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    • 2. 发明申请
    • Ultraviolet erasable semiconductor memory device
    • 紫外线可擦除半导体存储器件
    • US20050232026A1
    • 2005-10-20
    • US11053851
    • 2005-02-10
    • Yukihisa Kumagai
    • Yukihisa Kumagai
    • G11C16/04G11C5/00G11C8/00G11C11/34G11C11/42G11C16/00G11C16/06G11C16/18H01L21/8247H01L27/10H01L27/115H01L29/78H01L29/788H01L29/792
    • G11C16/18G11C8/00
    • Each memory cell of an EPROM contains two MOSFETs and a data of each memory cell is read out by detecting a current difference between the two MOSFETs by using a differential amplifier. In such constitution as described above, even when the data is erased by irradiating an ultraviolet ray, a stable output of the differential amplifier can be obtained and, therefore, confirmation of an initialized state can be facilitated. Specifically, a channel width WA of one of the two MOSFETs constituting the memory cell is formed narrower than a channel width WB of the other. By such arrangement as described above, in an initialized state in which the ultraviolet ray is irradiated, a data signal current value IHA of the MOSFET having the channel width WA becomes smaller than a data signal current value IHB flowing in the MOSFET having the channel width WB. Accordingly, the output of the differential amplifier is fixed in accordance with a current magnitude relation of IHA
    • EPROM的每个存储单元包含两个MOSFET,并且通过使用差分放大器检测两个MOSFET之间的电流差来读出每个存储单元的数据。 在这样构成的情况下,即使通过照射紫外线来擦除数据,也能够获得稳定的差分放大器的输出,因此能够促进初始化状态的确认。 具体地,构成存储单元的两个MOSFET之一的沟道宽度W A A A形成得窄于另一个的沟道宽度W B B。 通过如上所述的布置,在照射紫外线的初始化状态下,具有沟道宽度W A A的MOSFET的数据信号电流值I H HA < 小于在具有沟道宽度W B的MOSFET中流动的数据信号电流值I HB。 因此,差分放大器的输出根据I H B H I H B B的电流大小关系固定,从而定义数据“0”。 另一方面,在写入数据“1”时,将电荷注入具有沟道宽度W B B的MOSFET的浮置栅电极以提高阈值电压Vt,然后,MOSFET为 设置为“关闭”状态。
    • 4. 发明授权
    • Sealed semiconductor chip and process for fabricating sealed
semiconductor chip
    • 密封半导体芯片和制造密封半导体芯片的工艺
    • US5856705A
    • 1999-01-05
    • US734445
    • 1996-10-17
    • Chiu H. Ting
    • Chiu H. Ting
    • G11C16/18H01L23/00H01L23/29H01L23/31H01L21/78H01L29/34
    • H01L23/564G11C16/18H01L23/291H01L23/3171H01L2924/0002
    • Described is a structure and process for forming a hermetically sealed chip. This hermetically sealed chip will greatly simplify packaging requirements and eventually lead to the realization of a "packageless chip". The hermetic sealing is composed of two parts, an extremely thin passivation layer which is deposited over the entire chip top and side surfaces and a passivation layer which is deposited over the bonding pad surface. Preferably, SiN is deposited as a chip surface passivation layer and Ni is selectively deposited as a metal passivation layer. The extremely thin nitride layer will minimize the stress and the amount of hydrogen in the SiN film and minimize deleterious effects upon device performance caused by stress and hydrogen. The thickness of the metal passivation layer may be the same as that of the dielectric layer so as to give a planar surface or it may be thick enough so as to give a protruding metal passivation bump.
