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1. 发明申请

WO2012142126A2 METHOD OF MAKING RADIATION-SENSITIVE SOL-GEL MATERIALS 审中-公开
标题翻译：制造辐射敏感性溶胶凝胶材料的方法
公开(公告)号：WO2012142126A2
公开(公告)日：2012-10-18
申请号：PCT/US2012/033073
申请日：2012-04-11
申请人： BREWER SCIENCE INC. , LIN, Qin , WANG, Yubao , FLAIM, Tony D.
发明人： LIN, Qin , WANG, Yubao , FLAIM, Tony D.
IPC分类号： H01L21/027
CPC分类号： G03F7/075 , G03F7/0045 , G03F7/038 , G03F7/0757 , G03F7/11 , G03F7/20
摘要： Radiation-sensitive sol-gel compositions are provided, along with methods of forming microelectronic structures and the structures thus formed. The compositions comprise a sol-gel compound and a base generator dispersed or dissolved in a solvent system. The sol-gel compound comprises recurring monomeric units comprising silicon with crosslinkable moieties bonded to the silicon. Upon exposure to radiation, the base generator generates a strong base, which crosslinks the sol-gel compound in the compositions to yield a crosslinked layer that is insoluble in developers or solvents. The unexposed portions of the layer can be removed to yield a patterned sol-gel layer. The invention can be used to form patterns from sol-gel materials comprising features having feature sizes of less than about 1 m.
摘要翻译：提供了辐射敏感的溶胶 - 凝胶组合物，以及形成微电子结构和如此形成的结构的方法。组合物包含分散或溶解在溶剂体系中的溶胶 - 凝胶化合物和碱产生剂。溶胶 - 凝胶化合物包括具有与硅结合的可交联部分的包含硅的重复单体单元。暴露于辐射后，基底发生器产生强碱，其使组合物中的溶胶 - 凝胶化合物交联，得到不溶于显影剂或溶剂的交联层。可以除去该层的未曝光部分以产生图案化的溶胶 - 凝胶层。本发明可以用于形成包含特征尺寸小于约1μm的特征的溶胶 - 凝胶材料的图案。

2. 发明申请

WO2012092139A2 PROCESSES TO PATTERN SMALL FEATURES FOR ADVANCED PATTERNING NEEDS 审中-公开
标题翻译：处理高级图形需求的小尺寸特征
公开(公告)号：WO2012092139A2
公开(公告)日：2012-07-05
申请号：PCT/US2011/066910
申请日：2011-12-22
申请人： BREWER SCIENCE INC. , WASHBURN, Carlton Ashley , LAMB, James E., III , BRAKENSIEK, Nickolas L. , LIN, Qin , WANG, Yubao , KRISHNAMURTHY, Vandana , SCOTT, Claudia
发明人： WASHBURN, Carlton Ashley , LAMB, James E., III , BRAKENSIEK, Nickolas L. , LIN, Qin , WANG, Yubao , KRISHNAMURTHY, Vandana , SCOTT, Claudia
IPC分类号： H01L21/027
CPC分类号： H01L21/0337 , C09D5/00 , G03F7/0035 , G03F7/11 , G03F7/40 , H01L21/0338 , Y10T428/24612
摘要： Methods of forming microelectronic structure are provided. The methods comprise the formation of T-shaped structures using a controlled undercutting process, and the deposition of a selectively etchable composition into the undercut areas of the T-shaped structures. The T-shaped structures are subsequently removed to yield extremely small undercut-formed features that conform to the width and optionally the height of the undercut areas of the T-shaped structures. These methods can be combined with other conventional patterning methods to create structures having extremely small feature sizes regardless of the wavelength of light used for patterning.
摘要翻译：提供了形成微电子结构的方法。所述方法包括使用受控的底切工艺形成T形结构，以及将选择性可蚀刻的组合物沉积到T形结构的底切区域中。随后去除T形结构以产生符合T形结构的底切区域的宽度和任选的高度的极小的底切形特征。这些方法可以与其他常规图案化方法组合以产生具有极小特征尺寸的结构，而与用于图案化的光的波长无关。

