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1. 发明授权

US07989378B2 TiO2-containing silica glass 有权
标题翻译：含TiO2的二氧化硅玻璃
公开(公告)号：US07989378B2
公开(公告)日：2011-08-02
申请号：US12824923
申请日：2010-06-28
申请人： Akio Koike , Yasutomi Iwahashi , Shinya Kikugawa
发明人： Akio Koike , Yasutomi Iwahashi , Shinya Kikugawa
IPC分类号： C03C3/06 , C03C3/11 , C03C3/112
CPC分类号： C03B19/1453 , C03B19/1461 , C03B32/00 , C03B2201/12 , C03B2201/23 , C03B2201/42 , C03C3/06 , C03C2201/12 , C03C2201/23 , C03C2201/40 , C03C2201/42 , C03C2203/40 , C03C2203/46 , C03C2203/54 , Y02P40/57
摘要： The present invention is to provide a TiO2—SiO2 glass having suitable thermal expansion properties as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass having a temperature, at which a coefficient of thermal expansion is 0 ppb/° C., falling within the range of 23±4° C. and a temperature width, in which a coefficient of thermal expansion is 0±5 ppb/° C., of 5° C. or more.
摘要翻译：本发明提供具有合适的热膨胀性能的TiO 2 -SiO 2玻璃作为EUVL用曝光工具的光学部件。本发明涉及热膨胀系数为0ppb /℃的温度为23±4℃的温度范围的含TiO2的二氧化硅玻璃，其温度范围为的热膨胀为0±5ppb /℃，为5℃以上。

2. 发明授权

US07462574B2 Silica glass containing TiO2 and optical material for EUV lithography 有权
标题翻译：含二氧化硅的玻璃和用于EUV光刻的光学材料
公开(公告)号：US07462574B2
公开(公告)日：2008-12-09
申请号：US11174533
申请日：2005-07-06
申请人： Yasutomi Iwahashi , Akio Koike
发明人： Yasutomi Iwahashi , Akio Koike
IPC分类号： C03C3/06 , G02B1/00 , C03B19/00 , C03B19/14
CPC分类号： C03C3/06 , C03B19/1484 , C03B2201/42 , C03C4/0085 , C03C2201/42
摘要： A silica glass containing TiO2, characterized in that the fluctuation of the refractive index (Δn) is at most 2×10−4 within an area of 30 mm×30 mm in at least one plane. A silica glass containing TiO2, characterized in that the TiO2 concentration is at least 1 mass %, and the striae pitch is at most 10 μm. An optical material for EUV lithography, characterized in that it is made of a silica glass containing TiO2, and the fluctuation of the refractive index (Δn) is at most 2×10−4 in a plane perpendicular to the incident light direction. An optical material for EUV lithography, characterized in that it is made of a silica glass containing TiO2, wherein the TiO2 concentration is at least 1 mass %, and the difference between the maximum value and the minimum value of the TiO2 concentration is at most 0.06 mass % in a plane perpendicular to the incident light direction.
摘要翻译：含有TiO 2的二氧化硅玻璃，其特征在于，在至少一个平面中，在30mm×30mm的面积内，折射率（Deltan）的波动至多为2×10 -4。含有TiO 2的二氧化硅玻璃，其特征在于TiO 2浓度为1质量％以上，条纹间距为10μm以下。一种用于EUV光刻的光学材料，其特征在于它由含有TiO 2的二氧化硅玻璃制成，并且在垂直于入射光方向的平面中折射率（Deltan）的波动为至多2×10 -4。一种用于EUV光刻的光学材料，其特征在于，其由TiO 2的二氧化硅玻璃制成，其中TiO 2浓度为至少1质量％，并且TiO 2浓度的最大值和最小值之间的差为至多0.06 在垂直于入射光方向的平面中的质量％。

3. 发明申请

US20080103037A1 SILICA GLASS CONTAINING TiO2 AND PROCESS FOR ITS PRODUCTION 有权
标题翻译：含二氧化硅的二氧化硅玻璃及其生产工艺
公开(公告)号：US20080103037A1
公开(公告)日：2008-05-01
申请号：US11957855
申请日：2007-12-17
申请人： Yasutomi IWAHASHI , Akio Koike
发明人： Yasutomi IWAHASHI , Akio Koike
IPC分类号： C03C3/04
CPC分类号： C03B19/1415 , C03B19/1461 , C03B2201/12 , C03B2201/42 , C03C3/06 , C03C2201/12 , C03C2201/23 , C03C2201/42 , C03C2203/40 , C03C2203/54
摘要： A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C. A process for producing a silica glass containing TiO2, which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body, a step of obtaining a fluorine-containing formed glass body and a step of carrying out annealing treatment.
摘要翻译：含有TiO 2的二氧化硅玻璃，其具有至多1200℃的假想温度，至少100ppm的F浓度和0±200ppb /℃的热膨胀系数。 0至100℃。一种制备含有TiO 2的石英玻璃的方法，其包括在通过玻璃形成材料的火焰水解获得的目标石英玻璃颗粒上形成多孔玻璃体的步骤，获得含氟多孔玻璃体的步骤，获得含氟玻璃化玻璃体的步骤，获得含氟成形玻璃体的步骤和进行退火处理的步骤。

