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31. 发明授权

US08590342B2 Method for producing TiO2-SiO2 glass body, method for heat-treating TiO2-SiO2 glass body, TiO2-SiO2 glass body, and optical base for EUVL 有权
标题翻译： TiO2-SiO2玻璃体的制备方法，TiO2-SiO2玻璃体的热处理方法，TiO2-SiO2玻璃体，EUVL光学基
公开(公告)号：US08590342B2
公开(公告)日：2013-11-26
申请号：US13295652
申请日：2011-11-14
申请人： Akio Koike , Takahiro Mitsumori , Yasutomi Iwahashi , Tomonori Ogawa
发明人： Akio Koike , Takahiro Mitsumori , Yasutomi Iwahashi , Tomonori Ogawa
IPC分类号： C03B25/00 , C03B19/00
CPC分类号： C03B19/1453 , B82Y10/00 , B82Y40/00 , C03B32/00 , C03B2201/42 , C03C3/06 , C03C4/0085 , C03C2201/42 , C03C2203/52 , G03F1/24
摘要： The present invention relates to a process for production of a TiO2—SiO2 glass body, comprising a step of, when an annealing point of a TiO2—SiO2 glass body after transparent vitrification is taken as T1(° C.), holding the glass body after transparent vitrification in a temperature region of from T1−90(° C.) to T1−220(° C.) for 120 hours or more.
摘要翻译：本发明涉及一种制备TiO 2 -SiO 2玻璃体的方法，包括以下步骤：当将透明玻璃化后的TiO 2 -SiO 2玻璃体的退火点作为T1（℃）时，将玻璃体在从T1-90（℃）到T1-220（℃）的温度区域透明玻璃化120小时以上。

32. 发明授权

US08567214B2 Method for producing glass body and method for producing optical member for EUV lithography 失效
标题翻译：玻璃体的制造方法及用于制造EUV光刻用光学部件的方法
公开(公告)号：US08567214B2
公开(公告)日：2013-10-29
申请号：US13169459
申请日：2011-06-27
申请人： Junko Miyasaka , Akio Koike , Tomonori Ogawa , Masahiro Kawagishi
发明人： Junko Miyasaka , Akio Koike , Tomonori Ogawa , Masahiro Kawagishi
IPC分类号： C03B19/14
CPC分类号： C03B19/1423 , C03B2201/42 , C03B2207/06 , C03B2207/20 , Y02P40/57
摘要： The present invention relates to a method for producing a glass body containing: hydrolyzing a silicon compound and a compound containing a metal serving as a dopant, in a flame projected from a burner to form glass fine particles; and depositing and growing the formed glass fine particles on a base material, in which a raw material mixed gas containing a gas of the silicon compound, a gas of the compound containing a metal serving as a dopant, and either one of a combustible gas and a combustion supporting gas is fed into a central nozzle (A) positioning in the center of the burner; the other gas of the combustible gas and the combustion supporting gas is fed into a nozzle (B) different from the central nozzle (A) of the burner; a combustible gas or a combustion supporting gas is arbitrarily fed into a nozzle different from the nozzles (A) and (B); and a flow rate of the raw material mixed gas is 50% or more and not more than 90% of the largest flow rate among flow rate(s) of the combustible gas(ses) and the combustion supporting gas(ses) fed from other nozzle or nozzles than the central nozzle (A).
摘要翻译：本发明涉及一种玻璃体的制造方法，其特征在于，在从燃烧器投射的火焰中，含有硅化合物和含有作为掺杂剂的金属的化合物，形成玻璃微粒; 并且将形成的玻璃微粒沉积并生长在基材上，其中含有硅化合物的气体的原料混合气体，含有作为掺杂剂的金属的化合物的气体，以及可燃性气体和燃烧支持气体被供给到位于燃烧器中心的中心喷嘴（A）中; 可燃气体和燃烧辅助气体的其他气体被供给到与燃烧器的中心喷嘴（A）不同的喷嘴（B）中; 将可燃气体或燃烧性支持气体任意地供给到与喷嘴（A）和（B）不同的喷嘴中; 并且原料混合气体的流量在可燃气体（s）和从其他方式供给的燃烧负载气体（s））的流量之间的最大流量的50％以上且不大于90％喷嘴或喷嘴比中心喷嘴（A）。

