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1. 发明授权

US11315758B2 Impedance matching using electronically variable capacitance and frequency considerations 有权
公开(公告)号：US11315758B2
公开(公告)日：2022-04-26
申请号：US16502656
申请日：2019-07-03
申请人： Reno Technologies, Inc.
发明人： Imran Ahmed Bhutta
IPC分类号： H01J7/24 , H05B31/26 , H01J37/32 , H03H7/38 , H01L21/02 , H01L21/311 , H01L21/3213 , H01L21/285
摘要： In one embodiment, the present disclosure is directed to an RF impedance matching network that includes an electronically variable capacitor (EVC) and a control circuit. The control circuit is coupled to a sensor configured to detecting an RF parameter. To cause an impedance match between an RF source and a plasma chamber, the control circuit determines, using a match lookup table with a value based on the detected RF parameter, a match combination of a new EVC configuration for providing a new EVC capacitance, and a new source frequency for the RF source. The control circuit then alters the EVC to the new EVC configuration, and alters the variable frequency of the RF source to the new source frequency.

2. 发明授权

US11120971B2 Diagnostics for impedance matching network 有权
公开(公告)号：US11120971B2
公开(公告)日：2021-09-14
申请号：US16685698
申请日：2019-11-15
申请人： Reno Technologies, Inc.
发明人： Chingping Huang , Michael Gilliam Ulrich , Tomislav Lozic , Ronald Anthony Decker , Imran Ahmed Bhutta , Bala Kandampalayam
IPC分类号： H01J7/24 , H05B31/26 , H01J37/32 , H01L21/3213 , H01L21/311 , H01L21/285 , H03H11/28 , H01L21/02
摘要： In one embodiment, the present disclosure is directed to a method for performing diagnostics on a matching network that utilizes an electronically variable capacitor (EVC). According to the method, all the discrete capacitors of the EVC are switched out. At a first node, a parameter associated with a current flowing between a power supply and one or more of the switches of the discrete capacitors is measured. The method then switches in, one at a time, each discrete capacitor of the EVC. Upon the switching in of each discrete capacitor, the method remeasures the parameter at the first node and determines whether a change to the parameter at the first node is within a predetermined range to determine whether the corresponding switch, driver circuit, or filter of the discrete capacitor most recently switch in has failed.

3. 发明授权

US10923306B2 Ion source with biased extraction plate 有权
公开(公告)号：US10923306B2
公开(公告)日：2021-02-16
申请号：US16351956
申请日：2019-03-13
申请人： Applied Materials, Inc.
发明人： Svetlana B. Radovanov , Bon-Woong Koo , Alexandre Likhanskii
IPC分类号： H05B31/26 , H01J7/24 , H01J27/02 , H01J27/08
摘要： An indirectly heated cathode ion source having an electrically isolated extraction plate is disclosed. By isolating the extraction plate, a different voltage can be applied to the extraction plate than to the body of the arc chamber. By applying a more positive voltage to the extraction plate, more efficient ion source operation with higher plasma density can be achieved. In this mode the plasma potential is increased, and the electrostatic sheath reduces losses of electrons to the chamber walls. By applying a more negative voltage, an ion rich sheath adjacent to the extraction aperture can be created. In this mode, conditioning and cleaning of the extraction plate is achieved via ion bombardment. Further, in certain embodiments, the voltage applied to the extraction plate can be pulsed to allow ion extraction and cleaning to occur simultaneously.

4. 发明授权

US10727029B2 Impedance matching using independent capacitance and frequency control 有权
公开(公告)号：US10727029B2
公开(公告)日：2020-07-28
申请号：US16524805
申请日：2019-07-29
申请人： Reno Tchnologies, Inc.
发明人： Michael Gilliam Ulrich , Imran Ahmed Bhutta
IPC分类号： H01J7/24 , H05B31/26 , H01J37/32 , H01L21/02 , H01L21/3065
摘要： In one embodiment, the present disclosure is directed to an RF impedance matching network that includes an RF input coupled to an RF source, an RF output coupled to a plasma chamber, and an electronically variable capacitor (EVC). A first control circuit controls the EVC and is separate and distinct from a second control circuit controlling the RF source. To assist in causing an impedance match between the RF source and the plasma chamber, the first control circuit determines, using a match lookup table with a value based on a detected RF parameter, a new EVC configuration for providing a new EVC capacitance. To further cause the impedance match, the second control circuit alters the variable frequency of the RF source, but operates independently from the first control circuit.

