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1. 发明申请

US20120100341A1 METHOD FOR PRODUCING TIO2-SIO2 GLASS BODY, METHOD FOR HEAT-TREATING TIO2-SIO2 GLASS BODY, TIO2-SIO2 GLASS BODY, AND OPTICAL BASE FOR EUVL 审中-公开
标题翻译：生产TIO2-SIO2玻璃体的方法，热处理TIO2-SIO2玻璃体，TIO2-SIO2玻璃体和EUVL光学基质的方法
公开(公告)号：US20120100341A1
公开(公告)日：2012-04-26
申请号：US13299475
申请日：2011-11-18
申请人： Akio KOIKE , Takahiro Mitsumori , Yasutomi Iwahashi , Tomonori Ogawa
发明人： Akio KOIKE , Takahiro Mitsumori , Yasutomi Iwahashi , Tomonori Ogawa
IPC分类号： C03C3/04 , C03B25/00
CPC分类号： C03B25/00 , B82Y10/00 , B82Y40/00 , C03B19/1453 , C03B2201/12 , C03B2201/23 , C03B2201/42 , G03F1/24 , Y02P40/57 , Y10T428/24355
摘要： The present invention relates to a process for production of a TiO2—SiO2 glass body, comprising: a step of, when an annealing point of a TiO2—SiO2 glass body after transparent vitrification is taken as T1 (° C.), heating the glass body after transparent vitrification at a temperature of T1+400° C. or more for 20 hours or more; and a step of cooling the glass body after the heating step up to T1−400 (° C.) from T1 (° C.) in an average temperature decreasing rate of 10° C./hr or less.
摘要翻译：本发明涉及一种TiO 2 -SiO 2玻璃体的制造方法，其特征在于，在将透明玻璃化后的TiO 2 -SiO 2玻璃体的退火点作为T1（℃）时，将玻璃加热在T1 + 400℃以上的温度下透明玻璃化后20个小时以上; 以及在10℃/小时以上的平均降温速度下，从T1（℃）加热至T1-400（℃）后将玻璃体冷却的工序。

2. 发明申请

US20090242387A1 PROCESS FOR PRODUCING SILICA GLASS CONTAINING TIO2, AND OPTICAL MATERIAL FOR EUV LITHOGRAPHY EMPLOYING SILICA GLASS CONTAINING TIO2 审中-公开
标题翻译：生产含有二氧化硅玻璃的工艺，含有二氧化硅的二氧化硅玻璃的光学材料和含有二氧化硅的二氧化硅玻璃的光学材料
公开(公告)号：US20090242387A1
公开(公告)日：2009-10-01
申请号：US12466032
申请日：2009-05-14
申请人： Akio KOIKE , Yasutomi Iwahashi , Noriaki Shimodaira , Shinya Kikugawa , Naoki Sugimoto
发明人： Akio KOIKE , Yasutomi Iwahashi , Noriaki Shimodaira , Shinya Kikugawa , Naoki Sugimoto
IPC分类号： C23C14/34
CPC分类号： C03C3/06 , C03B19/1453 , C03B19/1484 , C03B2201/21 , C03B2201/42 , C03C17/40 , C03C2201/21 , C03C2201/42 , G03F7/70958
摘要： The claimed invention relates to a process for producing an optical material for EUV lithography, wherein the optical material contains a silica glass having a TiO2 concentration of from 3 to 12 mass % and a hydrogen molecule content of less than 5×1017 molecules/cm3 in the glass. The process including coating a multilayer film on the silica glass by ion beam sputtering.
摘要翻译：所要求保护的发明涉及一种用于制造用于EUV光刻的光学材料的方法，其中所述光学材料包含玻璃中TiO 2浓度为3至12质量％且氢分子含量小于5×10 17分子/ cm 3的二氧化硅玻璃。该方法包括通过离子束溅射在二氧化硅玻璃上涂覆多层膜。