33. 发明授权

US08329604B2 Silica glass containing TiO2 and process for its production 有权
标题翻译：含二氧化硅的硅玻璃及其生产工艺
公开(公告)号：US08329604B2
公开(公告)日：2012-12-11
申请号：US12351998
申请日：2009-01-12
申请人： Yasutomi Iwahashi , Akio Koike
发明人： Yasutomi Iwahashi , Akio Koike
IPC分类号： C03C3/06 , C03C3/04
CPC分类号： C03B19/1415 , C03B19/1461 , C03B2201/12 , C03B2201/42 , C03C3/06 , C03C2201/12 , C03C2201/23 , C03C2201/42 , C03C2203/40 , C03C2203/54
摘要： A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C.A process for producing a silica glass containing TiO2, which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body, a step of obtaining a fluorine-containing formed glass body and a step of carrying out annealing treatment.
摘要翻译：含有TiO 2的二氧化硅玻璃，其假想温度为至多1200℃，F浓度为至少100ppm，热膨胀系数为0±200ppb /℃，为0〜100℃。含有TiO 2的二氧化硅玻璃的制造方法，其包括在通过玻璃形成材料的火焰水解得到的目标石英玻璃粒子上形成多孔玻璃体的工序，得到含氟多孔玻璃体的工序，获得含氟玻璃化玻璃体，获得含氟成形玻璃体的步骤和进行退火处理的步骤。

34. 发明申请

US20120238434A1 SILICA GLASS CONTAINING TIO2 审中-公开
标题翻译：含硅胶玻璃包含TIO2
公开(公告)号：US20120238434A1
公开(公告)日：2012-09-20
申请号：US13486485
申请日：2012-06-01
申请人： Akio Koike , Takahiro Mitsumori , Tomonori Ogawa
发明人： Akio Koike , Takahiro Mitsumori , Tomonori Ogawa
IPC分类号： C03C3/06
CPC分类号： C03C3/06 , C03B19/1453 , C03B2201/10 , C03B2201/12 , C03B2201/23 , C03B2201/28 , C03B2201/42 , C03B2201/50 , C03C2201/10 , C03C2201/20 , C03C2201/28 , C03C2201/42
摘要： The present invention relates to a TiO2-containing silica glass containing TiO2 in an amount of from 5 to 10 mass % and at least one of B2O3, P2O5 and S in an amount of from 50 ppb by mass to 5 mass % in terms of the total content.
摘要翻译：本发明涉及含有5〜10质量％的TiO 2和B 2 O 3，P 2 O 5，S中的至少一种的含TiO 2的二氧化硅玻璃，其量为50ppb〜5质量％总内容

35. 发明申请

US20120205343A1 METHOD FOR PRODUCING SILICA-BASED GLASS SUBSTRATE FOR IMPRINT MOLD, AND METHOD FOR PRODUCING IMPRINT MOLD 审中-公开
标题翻译：用于制造用于印模的二氧化硅玻璃基材的方法和用于生产印模的方法
公开(公告)号：US20120205343A1
公开(公告)日：2012-08-16
申请号：US13445345
申请日：2012-04-12
申请人： Akio Koike , Junko Miyasaka
发明人： Akio Koike , Junko Miyasaka
IPC分类号： C03C15/00
CPC分类号： G03F7/0002 , B29C33/3842 , B82Y10/00 , B82Y40/00 , C03B19/14 , C03B2201/42 , C03C3/06 , C03C15/00 , C03C2201/42 , C03C2203/44
摘要： The present invention relates to a method for producing a silica glass substrate for an imprint mold, containing: obtaining a glass body from a glass-forming raw material containing an SiO2 precursor; machining the glass body into a glass substrate having a predetermined shape; and removing an affected layer on a surface of the glass substrate, to produce a silica glass substrate for an imprint mold having a fictive temperature distribution in a region from the surface to a depth of 10 μm on the side to be subjected to a transfer pattern formation of the glass substrate being within ±30° C.
摘要翻译：本发明涉及一种压印模具用石英玻璃基板的制造方法，其特征在于，包括：从含有SiO 2前体的玻璃成形原料获得玻璃体; 将玻璃体加工成具有预定形状的玻璃基板; 并除去玻璃基板的表面上的受影响层，从而生成用于压印模具的石英玻璃基板，该印模具具有在要进行转印图案的一侧的表面至深度10μm的区域中具有虚构的温度分布玻璃基板的形成在±30℃以内

