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1. 发明申请

WO2006085676A2 PROCESS AND APPARATUS FOR PRODUCING POROUS QUARTZ GLASS BASE 审中-公开
标题翻译：生产多孔石英玻璃基板的方法和设备
公开(公告)号：WO2006085676A2
公开(公告)日：2006-08-17
申请号：PCT/JP2006/302595
申请日：2006-02-08
申请人： ASAHI GLASS CO., LTD. , IWATA, Kei , UTO, Takao , SAKUMA, Takuya
发明人： IWATA, Kei , UTO, Takao , SAKUMA, Takuya
CPC分类号： C03B19/1446 , C03B37/0144 , Y02P40/57
摘要： The present invention provides a process for producing a porous quartz glass base, which comprises hydrolyzing a silicon compound in an oxyhydrogen flame in a reaction furnace to generate and deposit fine silica particles on a starting member, thereby forming a porous quartz glass base, wherein a gas discharge pipe for discharging an unnecessary gas from the reaction furnace is heated. According to the present invention, fine silica particles can be prevented from adhering to a gas discharge pipe for discharging the unnecessary hydrogen chloride gas generated in producing a porous quartz glass base.
摘要翻译：本发明提供了一种制备多孔石英玻璃基体的方法，该方法包括在反应炉中在氢氧火焰中水解硅化合物以在起始部件上生成和沉积细二氧化硅颗粒，由此形成多孔石英玻璃基体，其中用于从反应炉中排出不需要的气体的气体排出管被加热。根据本发明，可以防止二氧化硅微粒附着在气体排出管上，用于排出制造多孔石英玻璃基体时产生的不需要的氯化氢气体。

2. 发明申请

WO2007086617A1 SYNTHETIC QUARTZ GLASS WITH FAST AXES OF BIREFRINGENCE DISTRIBUTED IN CONCENTRIC-CIRCLE TANGENT DIRECTIONS AND PROCESS FOR PRODUCING THE SAME 审中-公开
标题翻译：合成锥形玻璃与聚合圆形方向分布的快速轴的方向及其生产方法
公开(公告)号：WO2007086617A1
公开(公告)日：2007-08-02
申请号：PCT/JP2007/051875
申请日：2007-01-30
申请人： ASAHI GLASS CO., LTD. , AGATA, Noriyuki , TAKATA, Masaaki , OGAWA, Tomonori , IWATA, Kei
发明人： AGATA, Noriyuki , TAKATA, Masaaki , OGAWA, Tomonori , IWATA, Kei
IPC分类号： C03B19/14 , C03C3/06 , C03C4/00
CPC分类号： C03B19/1453 , C03B2201/02 , C03B2201/04 , C03C3/06 , C03C4/0071 , C03C4/0085 , C03C2201/23 , C03C2203/44 , Y02P40/57 , Y10T428/2982
摘要： The present invention provides a synthetic quartz glass having a diameter of 100 mm or more for using in an optical apparatus comprising a light source emitting a light having a wavelength of 250 nm or less, the synthetic quartz glass having, in a region located inward from the periphery thereof by 10 mm or more in a plane perpendicular to the optical axis of the synthetic quartz glass: a birefringence of 0.5 nm or less per thickness of 1 cm with respect to a light having a wavelength of 193 nm; an OH group concentration of 60 ppm or less; an averaged differential OH group concentration from the center of the synthetic quartz glass toward a peripheral direction thereof, normalized with respect to the radius of the synthetic quartz glass, of -8 to +60 ppm,- and an unbiased standard deviation of a differential OH group concentration from the center of the synthetic quartz glass toward a peripheral direction thereof, normalized with respect to the radius of the synthetic quartz glass, of 10 ppm or less.
摘要翻译：本发明提供一种直径为100mm以上的合成石英玻璃，其用于包括发射波长为250nm以下的光的光源的光学装置中，所述合成石英玻璃在位于其周边在与合成石英玻璃的光轴垂直的平面中10mm以上：相对于波长193nm的光，每厚度1cm的双折射为0.5nm以下; OH基浓度为60ppm以下; 从合成石英玻璃的中心朝向其圆周方向的中心的平均差分OH基浓度相对于合成石英玻璃的半径归一化为-8〜+ 60ppm，差分OH的无偏标准差从合成石英玻璃的中心朝向其合成石英玻璃的半径标准化的圆周方向的组浓度为10ppm以下。

