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31. 发明申请

WO2011062296A2 EXPOSURE APPARATUS, EXPOSING METHOD, AND DEVICE FABRICATING METHOD 审中-公开
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：WO2011062296A2
公开(公告)日：2011-05-26
申请号：PCT/JP2010/071194
申请日：2010-11-19
申请人： NIKON CORPORATION , YOSHIMOTO Hiromitsu
发明人： YOSHIMOTO Hiromitsu
IPC分类号： G03F7/20
CPC分类号： G03F7/70758 , G03F7/707 , G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F7/70775
摘要： An exposure apparatus includes: a first moving body, which comprises guide members that extend in a first direction, moves in a second direction, which is substantially orthogonal to the first direction; two second moving bodies (WCS2), which are provided such that they are capable of moving in the first direction along the guide members, move in the second direction together with the guide members by the movement of the first moving body; a holding apparatus (WFS2) holds the object and is supported by the two second moving bodies such that it is capable of moving within a two dimensional plane that includes at least the first directions and the second directions; and a transport apparatus (102), which comprises a chuck member (108) that can noncontactually hold the object from above, transports the object to and from the holding apparatus.
摘要翻译：曝光装置包括：第一移动体，其包括沿第一方向延伸的引导构件，其沿与第一方向大致正交的第二方向移动; 两个第二移动体（WCS2）被设置成使得它们能够沿着引导构件在第一方向上移动，通过第一移动体的移动与引导构件一起沿着第二方向移动; 保持装置（WFS2）保持物体并由两个第二移动体支撑，使得其能够在至少包括第一方向和第二方向的二维平面内移动; 以及输送装置（102），其包括可以从上方非接触地保持物体的卡盘构件（108），将物体运送到保持装置和从保持装置传送。

32. 发明申请

WO2011037273A1 SUBSTRATE CARTRIDGE AND ITS APPLICATIONS 审中-公开
标题翻译：基板盒及其应用
公开(公告)号：WO2011037273A1
公开(公告)日：2011-03-31
申请号：PCT/JP2010/067293
申请日：2010-09-24
申请人： NIKON CORPORATION , KIUCHI Tohru
发明人： KIUCHI Tohru
IPC分类号： H01L21/00
CPC分类号： H05K13/0023 , B41J15/04 , H01L21/67132 , Y10T29/49002 , Y10T29/51
摘要： In order to provide a substrate cartridge, a substrate processing apparatus, a substrate processing system, a control apparatus, and a method of manufacturing a display element capable of preventing foreign objects from being attached to the substrate, there is provided a substrate cartridge including: a cartridge mainframe that ha an opening which a substrate is carried in/out and accommodates the substrate through the opening; a mount portion that is provided in the cartridge mainframe and is detachably connected to an external connecting portion; and a blocking unit that blocks the opening depending on a connection state between the mount portion and an external connecting portion.
摘要翻译：为了提供基板盒，基板处理装置，基板处理系统，控制装置以及能够防止异物附着到基板上的显示元件的制造方法，提供了一种基板盒，包括：盒式磁带主机，其具有基板被输入/输出并通过开口容纳基板的开口; 安装部分，其设置在所述盒主机中并且可拆卸地连接到外部连接部分; 以及阻挡单元，其根据所述安装部和外部连接部之间的连接状态来阻挡所述开口。

33. 发明申请

WO2011024985A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：WO2011024985A1
公开(公告)日：2011-03-03
申请号：PCT/JP2010/064663
申请日：2010-08-24
申请人： NIKON CORPORATION , SHIBAZAKI, Yuichi
发明人： SHIBAZAKI, Yuichi
IPC分类号： G03F7/20
CPC分类号： G03F7/70108 , G03F7/70058 , G03F7/70191 , G03F7/70516 , G03F7/70725 , G03F7/70758 , G03F7/70775 , G03F7/70975 , G03F9/70 , G03F9/7046 , Y10T29/49004
摘要： An exposure apparatus is equipped with an encoder system which measures positional information of a wafer stage (WST1) by irradiating a measurement beam using four heads (60 1 to 60 4 ) installed on the wafer stage (WST1) on a scale plate (21) which covers the movement range of the wafer stage (WST1) except for the area right under a projection optical system (PL). Placement distances (A, B) of the heads (60 1 to 60 4 ) here are each set to be larger than width (a i , b i ) of the opening of the scale plates (21), respectively. This allows the positional information of the wafer stage to be measured, by switching and using the three heads facing the scale plate out of the four heads according to the position of the wafer stage.
摘要翻译：曝光装置配备有通过使用安装在晶片台（WST1）上的四个头（601〜604）照射测量光束来测量晶片台（WST1）的位置信息的编码器系统，该刻度盘（21）覆盖除了投影光学系统（PL）正下方的区域之外的晶片台（WST1）的移动范围。这里的头部（601〜604）的放置距离（A，B）分别设定为大于刻度板（21）的开口部的宽度（ai，bi）。这允许根据晶片台的位置，通过切换和使用面向刻度板的三个磁头来测量晶片台的位置信息。

