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1. 发明授权

US11609492B2 Device having color resists pattern 有权
公开(公告)号：US11609492B2
公开(公告)日：2023-03-21
申请号：US16566337
申请日：2019-09-10
申请人： Ming-An Hsu
发明人： Ming-An Hsu
IPC分类号： H05K1/00 , G03F7/00 , G03F7/105 , G03F7/18 , G03F7/20 , G03F7/24 , G03F7/38 , H05K1/02 , H05K1/03 , G03F1/60
摘要： A device having a color photo resist pattern includes a 3D substrate, at least one color photo resist layer and at least one circuit pattern layer. The at least one color photo resist layer is formed on said 3D substrate and forms a visual pattern together. The at least one circuit pattern layer is formed on said visual pattern formed by said at least one color photo resist layer.

2. 发明授权

US10901319B2 Apparatus for forming an ophthalmic lens 有权
公开(公告)号：US10901319B2
公开(公告)日：2021-01-26
申请号：US16740607
申请日：2020-01-13
申请人： Johnson & Johnson Vision Care, Inc.
发明人： Michael F Widman , John B Enns , P. Mark Powell , Peter W Sites
IPC分类号： G03F7/24 , B29D11/00 , B28B17/00 , B29C35/08 , B29C39/26 , G02C7/04 , B33Y80/00 , B33Y70/00
摘要： This invention discloses apparatus for generating an ophthalmic lens with at least a portion of one surface free-formed from a Reactive Mixture. In some embodiments, an ophthalmic lens is formed on a substrate with an arcuate optical quality surface via a source of actinic radiation controllable to cure a definable portion of a volume of Reactive Mixture.

3. 发明授权

US10683185B2 Processing system and device manufacturing method 有权
公开(公告)号：US10683185B2
公开(公告)日：2020-06-16
申请号：US16276102
申请日：2019-02-14
申请人： NIKON CORPORATION
发明人： Yoshiaki Kito , Masaki Kato , Kei Nara , Masakazu Hori
IPC分类号： B65H20/34 , B65H20/02 , B65H20/24 , B65H18/10 , B65H23/188 , G03F7/16 , G03F7/24 , G03F9/00 , G03F7/30 , H01L21/677 , H01L21/67
摘要： A processing system and a device manufacturing method that can perform manufacturing of an electronic device without stopping the entire manufacturing system, even when the processing state actually implemented on a sheet substrate by a processing device differs from the target processing state. A processing system for sequentially conveying a long, flexible sheet substrate along a length direction to each of a first through a third processing device to form a predetermined pattern on the sheet substrate, wherein the first through the third processing devices implement a predetermined process relating to the sheet substrate according to setting conditions set to each processing device, and when at least one from among the states of the actual processing implemented on the sheet substrate by each of the first through the third processing devices exhibits a processing error relative to a target processing state, changes other setting conditions, separate from the setting conditions exhibiting the processing error, according to the processing error.

4. 发明授权

US10599035B2 Method of improving light stability of flexographic printing plates featuring flat top dots 有权
公开(公告)号：US10599035B2
公开(公告)日：2020-03-24
申请号：US15485504
申请日：2017-04-12
申请人： MacDermid Graphics Solutions, LLC
发明人： Chouaib Boukaftane , Eric Lee
IPC分类号： G03F7/00 , G03F7/031 , G03F7/24 , G03F7/20 , B29C35/08 , B41N1/12
摘要： A photocurable relief image printing blank comprising: (a) a support layer; (b) one or more photocurable layers disposed on the support layer, wherein the one or more photocurable layers comprise: i) a binder; ii) one or more monomers; iii) an alpha-aminoketone photoinitiator; and optionally, iv) an additive selected from the group consisting of phosphites, phosphines, thioether amine compounds, and combinations of one or more of the foregoing; (c) a laser ablatable masking layer disposed on the one or more photocurable layers, the laser ablatable masking layer comprising a radiation opaque material; and (d) optionally, a removable coversheet. Upon exposure and development, the resulting relief image printing element does not degrade if left under ambient lights for an extended period of time.

