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1. 发明授权

US08263169B2 Stent mandrel fixture and method for reducing coating defects 有权
标题翻译：支架心轴夹具及减少涂层缺陷的方法
公开(公告)号：US08263169B2
公开(公告)日：2012-09-11
申请号：US12246423
申请日：2008-10-06
申请人： Fuh-Wei Tang , Syed F. A. Hossainy , Dorie Happ , Ty T. Hu
发明人： Fuh-Wei Tang , Syed F. A. Hossainy , Dorie Happ , Ty T. Hu
IPC分类号： B05B13/02 , B05C13/00 , B05D3/00
CPC分类号： B29C39/003 , A61F2/91
摘要： A stent mandrel fixture for supporting a stent during the application of a coating substance is provided.
摘要翻译：提供了一种用于在施加涂层物质期间支撑支架的支架心轴夹具。

2. 发明授权

US06547812B1 Radiation therapy using a radioactive implantable device and a radiosensitizer agent 有权
标题翻译：使用放射性可植入装置和放射增敏剂的放射治疗
公开(公告)号：US06547812B1
公开(公告)日：2003-04-15
申请号：US09750674
申请日：2000-12-29
申请人： Ty T. Hu
发明人： Ty T. Hu
IPC分类号： A61F206
CPC分类号： A61F2/86 , A61F2210/0095
摘要： A method and apparatus for inhibiting vascular restenosis using a radioactive implantable medical device and a radiosensitizer agent. In one embodiment, the method of the invention includes implanting a medical device at a blood vessel site that has undergone a procedure to open a stenosed region within a blood vessel. The medical device contains a radioisotope to emit a radioactivity to a tissue mass at the blood vessel site. The method further includes delivering a radiosensitizer agent to the tissue mass at the blood vessel site. The radiosensitizer agent increases a therapeutic response of the tissue mass to the radioactivity emitted by the radioisotope.
摘要翻译：一种使用放射性可植入医疗装置和放射增敏剂来抑制血管再狭窄的方法和装置。在一个实施例中，本发明的方法包括将医疗装置植入在已经经历在血管内打开狭窄区域的程序的血管位置处。该医疗装置包含放射性同位素，以在血管部位向组织块发射放射性。该方法还包括在血管部位向组织块输送放射增敏剂。放射增敏剂增加组织块对由放射性同位素发射的放射性的治疗反应。

3. 发明授权

US07833566B2 Stent mandrel fixture and method for reducing coating defects 有权
公开(公告)号：US07833566B2
公开(公告)日：2010-11-16
申请号：US12246434
申请日：2008-10-06
申请人： Fuh-Wei Tang , Syed F. A. Hossainy , Dorrie Happ , Ty T. Hu
发明人： Fuh-Wei Tang , Syed F. A. Hossainy , Dorrie Happ , Ty T. Hu
IPC分类号： A61L33/00 , B05C13/00
CPC分类号： B29C39/003 , A61F2/91
摘要： A stent mandrel fixture for supporting a stent during the application of a coating substance is provided.

4. 发明授权

US07918181B2 Stent mandrel fixture and method for reducing coating defects 有权
标题翻译：支架心轴夹具及减少涂层缺陷的方法
公开(公告)号：US07918181B2
公开(公告)日：2011-04-05
申请号：US12246420
申请日：2008-10-06
申请人： Fuh-Wei Tang , Syed F. A. Hossainy , Dorrie Happ , Ty T. Hu
发明人： Fuh-Wei Tang , Syed F. A. Hossainy , Dorrie Happ , Ty T. Hu
IPC分类号： B05C13/02 , B05C13/00
CPC分类号： B29C39/003 , A61F2/91
摘要： A stent mandrel fixture for supporting a stent during the application of a coating substance is provided.
摘要翻译：提供了一种用于在施加涂层物质期间支撑支架的支架心轴夹具。

5. 发明申请

US20090030509A1 Stent Mandrel Fixture And Method For Reducing Coating Defects 有权
公开(公告)号：US20090030509A1
公开(公告)日：2009-01-29
申请号：US12246434
申请日：2008-10-06
申请人： Fuh-Wei Tang , Syed F.A. Hossainy , Dorrie happ , Ty T. Hu
发明人： Fuh-Wei Tang , Syed F.A. Hossainy , Dorrie happ , Ty T. Hu
IPC分类号： A61F2/06 , A61B19/00
CPC分类号： B29C39/003 , A61F2/91
摘要： A stent mandrel fixture for supporting a stent during the application of a coating substance is provided.

6. 发明授权

US06504307B1 Application of variable bias voltage on a cylindrical grid enclosing a target 有权
标题翻译：在包围目标的圆柱形网格上应用可变偏置电压
公开(公告)号：US06504307B1
公开(公告)日：2003-01-07
申请号：US09727971
申请日：2000-11-30
申请人： Shamim M. Malik , Ty T. Hu
发明人： Shamim M. Malik , Ty T. Hu
IPC分类号： H05B3126
CPC分类号： H01J37/32412 , H01J37/3266
摘要： An apparatus and methods for modifying a surface of a target. The apparatus includes a reaction vessel having a reaction chamber. A cylindrical or spherical grid is positioned within the chamber. An electrode is also positioned within the chamber. A target can be positioned within the chamber and within the grid. A voltage source is operatively associated with the target and with the grid to separately but concurrently provide an independently variable voltage to both the grid and the electrode.
摘要翻译：用于修改目标表面的装置和方法。该装置包括具有反应室的反应容器。圆柱形或球形网格位于腔室内。电极也位于腔室内。目标可以定位在舱内和网格内。电压源可操作地与靶相连，并与电网分开，但同时向栅格和电极提供独立可变的电压。

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