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1. 发明申请

US20230080083A1 Variable Thickness Ion Source Extraction Plate 有权
公开(公告)号：US20230080083A1
公开(公告)日：2023-03-16
申请号：US17473096
申请日：2021-09-13
申请人： Applied Materials, Inc.
发明人： Alexandre Likhanskii , Alexander S. Perel , Jay T. Scheuer , Bon-Woong Koo , Robert C. Lindberg , Peter F. Kurunczi , Graham Wright
IPC分类号： H01J27/02 , H01J37/08
摘要： An ion source having an extraction plate with a variable thickness is disclosed. The extraction plate has a protrusion on its interior or exterior surface proximate the extraction aperture. The protrusion increases the thickness of the extraction aperture in certain regions. This increases the loss area in those regions, which serves as a sink for ions and electrons. In this way, the plasma density is decreased more significantly in the regions where the extraction aperture has a greater thickness. The shape of the protrusion may be modified to achieve the desired plasma uniformity. Thus, it may be possible to create an extracted ion beam having a more uniform ion density. In some tests, the uniformity of the beam current along the width direction was improved by between 20% and 50%.

2. 发明申请

US20220216027A1 CHARGED PARTICLE BEAM SOURCE, SURFACE PROCESSING APPARATUS AND SURFACE PROCESSING METHOD 有权
公开(公告)号：US20220216027A1
公开(公告)日：2022-07-07
申请号：US17575429
申请日：2022-01-13
申请人： Oxford Instruments Nanotechnology Tools Limited
发明人： David Pearson , Sebastien Pochon , Joao Ferreira
IPC分类号： H01J37/08 , H01J27/02 , H01J37/32
摘要： A charged particle beam source for a surface processing apparatus is disclosed. The charged particle beam source comprises: a plasma chamber; a plasma generation unit adapted to convert an input gas within the plasma chamber into a plasma containing charged particles; and a grid assembly adjacent an opening of the plasma chamber. The grid assembly comprises one or more grids each having a plurality of apertures therethrough, the one or more grids being electrically biased in use so as to accelerate charged particles from the plasma through the grid(s) to thereby output a charged particle beam, the major axis of which is substantially perpendicular to the plane of the grid assembly. The transmissivity of the or each grid to the charged particles is defined by the relative proportion of aperture area to non-aperture area, and at least one of the grids has a transmissivity which varies across the grid along a first direction, the transmissivity being lower adjacent a first extremity of the grid than adjacent a second extremity of the grid opposite the first extremity, the first direction lying parallel to the plane of the grid assembly, such that in use the charged particle beam output by the source has a non-uniform charged particle current density profile in a plane parallel to the plane of the grid assembly which varies along the first direction, the charged particle current density being lower adjacent a first edge of the beam than adjacent a second edge of the beam opposite the first edge.

3. 发明授权

US11337296B2 Systems and methods for continuously supplying negative ions using multi-pulsed plasma sources 有权
公开(公告)号：US11337296B2
公开(公告)日：2022-05-17
申请号：US16764658
申请日：2018-10-24
申请人： KOREA ATOMIC ENERGY RESEARCH INSTITUTE
发明人： Sungryul Huh
IPC分类号： H05H1/46 , H01J27/02 , H01J37/32
摘要： The present disclosure relates to a system and method for continuously supplying negative ions using multi-pulsed plasma sources. The system includes a plurality of plasma generators each to generate plasma by applying pulsed power to the electronegative gas from a gas source; a negative ion supply unit connected to the plasma generators to receive the plasmas transferred therefrom and to continuously supply ions; and a controller connected to the plurality of plasma generators and configured to control characteristics of the pulsed powers delivered to the respective plasma generators and to adjust phase shift associated with the pulsed power envelopes. By adjusting the phase shift, the controller enables a plasma in one of the plasma generators to be in an after-glow state when a plasma in another plasma generator is in an active-glow state.

4. 发明授权

US11217419B2 Discharge device and electronic equipment 有权
公开(公告)号：US11217419B2
公开(公告)日：2022-01-04
申请号：US16921348
申请日：2020-07-06
申请人： SHARP KABUSHIKI KAISHA
发明人： Satoshi Okano , Nobuyuki Ohe , Tetsuya Ezaki
IPC分类号： H01T23/00 , H01J27/02
摘要： An ion generating device includes a high voltage transformer, a discharge electrode connected to a terminal of the high voltage transformer on a secondary side, and an induction electrode that generates ions between the induction electrode and the discharge electrode and is connected to a terminal of the high voltage transformer on the secondary side. A first conductive path includes the terminal and extends from the terminal to the discharge electrode and a second conductive path includes a terminal and the induction electrode. Part of the first conductive path is located in proximity and opposed to part of the second conductive path.

5. 发明授权

US11170967B2 Liquid metal ion source 有权
公开(公告)号：US11170967B2
公开(公告)日：2021-11-09
申请号：US16824069
申请日：2020-03-19
申请人： Axcelis Technologies, Inc.
发明人： Neil Bassom , Neil Colvin , Tseh-Jen Hsieh , Michael Ameen
IPC分类号： H01J37/08 , H01J37/30 , H01J49/10 , H01J27/02
摘要： An ion source is configured to form an ion beam and has an arc chamber enclosing an arc chamber environment. A reservoir apparatus can be configured as a repeller and provides a liquid metal to the arc chamber environment. A biasing power supply electrically biases the reservoir apparatus with respect to the arc chamber to vaporize the liquid metal to form a plasma in the arc chamber environment. The reservoir apparatus has a cup and cap defining a reservoir environment for the liquid metal that is fluidly coupled to the arc chamber environment by holes in the cap. Features extend from the cup into the reservoir and contact the liquid metal to feed the liquid metal toward the arc chamber environment by capillary action. A structure, surface area, roughness, and material modifies the capillary action. The feature can be an annular ring, rod, or tube extending into the liquid metal.