36. 发明申请

US20120100341A1 METHOD FOR PRODUCING TIO2-SIO2 GLASS BODY, METHOD FOR HEAT-TREATING TIO2-SIO2 GLASS BODY, TIO2-SIO2 GLASS BODY, AND OPTICAL BASE FOR EUVL 审中-公开
标题翻译：生产TIO2-SIO2玻璃体的方法，热处理TIO2-SIO2玻璃体，TIO2-SIO2玻璃体和EUVL光学基质的方法
公开(公告)号：US20120100341A1
公开(公告)日：2012-04-26
申请号：US13299475
申请日：2011-11-18
申请人： Akio KOIKE , Takahiro Mitsumori , Yasutomi Iwahashi , Tomonori Ogawa
发明人： Akio KOIKE , Takahiro Mitsumori , Yasutomi Iwahashi , Tomonori Ogawa
IPC分类号： C03C3/04 , C03B25/00
CPC分类号： C03B25/00 , B82Y10/00 , B82Y40/00 , C03B19/1453 , C03B2201/12 , C03B2201/23 , C03B2201/42 , G03F1/24 , Y02P40/57 , Y10T428/24355
摘要： The present invention relates to a process for production of a TiO2—SiO2 glass body, comprising: a step of, when an annealing point of a TiO2—SiO2 glass body after transparent vitrification is taken as T1 (° C.), heating the glass body after transparent vitrification at a temperature of T1+400° C. or more for 20 hours or more; and a step of cooling the glass body after the heating step up to T1−400 (° C.) from T1 (° C.) in an average temperature decreasing rate of 10° C./hr or less.
摘要翻译：本发明涉及一种TiO 2 -SiO 2玻璃体的制造方法，其特征在于，在将透明玻璃化后的TiO 2 -SiO 2玻璃体的退火点作为T1（℃）时，将玻璃加热在T1 + 400℃以上的温度下透明玻璃化后20个小时以上; 以及在10℃/小时以上的平均降温速度下，从T1（℃）加热至T1-400（℃）后将玻璃体冷却的工序。

37. 发明授权

US08093165B2 TiO2-containing silica glass and optical member for EUV lithography using the same 有权
标题翻译：含TiO 2的石英玻璃和使用其的EUV光刻的光学部件
公开(公告)号：US08093165B2
公开(公告)日：2012-01-10
申请号：US12869035
申请日：2010-08-26
申请人： Akio Koike , Yasutomi Iwahashi , Shinya Kikugawa , Yuko Tachibana
发明人： Akio Koike , Yasutomi Iwahashi , Shinya Kikugawa , Yuko Tachibana
IPC分类号： C03C3/06 , C03B19/06 , C03B37/018 , C03B25/00
CPC分类号： C03B19/1453 , B82Y10/00 , B82Y40/00 , C03B2201/075 , C03B2201/21 , C03B2201/23 , C03B2201/42 , C03C3/06 , C03C3/076 , C03C4/0071 , C03C4/0085 , C03C2201/21 , C03C2201/23 , C03C2201/42 , C03C2203/44 , C03C2203/52 , C03C2203/54 , G03F1/24 , G03F7/70958 , Y02P40/57
摘要： The present invention provides a TiO2—SiO2 glass in which when used as an optical member for an exposure tool for EUVL, a thermal expansion coefficient is substantially zero at the time of irradiation with high-EUV energy light, and physical properties of a multilayer can be kept over a long period of time by releasing hydrogen from the glass. The present invention relates to a TiO2-containing silica glass having a fictive temperature of 1,100° C. or lower, a hydrogen molecule concentration of 1×1016 molecules/cm3 or more, and a temperature, at which a linear thermal expansion coefficient is 0 ppb/° C., falling within the range of from 40 to 110° C.
摘要翻译：本发明提供了一种TiO 2 -SiO 2玻璃，其中当用作用于EUVL的曝光工具的光学部件时，在高EUV能量光照射时热膨胀系数基本上为零，并且多层罐的物理性能通过从玻璃中释放氢气，保持很长一段时间。本发明涉及一种假想温度为1100℃或更低，氢分子浓度为1×1016分/厘米3或更高的含钛二氧化硅玻璃以及线性热膨胀系数为0的温度 ppb /℃，在40〜110℃的范围内。

38. 发明授权

US08034731B2 TIO2-containing silica glass and optical member for lithography using the same 有权
标题翻译：含TiO 2的石英玻璃和使用其的光刻用光学构件
公开(公告)号：US08034731B2
公开(公告)日：2011-10-11
申请号：US12862174
申请日：2010-08-24
申请人： Akio Koike , Yasutomi Iwahashi , Shinya Kikugawa
发明人： Akio Koike , Yasutomi Iwahashi , Shinya Kikugawa
IPC分类号： C03C3/06 , C03C3/076 , C03B19/06 , C03B25/00
CPC分类号： C03C3/06 , C03B19/1453 , C03B2201/23 , C03B2201/42 , C03C2201/23 , C03C2203/44 , C03C2203/52 , C03C2203/54
摘要： The present invention is to provide a TiO2—SiO2 glass whose coefficient of linear thermal expansion at the time of irradiating with high EUV energy light becomes substantially zero when used as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass, having a fictive temperature of 1,000° C. or lower, a OH concentration of 600 ppm or higher, a temperature at which the coefficient of linear thermal expansion becomes 0 ppb/° C. of from 40 to 110° C., and an average coefficient of linear thermal expansion in the temperature range of 20 to 100° C., of 50 ppb/° C. or lower.
摘要翻译：本发明提供一种TiO 2 -SiO 2玻璃，当用作EUVL的曝光工具的光学部件时，其在高EUV能量光照射时的线性热膨胀系数基本为零。本发明涉及具有1000℃以下的假想温度，600ppm以上的OH浓度，线性热膨胀系数为0ppb /℃的温度的含TiO 2的二氧化硅玻璃。在20〜100℃的温度范围内的平均线性热膨胀系数为50ppb /℃以下。