3. 发明申请

WO2013055798A1 SPIN-ON CARBON COMPOSITIONS FOR LITHOGRAPHIC PROCESSING 审中-公开
标题翻译：用于石墨加工的旋转碳组合物
公开(公告)号：WO2013055798A1
公开(公告)日：2013-04-18
申请号：PCT/US2012/059565
申请日：2012-10-10
申请人： BREWER SCIENCE INC. , KRISHNAMURTHY, Vandana , SULLIVAN, Daniel M. , WANG, Yubao , LIN, Qin , SIMMONS, Sean
发明人： KRISHNAMURTHY, Vandana , SULLIVAN, Daniel M. , WANG, Yubao , LIN, Qin , SIMMONS, Sean
IPC分类号： H01L21/20 , H01L21/027 , H01L21/205
CPC分类号： B32B33/00 , B32B9/04 , B32B2255/26 , B32B2307/70 , B32B2379/08 , C08G73/00 , C08G73/1067 , C08G73/1075 , C08G73/1078 , C09D179/08 , G03F7/094 , H01L21/0332 , H01L21/3081 , Y10T428/24802 , Y10T428/24851 , Y10T428/30 , Y10T428/31623 , Y10T428/31667 , Y10T428/31681 , Y10T428/31721
摘要： The invention described herein is directed towards spin-on carbon materials comprising polyamic acid compositions and a crosslinker in a solvent system. The materials are useful in trilayer photolithography processes. Films made with the inventive compositions are not soluble in solvents commonly used in lithographic materials, such as, but not limited to PGME, PGMEA, and cyclohexanone. However, the films can be dissolved in developers commonly used in photolithography. In one embodiment, the films can be heated at high temperatures to improve the thermal stability for high temperature processing. Regardless of the embodiment, the material can be applied to a flat/planar or patterned surface. Advantageously, the material exhibits a wiggling resistance during pattern transfer to silicon substrate using fluorocarbon etch.
摘要翻译：本文描述的本发明涉及在溶剂体系中包含聚酰胺酸组合物和交联剂的旋涂碳材料。这些材料可用于三层光刻工艺。用本发明组合物制成的薄膜不溶于通常用于平版印刷材料的溶剂中，例如但不限于PGME，PGMEA和环己酮。然而，这些膜可以溶解在通常用于光刻中的显影剂中。在一个实施方案中，可以在高温下加热膜以改善用于高温处理的热稳定性。不管实施例如何，材料可以应用于平面/平面或图案化表面。有利地，该材料在使用碳氟化合物蚀刻的图案转移到硅衬底期间表现出摆动阻力。

4. 发明申请

WO2010080789A3 SPIN-ON SPACER MATERIALS FOR DOUBLE- AND TRIPLE-PATTERNING LITHOGRAPHY 审中-公开
公开(公告)号：WO2010080789A3
公开(公告)日：2010-07-15
申请号：PCT/US2010/020199
申请日：2010-01-06
申请人： BREWER SCIENCE INC. , LIN, Qin , PULIGADDA, Rama , CLAYPOOL, James , GUERRERO, Douglas, J. , SMITH, Brian
发明人： LIN, Qin , PULIGADDA, Rama , CLAYPOOL, James , GUERRERO, Douglas, J. , SMITH, Brian
IPC分类号： H01L21/027 , G03F7/20
摘要： Novel double- and triple-patterning methods are provided. The methods involve applying a shrinkable composition to a patterned template structure (e.g., a structure having lines) and heating the composition. The shrinkable composition is selected to possess properties that will cause it to shrink during heating, thus forming a conformal layer over the patterned template structure. The layer is then etched to leave behind pre-spacer structures, which comprise the features from the pattern with remnants of the shrinkable composition adjacent the feature sidewalls. The features are removed, leaving behind a doubled pattern. In an alternative embodiment, an extra etch step can be carried out prior to formation of the features on the template structure, thus allowing the pattern to be tripled rather than doubled.