5. 发明授权

US10438773B1 High power ion beam generator systems and methods 有权
公开(公告)号：US10438773B1
公开(公告)日：2019-10-08
申请号：US16196710
申请日：2018-11-20
申请人： PHOENIX LLC
发明人： Arne Kobernik , Carl Sherven , Casey Lamers , Chris Seyfert , Evan Sengbusch , Gabriel Becerra , Jin Lee , Logan Campbell , Mark Thomas , Michael Taylor , Preston Barrows , Ross Radel , Tye Gribb
IPC分类号： H01J7/24 , H05B31/26 , H01J37/32 , H01T23/00
摘要： Provided herein are high energy ion beam generator systems and methods that provide low cost, high performance, robust, consistent, uniform, low gas consumption and high current/high-moderate voltage generation of neutrons and protons. Such systems and methods find use for the commercial-scale generation of neutrons and protons for a wide variety of research, medical, security, and industrial processes.

6. 发明授权

US10115569B2 Plasma generator 有权
公开(公告)号：US10115569B2
公开(公告)日：2018-10-30
申请号：US15487985
申请日：2017-04-14
申请人： JEHARA CORPORATION
发明人： Hongseub Kim
IPC分类号： H01J7/24 , H05B31/26 , H01J37/32
摘要： Provided is a plasma generator for improving uniformity of plasma. The plasma generator which includes a pair of source electrode unit 110 and bias electrode unit 120 disposed to face each other in a vacuum chamber and an RF power unit 132 and a bias RF power unit 142 supplying RF power to the source electrode unit 110 and the bias electrode unit 120, respectively, comprises a common contact point cc which is connected with a plurality of contact points cp disposed along the edge of the source electrode unit 110; and an impedance controller 150 which is connected with the common contact point cc to control the impedance.

7. 发明授权

US09859101B2 Plasma processing apparatus and plasma processing method 有权
公开(公告)号：US09859101B2
公开(公告)日：2018-01-02
申请号：US15591197
申请日：2017-05-10
申请人： TOKYO ELECTRON LIMITED
发明人： Shinji Kubota
IPC分类号： H05B31/26 , H01J37/32
CPC分类号： H01J37/32165 , H01J37/32082 , H01J37/32146 , H01J37/32816
摘要： A plasma processing apparatus includes a processing chamber, a carrier wave group generation unit and a plasma generation unit. The carrier wave group generation unit is configured to generate a carrier wave group including a plurality of carrier waves having different frequencies in a frequency domain. The carrier wave group is represented by an amplitude waveform in which a first peak and a second peak of which absolute value is smaller than an absolute value of the first peak alternately appear in a time domain. The plasma generation unit is configured to generate a plasma in the processing chamber by using the carrier wave group.