3. 发明申请

US20100317505A1 TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR LITHOGRAPHY USING THE SAME 有权
标题翻译：含有二氧化硅的硅胶玻璃和光学元件用于使用它的光刻
公开(公告)号：US20100317505A1
公开(公告)日：2010-12-16
申请号：US12862174
申请日：2010-08-24
申请人： Akio KOIKE , Yasutomi Iwahashi , Shinya Kikugawa
发明人： Akio KOIKE , Yasutomi Iwahashi , Shinya Kikugawa
IPC分类号： C03C3/06
CPC分类号： C03C3/06 , C03B19/1453 , C03B2201/23 , C03B2201/42 , C03C2201/23 , C03C2203/44 , C03C2203/52 , C03C2203/54
摘要： The present invention is to provide a TiO2—SiO2 glass whose coefficient of linear thermal expansion at the time of irradiating with high EUV energy light becomes substantially zero when used as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass, having a fictive temperature of 1,000° C. or lower, a OH concentration of 600 ppm or higher, a temperature at which the coefficient of linear thermal expansion becomes 0 ppb/° C. of from 40 to 110° C., and an average coefficient of linear thermal expansion in the temperature range of 20 to 100° C., of 50 ppb/° C. or lower.
摘要翻译：本发明提供一种TiO 2 -SiO 2玻璃，当用作EUVL的曝光工具的光学部件时，其在高EUV能量光照射时的线性热膨胀系数基本为零。本发明涉及具有1000℃以下的假想温度，600ppm以上的OH浓度，线性热膨胀系数为0ppb /℃的温度的含TiO 2的二氧化硅玻璃。在20〜100℃的温度范围内的平均线性热膨胀系数为50ppb /℃以下。

4. 发明申请

US20100323872A1 TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR EUV LITHOGRAPHY USING THE SAME 有权
标题翻译：含氧二氧化硅玻璃和光学成员使用相同的EUV光刻
公开(公告)号：US20100323872A1
公开(公告)日：2010-12-23
申请号：US12869035
申请日：2010-08-26
申请人： Akio KOIKE , Yasutomi IWAHASHI , Shinya KIKUGAWA , Yuko TACHIBANA
发明人： Akio KOIKE , Yasutomi IWAHASHI , Shinya KIKUGAWA , Yuko TACHIBANA
IPC分类号： C03C3/04
CPC分类号： C03B19/1453 , B82Y10/00 , B82Y40/00 , C03B2201/075 , C03B2201/21 , C03B2201/23 , C03B2201/42 , C03C3/06 , C03C3/076 , C03C4/0071 , C03C4/0085 , C03C2201/21 , C03C2201/23 , C03C2201/42 , C03C2203/44 , C03C2203/52 , C03C2203/54 , G03F1/24 , G03F7/70958 , Y02P40/57
摘要： The present invention provides a TiO2—SiO2 glass in which when used as an optical member for an exposure tool for EUVL, a thermal expansion coefficient is substantially zero at the time of irradiation with high-EUV energy light, and physical properties of a multilayer can be kept over a long period of time by releasing hydrogen from the glass. The present invention relates to a TiO2-containing silica glass having a fictive temperature of 1,100° C. or lower, a hydrogen molecule concentration of 1×1016 molecules/cm3 or more, and a temperature, at which a linear thermal expansion coefficient is 0 ppb/° C., falling within the range of from 40 to 110° C.
摘要翻译：本发明提供了一种TiO 2 -SiO 2玻璃，其中当用作用于EUVL的曝光工具的光学部件时，在高EUV能量光照射时热膨胀系数基本上为零，并且多层罐的物理性能通过从玻璃中释放氢气，保持很长一段时间。本发明涉及一种假想温度为1100℃或更低，氢分子浓度为1×1016分/厘米3或更高的含钛二氧化硅玻璃以及线性热膨胀系数为0的温度 ppb /℃，在40〜110℃的范围内。

