）的一个或多个剂量值，使得对应于目标重叠区域（36）中的位置的剂量值之和超过非重叠区域的最大剂量值（ 38），其中相邻子区域（34）不重叠的目标，并且将模式数据（42）划分为多个子部分（44），每个子部分包括描述部分的图案数据模式被写入目标（30）的相应子区域（34），其中模式数据（42）包括描述要写入对应重叠区域（36）中的模式的一部分的重叠模式数据（46）），并且处理重叠图案数据（46）以减小由重叠图案数据描述的一个或多个特征的大小。

4. 发明申请

US20160130651A1 Biological Analysis Systems, Devices, And Methods 审中-公开
标题翻译：生物分析系统，设备和方法
公开(公告)号：US20160130651A1
公开(公告)日：2016-05-12
申请号：US14997956
申请日：2016-01-18
申请人： LIFE TECHNOLOGIES CORPORATION
发明人： Dennis LEHTO , Steven J. BOEGE
IPC分类号： C12Q1/68 , B01L7/00 , B01L3/00
CPC分类号： C12Q1/6874 , B01J2219/00286 , B01J2219/00306 , B01J2219/005 , B01J2219/00533 , B01J2219/00596 , B01J2219/00648 , B01L3/502 , B01L3/50851 , B01L7/00 , B01L7/52 , B01L9/527 , B01L2200/10 , B01L2300/043 , B01L2300/0822 , B01L2300/0877 , B01L2300/1805 , B01L2300/1811 , B01L2300/1894 , G01N15/1459 , G01N15/1463 , G01N15/1484 , G01N21/0332 , G01N21/05 , G01N2021/0346 , G01N2021/058 , G01N2201/02 , G03B27/42
摘要： A device for performing biological sample reactions may include a plurality of flow cells configured to be mounted to a common microscope translation stage, wherein each flow cell is configured to receive at least one sample holder containing biological sample. Each flow cell also may be configured to be selectively placed in an open position for positioning the at least one sample holder into the flow cell and a closed position for reacting biological sample contained in the at least one sample holder. The plurality of flow cells may be configured to be selectively placed in the open position and the closed position independently of each other.
摘要翻译：用于进行生物样品反应的装置可以包括多个流动池，其构造成安装到普通的显微镜平移台上，其中每个流动池被构造成容纳至少一个含有生物样品的样品架。每个流动池还可以被配置为选择性地放置在打开位置，用于将至少一个样品保持器定位到流动室中，以及用于使包含在至少一个样品保持器中的生物样品反应的关闭位置。多个流动池可以被配置为被选择性地彼此相对放置在打开位置和关闭位置。

5. 发明授权

US09235113B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US09235113B2
公开(公告)日：2016-01-12
申请号：US13149121
申请日：2011-05-31
申请人： Nicolaas Rudolf Kemper , Sjoerd Nicolaas Lambertus Donders , Joost Jeroen Ottens , Edwin Cornelis Kadijk , Sergei Shulepov
发明人： Nicolaas Rudolf Kemper , Sjoerd Nicolaas Lambertus Donders , Joost Jeroen Ottens , Edwin Cornelis Kadijk , Sergei Shulepov
IPC分类号： G03B27/52 , G03B27/42 , G03F7/20
CPC分类号： G03B27/42 , G03F7/70341 , G03F7/70716
摘要： Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.
摘要翻译：描述了光刻投影设备中的漏极的实施例，其具有例如在排水管中不存在液体的时段期间减少气体进入排水管的特征。在一个示例中，提供无源液体移除机构，使得排水管中的气体的压力等于环境气体压力，并且在另一个实施例中，提供了一个挡板，以在不需要液体移除的时间内关闭室。