5. 发明授权

US10473914B2 Electrofluidic display and methods for making 有权
公开(公告)号：US10473914B2
公开(公告)日：2019-11-12
申请号：US15670438
申请日：2017-08-07
申请人： University Of Cincinnati
发明人： Eric Kreit , John David Rudolph , Kenneth A. Dean
IPC分类号： G02B26/00 , G02B26/08 , G02F1/29 , G02F1/17 , B32B37/18 , B32B37/12 , B32B38/00 , B32B37/00 , G03F7/24
摘要： A method for manufacturing a freestanding film having at least one population of through holes cumulatively totaling at least 1% of the film area, wherein the standard deviation of hole diameters is less than 25% and a thickness less than 25 micrometers, The film provides a carrier substrate, a photo-curable material, a release agent and deposits a photo-curable material on the substrate, selectively curing the material and leaving uncured material in the pattern of holes, dissolving away the uncured material and removing the cured material from the carrier substrate. Methods and apparatus are described.

6. 发明授权

US10457082B2 Flexographic printing plate with improved storage stability 有权
公开(公告)号：US10457082B2
公开(公告)日：2019-10-29
申请号：US15590068
申请日：2017-05-09
申请人： MacDermid Graphics Solutions, LLC
发明人： Eric Lee , Chouaib Boukaftane
IPC分类号： G03F7/20 , B41N1/14 , G03F7/029 , G03F7/031 , G03F7/24 , B41N1/12 , G03F7/028
摘要： A method of making a relief image printing element comprising a plurality of relief printing dots. The method includes the steps of imagewise exposing at least one photocurable layer to actinic radiation to selectively crosslink and cure portions of the at least one photocurable layer; and developing the relief image printing element to separate and remove uncrosslinked and uncured portions of the at least one photocurable layer to reveal the relief image therein. The at least one photocurable layer includes a photoinitiator exhibiting a quantum yield of initiation (Qi) of more than 0.05 at a 365 nm wavelength. The substrate has an optical density from 0.5 to 5 in the wavelength range of 365 nm to 450 nm but preferably allows transmission of from 0.1% to 10% of incident light in the wavelength range of 365 nm to 450 nm.

7. 发明申请

US20180307138A1 MICROSTRUCTURE PATTERNS 审中-公开
公开(公告)号：US20180307138A1
公开(公告)日：2018-10-25
申请号：US15767990
申请日：2016-10-13
申请人： MicroTau IP Pty Ltd
发明人： Henry Claudius BILINSKY
IPC分类号： G03F7/038 , B64G1/22 , G03F7/20 , G03F7/24 , G03F7/30
CPC分类号： G03F7/038 , B64G1/22 , C09D133/00 , G03F7/201 , G03F7/24 , G03F7/30
摘要： In one aspect, there is provided a method of creating a microstructure pattern on an exterior surface of an aircraft, boat, automobile or other vehicle is disclosed. A layer of photopolymer (44) is applied to the top coat or substrate (43) by nozzles (45). The photopolymer is selectively irradiated to activate its photoinitiator and the unirradiated polymer is removed. The irradiation can be via a mask (49) which does not come into contact with the polymer, or via a beam splitting arrangement (63, 64) or a diffraction grating (71). The pattern can be formed by either leaving the exposed photopolymer in situ, or using the exposed photopolymer to mask the substrate, etching the substrate, and then removing the exposed photopolymer. In another aspect, there is provided a method 1100 comprising the step 1102 of applying a layer of photocurable material to the exterior surface, the step 1104 of irradiating the photocurable material with radiation including a predetermined irradiation intensity profile, and the step 1106 of removing uncured photocurable material to form the microstructure pattern. The radiation initiates curing of the irradiated photocurable material, causing a curing depth profile across the layer of the photocurable material corresponding to the selected intensity pro file.