34. 发明申请

WO2011024984A1 EXPOSURE METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光方法，曝光装置和装置制造方法
公开(公告)号：WO2011024984A1
公开(公告)日：2011-03-03
申请号：PCT/JP2010/064662
申请日：2010-08-24
申请人： NIKON CORPORATION , SHIBAZAKI, Yuichi
发明人： SHIBAZAKI, Yuichi
IPC分类号： G03F7/20
CPC分类号： G03F7/20 , G01B11/27 , G03F7/70133 , G03F7/70358 , G03F7/70483 , G03F7/70516 , G03F7/70725 , G03F7/70775 , G03F9/70 , H01L21/681 , Y10T29/49002
摘要： Within an area (A 0 ) where of four heads (60 1 to 60 4 ) installed on a stage (WST1), heads included in the first head group and the second head group to which three heads each belong that include one head different from each other face the corresponding areas on a scale plate, the stage (WST1) is driven based on positional information which is obtained using the first head group, as well as obtaining the displacement (displacement of position, rotation, and scaling) between the first and second reference coordinate systems (C 1 , C 2 ) corresponding to the first and second head groups using the positional information obtained using the first and second head groups. By using the results and correcting measurement results obtained using the second head group, the displacement between the first and second reference coordinate systems (C 1 , C 2 ) is calibrated, which allows the measurement errors that come with the displacement between the areas on the scale plates where each of the four heads (60 1 to 60 4 ) face to be corrected.
摘要翻译：在安装在平台（WST1）上的四个磁头（601至604）的区域（A0）内，包括在第一磁头组中的磁头和每个所属的三个磁头的第二磁头组包括一个彼此不同的磁头基于标尺板上的对应区域，基于使用第一头组获得的位置信息来驱动平台（WST1），以及获得第一和第二参考点之间的位移（位置，旋转和缩放位移）使用使用第一和第二头组获得的位置信息对应于第一和第二头组的坐标系（C1，C2）。通过使用结果并校正使用第二头组获得的测量结果，校准第一和第二参考坐标系（C1，C2）之间的位移，这允许在刻度板上的区域之间的位移所带来的测量误差其中四个头（601至604）中的每一个面都要被校正。

35. 发明申请

WO2011021723A1 OBJECT PROCESSING APPARATUS, EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：对象处理装置，曝光装置和曝光方法及装置制造方法
公开(公告)号：WO2011021723A1
公开(公告)日：2011-02-24
申请号：PCT/JP2010/064430
申请日：2010-08-19
申请人： NIKON CORPORATION , AOKI, Yasuo
发明人： AOKI, Yasuo
IPC分类号： G03F7/20 , B65G49/06 , H01L21/68
CPC分类号： G03F7/70716 , B65G49/065 , G03F7/70791 , H01L21/67784 , H01L21/6838
摘要： A plurality of air levitation units (50) that jet air to the lower surface of a substrate (P) are placed below the substrate (P), and the substrate (P) is supported in a noncontact manner so as to be substantially horizontal. Further, a portion subject to exposure of the substrate (P) is held from below in a noncontact manner by a chuck main body (81) that a fixed-point stage (40) has, and a surface position of the portion subject to exposure is adjusted in a pinpoint manner. Consequently, exposure can be performed on the substrate (P) with high precision. Since the chuck main body (81) moves in a scanning direction according to the position of the substrate, the chuck main body can surely hold the substrate even when the substrate proceeds into an exposure area (IA).
摘要翻译：将空气喷射到基板（P）的下表面的多个空气悬浮单元（50）放置在基板（P）的下方，基板（P）以非接触方式被支撑为基本水平。此外，由基板（P）进行曝光的部分通过定位台（40）所具有的卡盘主体（81）以及暴露部分的表面位置以非接触的方式从下方保持以精确的方式进行调整。因此，可以高精度地对基板（P）进行曝光。由于卡盘主体（81）根据基板的位置沿扫描方向移动，所以即使当基板进入曝光区域（IA）时，卡盘主体也能够可靠地保持基板。

