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    • 5. 发明授权
    • Hydraulic driven jaw-type clutch impeller combination and swimming pool bottom hydraulic pushed automatic cleaner comprising same
    • 液压驱动颚式离合器叶轮组合和游泳池底部液压推动自动清洁器组成
    • US08555445B2
    • 2013-10-15
    • US13499551
    • 2010-06-29
    • Guilan FuQian YuJian LiuBichang WangXinru GongXianozhou LvZhi Yi Zou
    • Guilan FuQian YuChangsheng ZouJian LiuBichang WangXinru GongXianozhou Lv
    • E04H4/16
    • E04H4/1654
    • A swimming pool bottom hydraulic pushed automatic cleaner includes an underwater cleaner and a control power supply connected by a buoyancy cable. The underwater cleaner includes a housing cover, housing body, filter, double extension shaft motor assembly, hydraulic driven jaw-type clutch impeller combination, water inlet/outlet flow passage, wheel and bracket, an isolated hood and a cable with floaters. Along with the changing of the rotating direction of the motor, the impeller combination is engaged and disengaged under the action of hydraulic power to change the working state of the impeller, thereby changing water outlet of injection water flow and further changing the travel direction of the cleaner. The housing touches a wall to cause the cleaner to adjust the direction after touching the wall. Furthermore, two or more axial-flow pumps are arranged horizontally and parallelly, so that the cleaner has turning function and orderly complete coverage cleaning is realized.
    • 游泳池底部液压推动自动清洁器包括水下清洁器和通过浮力电缆连接的控制电源。 水下清洁器包括壳体盖,壳体,过滤器,双延伸轴电机组件,液压驱动颚式离合器叶轮组合,进水/出口流动通道,轮和支架,隔离罩和带有浮子的电缆。 随着电动机旋转方向的变化,叶轮组合在液压动力作用下接合和分离,改变了叶轮的工作状态,从而改变了注入水流的出水口,并进一步改变了 清洁器。 外壳接触墙壁,使吸尘器在接触墙壁后调整方向。 此外,两个或更多个轴流泵被水平和平行布置,使得清洁器具有转向功能并且有序地完成覆盖清洁。
    • 6. 发明授权
    • System for generating and optimizing mask assist features based on hybrid (model and rules) methodology
    • 基于混合(模型和规则)方法生成和优化掩模辅助功能的系统
    • US08103979B2
    • 2012-01-24
    • US12254172
    • 2008-10-20
    • Yi ZouLuigi Capodieci
    • Yi ZouLuigi Capodieci
    • G06F17/50
    • G03F1/36
    • An optimal assist feature rules set for an integrated circuit design layout is created using inverse lithography. The full chip layout is lithographically simulated, and printability failure areas are determined. The features are analyzed for feature layout patterns, and inverse lithography is performed on the unique feature layouts to form assist features. The resulting layout of assist features is analyzed to create an assist feature rules set. The rules can then be applied to a photomask patterned with the integrated circuit design layout to print optimal assist features. The resulting photomask may be used to form an integrated circuit on a semiconductor substrate.
    • 使用反光刻法创建集成电路设计布局的最佳辅助特征规则集。 全芯片布局被光刻仿真,并确定了可印刷性故障区域。 对特征布局图案进行特征分析,并对独特特征布局进行反光刻以形成辅助特征。 分析所得到的辅助特征布局以创建辅助特征规则集。 然后可以将规则应用于利用集成电路设计布局图案化的光掩模,以打印最佳辅助特征。 所得到的光掩模可用于在半导体衬底上形成集成电路。
    • 7. 发明申请
    • Mobile Device Location Estimation Using Categorized Local Location Data From Various Sources
    • 使用来自不同来源的分类本地位置数据的移动设备位置估计
    • US20160142883A1
    • 2016-05-19
    • US14542549
    • 2014-11-15
    • Jian ZouYi Zou
    • Jian ZouYi Zou
    • H04W4/02H04W48/16H04W64/00
    • H04W48/16H04W4/023H04W4/029H04W64/003H04W64/006H04W88/16
    • Methods and program products of mobile device location estimation using categorized local location data from various sources. For example, a method includes: detecting one or more wireless access gateways on a mobile device; for at least one detected wireless access gateway, determining whether or not location data of the gateway exists among part or all of a predetermined collection of data on the mobile device, the location data including a location estimate of the gateway, and none or at least one of: an uncertainty value associated with the location estimate; or a confidence value related to the likelihood that the gateway is stationary; determining whether or not a condition related to location estimation of the device is true; determining a location estimate of the device using the existing location data of the detected gateways on the device or other location estimation methods, based on the determination of the condition.
