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1. 发明专利

DE60135705D1 未知
公开(公告)号：DE60135705D1
公开(公告)日：2008-10-23
申请号：DE60135705
申请日：2001-07-05
申请人： MORI YUZO , EBARA CORP
发明人： MORI YUZO , KOBATA ITSUKI , SHIRAKASHI MITSUHIKO , SAITO TAKAYUKI , TOMA YASUSHI
IPC分类号： B23H3/08 , C25F3/00
摘要： An electrochemical machining apparatus comprises a machining chamber for holding ultrapure water, a cathode/anode immersed in the ultrapure water held in the machining chamber, and a workpiece holding portion for holding a workpiece at a predetermined distance from the cathode/anode so that a surface, to be machined, of the workpiece is brought into contact with the ultrapure water. The electrochemical machining apparatus further comprises an anode/cathode contact brought into contact with the workpiece held by the workpiece holding portion so that the workpiece serves as an anode/cathode, a catalyst having a strongly basic anion exchange function or a strongly acidic cation exchange function, a power source for applying a voltage between the cathode/anode and the workpiece, and a moving mechanism for relatively moving the workpiece and the catalyst. The catalyst is disposed between the cathode/anode and the workpiece held by the workpiece holding portion.

2. 发明专利

DE60034851D1 未知
公开(公告)号：DE60034851D1
公开(公告)日：2007-06-28
申请号：DE60034851
申请日：2000-08-25
申请人： MORI YUZO , EBARA CORP
发明人： MORI YUZO , SHIRAKASHI MITSUHIKO , SAITO TAKAYUKI , TOMA YASUSHI , FUKUNAGA AKIRA , KOBATA ITSUKI
IPC分类号： C23F3/00 , B23H3/08 , C25D11/02 , C25F3/00
摘要： An anode (2) as a workpiece, and a cathode (1) opposed to the anode with a predetermined spacing are placed in ultrapure water. A catalytic material (3) promoting dissociation of the ultrapure water and having water permeability is disposed between the workpiece and the cathode. A flow of the ultrapure water is formed inside the catalytic material, with a voltage being applied between the workpiece and the cathode, to decompose water molecules in the ultrapure water into hydrogen ions and hydroxide ions, and supply the resulting hydroxide ions to a surface of the workpiece, thereby performing removal processing of or oxide film formation on the workpiece through a chemical dissolution reaction or an oxidation reaction mediated by the hydroxide ions. Thus, clean processing can be performed by use of hydroxide ions in ultrapure water, with no impurities left behind on the processed surface of the workpiece.

3. 发明专利

DE60034851T2 未知
公开(公告)号：DE60034851T2
公开(公告)日：2008-01-17
申请号：DE60034851
申请日：2000-08-25
申请人： MORI YUZO , EBARA CORP
发明人： MORI YUZO , SHIRAKASHI MITSUHIKO , SAITO TAKAYUKI , TOMA YASUSHI , FUKUNAGA AKIRA , KOBATA ITSUKI
IPC分类号： C23F3/00 , B23H3/08 , C25D11/02 , C25F3/00
摘要： An anode (2) as a workpiece, and a cathode (1) opposed to the anode with a predetermined spacing are placed in ultrapure water. A catalytic material (3) promoting dissociation of the ultrapure water and having water permeability is disposed between the workpiece and the cathode. A flow of the ultrapure water is formed inside the catalytic material, with a voltage being applied between the workpiece and the cathode, to decompose water molecules in the ultrapure water into hydrogen ions and hydroxide ions, and supply the resulting hydroxide ions to a surface of the workpiece, thereby performing removal processing of or oxide film formation on the workpiece through a chemical dissolution reaction or an oxidation reaction mediated by the hydroxide ions. Thus, clean processing can be performed by use of hydroxide ions in ultrapure water, with no impurities left behind on the processed surface of the workpiece.

