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1. 发明授权

US08206833B2 Metal oxide film, laminate, metal member and process for producing the same 有权
标题翻译：金属氧化物膜，层压体，金属构件及其制造方法
公开(公告)号：US08206833B2
公开(公告)日：2012-06-26
申请号：US11917614
申请日：2006-05-09
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa
IPC分类号： B32B9/00
CPC分类号： C25D11/06 , C25D11/18 , Y10T428/265
摘要： A metal oxide film suitable for protection of metals, composed mainly of aluminum. A metal oxide film includes a film of an oxide of a metal composed mainly of aluminum, having a thickness of 10 nm or greater, and exhibiting a moisture release rate from the film of 1E18 mol./cm2 or less. Further, there is provided a process for producing a metal oxide film, wherein a metal composed mainly of aluminum is subjected to anodic oxidation in a chemical solution of 4 to 10 pH value so as to obtain a metal oxide film.
摘要翻译：适用于主要由铝组成的金属保护金属氧化物膜。金属氧化物膜包括厚度为10nm以上的主要由铝构成的金属的氧化物的膜，并且具有1E18mol / cm 2以下的膜的水分释放率。此外，提供了一种制造金属氧化物膜的方法，其中主要由铝组成的金属在pH值为4至10的化学溶液中进行阳极氧化，以获得金属氧化物膜。

2. 发明授权

US08124240B2 Protective film structure of metal member, metal component employing protective film structure, and equipment for producing semiconductor or flat-plate display employing protective film structure 有权
标题翻译：金属构件的保护膜结构，采用保护膜结构的金属成分，以及使用保护膜结构制造半导体或平板显示器的设备
公开(公告)号：US08124240B2
公开(公告)日：2012-02-28
申请号：US11917633
申请日：2006-06-16
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa , Yukio Kishi
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa , Yukio Kishi
IPC分类号： B32B9/00
CPC分类号： C23C4/02 , C23C8/80 , C23C28/00 , C23C28/042 , C25D11/02 , C25D11/04 , C25D11/08 , C25D11/10 , C25D11/16 , C25D11/18 , Y10T428/26 , Y10T428/265 , Y10T428/31678
摘要： A protective film structure of a metal member for use in an apparatus for manufacturing a semiconductor or the like, the protective film structure including a first coating layer of faultless aluminum oxide formed by direct anodic oxidation of a base-material metal of an aluminum alloy; and a second coating layer formed on the first coating layer and made of yttrium oxide by a plasma spraying method.
摘要翻译：一种用于半导体制造装置的金属构件的保护膜结构，所述保护膜结构包括由铝合金的基材金属的直接阳极氧化形成的无缺陷氧化铝的第一涂层; 以及通过等离子喷涂法形成在第一涂层上并由氧化钇制成的第二涂层。

3. 发明申请

US20100281901A1 Air conditioner for vehicle 审中-公开
标题翻译：汽车空调
公开(公告)号：US20100281901A1
公开(公告)日：2010-11-11
申请号：US12799905
申请日：2010-05-04
申请人： Yasuhiro Kawase , Yukikatsu Ozaki , Mitsuo Inagaki
发明人： Yasuhiro Kawase , Yukikatsu Ozaki , Mitsuo Inagaki
IPC分类号： F25B27/00 , B60H3/00 , F25B41/00 , F25B13/00 , F25B43/00 , F28D1/00
CPC分类号： F25B25/005 , B60H1/00885 , B60H1/20 , B60H1/32284 , B60H2001/00928 , B60H2001/00949 , F25B2339/047
摘要： In an air conditioner for a vehicle, in a heating operation for heating a vehicle compartment, when heating capacity is obtained by flowing a coolant through an inside of an indoor heat exchanger, the coolant flows directly in the inside of the indoor heat exchanger to heat air to be supplied to the vehicle compartment. In contrast, when the heating capacity is not obtained by flowing the coolant through the inside of the indoor heat exchanger, the coolant flows through a first water-refrigerant heat exchanger and a refrigerant in a heat pump cycle circulates so that heat of the coolant is absorbed by the refrigerant in the first water-refrigerant heat exchanger, and the air is heated in the indoor heat exchanger by using heat of the refrigerant that has absorbed the heat of the coolant.
摘要翻译：在车辆用空调机中，在车辆的加热用加热动作中，当通过室内热交换器的内部流动冷却剂而获得加热量时，冷却剂直接在室内热交换器的内部流动供应到车厢的空气。相反，当通过室内热交换器的内部流动冷却剂而不能获得加热能力时，冷却剂流过第一水 - 制冷剂热交换器，并且热泵循环中的制冷剂循环，使得冷却剂的热量被第一水 - 制冷剂热交换器中的制冷剂吸收，并且通过吸收了冷却剂的热量的制冷剂的热量在室内热交换器中对空气进行加热。