    • 使用来自各种来源的分类的本地位置数据的移动设备位置估计的方法和程序产品。 例如,一种方法包括:检测移动设备上的一个或多个无线接入网关; 对于至少一个检测到的无线接入网关,确定所述网关的位置数据是否存在于所述移动设备上的预定数据集合的部分或全部中,所述位置数据包括所述网关的位置估计,并且至少 一个:与位置估计相关的不确定性值; 或与网关静止的可能性相关的置信度值; 确定与设备的位置估计相关的条件是否为真; 基于条件的确定,使用设备上检测到的网关的现有位置数据或其他位置估计方法来确定设备的位置估计。
    • 9. 发明申请
    • SYSTEM FOR GENERATING AND OPTIMIZING MASK ASSIST FEATURES BASED ON HYBRID (MODEL AND RULES) METHODOLOGY
    • 基于混合(模型和规则)方法生成和优化掩蔽辅助功能的系统
    • US20100099032A1
    • 2010-04-22
    • US12254172
    • 2008-10-20
    • Yi ZouLuigi Capodieci
    • Yi ZouLuigi Capodieci
    • G03F1/00
    • G03F1/36
    • An optimal assist feature rules set for an integrated circuit design layout is created using inverse lithography. The full chip layout is lithographically simulated, and printability failure areas are determined. The features are analyzed for feature layout patterns, and inverse lithography is performed on the unique feature layouts to form assist features. The resulting layout of assist features is analyzed to create an assist feature rules set. The rules can then be applied to a photomask patterned with the integrated circuit design layout to print optimal assist features. The resulting photomask may be used to form an integrated circuit on a semiconductor substrate.
    • 使用反光刻法创建集成电路设计布局的最佳辅助特征规则集。 全芯片布局被光刻仿真,并确定了可印刷性故障区域。 对特征布局图案进行特征分析,并对独特特征布局进行反光刻以形成辅助特征。 分析所得到的辅助特征布局以创建辅助特征规则集。 然后可以将规则应用于利用集成电路设计布局图案化的光掩模,以打印最佳辅助特征。 所得到的光掩模可用于在半导体衬底上形成集成电路。
    • 10. 发明授权
    • Transparent copolyester, preparing method thereof and articles made from the same
    • 透明共聚聚酯,其制备方法和由其制成的制品
    • US09102782B2
    • 2015-08-11
    • US13571317
    • 2012-08-09
    • Ning XuGuixiang ZhuWei ZhangLing HanYi ZouWenxi Ji
    • Ning XuGuixiang ZhuWei ZhangLing HanYi ZouWenxi Ji
    • C08G18/42C08G63/60C08G63/91C08G18/73C08G18/34
    • C08G18/4216C08G18/348C08G18/73C08G63/60C08G63/91
    • The present invention relates to a transparent copolyester, wherein the transparent copolyester comprises an aliphatic-aromatic copolyester segment A, a segment B having repeating units —O—CH(CH3)—C(O)—, and structural units C derived from polyisocyanate(s), wherein the weight ratio for the segment A, segment B and structural unit C is 100:(100-2000):(0.1-10) and wherein the weight-average molecular weight Mw of the transparent copolyester is from 50,000 to 1,000,000. The present invention further relates to a preparation method for a transparent copolyester, including polymerizing lactide, a hydroxyl-terminated aliphatic-aromatic copolyester and a polyisocyanate in the presence of a catalyst; wherein the weight ratio for the aliphatic-aromatic copolyester, lactide and polyisocyanate is 100:(100-2000):(0.1-10). The present invention further relates to a transparent copolyester prepared by said method and an article made from the transparent copolyester according to present invention.
    • 本发明涉及一种透明共聚酯,其中该透明共聚聚酯包括脂肪族 - 芳族共聚酯链段A,具有重复单元-O-CH(CH 3)-C(O)的链段B和衍生自多异氰酸酯的结构单元C s),其中段A,段B和结构单元C的重量比为100:(100-2000):(0.1-10),并且其中透明共聚酯的重均分子量Mw为50,000至1,000,000 。 本发明还涉及一种透明共聚酯的制备方法,包括在催化剂存在下聚合丙交酯,羟基封端的脂族 - 芳族共聚酯和多异氰酸酯; 其中脂族 - 芳族共聚酯,丙交酯和多异氰酸酯的重量比为100:(100-2000):(0.1-10)。 本发明还涉及通过所述方法制备的透明共聚酯和由根据本发明的透明共聚酯制成的制品。