4. 发明专利

JP2001064799A ELECTROLYTIC WORKING METHOD AND DEVICE 失效
公开(公告)号：JP2001064799A
公开(公告)日：2001-03-13
申请号：JP24186999
申请日：1999-08-27
申请人： MORI YUZO , EBARA CORP
发明人： MORI YUZO , SHIRAKASHI MICHIHIKO , SAITO TAKAYUKI , TAIMA YASUSHI , FUKUNAGA AKIRA , OBATA ITSUKI
IPC分类号： B23H3/08 , C25D11/02 , C25F3/00
摘要： PROBLEM TO BE SOLVED: To provide a working method capable of executing clean working which does not leave impurities on the working face in the object to be worked by using hydroxide ions in ultrapure water. SOLUTION: In ultrapure water, an anode 2 as the object to be worked and a cathode 1 confronted with this at prescribed intervals are arranged, the space between the object to be worked and the cathode is provided with a catalytic member 3b promoting the dissociation of the ultrapure water and having water passability, and the flow of ultrapure water is formed in the catalytic member as voltage is applied on the space between the object to be worked and the cathode, by which water molecules in the ultrapure water are decomposed into hydrogen ions and hydroxide ions, the produced hydroxide ions are fed to the surface of the object to be worked, and, by chemical elution reaction or oxidation reaction by hydroxide ions, removing working or oxidized film forming working is executed to the object to be worked.

5. 发明专利

JP2002292523A ELECTROCHEMICAL MACHINING METHOD AND APPARATUS 失效
公开(公告)号：JP2002292523A
公开(公告)日：2002-10-08
申请号：JP2001179340
申请日：2001-06-13
申请人： EBARA CORP , MORI YUZO
发明人： MORI YUZO , SHIRAKASHI MICHIHIKO , TAIMA YASUSHI , OBATA ITSUKI , SAITO TAKAYUKI
IPC分类号： B23H3/04 , B01J47/12 , B23H3/00 , B23H3/08 , C25D11/02 , C25D11/06 , C25D11/34 , C25D17/00 , C25F3/00 , C25F7/00
摘要： PROBLEM TO BE SOLVED: To provide an electrochemical machining method and an apparatus in which ultra pure water is used, and elimination processings of materials such as aluminum or iron are effectively carried out. SOLUTION: A workpiece 28 which is made to be a positive pole and a negative pole 24 are disposed at a prescribed interval in ultra pure water 12, and catalyst imparted with an exchangability of strong basic anion is disposed between the workpiece 28 and the negative pole 24, and the workpiece 28 and the negative pole 24 are relatively moved while applying voltage between the workpiece 28 and the negative pole 24.

6. 发明专利

JP2003205428A ELECTRO-CHEMICAL MACHINING APPARATUS, AND METHOD 审中-公开
公开(公告)号：JP2003205428A
公开(公告)日：2003-07-22
申请号：JP2002001737
申请日：2002-01-08
申请人： EBARA CORP , MORI YUZO
发明人： SHIRAKASHI MICHIHIKO , KUMEGAWA MASAYUKI , YASUDA HOZUMI , OBATA ITSUKI , TAIMA YASUSHI , MORI YUZO
IPC分类号： B23H3/00 , B23H3/08 , B23H5/08 , C25F3/00 , C25F7/00
摘要： PROBLEM TO BE SOLVED: To form an object shape of high shape accuracy by machining a work formed of a conductive material at a high machining accuracy. SOLUTION: An electro-chemical machining apparatus comprises a holding unit 30 to attachably/detachably hold a work W, a machining electrode 32 approachable to the work W held by the holding unit 30, a power supply electrode 34 to supply power to the work W held by the holding unit 30, an ion exchanger 40 which is disposed between the work W and the machining electrode 32, or between the work W and the power supply electrode 34, a fluid supply unit 70 to supply the fluid between the work W with the ion exchanger 40 present therein and at least one of the machining electrode 32 and the power supply electrode 34, a power source 68 to apply the voltage between the machining electrode 32 and the power supply electrode 34, driving units 44, 56 and 60 to put the work W held by the holding unit 30 and the machining electrode 32 facing each other into relative motion, and a numerical control unit 72 to numerically control the driving units 44, 56 and 60. COPYRIGHT: (C)2003,JPO