6. 发明授权

US09229312B2 Exposure apparatus, measurement method, stabilization method, and device fabrication method 有权
标题翻译：曝光装置，测量方法，稳定方法和装置制造方法
公开(公告)号：US09229312B2
公开(公告)日：2016-01-05
申请号：US13102739
申请日：2011-05-06
申请人： Nobuhiko Yabu
发明人： Nobuhiko Yabu
IPC分类号： G03B27/53 , G03B27/68 , G03B27/32 , G03B27/42 , G03F7/20
CPC分类号： G03B27/32 , G03B27/42 , G03F7/70425 , G03F7/70941
摘要： The present invention provides an exposure apparatus including a projection optical system configured to project a reticle pattern onto a wafer, a selector configured to select a dummy wafer to be placed near an image plane of the projection optical system, from a plurality of dummy wafers having the same shape as that of the wafer and different reflectance with each other, a transfer unit configured to place the dummy wafer selected by the selector near the image plane of the projection optical system, and a controller configured to perform control such that dummy exposure is performed by irradiating the dummy wafer, which is placed near the image plane of the projection optical system by the transfer unit, with light via the projection optical system.
摘要翻译：本发明提供了一种曝光装置，包括：投影光学系统，其配置为将光罩图案投影到晶片上;选择器，被配置为从多个伪晶片中选择待放置在投影光学系统的像面附近的虚设晶片，与晶片相同的形状和彼此的反射率不同的传送单元，被配置为将由选择器选择的伪晶片放置在投影光学系统的像面附近的传送单元，以及控制器，被配置为执行控制，使得虚拟曝光是通过经由投影光学系统的光照射通过转印单元放置在投影光学系统的像面附近的伪晶片。

7. 发明授权

US09146474B2 Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger and different linear polarization states in an on-axis area and a plurality of off-axis areas 有权
标题翻译：曝光方法和装置以及在轴上区域和多个离轴区域中制造具有光线大小和不同线偏振状态的光量分布的装置的方法
公开(公告)号：US09146474B2
公开(公告)日：2015-09-29
申请号：US12382277
申请日：2009-03-12
申请人： Takehito Kudo , Shigeru Hirukawa
发明人： Takehito Kudo , Shigeru Hirukawa
IPC分类号： G03F7/20 , G03B27/42
CPC分类号： G03F7/70191 , G03B27/42 , G03F7/70091 , G03F7/701 , G03F7/70108 , G03F7/70158 , G03F7/70566
摘要： An exposure method and apparatus that illuminates a pattern with an illumination system to expose a substrate through a projection system are provided. The pattern is illuminated with illumination light having a light amount distribution, which is set such that an amount of light is larger in an on-axis area substantially including an optical axis and in a plurality of off-axis areas arranged out of the optical axis than in an area other than the on-axis area and the plurality of off-axis areas on a pupil plane of the illumination system. The polarization states of the illumination light are different between the on-axis area and the off-axis areas.
摘要翻译：提供了利用照明系统照亮图案以通过投影系统曝光基板的曝光方法和装置。用具有光量分布的照明光照射图案，该光量被设定为使得在基本上包括光轴的轴上区域中的光量以及布置在光轴外的多个离轴区域中的光量较大而不是在照明系统的光瞳平面上的除了轴上区域和多个离轴区域之外的区域中。照明光的偏振状态在轴上区域和离轴区域之间是不同的。

8. 发明授权

US09128383B2 Sub-resolution assist devices and methods 有权
标题翻译：分解辅助装置和方法
公开(公告)号：US09128383B2
公开(公告)日：2015-09-08
申请号：US14274455
申请日：2014-05-09
申请人： Micron Technology, Inc.
发明人： Anton P. Eppich , Fei Wang
IPC分类号： G03B27/42 , G03F1/00 , G03F1/38 , G03F7/20
CPC分类号： G03F1/38 , G03B27/42 , G03F7/70058 , G03F7/70283 , G03F7/70433
摘要： Photolithographic apparatus, systems, and methods that make use of sub-resolution assist devices are disclosed. In the various embodiments, an imaging mask includes an optically transmissive substrate having a sub-resolution assist device that further includes a first optical attenuation region and a spaced-apart second optical attenuation region, and an optically transmissive phase adjustment region interposed between the first optical attenuation region and the second optical attenuation region, the phase adjustment region being configured to change a phase of incident illumination radiation by altering an optical property of the substrate.
摘要翻译：公开了利用次分解辅助装置的光刻设备，系统和方法。在各种实施例中，成像掩模包括具有副分辨率辅助装置的光学透射基板，其还包括第一光学衰减区域和间隔开的第二光学衰减区域，以及光学透射相位调整区域，介于第一光学衰减区域和第二光衰减区域，所述相位调整区域被配置为通过改变所述衬底的光学特性来改变入射照射辐射的相位。