5. 发明申请

US20100261597A1 TIO2-CONTAINING SILICA GLASS 有权
标题翻译：含TIO2的二氧化硅玻璃
公开(公告)号：US20100261597A1
公开(公告)日：2010-10-14
申请号：US12824923
申请日：2010-06-28
申请人： Akio KOIKE , Yasutomi Iwahashi , Shinya Kikugawa
发明人： Akio KOIKE , Yasutomi Iwahashi , Shinya Kikugawa
IPC分类号： C03C3/04
CPC分类号： C03B19/1453 , C03B19/1461 , C03B32/00 , C03B2201/12 , C03B2201/23 , C03B2201/42 , C03C3/06 , C03C2201/12 , C03C2201/23 , C03C2201/40 , C03C2201/42 , C03C2203/40 , C03C2203/46 , C03C2203/54 , Y02P40/57
摘要： The present invention is to provide a TiO2—SiO2 glass having suitable thermal expansion properties as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass having a temperature, at which a coefficient of thermal expansion is 0 ppb/° C., falling within the range of 23±4° C. and a temperature width, in which a coefficient of thermal expansion is 0±5 ppb/° C., of 5° C. or more.
摘要翻译：本发明提供具有合适的热膨胀性能的TiO 2 -SiO 2玻璃作为EUVL用曝光工具的光学部件。本发明涉及热膨胀系数为0ppb /℃的温度为23±4℃的温度范围的含TiO 2的二氧化硅玻璃，其温度范围为的热膨胀为0±5ppb /℃，为5℃以上。

6. 发明申请

US20120149543A1 TIO2-CONTAINING SILICA GLASS, AND OPTICAL MEMBER FOR EUV LITHOGRAPHY 审中-公开
标题翻译：含二氧化硅的玻璃，以及用于EUV光刻的光学部件
公开(公告)号：US20120149543A1
公开(公告)日：2012-06-14
申请号：US13401475
申请日：2012-02-21
申请人： Akio KOIKE , Yasutomi Iwahashi , Shinya Kikugawa
发明人： Akio KOIKE , Yasutomi Iwahashi , Shinya Kikugawa
IPC分类号： C03C3/06 , C03C3/076
CPC分类号： C03C3/06 , C03C4/0085 , C03C2201/42 , C03C2203/44 , G03F7/70958
摘要： The present invention relates to a TiO2-containing silica glass having a TiO2 content of 7.5 to 12% by mass, a fictive temperature of 1,000° C. or higher, and a temperature at which a coefficient of linear thermal expansion is 0 ppb/° C. being within the range of 40 to 110° C.
摘要翻译：本发明涉及TiO 2含量为7.5〜12质量％，假想温度为1000℃以上的含TiO 2的二氧化硅玻璃，线膨胀系数为0ppb /°的温度 C.在40至110℃的范围内

7. 发明申请

US20070207911A1 PROCESS FOR PRODUCING SILICA GLASS CONTAINING TIO2, AND OPTICAL MATERIAL FOR EUV LITHOGRAPHY EMPLOYING SILICA GLASS CONTAINING TIO2 审中-公开
标题翻译：生产含有二氧化硅玻璃的工艺，含有二氧化硅的二氧化硅玻璃的光学材料和含有二氧化硅的二氧化硅玻璃的光学材料
公开(公告)号：US20070207911A1
公开(公告)日：2007-09-06
申请号：US11747698
申请日：2007-05-11
申请人： Akio KOIKE , Yasutomi Iwahashi , Noriaki Shimodaira , Shinya Kikugawa , Naoki Sugimoto
发明人： Akio KOIKE , Yasutomi Iwahashi , Noriaki Shimodaira , Shinya Kikugawa , Naoki Sugimoto
IPC分类号： C03C3/06 , C03B19/06
CPC分类号： C03C3/06 , C03B19/1453 , C03B19/1484 , C03B2201/21 , C03B2201/42 , C03C17/40 , C03C2201/21 , C03C2201/42 , G03F7/70958
摘要： Conventional TiO2—SiO2 glass contains hydrogen atoms substantially, and during deposition under ultrahigh vacuum condition, the hydrogen molecules will diffuse in the chamber, and H2 molecules will be taken into a film thereby formed. Hydrogen molecules will readily diffuse, and the optical characteristics of the multilayer film are likely to be thereby changed. In an optical material for EUV lithography, a multilayer film is coated by ion beam sputtering on a silica glass having a TiO2 concentration of from 3 to 12 mass % and a hydrogen molecule content of less than 5×1017 molecules/cm3 in the glass.
摘要翻译：常规的TiO 2 -SiO 2 SiO 2玻璃基本上含有氢原子，并且在超高真空条件下沉积期间，氢分子将在室中扩散，并且H 2 < / SUB>分子将被吸收到由此形成的膜中。氢分子将容易扩散，并且可能由此改变多层膜的光学特性。在用于EUV光刻的光学材料中，通过离子束溅射在具有3至12质量％的TiO 2浓度和小于5×10 5质量％的氢分子含量的二氧化硅玻璃上涂覆多层膜， SUP> 17分子/ cm 3在玻璃中。