5. 发明申请

WO2009015464A1 HEAT SEALING JAW, APPARATUS AND METHOD 审中-公开
标题翻译：热封缝，装置和方法
公开(公告)号：WO2009015464A1
公开(公告)日：2009-02-05
申请号：PCT/CA2008/001365
申请日：2008-07-25
申请人： LIQUI-BOX CANADA INC. , SADLER, James William , LIN, Qin , BIRD, Gordon Charles , MCCARRON, Victor Wayne
发明人： SADLER, James William , LIN, Qin , BIRD, Gordon Charles , MCCARRON, Victor Wayne
IPC分类号： B65B51/30
CPC分类号： B65B51/146 , B29C59/007 , B29C65/18 , B29C65/224 , B29C65/226 , B29C65/74 , B29C65/76 , B29C66/0044 , B29C66/1122 , B29C66/346 , B29C66/3472 , B29C66/43 , B29C66/4312 , B29C66/71 , B29C66/7234 , B29C66/73921 , B29C66/80 , B29C66/8122 , B29C66/81422 , B29C66/81427 , B29C66/81457 , B29C66/8181 , B29C66/81811 , B29C66/81821 , B29C66/81871 , B29C66/83221 , B29C66/849 , B29C2793/009 , B29K2023/083 , B29K2023/086 , B29K2067/00 , B29K2077/00 , B29K2101/12 , B29K2995/0039 , B29L2031/712 , B31B70/00 , B31B70/14 , B31B70/20 , B31B70/64 , B31B70/642 , B31B70/81 , B31B2155/00 , B31B2155/002 , B31B2160/10 , B29K2827/18 , B29K2909/08 , B29K2067/003
摘要： A heat sealing jaw for use in cooperation with an opposing backing jaw for sealing layers of film together is described. The heat sealing jaw may be suitable for forming an easy-open feature on a. packaging pouch used to contain flowable material. In certain embodiments the heat sealing jaw comprises a jaw body, a heat sealing element secured to the jaw body, a support surface for clamping the layers of film together against the opposing backing jaw, and, a heat sink coupled to the heat sealing element for inducing a temperature gradient along a sealing face of the heat sealing element. The sealing face may have a protrusion for forming a notch within the layers of film. Related apparatuses and methods are also described.
摘要翻译：描述了用于与相对的背衬颚配合使用以将薄膜层一起密封的热封颚。热封颚可适用于在a上形成易开启的特征。包装袋用于包含可流动的材料。在某些实施例中，热封钳口包括钳口体，固定到钳口本体的热封元件，用于将膜层夹在一起抵靠相对的背衬钳口的支撑表面，以及联接到热封元件的散热器沿着热封元件的密封面引起温度梯度。密封面可以具有用于在膜的层内形成切口的突起。还描述了相关的装置和方法。

6. 发明授权

EP2766920B1 SPIN-ON CARBON COMPOSITIONS FOR LITHOGRAPHIC PROCESSING 有权
公开(公告)号：EP2766920B1
公开(公告)日：2020-12-02
申请号：EP12840652.7
申请日：2012-10-10
申请人： Brewer Science Inc.
发明人： KRISHNAMURTHY, Vandana , SULLIVAN, Daniel M. , WANG, Yubao , LIN, Qin , SIMMONS, Sean
IPC分类号： H01L21/20 , H01L21/027 , H01L21/205 , C09D179/08

7. 发明公开

EP2766920A1 SPIN-ON CARBON COMPOSITIONS FOR LITHOGRAPHIC PROCESSING 审中-公开
标题翻译：螺丝碳的化合物为平版印刷工艺
公开(公告)号：EP2766920A1
公开(公告)日：2014-08-20
申请号：EP12840652.7
申请日：2012-10-10
申请人： Brewer Science, Inc.
发明人： KRISHNAMURTHY, Vandana , SULLIVAN, Daniel M. , WANG, Yubao , LIN, Qin , SIMMONS, Sean
IPC分类号： H01L21/20 , H01L21/027 , H01L21/205
CPC分类号： B32B33/00 , B32B9/04 , B32B2255/26 , B32B2307/70 , B32B2379/08 , C08G73/00 , C08G73/1067 , C08G73/1075 , C08G73/1078 , C09D179/08 , G03F7/094 , H01L21/0332 , H01L21/3081 , Y10T428/24802 , Y10T428/24851 , Y10T428/30 , Y10T428/31623 , Y10T428/31667 , Y10T428/31681 , Y10T428/31721
摘要： The invention described herein is directed towards spin-on carbon materials comprising polyamic acid compositions and a crosslinker in a solvent system. The materials are useful in trilayer photolithography processes. Films made with the inventive compositions are not soluble in solvents commonly used in lithographic materials, such as, but not limited to PGME, PGMEA, and cyclohexanone. However, the films can be dissolved in developers commonly used in photolithography. In one embodiment, the films can be heated at high temperatures to improve the thermal stability for high temperature processing. Regardless of the embodiment, the material can be applied to a flat/planar or patterned surface. Advantageously, the material exhibits a wiggling resistance during pattern transfer to silicon substrate using fluorocarbon etch.