6. 发明授权

US11127556B2 Extraction apparatus and system for high throughput ion beam processing 有权
公开(公告)号：US11127556B2
公开(公告)日：2021-09-21
申请号：US16578847
申请日：2019-09-23
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： Costel Biloiu , Jon Ballou , James P. Buonodono
IPC分类号： H01J37/08 , H01J37/04 , H01J37/317 , H01J27/02
摘要： In one embodiment, an ion extraction optics for extracting a plurality of ion beams is provided. The ion extraction optics may include, an extraction plate, the extraction plate defining a cut-out region, the cut-out region being elongated along a first direction. The extraction apparatus may include a slidable insert, the slidable insert disposed to overlap the cut-out region, and slidably movable with respect to the extraction plate, along the first direction, wherein the slidable insert and cut-out region define a first aperture and a second aperture.

7. 发明申请

US20210257180A1 Dynamic Electron Impact Ion Source 有权
公开(公告)号：US20210257180A1
公开(公告)日：2021-08-19
申请号：US17135839
申请日：2020-12-28
申请人： PerkinElmer Health Sciences, Inc.
发明人： David G. Welkie , Tong Chen
IPC分类号： H01J37/08 , H01J27/02 , H01J37/30
摘要： An ion source can include a magnetic field generator configured to generate a magnetic field in a direction parallel to a direction of the electron beam and coincident with the electron beam. However, this magnetic field can also influence the path of ionized sample constituents as they pass through and exit the ion source. An ion source can include an electric field generator to compensate for this effect. As an example, the electric field generator can be configured to generate an electric field within the ion source chamber, such that an additional force is imparted on the ionized sample constituents, opposite in direction and substantially equal in magnitude to the force imparted on the ionized sample constituents by the magnetic field.

8. 发明申请

US20210104377A1 ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CLEANING ELECTRODE ASSEMBLY 有权
公开(公告)号：US20210104377A1
公开(公告)日：2021-04-08
申请号：US17123883
申请日：2020-12-16
申请人： CANON ANELVA CORPORATION
发明人： Yasushi Yasumatsu , Naoyuki Okamoto , Masashi Tsujiyama , Fumihito Suzuki
IPC分类号： H01J37/305 , B08B3/08 , H01J27/02 , H01J37/063 , H01J37/08 , H01J37/317
摘要： Provided is an ion beam processing apparatus including an ion generation chamber, a processing chamber, and electrodes to form an ion beam by extracting ions generated in the ion generation chamber to the processing chamber. The electrodes includes a first electrode disposed close to the ion generation chamber and provided with an ion passage hole to allow passage of the ions, and a second electrode disposed adjacent to the first electrode and closer to the processing chamber than the first electrode is, and provided with an ion passage hole to allow passage of the ions. The apparatus also includes a power unit which applies different electric potentials to the first electrode and the second electrode, respectively, so as to accelerate the ions generated by an ion generator in the ion generation chamber. A material of the first electrode is different from a material of the second electrode.

9. 发明授权

US10950409B2 High reliability, long lifetime, negative ion source 有权
公开(公告)号：US10950409B2
公开(公告)日：2021-03-16
申请号：US16416423
申请日：2019-05-20
申请人： PHOENIX LLC
发明人： Joseph D. Sherman , Evan R. Sengbusch , Ross F. Radel , Arne V. Kobernik , Tye T. Gribb , Preston J. Barrows , Christopher M. Seyfert , Logan D. Campbell , Daniel J. Swanson , Eric D. Risley , Jin W. Lee , Kevin D. Meaney
IPC分类号： H01J37/08 , H01J27/16 , H01J27/02 , H01J27/18 , H05H1/30 , H05H3/00 , H01J27/22
摘要： A negative ion source includes a plasma chamber, a microwave source, a negative ion converter, a magnetic filter and a beam formation mechanism. The plasma chamber contains gas to be ionized. The microwave source transmits microwaves to the plasma chamber to ionize the gas into atomic species including hyperthermal neutral atoms. The negative ion converter converts the hyperthermal neutral atoms to negative ions. The magnetic filter reduces a temperature of an electron density provided between the plasma chamber and the negative ion converter. The beam formation mechanism extract the negative ions.

10. 发明申请

US20200294750A1 Ion Source With Biased Extraction Plate 审中-公开
公开(公告)号：US20200294750A1
公开(公告)日：2020-09-17
申请号：US16351956
申请日：2019-03-13
申请人： Applied Materials, Inc.
发明人： Svetlana B. Radovanov , Bon-Woong Koo , Alexandre Likhanskii
IPC分类号： H01J27/02 , H01J27/08
摘要： An indirectly heated cathode ion source having an electrically isolated extraction plate is disclosed. By isolating the extraction plate, a different voltage can be applied to the extraction plate than to the body of the arc chamber. By applying a more positive voltage to the extraction plate, more efficient ion source operation with higher plasma density can be achieved. In this mode the plasma potential is increased, and the electrostatic sheath reduces losses of electrons to the chamber walls. By applying a more negative voltage, an ion rich sheath adjacent to the extraction aperture can be created. In this mode, conditioning and cleaning of the extraction plate is achieved via ion bombardment. Further, in certain embodiments, the voltage applied to the extraction plate can be pulsed to allow ion extraction and cleaning to occur simultaneously.

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