8. 发明申请

US20180281239A1 CYLINDRICAL BASE, MASTER AND MASTER MANUFACTURING METHOD 审中-公开
公开(公告)号：US20180281239A1
公开(公告)日：2018-10-04
申请号：US15950596
申请日：2018-04-11
申请人： DEXERIALS CORPORATION
发明人： Yutaka MURAMOTO , Masanao KIKUCHI , Shunichi KAJIYA , Takaaki OTOWA , Yasuhiro TAKAHASHI
IPC分类号： B29C33/42 , G11B7/26 , B29C33/38 , G03F7/00 , G03F7/24 , B29C35/08 , B29C41/28 , B29C59/04 , C03C15/00 , B29D11/00 , B29L11/00
摘要： Provided are a cylindrical base, a master and a method for manufacturing a master enabling a uniform transfer of a fine pattern. A cylindrical base of a quartz glass having an internal strain in terms of birefringence of less than 70 nm/cm is used. A resist layer is deposited to an outer circumference surface of this cylindrical base, a latent image is formed on the resist layer, the latent image formed on the resist layer is developed and the pattern of the developed resist layer is used as a mask for etching to form a structure including concaves or convexes arranged in a plurality of rows on the outer circumference surface of the cylindrical base.

9. 发明授权

US10036854B2 Digital roller mold manufacturing system 有权
公开(公告)号：US10036854B2
公开(公告)日：2018-07-31
申请号：US14964276
申请日：2015-12-09
申请人： National Cheng Kung University
发明人： Yung-Chun Lee , Hung-Liang Chien
IPC分类号： G03F7/20 , G02B26/08 , G02B6/32 , G03F7/00 , G03F7/24
摘要： A digital roller mold manufacturing system for manufacture of exterior characteristic structures on a roller mold depends on an illuminator for generation and projection of a light source on a Digital Mirror Device (DMD) chip in which micro-mirrors are rotated a controllable angle for defining the light source as an optical image and projecting the optical image on first micro-lenses at which digital light energy is transformed from the optical image and transmitted to first optical fibers, second optical fibers via couplers, and second micro-lenses. Furthermore, the second micro-lenses focus the digital light energy as light spots which are received by a photo-resist layer externally covered on the roller for development of patterns with exterior characteristic structures on the roller mold because a control unit regulates rotations of the roller and horizontal shifts of second micro-lenses.

10. 发明授权

US10007190B2 Substrate processing apparatus, processing apparatus, and method for manufacturing device 有权
公开(公告)号：US10007190B2
公开(公告)日：2018-06-26
申请号：US15438579
申请日：2017-02-21
申请人： NIKON CORPORATION
发明人： Masaki Kato , Tohru Kiuchi
IPC分类号： G03F7/20 , G03F7/16 , G03F7/24
CPC分类号： G03F7/70366 , G03F7/16 , G03F7/20 , G03F7/24 , G03F7/42 , G03F7/70 , G03F7/70641 , G03F7/70758 , G03F7/70775 , G03F7/70791 , G03F9/00
摘要： A substrate processing apparatus includes: a rotary cylindrical member (DR) that includes a cylindrical supporting surface curved with a constant radius from a predetermined center line (AX2) and that feeds a substrate (P) in a length direction of the substrate; a processing mechanism that performs a predetermined process on the substrate at a specific position (PA, EL2) of a part of the substrate; a scale member (SD) that rotates about the center line along with the rotary cylindrical member so as to measure a displacement in a circumferential direction of the supporting surface of the rotary cylindrical member or a displacement in a direction of the center line of the rotary cylindrical member and that includes a scale portion (GP) carved in a ring shape; and a reading mechanism (EN1, EN2) that faces the scale portion, that is disposed in substantially a same direction as the specific position when viewed from the center line, and that reads the scale portion.

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