    • 描述了形成密封芯片的结构和工艺。 这种密封芯片将大大简化封装要求,最终导致实现“无封装芯片”。 气密密封由两部分组成,其沉积在整个芯片顶部和侧表面上的极薄的钝化层和沉积在焊盘表面上的钝化层。 优选地,SiN作为芯片表面钝化层沉积,并且Ni被选择性地沉积为金属钝化层。 极薄的氮化物层将使SiN膜中的应力和氢的量最小化,并使由应力和氢引起的对器件性能的有害影响最小化。 金属钝化层的厚度可以与电介质层的厚度相同,以便得到平坦的表面,或者可以足够厚以便产生突出的金属钝化凸块。
    • 5. 发明授权
    • Process for fabricating sealed semiconductor chip using silicon nitride
passivation film
    • 使用氮化硅钝化膜制造密封半导体芯片的工艺
    • US5300461A
    • 1994-04-05
    • US8469
    • 1993-01-25
    • Chiu H. Ting
    • Chiu H. Ting
    • G11C16/18H01L23/00H01L23/29H01L23/31H01L21/80
    • H01L23/564G11C16/18H01L23/291H01L23/3171H01L2924/0002
    • Described is a structure and process for forming a hermetically sealed chip. This hermetically sealed chip will greatly simplify packaging requirements and eventually lead to the realization of a "packageless chip". The hermetic sealing is composed of two parts, an extremely thin passivation layer which is deposited over the entire chip top and side surfaces and a passivation layer which is deposited over the bonding pad surface. Preferably, SiN is deposited as a chip surface passivation layer and Ni is selectively deposited as a metal passivation layer. The extremely thin nitride layer will minimize the stress and the amount of hydrogen in the SiN film and minimize deleterious effects upon device performance caused by stress and hydrogen. The thickness of the metal passivation layer may be the same as that of the dielectric layer so as to give a planar surface or it may be thick enough so as to give a protruding metal passivation bump.
    • 描述了形成密封芯片的结构和工艺。 这种密封芯片将大大简化封装要求,最终导致实现“无封装芯片”。 气密密封由两部分组成,其沉积在整个芯片顶部和侧表面上的极薄的钝化层和沉积在焊盘表面上的钝化层。 优选地,SiN作为芯片表面钝化层沉积,并且Ni被选择性地沉积为金属钝化层。 极薄的氮化物层将使SiN膜中的应力和氢的量最小化,并使由应力和氢引起的对器件性能的有害影响最小化。 金属钝化层的厚度可以与电介质层的厚度相同,以便得到平坦的表面,或者可以足够厚以便产生突出的金属钝化凸块。
    • 7. 发明授权
    • Method for making a ceramic lid for hermetic sealing of an EPROM circuit
    • 制造用于EPROM电路气密密封的陶瓷盖的方法
    • US5043004A
    • 1991-08-27
    • US574668
    • 1990-08-29
    • Nobuaki Miyauchi
    • Nobuaki Miyauchi
    • C04B37/04G11C16/18
    • G11C16/18
    • An assembly structure and a method for making a ceramic lid for a hermetically sealed package for an EPROM circuit are disclosed. The assembly structure includes, in combination, a ceramic lid, a UV transparent lens, and two fixtures for supporting the lens in the lid. The two fixtures are configured to contact the lens only at predetermined areas which are not crucial to UV transparency. The UV transparent lens is hermetically sealed to the ceramic lid by firing the assembly structure. The assembly structure prevents the lens from attracting foreign particulate matter during firing, thereby leaving the surfaces of the lens clean. The method provides a ceramic lid having a UV transparent lens hermetically sealed thereto, which finds wide use in integrated circuit packages for high-density EPROM's because of the untainted surfaces of the lens.
    • 公开了一种用于制造用于EPROM电路的气密封装的陶瓷盖的组装结构和方法。 组合结构包括陶瓷盖,UV透明透镜和用于将透镜支撑在盖中的两个固定装置。 两个固定装置被配置成仅在对UV透明度至关重要的预定区域接触透镜。 UV透明透镜通过烧结组装结构而密封在陶瓷盖上。 组装结构防止了镜头在烧制过程中吸引外来颗粒物,从而使透镜的表面清洁。 该方法提供了一种具有密封在其上的UV透明透镜的陶瓷盖,其由于透镜的未被保持的表面而被广泛用于高密度EPROM的集成电路封装中。