4. 发明申请

US20090142588A1 Protective Film Structure of Metal Member, Metal Component Employing Protective Film Structure, and Equipment for Producing Semiconductor or Flat-Plate Display Employing Protective Film Structure 有权
标题翻译：金属部件的保护膜结构，使用保护膜结构的金属部件以及使用保护膜结构的半导体或平板显示器的生产设备
公开(公告)号：US20090142588A1
公开(公告)日：2009-06-04
申请号：US11917633
申请日：2006-06-16
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa , Yukio Kishi
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa , Yukio Kishi
IPC分类号： B32B15/00
CPC分类号： C23C4/02 , C23C8/80 , C23C28/00 , C23C28/042 , C25D11/02 , C25D11/04 , C25D11/08 , C25D11/10 , C25D11/16 , C25D11/18 , Y10T428/26 , Y10T428/265 , Y10T428/31678
摘要： Multifunction production equipment enabling a plurality of processes in which deposition of reaction products on the inner wall of the processing chamber of equipment for producing a semiconductor or a flat-plate display, metal contamination due to corrosion of the inner wall, or the like, and fluctuation of the process due to discharged gas are suppressed, and a protective film structure for use therein. On the surface of a metal material, a first coating layer having an oxide coating of 1μ thick or less formed as an underlying layer by direct oxidation of a parent material, and a second coating layer of about 200 μm thick are formed. With such an arrangement, corrosion resistance against irradiation with ions or radicals can be imparted to a second layer protective film, and the effect of a protective layer for preventing corrosion of the surface of parent metal caused by diffusing molecules or ions into the second layer protective film can be imparted to the first layer oxide film. Consequently, contamination of the substrate with metals generated from each metal member and the inner surface of the process chamber is reduced, and stripping of the second layer protective film due to lowering in adhesion of the second layer protective film due to corrosion of the interface between the parent material and the second layer protective film can be suppressed.
摘要翻译：多功能生产设备能够实现多个工艺，其中在用于制造半导体或平板显示器的设备的处理室的内壁上沉积反应产物，由于内壁的腐蚀而引起的金属污染等，以及排出气体的处理的波动被抑制，以及用于其中的保护膜结构。在金属材料的表面上，形成通过母材直接氧化形成作为下层的1μm厚以下的氧化物被膜的第1被覆层和200μm厚的第2被覆层。通过这样的布置，可以对第二层保护膜赋予对离子或自由基的照射的耐腐蚀性，以及用于防止母体金属表面由于扩散分子或离子而导致的第二层保护层的腐蚀的保护层的效果可以将膜施加到第一层氧化物膜。因此，由金属构件和处理室的内表面产生的金属对衬底的污染减少，并且由于第二层保护膜的粘附性的降低而导致的第二层保护膜的剥离可以抑制母材和第二层保护膜。