9. 发明授权

US09041906B2 Immersion exposure apparatus and method that detects liquid adhered to rear surface of substrate 有权
标题翻译：浸渍曝光装置和方法，其检测粘附到基板后表面的液体
公开(公告)号：US09041906B2
公开(公告)日：2015-05-26
申请号：US13936517
申请日：2013-07-08
申请人： NIKON CORPORATION
发明人： Hiroaki Takaiwa , Takashi Horiuchi
IPC分类号： G03F7/20 , G03B27/42
CPC分类号： G03F7/70341 , G03B27/42 , G03F7/7085 , G03F7/70916
摘要： An exposure apparatus exposes a substrate via a projection optical system and a liquid. The exposure apparatus includes a stage that is movable below the projection optical system while holding the substrate and a detector that is capable of detecting a liquid adhered to a rear surface of the substrate. As an alternative, or in addition, the apparatus can include a detector that is capable of detecting a liquid adhered to an optical member disposed at the stage.
摘要翻译：曝光装置经由投影光学系统和液体露出基板。曝光装置包括在保持基板的同时在投影光学系统下方移动的台，以及能够检测粘附到基板的后表面的液体的检测器。作为替代或另外，该装置可以包括检测器，其能够检测粘附到设置在该阶段的光学构件的液体。

10. 发明授权

US09025136B2 System and method for manufacturing three dimensional integrated circuits 有权
标题翻译：制造三维集成电路的系统和方法
公开(公告)号：US09025136B2
公开(公告)日：2015-05-05
申请号：US13225404
申请日：2011-09-02
申请人： Jang Fung Chen , Thomas Laidig
发明人： Jang Fung Chen , Thomas Laidig
IPC分类号： G03B27/44 , G03F7/20
CPC分类号： G03B27/42 , G03F7/70275 , G03F7/70283 , G03F7/70291 , G03F7/70391 , G03F7/70433 , G03F7/70475 , G03F7/70491 , G03F7/70508
摘要： System and method for manufacturing three-dimensional integrated circuits are disclosed. In one embodiment, the method includes providing an imaging writer system that includes a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays, receiving mask data to be written to one or more layers of the three-dimensional integrated circuit, processing the mask data to form a plurality of partitioned mask data patterns corresponding to the one or more layers of the three-dimensional integrated circuit, assigning one or more SLM imaging units to handle each of the partitioned mask data pattern, and controlling the plurality of SLM imaging units to write the plurality of partitioned mask data patterns to the one or more layers of the three-dimensional integrated circuits in parallel. The method of assigning performs at least one of scaling, alignment, inter-ocular displacement, rotational factor, or substrate deformation correction.
摘要翻译：公开了用于制造三维集成电路的系统和方法。在一个实施例中，该方法包括提供一种成像写入器系统，该系统包括布置在一个或多个并行阵列中的多个空间光调制器（SLM）成像单元，接收要写入三维集成的一个或多个层的掩模数据处理掩模数据以形成与三维集成电路的一层或多层相对应的多个划分的掩模数据模式，分配一个或多个SLM成像单元以处理每个分割的掩模数据模式，并且控制多个SLM成像单元将多个划分的掩模数据图案并行地写入三维集成电路的一个或多个层。分配方法执行缩放，对准，眼内位移，旋转因子或基底变形校正中的至少一个。

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