3. 发明申请

WO2007086611A1 SYNTHETIC QUARTZ GLASS WITH RADIAL DISTRIBUTION OF FAST AXES OF BIREFRINGENCE AND PROCESS FOR PRODUCING THE SAME 审中-公开
标题翻译：具有快速轴向径向分布的合成石英玻璃及其制造方法
公开(公告)号：WO2007086611A1
公开(公告)日：2007-08-02
申请号：PCT/JP2007/051853
申请日：2007-01-30
申请人： ASAHI GLASS CO., LTD. , TAKATA, Masaaki , AGATA, Noriyuki , OGAWA, Tomonori , IWATA, Kei
发明人： TAKATA, Masaaki , AGATA, Noriyuki , OGAWA, Tomonori , IWATA, Kei
IPC分类号： C03C3/06 , C03B19/14
CPC分类号： C03C3/06 , C03B19/1453 , C03B2201/075 , C03B2201/23 , C03C2201/23 , Y02P40/57 , Y10T428/2982
摘要： The present invention provides a synthetic quartz glass having a diameter of 100 mm or more for using in an optical apparatus comprising a light source emitting a light having a wavelength of 250 nm or less, the synthetic quartz glass having, in a region located inward from the periphery thereof by 10 mm or more in a plane perpendicular to the optical axis of the synthetic quartz glass: a birefringence of 0.5 nm or less per thickness of 1 cm with respect to a light having a wavelength of 193 nm; an OH group concentration of 60 ppm or less; an averaged differential OH group concentration from the center of the synthetic quartz glass toward a peripheral direction thereof, normalized with respect to the radius of the synthetic quartz glass, of not less than -60 ppm and less than -8 ppm; and an unbiased standard deviation σ of a differential OH group concentration from the center of the synthetic quartz glass toward a peripheral direction thereof, normalized with respect to the radius of the synthetic quartz glass, of 10 ppm or less, the unbiased standard deviation σ being determined with the following formula (1): (1) providing; (a): differential OH group concentration at measurement point i normalized with respect to the radius R of the synthetic quartz glass; (b): OH group concentration at measurement point i in terms of moving average for three points including the two points before and after the measurement point i; (c): radius at measurement point i normalized with respect to the radius R of the synthetic quartz glass; (d): average of OH group concentrations Xi in the whole evaluation region; and n: number of measurement points in the evaluation region (integer of 2 or more).
摘要翻译：本发明提供一种直径为100mm以上的合成石英玻璃，其用于包括发射波长为250nm以下的光的光源的光学装置中，所述合成石英玻璃在位于其周边在与合成石英玻璃的光轴垂直的平面中10mm以上：相对于波长193nm的光，每厚度1cm的双折射为0.5nm以下; OH基浓度为60ppm以下; 从合成石英玻璃的中心朝向其圆周方向的中心的相对于合成石英玻璃的半径归一化的平均差分OH基浓度为-60ppm以上且小于-8ppm的平均值; 以及相对于合成石英玻璃的半径归一化为10ppm以下的从合成石英玻璃的中心向其周向的不同OH基浓度的无偏差标准偏差s为无偏标准偏差s 用以下公式（1）确定：（1）提供; （a）：相对于合成石英玻璃的半径R，在测量点i处的差示OH基浓度归一化; （b）：在测量点i之前和之后三点的移动平均值的测量点i处的OH基浓度; （c）：测量点i处的半径相对于合成石英玻璃的半径R标准化; （d）：整个评价区域的OH基浓度Xi的平均值; n：评价区域的测定点数（2以上的整数）。

4. 发明申请

WO2006085676A3 PROCESS AND APPARATUS FOR PRODUCING POROUS QUARTZ GLASS BASE 审中-公开
标题翻译：用于生产多孔石英玻璃基底的方法和装置
公开(公告)号：WO2006085676A3
公开(公告)日：2006-10-19
申请号：PCT/JP2006302595
申请日：2006-02-08
申请人： ASAHI GLASS CO LTD , IWATA KEI , UTO TAKAO , SAKUMA TAKUYA
发明人： IWATA KEI , UTO TAKAO , SAKUMA TAKUYA
IPC分类号： C03B19/14 , C03B37/014
CPC分类号： C03B19/1446 , C03B37/0144 , Y02P40/57
摘要： The present invention provides a process for producing a porous quartz glass base, which comprises hydrolyzing a silicon compound in an oxyhydrogen flame in a reaction furnace to generate and deposit fine silica particles on a starting member, thereby forming a porous quartz glass base, wherein a gas discharge pipe for discharging an unnecessary gas from the reaction furnace is heated. According to the present invention, fine silica particles can be prevented from adhering to a gas discharge pipe for discharging the unnecessary hydrogen chloride gas generated in producing a porous quartz glass base.
摘要翻译：本发明提供一种多孔石英玻璃基底的制造方法，该方法包括在反应炉中水解含氢氢火焰中的硅化合物，以在起始部件上产生并沉积二氧化硅微粒，从而形成多孔石英玻璃基底，其中，用于从反应炉排出不需要的气体的排气管被加热。根据本发明，可以防止二氧化硅微粒附着在用于排出生产多孔石英玻璃基底中产生的不必要的氯化氢气体的排气管。

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