4. 发明申请

US20100323873A1 TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR LITHOGRAPHY USING THE SAME 失效
标题翻译：含有二氧化硅的硅胶玻璃和光学元件用于使用它的光刻
公开(公告)号：US20100323873A1
公开(公告)日：2010-12-23
申请号：US12870156
申请日：2010-08-27
申请人： Akio Koike , Yasutomi Iwahashi , Shinya Kikugawa
发明人： Akio Koike , Yasutomi Iwahashi , Shinya Kikugawa
IPC分类号： C03C3/04
CPC分类号： C03B19/1461 , C03B19/1453 , C03B2201/12 , C03B2201/42 , C03C3/06 , C03C2201/12 , C03C2203/46 , C03C2203/52 , C03C2203/54 , Y02P40/57
摘要： The present invention provides a TiO2—SiO2 glass whose coefficient of linear thermal expansion upon irradiation with high EUV energy light is substantially zero, which is suitable as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass having a halogen content of 100 ppm or more; a fictive temperature of 1,100° C. or lower; an average coefficient of linear thermal expansion in the range of from 20 to 100° C. of 30 ppb/° C. or lower; a temperature width ΔT, in which a coefficient of linear thermal expansion is 0±5 ppb/° C., of 5° C. or greater; and a temperature, at which a coefficient of linear thermal expansion is 0 ppb/° C., falling within the range of from 30 to 150° C.
摘要翻译：本发明提供了一种TiO 2 -SiO 2玻璃，其在高EUV能量光照射时的线性热膨胀系数基本为零，这适合作为EUVL用曝光工具的光学部件。本发明涉及卤素含量为100ppm以上的含TiO 2的二氧化硅玻璃，假想温度为1100℃或更低; 20〜100℃范围内的平均线性热膨胀系数为30ppb /℃以下; 5℃以上的线性热膨胀系数为0±5ppb /℃的温度宽度＆amp; T; T; 以及线性热膨胀系数为0ppb /℃的温度在30〜150℃的范围内。

5. 发明申请

US20100234205A1 TiO2-containing quartz glass substrate 审中-公开
标题翻译：含TiO2的石英玻璃基板
公开(公告)号：US20100234205A1
公开(公告)日：2010-09-16
申请号：US12659595
申请日：2010-03-15
申请人： Yoshiaki Ikuta , Yasutomi Iwahashi , Kenji Okamura
发明人： Yoshiaki Ikuta , Yasutomi Iwahashi , Kenji Okamura
IPC分类号： C03C3/04
CPC分类号： B29C33/38 , B82Y10/00 , B82Y40/00 , C03C3/06 , C03C2201/12 , C03C2201/42 , G03F7/0002
摘要： An object of the present invention is to provide a TiO2-containing quartz glass substrate which, when used as a mold base for nanoimprint lithography, can form a concavity and convexity pattern having a dimensional variation falling within ±10%. The invention relates to a TiO2-containing quartz glass substrate: in which a coefficient of thermal expansion in the range of from 15 to 35° C. is within ±200 ppb/° C.; a TiO2 concentration is from 4 to 9 wt %; and a TiO2 concentration distribution, in a substrate surface on the side where a transfer pattern is to be formed, is within ±1 wt %.
摘要翻译：本发明的目的是提供一种含TiO 2的石英玻璃基板，其用作纳米压印光刻用的模具基底时，可以形成尺寸变化在±10％以内的凹凸图案。本发明涉及一种含TiO 2的石英玻璃基板，其中15至35℃范围内的热膨胀系数在±200ppb /℃以内。 TiO 2浓度为4〜9重量％。并且在要形成转印图案的一侧的基板表面中的TiO 2浓度分布在±1重量％以内。