36. 发明申请

WO2011021444A1 POLARIZATION CONVERTING UNIT, ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：偏光转换单元，照明光学系统，曝光装置和设备制造方法
公开(公告)号：WO2011021444A1
公开(公告)日：2011-02-24
申请号：PCT/JP2010/061300
申请日：2010-06-25
申请人： NIKON CORPORATION , TANITSU, Osamu
发明人： TANITSU, Osamu
IPC分类号： G02B27/28 , G03F7/20
CPC分类号： G02B27/286 , G03F7/70566
摘要： An embodiment of the present invention relates to a polarization converting unit with a structure for achieving a pupil intensity distribution in a circumferentially polarized state with high continuity, which is arrange in an optical path of an illumination optical system. The polarization converting unit for converting incident light into light in a predetermined polarization state has a first optical element and a second optical element. The first optical element has a plurality of first regions, and at least two adjacent first regions have respective different thicknesses so as to have different polarization conversion properties. Likewise, the second optical element also has a plurality of second regions, and at least two adjacent second regions have different polarization conversion properties. The first and second optical elements are arranged so that a light beam having passed through one first region is incident to two adjacent second regions, whereby the sum of thicknesses of the first and second optical elements is varied depending upon a passing position of light.
摘要翻译：本发明的一个实施例涉及一种具有用于实现具有高连续性的周向极化状态下的光瞳强度分布的结构的偏振转换单元，其被布置在照明光学系统的光路中。用于将入射光以预定偏振态转换成光的偏振转换单元具有第一光学元件和第二光学元件。第一光学元件具有多个第一区域，并且至少两个相邻的第一区域具有各自不同的厚度，以具有不同的偏振转换特性。类似地，第二光学元件还具有多个第二区域，并且至少两个相邻的第二区域具有不同的偏振转换特性。第一和第二光学元件被布置成使得已经穿过一个第一区域的光束入射到两个相邻的第二区域，由此第一和第二光学元件的厚度之和根据光的通过位置而变化。

37. 发明申请

WO2010147245A2 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置和装置制造方法
公开(公告)号：WO2010147245A2
公开(公告)日：2010-12-23
申请号：PCT/JP2010/060925
申请日：2010-06-21
申请人： NIKON CORPORATION , ICHINOSE, Go
发明人： ICHINOSE, Go
IPC分类号： G03F7/20
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70725 , G03F7/70733 , G03F7/70775 , G03F7/70825
摘要： At a measurement bar (71) on which a first measurement head group (72) that measures positional information of a fine movement stage (WFS1) that holds a wafer (W) is arranged, various types of measurement instruments, e.g. an aerial image measuring instrument (160) and the like, used in measurement related exposure such as the optical properties of a projection optical system (PL) are arranged. The measurement is performed using the various types of measurement instruments and the exposure conditions such as the optical properties of the projection optical system (PL) are adjusted based on the result of the measurement, as needed, and thereby the exposure processing can appropriately be performed on the wafer.
摘要翻译：在其上配置有测量保持晶片（W）的微动载台（WFS1）的位置信息的第一测量头组（72））的测量棒（71），各种测量仪器布置了诸如投影光学系统（PL）的光学特性的测量相关曝光中使用的空间图像测量仪器（160）等。使用各种测量仪器进行测量，并且根据需要根据测量结果调整投影光学系统（PL）的光学特性等曝光条件，从而适当地进行曝光处理在晶圆上。