5. 发明申请

US20090038946A1 METAL OXIDE FILM, LAMINATE, METAL MEMBER AND PROCESS FOR PRODUCING THE SAME 有权
标题翻译：金属氧化物膜，层压板，金属构件及其制造方法
公开(公告)号：US20090038946A1
公开(公告)日：2009-02-12
申请号：US11917614
申请日：2006-05-09
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa
IPC分类号： C25D7/12 , B32B15/04 , C23F13/00
CPC分类号： C25D11/06 , C25D11/18 , Y10T428/265
摘要： A metal oxide film suitable for protection of metals, composed mainly of aluminum. A metal oxide film includes a film of an oxide of a metal composed mainly of aluminum, having a thickness of 10 nm or greater, and exhibiting a moisture release rate from the film of 1E18 mol./cm2 or less. Further, there is provided a process for producing a metal oxide film, wherein a metal composed mainly of aluminum is subjected to anodic oxidation in a chemical solution of 4 to 10 pH value so as to obtain a metal oxide film.
摘要翻译：适用于主要由铝组成的金属保护金属氧化物膜。金属氧化物膜包括厚度为10nm以上的主要由铝构成的金属的氧化物的膜，并且具有1E18mol / cm 2以下的膜的水分释放率。此外，提供了一种制造金属氧化物膜的方法，其中主要由铝组成的金属在pH值为4至10的化学溶液中进行阳极氧化，以获得金属氧化物膜。

6. 发明申请

US20050020463A1 Cleaning solution for cleaning substrate for semiconductor devices and cleaning method using the same 审中-公开
标题翻译：用于半导体器件的清洁用基板的清洗液及使用其的清洗方法
公开(公告)号：US20050020463A1
公开(公告)日：2005-01-27
申请号：US10899304
申请日：2004-07-27
申请人： Makoto Ikemoto , Yasuhiro Kawase , Hitoshi Morinaga
发明人： Makoto Ikemoto , Yasuhiro Kawase , Hitoshi Morinaga
IPC分类号： C11D1/72 , C11D3/02 , C11D3/20 , C11D11/00 , C11D1/00
CPC分类号： C11D3/042 , C11D1/72 , C11D3/2075 , C11D11/0047
摘要： A cleaning solution for cleaning a substrate for semiconductor devices and a cleaning method using the said cleaning solution, which comprises at least the following components (A), (B) and (C): (A) an ethyleneoxide-type surfactant containing a hydrocarbon group which may have a substituent group except for phenyl, and a polyoxyethylene group in which a ratio (m/n) of a number (m) of carbon atoms contained in the hydrocarbon group to a number (n) of oxyethylene groups contained in the polyoxyethylene group is in the range of 1 to 1.5, the number (m) of carbon atoms is not less than 9, and the number (n) of oxyethylene groups is not less than 7; (B) water; and (C) alkali or an organic acid. The cleaning solution highly clean the surface of the substrate without occurrence of corrosion by removing fine particles and organic contaminants which are adhered onto the surface of the substrate.
摘要翻译：一种用于清洁半导体器件用基板的清洗液和使用上述清洗液的清洗方法，其至少包括以下成分（A），（B）和（C）：（A）含有烃的环氧乙烷型表面活性剂可以具有除苯基以外的取代基的基团，以及其中烃基中所含的（m）个碳原子数（m）与（甲）聚氧乙烯基的范围为1〜1.5，碳原子数（m）为9以上，氧化乙烯基的数（n）为7以上。（B）水; 和（C）碱或有机酸。清洁溶液通过除去附着在基材表面上的细小颗粒和有机污染物，高度清洁基板的表面而不会发生腐蚀。