6. 发明申请

US20090242387A1 PROCESS FOR PRODUCING SILICA GLASS CONTAINING TIO2, AND OPTICAL MATERIAL FOR EUV LITHOGRAPHY EMPLOYING SILICA GLASS CONTAINING TIO2 审中-公开
标题翻译：生产含有二氧化硅玻璃的工艺，含有二氧化硅的二氧化硅玻璃的光学材料和含有二氧化硅的二氧化硅玻璃的光学材料
公开(公告)号：US20090242387A1
公开(公告)日：2009-10-01
申请号：US12466032
申请日：2009-05-14
申请人： Akio KOIKE , Yasutomi Iwahashi , Noriaki Shimodaira , Shinya Kikugawa , Naoki Sugimoto
发明人： Akio KOIKE , Yasutomi Iwahashi , Noriaki Shimodaira , Shinya Kikugawa , Naoki Sugimoto
IPC分类号： C23C14/34
CPC分类号： C03C3/06 , C03B19/1453 , C03B19/1484 , C03B2201/21 , C03B2201/42 , C03C17/40 , C03C2201/21 , C03C2201/42 , G03F7/70958
摘要： The claimed invention relates to a process for producing an optical material for EUV lithography, wherein the optical material contains a silica glass having a TiO2 concentration of from 3 to 12 mass % and a hydrogen molecule content of less than 5×1017 molecules/cm3 in the glass. The process including coating a multilayer film on the silica glass by ion beam sputtering.
摘要翻译：所要求保护的发明涉及一种用于制造用于EUV光刻的光学材料的方法，其中所述光学材料包含玻璃中TiO 2浓度为3至12质量％且氢分子含量小于5×10 17分子/ cm 3的二氧化硅玻璃。该方法包括通过离子束溅射在二氧化硅玻璃上涂覆多层膜。

7. 发明申请

US20070042893A1 Silica glass containing TiO2 and process for its production 有权
标题翻译：含二氧化硅的硅玻璃及其生产工艺
公开(公告)号：US20070042893A1
公开(公告)日：2007-02-22
申请号：US11589875
申请日：2006-10-31
申请人： Akio Koike , Yasutomi Iwahashi , Yasuyuki Takimoto , Shinya Kikugawa
发明人： Akio Koike , Yasutomi Iwahashi , Yasuyuki Takimoto , Shinya Kikugawa
IPC分类号： C03C3/06 , C03B19/00 , C03B23/00 , C03B32/00
CPC分类号： C03C3/06 , C03B19/1453 , C03B2201/12 , C03B2201/23 , C03B2201/42 , C03C2201/12 , C03C2201/23 , C03C2201/42
摘要： It is to provide a silica glass containing TiO2, having a wide temperature range wherein the coefficient of thermal expansion is substantially zero. A silica glass containing TiO2, which has a TiO2 concentration of from 3 to 10 mass %, a OH group concentration of at most 600 mass ppm and a Ti3+ concentration of at most 70 mass ppm, characterized by having a fictive temperature of at most 1,200° C., a coefficient of thermal expansion from 0 to 100° C. of 0±150 ppb/° C., and an internal transmittance T400-700 per 1 mm thickness in a wavelength range of from 400 to 700 nm of at least 80%. A process for producing a silica glass containing TiO2, which comprises porous glass body formation step, F-doping step, oxygen treatment step, densification step and vitrification step.
摘要翻译：提供含有TiO 2的二氧化硅玻璃，其具有宽的温度范围，其中热膨胀系数基本上为零。含有TiO 2浓度为3〜10质量％，OH基浓度为600质量ppm以下且Ti 3 +浓度为70质量ppm以下，其特征在于，假想温度为1200℃以下，0〜100℃的热膨胀系数为0±150ppb /℃。并且在400至700nm的波长范围内每1mm厚度的内部透射率T 400-700 至少为80％。一种制备含有TiO 2的二氧化硅玻璃的方法，其包括多孔玻璃体形成步骤，F掺杂步骤，氧处理步骤，致密化步骤和玻璃化步骤。

8. 发明授权

US08178450B2 TiO2-containing silica glass and optical member for EUV lithography using high energy densities as well as special temperature controlled process for its manufacture 失效
标题翻译：含TiO 2的石英玻璃和用于EUV光刻的光学构件，使用高能量密度以及用于其制造的特殊温度控制方法
公开(公告)号：US08178450B2
公开(公告)日：2012-05-15
申请号：US12868900
申请日：2010-08-26
申请人： Akio Koike , Kenta Saito , Long Shao , Yasutomi Iwahashi , Shinya Kikugawa
发明人： Akio Koike , Kenta Saito , Long Shao , Yasutomi Iwahashi , Shinya Kikugawa
IPC分类号： C03C3/06 , C03C3/04 , C03B37/018
CPC分类号： C03B19/1453 , C03B19/1415 , C03B2201/075 , C03B2201/23 , C03B2201/42 , C03B2207/70 , C03B2207/81 , C03C3/06 , C03C3/076 , C03C2201/23 , C03C2201/42 , C03C2203/44 , C03C2203/52 , C03C2203/54 , Y02P40/57
摘要： The present invention provides a TiO2—SiO2 glass whose coefficient of linear thermal expansion in the range of the time of irradiation with EUV light is substantially zero when used as an optical member of an exposure tool for EUVL and which has extremely high surface smoothness. The present invention relates to a TiO2-containing silica glass having a TiO2 content of from 7.5 to 12% by mass, a temperature at which a coefficient of linear thermal expansion is 0 ppb/° C., falling within the range of from 40 to 110° C., and a standard deviation (σ) of a stress level of striae of 0.03 MPa or lower within an area of 30 mm×30 mm in at least one plane.
摘要翻译：本发明提供一种TiO 2 -SiO 2玻璃，当用作EUVL的曝光工具的光学部件并且具有非常高的表面光滑度时，在EUV光的照射时间范围内的线性热膨胀系数基本上为零。本发明涉及TiO 2含量为7.5〜12质量％，线膨胀系数为0ppb /℃的温度，在40〜 110℃，在至少一个平面内在30mm×30mm的区域内的条纹应力水平为0.03MPa以下的标准偏差（＆sgr）。