8. 发明申请

US20110314868A1 METHOD FOR PRODUCING GLASS BODY AND METHOD FOR PRODUCING OPTICAL MEMBER FOR EUV LITHOGRAPHY 失效
标题翻译：用于生产玻璃体的方法和用于制造用于EUV光刻的光学构件的方法
公开(公告)号：US20110314868A1
公开(公告)日：2011-12-29
申请号：US13169459
申请日：2011-06-27
申请人： Junko MIYASAKA , Akio KOIKE , Tomonori OGAWA , Masahiro KAWAGISHI
发明人： Junko MIYASAKA , Akio KOIKE , Tomonori OGAWA , Masahiro KAWAGISHI
IPC分类号： C03B20/00 , C03B19/01
CPC分类号： C03B19/1423 , C03B2201/42 , C03B2207/06 , C03B2207/20 , Y02P40/57
摘要： The present invention relates to a method for producing a glass body containing: hydrolyzing a silicon compound and a compound containing a metal serving as a dopant, in a flame projected from a burner to form glass fine particles; and depositing and growing the formed glass fine particles on a base material, in which a raw material mixed gas containing a gas of the silicon compound, a gas of the compound containing a metal serving as a dopant, and either one of a combustible gas and a combustion supporting gas is fed into a central nozzle (A) positioning in the center of the burner; the other gas of the combustible gas and the combustion supporting gas is fed into a nozzle (B) different from the central nozzle (A) of the burner; a combustible gas or a combustion supporting gas is arbitrarily fed into a nozzle different from the nozzles (A) and (B); and a flow rate of the raw material mixed gas is 50% or more and not more than 90% of the largest flow rate among flow rate(s) of the combustible gas(ses) and the combustion supporting gas(ses) fed from other nozzle or nozzles than the central nozzle (A).
摘要翻译：本发明涉及一种玻璃体的制造方法，其特征在于，在从燃烧器投射的火焰中，含有硅化合物和含有作为掺杂剂的金属的化合物，形成玻璃微粒; 并且将形成的玻璃微粒沉积并生长在基材上，其中含有硅化合物的气体的原料混合气体，含有作为掺杂剂的金属的化合物的气体和可燃性气体和燃烧支持气体被供给到位于燃烧器中心的中心喷嘴（A）中; 可燃气体和燃烧辅助气体的其他气体被供给到与燃烧器的中心喷嘴（A）不同的喷嘴（B）中; 将可燃气体或燃烧性支持气体任意地供给到与喷嘴（A）和（B）不同的喷嘴中; 并且原料混合气体的流量在可燃气体（s）和从其他方式供给的燃烧负载气体（s））的流量之间的最大流量的50％以上且不大于90％喷嘴或喷嘴比中心喷嘴（A）。

