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    • 1. 发明专利
    • Starting Device for Internal Combustion Engines.
    • GB191225889A
    • 1913-05-08
    • GB191225889D
    • 1912-11-11
    • CROUSE DAVID ELDRIDGEEIDSON CHARLES GEORGE
    • CROUSE DAVID ELDRIDGEEIDSON CHARLES GEORGE
    • 25,889. Crouse, D. E., and Edison, C. G. Nov. 11. Electric and magnetic gears.-Internal-combustion engines are started by a compressed-air engine having electromagnetically - operated valves. The compressed - air piston has a #-shaped rod 3, 4 carrying a frame 9, capable of slight lateral displacement, in which is mounted a rack 10 capable of slight axial displacement. A piston 7 open to the air pressure through a passage 5 in the rod 3, 4 moves the rack into engagement with a pinion 47 on the main shaft. The inlet and exhaust valves 26, 25 are controlled by a rod 23 moving in a solenoid 22. Contact is made between points 40, 41 on the piston-rod and cylinder when the rack and pinion are not engaged. On closing a starting- switch the circuit is completed and the valve 26 opened. As the piston moves upwards, the downward pressure of the pinion 47 on the rack 10 closes the switch 11 , 13 before the circuit through 40, 41 is broken. A bridge-piece 24 carried on the rod 23 closes a locking circuit so that the apparatus will continue to work even if the switch K is opened. When the piston reaches the end of its stroke or the main engine starts, the rack is raised and the contacts 11 , 13 are broken; the rod 23 returns and the exhaust valve 25 is opened; and the piston returns under gravity. If the main engine fires prematurely, the piston 2 is driven back and the resulting pressure opens a valve 31 and breaks the circuit. If the engine fails to start on the first stroke, the piston 2 will continue working as long as the starting-switch is closed.
    • 3. 发明申请
    • ION SOURCE CLEANING IN SEMICONDUCTOR PROCESSING SYSTEMS
    • 半导体加工系统中的离子源清洁
    • US20110259366A1
    • 2011-10-27
    • US12867245
    • 2009-02-11
    • Joseph D. SweeneySharad N. YedaveOleg BylRobert KaimDavid EldridgeSteven SergiLin FengSteven E. BishopW. Karl OlanderYing Tang
    • Joseph D. SweeneySharad N. YedaveOleg BylRobert KaimDavid EldridgeSteven SergiLin FengSteven E. BishopW. Karl OlanderYing Tang
    • B08B7/00H01L21/265B08B5/00
    • H01J37/3171C23C14/48C23C14/54C23C14/564H01J37/08H01J37/16H01J37/18H01J2237/082H01J2237/22
    • Cleaning of an ion implantation system or components thereof, utilizing a reactive cleaning reagent enabling growth/etching of the filament in an ion source of the arc chamber, by appropriate control of temperature in the arc chamber to effect the desired filament growth or alternative filament etching. Also described is the use of reactive gases such as XeFx, WFx, AsFx, PFx and TaFx, wherein x has a stoichioimetrically appropriate value or range of values, for cleaning regions of ion implanters, or components of implanters, in in situ or ex situ cleaning arrangements, under ambient temperature, elevated temperature or plasma conditions. Among specific reactive cleaning agents, BrF3 is described as useful for cleaning ion implant systems or component(s) thereof, in in situ or ex situ cleaning arrangements. Also described is a method of cleaning the forelines of an ion implant system for at least partial removal of ionization-related deposit from said forelines, comprising contacting said forelines with a cleaning gas wherein said cleaning gas is chemically reactive with said deposit. Also described is a method of improving the performance and extending the lifetime of an ion implant system, comprising contacting the cathode with a gas mixture.
    • 使用能够在电弧室的离子源中生长/蚀刻细丝的反应性清洁剂来清洁离子注入系统或其组分,通过适当地控制电弧室中的温度以实现所需的长丝生长或替代的细丝蚀刻 。 还描述了使用诸如XeFx,WFx,AsFx,PFx和TaFx的反应性气体,其中x具有化学计量学上适当的值或值范围,用于清除离子注入器或植入物的组分的原位或非原生境 清洁布置,在环境温度,升高的温度或等离子体条件下。 在特定的反应性清洁剂中,BrF3被描述为用于在原位或非原位清洁装置中清洁离子注入系统或其组分。 还描述了一种清洁离子注入系统的前沿以从所述前线至少部分去除电离相关沉积物的方法,包括使所述前沿与清洁气体接触,其中所述清洁气体与所述沉积物化学反应。 还描述了改进离子注入系统的性能和延长寿命的方法,包括使阴极与气体混合物接触。
    • 10. 发明授权
    • Suspension system and adjustment mechanism for an integrated chip and method
    • 集成芯片和方法的悬挂系统和调整机制
    • US07626405B2
    • 2009-12-01
    • US11764230
    • 2007-06-18
    • David Eldridge
    • David Eldridge
    • G01R31/02
    • G01R1/0466
    • Disclosed herein is a suspension system and adjustment mechanism for an integrated chip held in a clamping or similar assembly and a related method for same. The suspension system Includes a pressure plate member adapted to fit compatibly within the clamp assembly. A hinge assembly applies and releases pressure through the pressure plate member. The hinge assembly has a first open position where pressure is released and a second closed position where pressure is applied. A spring member between the pressure plate member and the hinge assembly has predetermined travel limits controlling the amount of pressure to be applied. In an exemplary embodiment of the invention disclosed herein the suspension system includes an adjustment mechanism which adjusts to the pressure to a fine degree. The adjustment mechanism includes a housing which applies and releases pressures in response to the turning of a control knob. The control knob is connected to a gear apparatus within the housing which responds to the movement of the control knob by moving the housing.
    • 本文公开了一种用于夹持或类似组件的集成芯片的悬挂系统和调节机构及其相关方法。 悬挂系统包括适于在夹具组件内相配合的压板构件。 铰链组件通过压板构件施加并释放压力。 铰链组件具有第一打开位置,其中释放压力和施加压力的第二关闭位置。 压板构件和铰链组件之间的弹簧构件具有控制要施加的压力量的预定行程限制。 在本文公开的本发明的示例性实施例中,悬架系统包括调节机构,该调节机构能够将压力调节到很小程度。 调节机构包括响应于控制旋钮转动而施加和释放压力的壳体。 控制旋钮连接到外壳内的齿轮装置,通过移动外壳来响应控制旋钮的移动。