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    • 3. 发明授权
    • Method for producing group III nitride-based compound semiconductor
    • 制备III族氮化物基化合物半导体的方法
    • US08361222B2
    • 2013-01-29
    • US12081943
    • 2008-04-23
    • Shiro YamazakiSeiji NagaiTakayuki SatoKatsuhiro ImaiMakoto IwaiTakatomo SasakiYusuke MoriFumio Kawamura
    • Shiro YamazakiSeiji NagaiTakayuki SatoKatsuhiro ImaiMakoto IwaiTakatomo SasakiYusuke MoriFumio Kawamura
    • C30B15/14C30B15/00C30B21/06C30B27/02C30B28/10C30B30/04
    • C30B29/403C30B9/00C30B9/12C30B29/406
    • In the production of GaN through the flux method, deposition of miscellaneous crystals on the nitrogen-face of a GaN self-standing substrate and waste of raw materials are prevented. Four arrangements of crucibles and a GaN self-standing substrate are exemplified. In FIG. 1A, a nitrogen-face of a self-standing substrate comes into close contact with a sloped flat inner wall of a crucible. In FIG. 1B, a nitrogen-face of a self-standing substrate comes into close contact with a horizontally facing flat inner wall of a crucible, and the substrate is fixed by means of a jig. In FIG. 1C, a jig is provided on a flat bottom of a crucible, and two GaN self-standing substrates are fixed by means of the jig so that the nitrogen-faces of the substrates come into close contact with each other. In FIG. 1D, a jig is provided on a flat bottom of a crucible, and a GaN self-standing substrate is fixed on the jig so that the nitrogen-face of the substrate is covered with the jig. A flux mixture of molten gallium and sodium is charged into each crucible, and a GaN single crystal is grown on a gallium-face under pressurized nitrogen.
    • 在通过助熔剂制造GaN的情况下,可以防止在GaN自立基板的氮面上沉积杂晶,原料的浪费。 例示了四个坩埚和GaN自立衬底的布置。 在图 如图1A所示,自立基板的氮面与坩埚的倾斜的平坦的内壁紧密接触。 在图 如图1B所示,自立基板的氮面与坩埚的水平方向的平坦的内壁紧密接触,通过夹具固定基板。 在图 如图1C所示,在坩埚的平坦底部设置夹具,通过夹具固定两个GaN自立基板,使得基板的氮面彼此紧密接触。 在图 如图1D所示,在坩埚的平坦底部设置夹具,并且将GaN自立基板固定在夹具上,使得基板的氮面被夹具覆盖。 将熔融的镓和钠的助熔剂混合物装入每个坩埚中,并且在加压氮气下在镓面上生长GaN单晶。
    • 8. 发明申请
    • Production Methods of Semiconductor Crystal and Semiconductor Substrate
    • 半导体晶体和半导体基板的生产方法
    • US20090155580A1
    • 2009-06-18
    • US12225389
    • 2007-04-05
    • Naoki ShibataKoji HirataShiro YamazakiKatsuhiro ImaiMakoto IwaiTakatomo SasakiYusuke MoriFumio Kawamura
    • Naoki ShibataKoji HirataShiro YamazakiKatsuhiro ImaiMakoto IwaiTakatomo SasakiYusuke MoriFumio Kawamura
    • C30B19/02B32B9/00B32B1/00
    • C30B29/403C30B9/00H01L33/0075Y10T428/265Y10T428/266
    • To provide a semiconductor substrate of high quality suitable for fabricating an electronic device or an optical device. The present invention provides a method for producing a semiconductor substrate for an electronic device or an optical device, the method including reacting nitrogen (N) with gallium (Ga), aluminum (Al), or indium (In), which are group III elements, in a flux mixture containing a plurality of metal elements selected from among alkali metals and alkaline earth metals, to thereby grow a group III nitride based compound semiconductor crystal. The group III nitride based compound semiconductor crystal is grown while the flux mixture and the group III element are mixed under stirring. At least a portion of a base substrate on which the group III nitride based compound semiconductor crystal is grown is formed of a flux-soluble material, and the flux-soluble material is dissolved in the flux mixture, at a temperature near the growth temperature of the group III nitride based compound semiconductor crystal, during the course of growth of the semiconductor crystal or after completion of growth of the semiconductor crystal.
    • 提供适合于制造电子器件或光学器件的高品质的半导体衬底。 本发明提供了一种用于制造电子器件或光学器件的半导体衬底的方法,所述方法包括使氮(N)与镓(Ga),铝(Al)或铟(In)反应,其为III族元素 在含有选自碱金属和碱土金属中的多种金属元素的助熔剂混合物中,从而生长III族氮化物类化合物半导体晶体。 在熔融混合物和III族元素在搅拌下混合,生长III族氮化物基化合物半导体晶体。 在其上生长III族氮化物基化合物半导体晶体的基底基板的至少一部分由助溶剂材料形成,并且将助熔剂材料溶解在助熔剂混合物中,在接近生长温度的温度 III族氮化物基化合物半导体晶体,在半导体晶体生长过程中或半导体晶体生长完成之后。