7. 发明授权

US08642187B2 Structural member to be used in apparatus for manufacturing semiconductor or flat display, and method for producing the same 有权
标题翻译：用于制造半导体或平板显示器的装置中的结构件及其制造方法
公开(公告)号：US08642187B2
公开(公告)日：2014-02-04
申请号：US12521387
申请日：2007-12-21
申请人： Tadahiro Ohmi , Minoru Tahara , Yasuhiro Kawase
发明人： Tadahiro Ohmi , Minoru Tahara , Yasuhiro Kawase
IPC分类号： B32B15/00 , B32B15/01 , B32B15/04 , B32B15/10 , B32B9/00 , B32B19/00
CPC分类号： C23C8/02 , C23C14/165 , C23C14/5853 , C23C16/20 , C23C16/56 , C23C28/322 , C23C28/345 , C25D11/04 , C25D11/06 , C25D11/18 , H05K1/053 , H05K2203/0315
摘要： A structural member for a manufacturing apparatus has a metal base member mainly composed of aluminum, a high-purity aluminum film formed on the surface of the metal base member, and a nonporous amorphous aluminum oxide passivation film which is formed by anodizing the high-purity aluminum film. A method for producing a structural member for a manufacturing apparatus, includes forming a high-purity aluminum film on the surface of a metal base member mainly composed of aluminum, and anodizing the high-purity aluminum film in a chemical conversion liquid having a pH of 4-10 and containing a nonaqueous solvent, which has a dielectric constant lower than that of water and dissolves water, thereby converting at least a surface portion of the high-purity aluminum film into a nonporous amorphous aluminum oxide passivation film.
摘要翻译：用于制造装置的结构件具有主要由铝构成的金属基底构件，在金属基底构件的表面上形成的高纯度铝膜和通过阳极氧化高纯度形成的无孔非晶态氧化铝钝化膜铝膜。一种制造装置用结构构件的制造方法，其特征在于，在主要由铝构成的金属基材的表面上形成高纯度的铝膜，并将该高纯度的铝膜阳极氧化为pH为并且含有介电常数低于水的非水溶剂，并溶解水，从而将高纯度铝膜的至少一部分表面部分转变为无孔非晶态氧化铝钝化膜。

8. 发明申请

US20100330390A1 STRUCTURAL MEMBER TO BE USED IN APPARATUS FOR MANUFACTURING SEMICONDUCTOR OR FLAT DISPLAY, AND METHOD FOR PRODUCING THE SAME 有权
标题翻译：用于制造半导体或平面显示器的装置中使用的结构构件及其制造方法
公开(公告)号：US20100330390A1
公开(公告)日：2010-12-30
申请号：US12521387
申请日：2007-12-21
申请人： Tadahiro Ohmi , Minoru Tahara , Yasuhiro Kawase
发明人： Tadahiro Ohmi , Minoru Tahara , Yasuhiro Kawase
IPC分类号： B32B15/20 , C23C28/00
CPC分类号： C23C8/02 , C23C14/165 , C23C14/5853 , C23C16/20 , C23C16/56 , C23C28/322 , C23C28/345 , C25D11/04 , C25D11/06 , C25D11/18 , H05K1/053 , H05K2203/0315
摘要： A structural member for a manufacturing apparatus has a metal base member mainly composed of aluminum, a high-purity aluminum film formed on the surface of the metal base member, and a nonporous amorphous aluminum oxide passivation film which is formed by anodizing the high-purity aluminum film. A method for producing a structural member for a manufacturing apparatus, includes forming a high-purity aluminum film on the surface of a metal base member mainly composed of aluminum, and anodizing the high-purity aluminum film in a chemical conversion liquid having a pH of 4-10 and containing a nonaqueous solvent, which has a dielectric constant lower than that of water and dissolves water, thereby converting at least a surface portion of the high-purity aluminum film into a nonporous amorphous aluminum oxide passivation film.
摘要翻译：用于制造装置的结构件具有主要由铝构成的金属基底构件，在金属基底构件的表面上形成的高纯度铝膜和通过阳极氧化高纯度形成的无孔非晶态氧化铝钝化膜铝膜。一种制造装置用结构构件的制造方法，其特征在于，在主要由铝构成的金属基材的表面上形成高纯度的铝膜，并将该高纯度的铝膜阳极氧化为pH为并且含有介电常数低于水的非水溶剂，并溶解水，从而将高纯度铝膜的至少一部分表面部分转变为无孔非晶态氧化铝钝化膜。