7. 发明专利

JP2000052235A POLISHING METHOD AND DEVICE THEREFOR 失效
公开(公告)号：JP2000052235A
公开(公告)日：2000-02-22
申请号：JP23499598
申请日：1998-08-06
申请人： MORI YUZO , EBARA CORP
发明人： MORI YUZO , KIMURA NORIO , SHIRAKASHI MICHIHIKO , TAIMA YASUSHI , FUKUNAGA AKIRA
IPC分类号： B24B37/00 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a method and the device assuring efficient polishing by reducing washing for a polished wafer and a load to drainage treatment with the use of chemicals restraining. SOLUTION: Chemo-mechanical polishing is applied to a surface to be polished by forming a given electrical field around the surface to be polished with ultrapure water supplying between the surface to be polished of a material to be polished W and the polishing surface of a polishing member, and by sliding the surface to be polished and the polishing surface, respectively with an OH- or an H+ ion in water unevenly distributing around the surface to be polished.

8. 发明专利

DE3886113T3 未知
公开(公告)号：DE3886113T3
公开(公告)日：1999-04-01
申请号：DE3886113
申请日：1988-06-24
申请人： MORI YUZO , UHA MIKAKUTO PRECISION ENGINEE
发明人： MORI YUZO , YAMAUCHI KAZUTO
IPC分类号： B28D5/00 , C30B33/00 , B23K26/12
摘要： The invention relates to a precision process, wherein a radical reaction of a radical produced from a gas on discharge or laser beam excitation in a gaseous atmosphere with an atom or molecule constituting a workpiece is utilized, a compound produced according to the reaction is vaporized and removed, and thus a workpiece such as silicon single crystal, ceramics material or the like can be smoothed, cut, bored, grooved and so forth without leaving a residual defect such as residual crack, thermally affected layer or the like on the surface.

9. 发明专利

DE69940611D1 未知
公开(公告)号：DE69940611D1
公开(公告)日：2009-04-30
申请号：DE69940611
申请日：1999-12-07
申请人： MORI YUZO
发明人： MORI YUZO , ISHIKAWA TOSHIO
IPC分类号： H01L21/3063 , B08B3/02 , C25D11/32 , C25F1/00 , C25F3/00 , H01L21/00
摘要： With the present invention, clean processing can be performed, without leaving any impurities behind on the surface of a material, or washing can be performed in which fine impurity metals adhering to the material surface are completely removed, using just the hydroxide ions in ultra-pure water. With the present invention, the hydroxide ion density is increased and reaction substances produced through bonding with hydroxide ions are quickly removed from the surface, preventing re-adhesion and allowing processing and washing to be performed more efficiently. A material and a high pressure nozzle are disposed a specific distance apart from each other inside a washing tank containing only ultra-pure water, an ion exchange material or catalyst material that increases the amount of hydroxide ions is provided between the processing surface of said workpiece and the distal end of the high pressure nozzle facing said surface, and a voltage is applied using the high pressure nozzle as the cathode and the material as the anode. A high-speed shear flow of ultra-pure water sprayed from the high pressure nozzle is generated near the surface of the material, hydroxide ions produced from the ultra-pure water are supplied to the workpiece surface, and the material is subjected to removal processing or to oxide film formation processing by means of a chemical elution reaction or oxidation reaction brought about by the hydroxide ions.

10. 发明专利

DE3886113T2 未知
公开(公告)号：DE3886113T2
公开(公告)日：1994-06-30
申请号：DE3886113
申请日：1988-06-24
申请人： MORI YUZO , UHA MIKAKUTO PRECISION ENGINEE
发明人： MORI YUZO , YAMAUCHI KAZUTO
IPC分类号： B28D5/00 , C30B33/00 , B23K26/12
摘要： The invention relates to a precision process, wherein a radical reaction of a radical produced from a gas on discharge or laser beam excitation in a gaseous atmosphere with an atom or molecule constituting a workpiece is utilized, a compound produced according to the reaction is vaporized and removed, and thus a workpiece such as silicon single crystal, ceramics material or the like can be smoothed, cut, bored, grooved and so forth without leaving a residual defect such as residual crack, thermally affected layer or the like on the surface.

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