8. 发明公开

EP2374145A2 SPIN-ON SPACER MATERIALS FOR DOUBLE- AND TRIPLE-PATTERNING LITHOGRAPHY 审中-公开
标题翻译： SPIN-ON中间层的材料与双重和三重结构性光刻
公开(公告)号：EP2374145A2
公开(公告)日：2011-10-12
申请号：EP10729436.5
申请日：2010-01-06
申请人： Brewer Science, Inc.
发明人： LIN, Qin , PULIGADDA, Rama , CLAYPOOL, James , GUERRERO, Douglas, J. , SMITH, Brian
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： H01L21/0337 , C08G77/20 , G03F7/40 , H01L21/0338 , H01L21/3121
摘要： Novel double- and triple-patterning methods are provided. The methods involve applying a shrinkable composition to a patterned template structure (e.g., a structure having lines) and heating the composition. The shrinkable composition is selected to possess properties that will cause it to shrink during heating, thus forming a conformal layer over the patterned template structure. The layer is then etched to leave behind pre-spacer structures, which comprise the features from the pattern with remnants of the shrinkable composition adjacent the feature sidewalls. The features are removed, leaving behind a doubled pattern. In an alternative embodiment, an extra etch step can be carried out prior to formation of the features on the template structure, thus allowing the pattern to be tripled rather than doubled.

9. 发明申请

WO2007131361A1 ASEPTIC PACKAGE 审中-公开
标题翻译：自由包装
公开(公告)号：WO2007131361A1
公开(公告)日：2007-11-22
申请号：PCT/CA2007/000866
申请日：2007-05-15
申请人： LIQUI-BOX CANADA INC. , FERGUSSON, Stuart , MONTGOMERY, Jeffrey, A. , GRAVES, Stewart, M. , LIN, Qin
发明人： FERGUSSON, Stuart , MONTGOMERY, Jeffrey, A. , GRAVES, Stewart, M. , LIN, Qin
IPC分类号： B65D33/14 , B65B51/10 , B65B55/00 , B65B61/06 , B65B7/00
CPC分类号： B65B61/186 , B65B55/022 , B65D75/5822
摘要： A process for making an aseptic sealed product-filled package in disclosed. The process includes the steps of: providing a bag having a preformed filling fitment; filling the bag with product through the filling fitment; and sealing the bag below the filling fitment. The process can further include the step of cutting off at least a portion of the bag above the seal to remove the filling fitment. Also provided is a bag for forming an aseptic product-filled package. The bag includes a pair of corresponding walls of flexible, sealable material, which are sealed about a common periphery to form an internal volume having a product portion and a fitment portion. The product portion and the fitment portion are fluidly connected. The bag further includes a filling fitment attached to at least one of the walls near the common periphery. The package is formable by aseptically sealing at least a part of the fitment portion with the fitment so as to isolate the fitment from the remainder of the bag. Optionally, the package may be formed by the additional step of cutting off at least a part of the bag above the seal including the fitment.
摘要翻译：公开的制造无菌密封产品填充包装的方法。该方法包括以下步骤：提供具有预成型填充配件的袋子; 通过填充配件将产品填充袋; 并将袋子密封在填充配件下方。该方法还可以包括在密封件上方切断袋子的至少一部分以移除填充配件的步骤。还提供了用于形成无菌产品填充包装的袋。该袋包括一对相应的柔性可密封材料的壁，其围绕公共周边密封以形成具有产品部分和配件部分的内部容积。产品部分和配件部分流体连接。该袋还包括附接到靠近公共周边的至少一个壁的填充配件。该包装可通过用配件无菌地密封装配部分的至少一部分而形成，从而将配件与袋的其余部分隔离。任选地，包装可以通过附加步骤形成，该步骤将袋子的至少一部分切掉，包括配件。

10. 发明申请

WO2012122270A1 MULTILAYER PROTECTIVE LINER 审中-公开
标题翻译：多层防护衬里
公开(公告)号：WO2012122270A1
公开(公告)日：2012-09-13
申请号：PCT/US2012/028075
申请日：2012-03-07
申请人： E. I. DU PONT DE NEMOURS AND COMPANY , SMILLIE, Benjamin, Andrew , HOJABR, Sassan , VANSANT, John, D. , LIN, Qin
发明人： SMILLIE, Benjamin, Andrew , HOJABR, Sassan , VANSANT, John, D. , LIN, Qin
IPC分类号： B32B27/30 , F16L57/06
CPC分类号： B32B27/308 , B32B1/08 , B32B15/08 , B32B27/08 , B32B27/12 , B32B27/32 , B32B2307/00 , B32B2307/536 , B32B2307/546 , B32B2307/554 , B32B2597/00 , F16L9/147 , F16L57/06 , Y10T428/13 , Y10T428/1303 , Y10T428/1338 , Y10T428/1352 , Y10T428/1359 , Y10T428/139 , Y10T428/249951
摘要： Disclosed is a multilayer structure useful for preparing highly abrasion-resistant protective liners, including tubular articles such as multilayer tubes or pipes.
摘要翻译：公开了一种用于制备高耐磨保护衬垫的多层结构，包括管状制品如多层管或管。

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