9. 发明申请

US20100323871A1 TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR EUV LITHOGRAPHY USING HIGH ENERGY DENSITIES AS WELL AS SPECIAL TEMPERATURE CONTROLLED PROCESS FOR ITS MANUFACTURE 失效
标题翻译：含氧二氧化硅玻璃和光学成员，用于使用高能量密度的EUV光刻作为其特殊温度控制过程的制造
公开(公告)号：US20100323871A1
公开(公告)日：2010-12-23
申请号：US12868900
申请日：2010-08-26
申请人： Akio Koike , Kenta Saito , Long Shao , Yasutomi Iwahashi , Shinya Kikugawa
发明人： Akio Koike , Kenta Saito , Long Shao , Yasutomi Iwahashi , Shinya Kikugawa
IPC分类号： C03C3/04
CPC分类号： C03B19/1453 , C03B19/1415 , C03B2201/075 , C03B2201/23 , C03B2201/42 , C03B2207/70 , C03B2207/81 , C03C3/06 , C03C3/076 , C03C2201/23 , C03C2201/42 , C03C2203/44 , C03C2203/52 , C03C2203/54 , Y02P40/57
摘要： The present invention provides a TiO2—SiO2 glass whose coefficient of linear thermal expansion in the range of the time of irradiation with EUV light is substantially zero when used as an optical member of an exposure tool for EUVL and which has extremely high surface smoothness. The present invention relates to a TiO2-containing silica glass having a TiO2 content of from 7.5 to 12% by mass, a temperature at which a coefficient of linear thermal expansion is 0 ppb/° C., falling within the range of from 40 to 110° C., and a standard deviation (σ) of a stress level of striae of 0.03 MPa or lower within an area of 30 mm×30 mm in at least one plane.
摘要翻译：本发明提供一种TiO 2 -SiO 2玻璃，当用作EUVL的曝光工具的光学部件并且具有非常高的表面光滑度时，在EUV光的照射时间范围内的线性热膨胀系数基本上为零。本发明涉及TiO 2含量为7.5〜12质量％，线膨胀系数为0ppb /℃的温度，在40〜 110℃，在至少一个平面内在30mm×30mm的区域内的条纹应力水平为0.03MPa以下的标准偏差（＆sgr）。

10. 发明申请

US20100317505A1 TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR LITHOGRAPHY USING THE SAME 有权
标题翻译：含有二氧化硅的硅胶玻璃和光学元件用于使用它的光刻
公开(公告)号：US20100317505A1
公开(公告)日：2010-12-16
申请号：US12862174
申请日：2010-08-24
申请人： Akio KOIKE , Yasutomi Iwahashi , Shinya Kikugawa
发明人： Akio KOIKE , Yasutomi Iwahashi , Shinya Kikugawa
IPC分类号： C03C3/06
CPC分类号： C03C3/06 , C03B19/1453 , C03B2201/23 , C03B2201/42 , C03C2201/23 , C03C2203/44 , C03C2203/52 , C03C2203/54
摘要： The present invention is to provide a TiO2—SiO2 glass whose coefficient of linear thermal expansion at the time of irradiating with high EUV energy light becomes substantially zero when used as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass, having a fictive temperature of 1,000° C. or lower, a OH concentration of 600 ppm or higher, a temperature at which the coefficient of linear thermal expansion becomes 0 ppb/° C. of from 40 to 110° C., and an average coefficient of linear thermal expansion in the temperature range of 20 to 100° C., of 50 ppb/° C. or lower.
摘要翻译：本发明提供一种TiO 2 -SiO 2玻璃，当用作EUVL的曝光工具的光学部件时，其在高EUV能量光照射时的线性热膨胀系数基本为零。本发明涉及具有1000℃以下的假想温度，600ppm以上的OH浓度，线性热膨胀系数为0ppb /℃的温度的含TiO 2的二氧化硅玻璃。在20〜100℃的温度范围内的平均线性热膨胀系数为50ppb /℃以下。

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