8. 发明授权

US09509266B2 Feedback control and coherency of multiple power supplies in radio frequency power delivery systems for pulsed mode schemes in thin film processing 有权
标题翻译：用于薄膜处理中的脉冲模式方案的射频功率传递系统中的多个电源的反馈控制和一致性
公开(公告)号：US09509266B2
公开(公告)日：2016-11-29
申请号：US14324540
申请日：2014-07-07
申请人： MKS Instruments, Inc.
发明人： David J. Coumou , Richard Pham
IPC分类号： H05B31/26 , B23K10/00 , H03G1/00 , H03H7/40 , H03F1/02 , H03F1/56 , H03F3/189 , H03F3/20
CPC分类号： H03G1/00 , H03F1/0211 , H03F1/56 , H03F3/189 , H03F3/20 , H03H7/40
摘要： A RF power supply system for delivering periodic RF power to a load. A power amplifier outputs a RF signal to the load. A sensor measures the RF signal provided to the load and outputs signals that vary in accordance with the RF signal. A first feedback loop enables control the RF signal based upon power determined in accordance with output from the sensor. A second feedback loop enables control the RF signal based upon energy measured in accordance with signals output from the sensor. Energy amplitude and duration provide control values for varying the RF signal. The control system and techniques are applicable to both pulsed RF power supplies and in various instances to continuous wave power supplies.
摘要翻译：用于向负载提供周期性RF功率的RF电源系统。功率放大器将RF信号输出到负载。传感器测量提供给负载的RF信号，并输出根据RF信号变化的信号。第一反馈环路使得能够根据根据传感器的输出确定的功率来控制RF信号。第二反馈回路使得能够根据根据从传感器输出的信号测量的能量来控制RF信号。能量幅度和持续时间提供用于改变RF信号的控制值。控制系统和技术适用于脉冲式RF电源以及各种情况下的连续波浪电源。

9. 发明授权

US09398678B2 Method and device for forming a plasma beam 有权
标题翻译：用于形成等离子体束的方法和装置
公开(公告)号：US09398678B2
公开(公告)日：2016-07-19
申请号：US13825913
申请日：2011-09-14
申请人： Ane Aanesland , Pascal Chabert , Michael Irzyk , Stéphane Mazouffre
发明人： Ane Aanesland , Pascal Chabert , Michael Irzyk , Stéphane Mazouffre
IPC分类号： H01J7/24 , H05B31/26 , H05H1/24 , H01J27/02 , H01J27/16 , H05H1/54 , F03H1/00
CPC分类号： H05H1/24 , F03H1/0025 , H01J27/024 , H01J27/16 , H05H1/54
摘要： The invention relates to a method and device for forming a plasma beam. According to the invention: the quality of the electroneutrality of the plasma beam (PB) is detected (in 12 and/or 13); and the alternating polarization potentials of the extraction and acceleration grid (4) are adjusted such that the plasma beam (PB) is at least approximately electrically neutral.
摘要翻译：本发明涉及一种用于形成等离子体束的方法和装置。根据本发明：检测等离子体束（PB）的电中性的质量（12和/或13）; 并且调整提取和加速栅格（4）的交变极化电位，使得等离子体束（PB）至少大致电中性。

10. 发明授权

US09392752B2 Plasma growth lamp for horticulture 有权
标题翻译：园艺等离子体生长灯
公开(公告)号：US09392752B2
公开(公告)日：2016-07-19
申请号：US14277024
申请日：2014-05-13
申请人： Topanga USA, Inc.
发明人： Douglas A. Doughty
IPC分类号： H05B31/26 , A01G7/04 , H01J65/04
CPC分类号： A01G7/045 , H01J61/025 , H01J61/125 , H01J61/20 , H01J61/40 , H01J61/827 , H01J65/042 , Y02P60/146
摘要： A lamp apparatus for horticulture lighting is disclosed. The lamp apparatus is a high intensity electrodeless plasma lamp with an optimized spectrum for horticulture applications. The spectrum is provided from single light source and consists of peaks in the blue range of the spectrum, 400 nm to 470 nm, needed for early growth cycle of the plant as well as peaks in the red range of the spectrum, 600 nm to 700 nm, desirable for flowering cycle while providing lower amount of light in the green spectral region which is typically reflected by the plants. The ratio of the red spectrum to blue spectrum provided by the lamp can be varied by adjusting the RF power to the lamp.
摘要翻译：公开了一种用于园艺照明的灯具。灯装置是具有用于园艺应用的优化光谱的高强度无电极等离子体灯。该光谱由单一光源提供，由在植物的早期生长周期所需的400nm至470nm的光谱蓝色范围内的峰以及在光谱的红色范围内的峰值组成，600nm至700nm nm，对于通常由植物反射的绿色光谱区域中提供更少量的光而开花循环是期望的。由灯提供的红色光谱与蓝色光谱的比例可以通过调节灯的RF功率来改变。

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