9. 发明申请

US20100179047A1 OPTICAL MEMBER COMPRISING TIO2-CONTAINING SILICA GLASS 有权
标题翻译：包含含TIO2的二氧化硅玻璃的光学构件
公开(公告)号：US20100179047A1
公开(公告)日：2010-07-15
申请号：US12718776
申请日：2010-03-05
申请人： Akio KOIKE , Chikaya Tamitsuji , Kunio Watanabe , Tomonori Ogawa
发明人： Akio KOIKE , Chikaya Tamitsuji , Kunio Watanabe , Tomonori Ogawa
IPC分类号： C03C3/06 , C03C10/00
CPC分类号： C03C3/06 , C03B19/1423 , C03B19/1453 , C03B19/1461 , C03B25/02 , C03B2201/075 , C03B2201/12 , C03B2201/42 , C03B2207/36 , C03C4/0085 , C03C2201/12 , C03C2201/23 , C03C2201/42 , C03C2203/54
摘要： The present invention relates to an optical member including a TiO2-containing silica glass having: a TiO2 concentration of from 3 to 10% by mass; a Ti3+ concentration of 100 wt ppm or less; a thermal expansion coefficient at from 0 to 100° C., CTE0-100, of 0±150 ppb/° C.; and an internal transmittance in the wavelength range of 400 to 700 nm per a thickness of 1 mm, T400-700, of 80% or more, in which the optical member has a ratio of variation of Ti3+ concentration to an average value of the Ti3+ concentration, ΔTi3+/Ti3+, on an optical use surface, is 0.2 or less.
摘要翻译：本发明涉及一种含有TiO2含量为3〜10质量％的含TiO 2的二氧化硅玻璃的光学构件， Ti3 +浓度为100重量ppm以下; 0-100℃的热膨胀系数，CTE0-100，为0±150ppb /℃。并且在400〜700nm的波长范围内的内部透射率，每1mm厚度，T400〜700，为80％以上，其中光学部件具有Ti 3+浓度的变化比与Ti 3+的平均值的比值，在光学用表面上的浓度＆Dgr; Ti 3+ / Ti 3+为0.2以下。

10. 发明申请

US20090208760A1 ENERGY-TRANSMITTING OR ULTRAVIOLET LIGHT-TRANSMITTING OPTICAL FIBER PREFORM AND PRODUCTION PROCESS THEREOF 审中-公开
标题翻译：能量发射或超紫外光发射光纤预制及其生产工艺
公开(公告)号：US20090208760A1
公开(公告)日：2009-08-20
申请号：US12429513
申请日：2009-04-24
申请人： Madoka KUWAHARA , Akio KOIKE , Kaname OKADA , Tomonori OGAWA
发明人： Madoka KUWAHARA , Akio KOIKE , Kaname OKADA , Tomonori OGAWA
IPC分类号： B32B17/06 , C03C3/06 , C03B37/075 , C03B37/10
CPC分类号： C03B37/01228 , C03B37/01453 , C03B37/01466 , C03B37/01861 , C03B2201/12 , C03C3/06 , C03C2201/12 , C03C2201/23 , G02B6/102
摘要： The present invention is to provide an optical fiber preform suitable for the production of an energy-transmitting or ultraviolet light-transmitting optical fiber, which has an excellent transmittance of a high-energy light of 50 KW/cm2 or more in terms of laser peak power or an ultraviolet light, to be transmitted through the optical fiber and which exhibits excellent durability that causes almost no deterioration by the irradiation with those two lights; and a production process thereof. The present invention relates to an energy-transmitting or ultraviolet light-transmitting optical fiber preform, having a core and a cladding each comprising a silica glass, wherein the core has an average OH concentration of 0 to 10 ppm, an average O2 concentration of ≦1015 molecules/cm3, an average ODC (I) concentration of ≦1013 defects/cm3, an average ODC (II) concentration of ≦1012 defects/cm3 and an average F concentration of ≦1,000 ppm, and the cladding has an average OH concentration of 0 to 10 ppm, an average F concentration of ≧7,000 ppm, an average O2 concentration of ≦1016 molecules/cm3, an average ODC (I) concentration of ≦1013 defects/cm3 and an average ODC (II) concentration of ≦1012 defects/cm3.
摘要翻译：本发明提供一种适用于生产能量透射或紫外光透射光纤的光纤预制件，其具有以激光峰值表示的50KW / cm 2以上的高能量光的透射率优异功率或紫外光通过光纤传输，并且其表现出优异的耐久性，几乎不会由于这两种灯的照射而劣化; 及其制造方法。本发明涉及一种具有芯和包层的能量透射或紫外光透射光纤预制件，每个包含二氧化硅玻璃，其中核的平均OH浓度为0至10ppm，平均氧浓度< = 1015分子/ cm 3，平均ODC（I）浓度<1013缺陷/ cm3，平均ODC（II）浓度<= 1012缺陷/ cm3，平均F浓度<= 1,000ppm，包层具有平均OH浓度为0〜10ppm，平均F浓度> 7,000ppm，平均O 2浓度<1016分子/ cm 3，平均ODC（I）浓度<= 1013缺陷/ cm3，平均ODC （II）浓度<= 1012缺陷/ cm3。

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