38. 发明申请

WO2010147244A2 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置和装置制造方法
公开(公告)号：WO2010147244A2
公开(公告)日：2010-12-23
申请号：PCT/JP2010/060924
申请日：2010-06-21
申请人： NIKON CORPORATION , ICHINOSE, Go
发明人： ICHINOSE, Go
IPC分类号： G03F7/20
CPC分类号： G03F7/709 , G03F7/70775 , G03F7/70825 , G03F7/7085
摘要： Positional information of each of wafer stages (WST1 and WST2) during exposure and during alignment is measured directly under a projection optical system (PL) and directly under a primary alignment system (AL1), respectively, by a plurality of encoder heads, Z heads and the like, which a measurement bar (71) placed below surface plates (14A and 14B) has, using gratings placed on the lower surfaces of fine movement stages (WFS1 and WFS2). Consequently, high-precision measurement of the positional information of the wafer stages (WST1 and WST2) can be performed.
摘要翻译：在曝光和对准期间每个晶片台（WST1和WST2）的位置信息直接在投影光学系统（PL）下直接在主对准系统（AL1）下由多个编码器头，Z头使用放置在微动台（WFS1和WFS2）的下表面上的光栅，其中放置在表面板（14A和14B）之下的测量棒（71）具有。因此，可以进行晶片台（WST1和WST2）的位置信息的高精度测量。

39. 发明申请

WO2010134644A1 MOVABLE BODY APPARATUS, EXPOSURE APPARATUS AND METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：可移动身体装置，曝光装置和方法以及装置制造方法
公开(公告)号：WO2010134644A1
公开(公告)日：2010-11-25
申请号：PCT/JP2010/058947
申请日：2010-05-20
申请人： NIKON CORPORATION , SHIBAZAKI, Yuichi
发明人： SHIBAZAKI, Yuichi
IPC分类号： G03F7/20 , H01L21/67
CPC分类号： G03F7/70725 , G03F7/70775 , G03F7/7085
摘要： A fine movement stage (WFS) is driven by a controller, based on positional information of the fine movement stage (WFS) in a measurement direction measured by a measurement system (70)and correction information of a measurement error caused by a tilt of the fine movement stage (WFS) included in the positional information. Accordingly, driving the fine movement stage (WFS) with high precision becomes possible, which is not affected by a measurement error included in the positional information in a measurement direction of the measurement system that occurs due to a tilt of the fine movement stage (WFS).
摘要翻译：基于由测量系统（70）测量的测量方向上的精细运动级（WFS）的位置信息和由倾斜的测量误差引起的测量误差的校正信息，由控制器驱动精细运动级（WFS）精细运动阶段（WFS）包含在位置信息中。因此，可以高精度地驱动精细运动级（WFS），不受由精细运动级（WFS）倾斜引起的测量系统的测量方向上的位置信息中包含的测量误差的影响）。

40. 发明申请

WO2010071238A1 MOVABLE BODY APPARATUS 审中-公开
标题翻译：可移动身体装置
公开(公告)号：WO2010071238A1
公开(公告)日：2010-06-24
申请号：PCT/JP2009/071721
申请日：2009-12-18
申请人： NIKON CORPORATION , SHIBAZAKI, Yuichi
发明人： SHIBAZAKI, Yuichi
IPC分类号： G03F7/20
CPC分类号： G03F7/7055 , G01B11/002 , G03F7/70341 , G03F7/70716 , G03F7/70733 , G03F7/70775 , G03F7/708 , Y10T29/49826
摘要： In an exposure station (200), positional information of a stage (WFS1) holding a wafer is measured by a first fine movement stage position measurement system including a measurement arm (71A), and in a measurement station (300), positional information of a stage (WFS2) holding a wafer is measured by a second fine movement stage position measurement system including another measurement arm (71B). An exposure apparatus (100) has a third fine movement stage position measurement system which can measure positional information of the stage (WFS2) when the stage (WFS2) is carried from the measurement station (300) to the exposure station (200). The third fine movement stage measurement system includes an encoder system including a plurality of Y heads (96, 97) and a laser interferometer system including laser interferometers (76a to 76d).
摘要翻译：在曝光台（200）中，通过包括测量臂（71A）的第一微动台位置测量系统测量保持晶片的台（WFS1）的位置信息，在测量台（300）中，位置信息通过包括另一个测量臂（71B）的第二微动台位置测量系统测量保持晶片的平台（WFS2）。曝光装置（100）具有第三精细移动台位置测量系统，其能够测量当从测量站（300）向曝光站（200）传送载物台（WFS2）时的载物台（WFS2）的位置信息。第三精细运动台测量系统包括包括多个Y头（96,97）和包括激光干涉仪（76a至76d）的激光干涉仪系统的编码器系统。

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