39. 发明授权

US07998892B2 TiO2-containing silica glass and optical member for lithography using the same 失效
标题翻译：含TiO 2的二氧化硅玻璃和使用其的光刻用光学部件
公开(公告)号：US07998892B2
公开(公告)日：2011-08-16
申请号：US12870156
申请日：2010-08-27
申请人： Akio Koike , Yasutomi Iwahashi , Shinya Kikugawa
发明人： Akio Koike , Yasutomi Iwahashi , Shinya Kikugawa
IPC分类号： C03C3/06 , C03C3/11 , C03C3/112
CPC分类号： C03B19/1461 , C03B19/1453 , C03B2201/12 , C03B2201/42 , C03C3/06 , C03C2201/12 , C03C2203/46 , C03C2203/52 , C03C2203/54 , Y02P40/57
摘要： The present invention provides a TiO2—SiO2 glass whose coefficient of linear thermal expansion upon irradiation with high EUV energy light is substantially zero, which is suitable as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass having a halogen content of 100 ppm or more; a fictive temperature of 1,100° C. or lower; an average coefficient of linear thermal expansion in the range of from 20 to 100° C. of 30 ppb/° C. or lower; a temperature width ΔT, in which a coefficient of linear thermal expansion is 0±5 ppb/° C., of 5° C. or greater; and a temperature, at which a coefficient of linear thermal expansion is 0 ppb/° C., falling within the range of from 30 to 150° C.
摘要翻译：本发明提供了一种TiO 2 -SiO 2玻璃，其在高EUV能量光照射时的线性热膨胀系数基本上为零，这适合作为EUVL的曝光工具的光学部件。本发明涉及卤素含量为100ppm以上的含TiO 2的二氧化硅玻璃，假想温度为1100℃或更低; 20〜100℃范围内的平均线性热膨胀系数为30ppb /℃以下; 5℃以上的线性热膨胀系数为0±5ppb /℃的温度宽度＆amp; T; T; 以及线性热膨胀系数为0ppb /℃的温度在30〜150℃的范围内。

40. 发明申请

US20100323872A1 TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR EUV LITHOGRAPHY USING THE SAME 有权
标题翻译：含氧二氧化硅玻璃和光学成员使用相同的EUV光刻
公开(公告)号：US20100323872A1
公开(公告)日：2010-12-23
申请号：US12869035
申请日：2010-08-26
申请人： Akio KOIKE , Yasutomi IWAHASHI , Shinya KIKUGAWA , Yuko TACHIBANA
发明人： Akio KOIKE , Yasutomi IWAHASHI , Shinya KIKUGAWA , Yuko TACHIBANA
IPC分类号： C03C3/04
CPC分类号： C03B19/1453 , B82Y10/00 , B82Y40/00 , C03B2201/075 , C03B2201/21 , C03B2201/23 , C03B2201/42 , C03C3/06 , C03C3/076 , C03C4/0071 , C03C4/0085 , C03C2201/21 , C03C2201/23 , C03C2201/42 , C03C2203/44 , C03C2203/52 , C03C2203/54 , G03F1/24 , G03F7/70958 , Y02P40/57
摘要： The present invention provides a TiO2—SiO2 glass in which when used as an optical member for an exposure tool for EUVL, a thermal expansion coefficient is substantially zero at the time of irradiation with high-EUV energy light, and physical properties of a multilayer can be kept over a long period of time by releasing hydrogen from the glass. The present invention relates to a TiO2-containing silica glass having a fictive temperature of 1,100° C. or lower, a hydrogen molecule concentration of 1×1016 molecules/cm3 or more, and a temperature, at which a linear thermal expansion coefficient is 0 ppb/° C., falling within the range of from 40 to 110° C.
摘要翻译：本发明提供了一种TiO 2 -SiO 2玻璃，其中当用作用于EUVL的曝光工具的光学部件时，在高EUV能量光照射时热膨胀系数基本上为零，并且多层罐的物理性能通过从玻璃中释放氢气，保持很长一段时间。本发明涉及一种假想温度为1100℃或更低，氢分子浓度为1×1016分/厘米3或更高的含钛二氧化硅玻璃以及线性热膨胀系数为0的温度 ppb /℃，在40〜110℃的范围内。

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