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    • 7. 发明公开
    • ELECTRON BEAM ASSISTED EEM METHOD
    • ELEKTRONENSTRAHLUNTERSTÜTZTESEEM-VERFAHREN
    • EP1920883A1
    • 2008-05-14
    • EP06782248.6
    • 2006-08-03
    • Mori, Yuzo
    • Mori, Yuzo
    • B24B1/00B24B19/22B24B31/06B24B37/00
    • G21K1/06B23H5/04B23H7/38B23K15/00B24B31/10B24C1/08G21K2201/064G21K2201/067Y10S451/908
    • To provide an electron beam assisted EEM method that can realize ultraprecision machining of workpieces, including glass ceramic materials, in which at least two component materials different from each other in machining speed in a machining process are present in a refined mixed state and the surface state is not even, to a surface roughness of 0.2 to 0.05 nm RMS. The EEM method comprises a working process in which a workpiece and chemically reactive fine particles are allowed to flow along the working face to remove atoms on the working face chemically bonded to the fine particles together with the fine particles through chemical interaction between the fine particles and the working face interface. The workpiece comprises at least two component materials present in a refined mixed state and different from each other in machining speed in the machining process. After the exposure of the workpiece in its working face to an electron beam to conduct modification so that the machining speed of the surface layer part in the working face is substantially even, ultraprecision smoothening is carried out by working process.
    • 提供一种能够实现包括玻璃陶瓷材料的工件的超精密加工的电子束辅助EEM方法,其中在加工过程中以加工速度彼此不同的至少两种组分材料以精细混合状态存在,并且表面状态 不均匀,表面粗糙度为0.2〜0.05nm RMS。 EEM方法包括一个工作过程,其中允许工件和化学反应性微粒沿着工作面流动,以通过细颗粒与细颗粒之间的化学相互作用将微粒与化学键合的工作面上的原子除去 工作面界面。 工件包括以精加工的混合状态存在并且在加工过程中加工速度彼此不同的至少两种组分材料。 在将工件的工作面暴露于电子束进行变形,使得工作面中的表面层部的加工速度基本均匀的情况下,通过工作过程进行超精密平滑化。
    • 8. 发明公开
    • Electrolytic machining method and apparatus
    • 维尔法赫恩(Vfrichtung zur elektrolytischen)熊贝通
    • EP1079003A3
    • 2004-01-21
    • EP00118511.5
    • 2000-08-25
    • Mori, YuzoEBARA CORPORATION
    • Mori, YuzoShirakashi, MitsuhikoSaito, TakayukiToma, YasushiFukunaga, AkiraKobata, Itsuki
    • C23F3/00B23H3/08
    • C25F3/00B23H3/08
    • An anode (2) as a workpiece, and a cathode (1) opposed to the anode with a predetermined spacing are placed in ultrapure water. A catalytic material (3) promoting dissociation of the ultrapure water and having water permeability is disposed between the workpiece and the cathode. A flow of the ultrapure water is formed inside the catalytic material, with a voltage being applied between the workpiece and the cathode, to decompose water molecules in the ultrapure water into hydrogen ions and hydroxide ions, and supply the resulting hydroxide ions to a surface of the workpiece, thereby performing removal processing of or oxide film formation on the workpiece through a chemical dissolution reaction or an oxidation reaction mediated by the hydroxide ions. Thus, clean processing can be performed by use of hydroxide ions in ultrapure water, with no impurities left behind on the processed surface of the workpiece.
    • 将作为工件的阳极(2)和与阳极相对的具有预定间隔的阴极(1)放置在超纯水中。 在工件和阴极之间设置促进超纯水的离解并具有透水性的催化材料(3)。 在催化材料内部形成有超纯水的流动,​​在工件和阴极之间施加电压,将超纯水中的水分子分解为氢离子和氢氧根离子,并将得到的氢氧根离子供给到 从而通过化学溶解反应或由氢氧根离子介导的氧化反应进行工件的去除处理或氧化膜形成。 因此,可以通过在超纯水中使用氢氧根离子进行清洁处理,在工件的加工表面上不会留下杂质。