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    • 1. 发明申请
    • CROSSBAR-INTEGRATED MEMRISTOR ARRAY AND METHOD EMPLOYING INTERSTITIAL LOW DIELECTRIC CONSTANT INSULATOR
    • 交叉整体式电容器阵列和采用间接低介电常数绝缘体的方法
    • US20110169136A1
    • 2011-07-14
    • US12687798
    • 2010-01-14
    • Matthew D. PickettDmitri B. Strukov
    • Matthew D. PickettDmitri B. Strukov
    • H01L29/86H01L21/02
    • H01L27/24
    • A memristor crossbar array and method of making employ an interstitial insulator. The memristor crossbar array includes a plurality of memristors in an array. The memristors include columns of memristor material disposed between and connecting to a first plurality of wire electrodes and a second plurality of wire electrodes at cross points between the respective wire electrodes. The memristor crossbar array further includes an insulator of a solid material in an interstitial space between the wire electrodes of the first plurality and between the columns of memristor material. The insulator isolates the memristors from one another and has a dielectric constant that is lower than a dielectric constant of the memristor material. The method of making includes forming the plurality of memristors and filling the interstitial space between adjacent memristors with the insulator material.
    • 忆阻器横杆阵列和制造方法采用间隙绝缘体。 忆阻器横杆阵列包括阵列中的多个忆阻器。 忆阻器包括设置在第一多个线电极之间并连接到第一多个线电极之间的忆阻器材料的列和在各个线电极之间的交叉点处的第二多个线电极。 忆阻器横杆阵列还包括固体材料的绝缘体,其位于第一组的线电极之间和忆阻器材料柱之间的间隙空间中。 绝缘体将忆阻器彼此隔离,并且具有低于忆阻器材料的介电常数的介电常数。 制造方法包括形成多个忆阻器并且将相邻忆阻器之间的间隙填充到绝缘体材料。