9. 发明申请

US20080164151A1 METAL MEMBER HAVING A METAL OXIDE FILM AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译：具有金属氧化物膜的金属构件及其制造方法
公开(公告)号：US20080164151A1
公开(公告)日：2008-07-10
申请号：US11966417
申请日：2007-12-28
申请人： Tadahiro Ohmi , Minoru Tahara , Yasuhiro Kawase
发明人： Tadahiro Ohmi , Minoru Tahara , Yasuhiro Kawase
IPC分类号： C25D11/04
CPC分类号： C25D11/06 , C25D11/18 , C25D21/12
摘要： In a method of manufacturing a metal member, a metal material containing aluminum as a main component is anodized in an anodization solution having a pH of 4 to 10 and containing a nonaqueous solvent having a dielectric constant smaller than that of water and capable of dissolving water, thereby forming a nonporous amorphous aluminum oxide passivation film on a surface of the metal member. The method includes a step of controlling the viscosity of the anodization solution. In the step of controlling the viscosity, the viscosity of the anodization solution is lowered by elevating the temperature of the anodization solution above the room temperature or by adding to the anodization solution a substance having a dielectric constant smaller than that of water and a viscosity lower than that of the nonaqueous solvent.
摘要翻译：在制造金属构件的方法中，以pH为4〜10的阳极氧化液阳极氧化含有铝作为主要成分的金属材料，并且含有比水的介电常数小的能够溶解水的非水溶剂从而在金属构件的表面上形成无孔非晶态氧化铝钝化膜。该方法包括控制阳极氧化溶液的粘度的步骤。在控制粘度的步骤中，通过将阳极氧化溶液的温度升高到室温以上，阳极氧化溶液的粘度降低，或者通过向阳极氧化溶液中添加介电常数小于水的介电常数物质和较低的粘度的物质比非水溶剂高。

10. 发明申请

US20070175212A1 Fluid machine for Rankine cycle 有权
标题翻译：兰金循环流体机
公开(公告)号：US20070175212A1
公开(公告)日：2007-08-02
申请号：US11641202
申请日：2006-12-18
申请人： Keiichi Uno , Hironori Asa , Yasuhiro Takeuchi , Hiroshi Ogawa , Hiroshi Kishita , Kazuhide Uchida , Yasuhiro Kawase , Atsushi Inaba
发明人： Keiichi Uno , Hironori Asa , Yasuhiro Takeuchi , Hiroshi Ogawa , Hiroshi Kishita , Kazuhide Uchida , Yasuhiro Kawase , Atsushi Inaba
IPC分类号： F01C1/02 , F04B1/06 , F02G1/04 , F01K23/10
CPC分类号： F01K25/06 , F01C1/0215 , F01C13/04 , F01K21/005 , F01K25/04 , F04C2240/45
摘要： It is an object to provide a fluid machine, which is simple in structure and in which lubricating oil containing smaller amount of the working fluid is supplied to sliding portions of an expansion device. The fluid machine has the expansion device for generating a driving force by expansion of the working fluid, which contains the lubricating oil and is heated to a gas phase condition. The fluid machine further has an electric power generating device driven by the driving force of the expansion device and generating electric power. An oil pooling portion is formed in a fluid passage, through which the working fluid discharged from the expansion device flows, such that the lubricating oil contained in the working fluid is brought into contact with at least one of sliding portions of the expansion device and the electric power generating device. And a heating unit is provided to heat the working fluid in the oil pooling portion.
摘要翻译：本发明的目的是提供一种流体机械，其结构简单，并且将含有较少量的工作流体的润滑油供应到膨胀装置的滑动部分。流体机械具有用于通过膨胀包含润滑油并被加热到气相状态的工作流体产生驱动力的膨胀装置。流体机械还具有由膨胀装置的驱动力驱动并产生电力的发电装置。在液体通道中形成有一个集油部分，从膨胀装置排出的工作流体通过该流体通道流动，使得包含在工作流体中的润滑油与膨胀装置的滑动部分和发电装置。并且提供加热单元以加热储油部分中的工作流体。

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