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    • 3. 发明申请
    • SURFACE POSITION DETECTING APPARATUS, EXPOSURE APPARATUS, SURFACE POSITION DETECTING METHOD, AND DEVICE MANUFACTURING METHOD
    • 表面位置检测装置,曝光装置,表面位置检测方法和装置制造方法
    • WO2009148185A1
    • 2009-12-10
    • PCT/JP2009/060568
    • 2009-06-03
    • NIKON CORPORATIONHIDAKA, YasuhiroISHIKAWA, Motofusa
    • HIDAKA, YasuhiroISHIKAWA, Motofusa
    • G03F9/00
    • G03F9/7049G03F9/7026G03F9/7034
    • A surface position detecting apparatus comprises a light-sending optical system which makes first light from a first pattern and second light from a second pattern incident at different incidence angles to a predetermined surface to project an intermediate image of the first pattern and an intermediate image of the second pattern onto the predetermined surface; a light-receiving optical system which guides the first light and the second light reflected on the predetermined surface, to a first observation surface and to a second observation surface, respectively, to form an observation image of the first pattern on the first observation surface and an observation image of the second pattern on the second observation surface; and a detecting section which detects position information of the observation image of the first pattern on the first observation surface and position information of the observation image of the second pattern on the second observation surface and which calculates a surface position of the predetermined surface, based on the position information of the observation image of the first pattern and the position information of the observation image of the second pattern.
    • 表面位置检测装置包括发光光学系统,其将来自第一图案的第一光和来自以不同入射角入射到预定表面的第二图案的第二光投射到第一图案的中间图像和第二图案的中间图像 第二图案到预定表面上; 分别将第一光和第二光反射到预定表面上的光接收光学系统分别连接到第一观察表面和第二观察表面,以在第一观察表面上形成第一图案的观察图像, 在第二观察面上的第二图案的观察图像; 以及检测部,其基于第一观察面检测第一图案的观察图像的位置信息和第二观察面上的第二图案的观察图像的位置信息,并且基于 第一图案的观察图像的位置信息和第二图案的观察图像的位置信息。
    • 8. 发明申请
    • SURFACE POSITION DETECTING APPARATUS, EXPOSURE APPARATUS, SURFACE POSITION DETECTING METHOD, AND DEVICE MANUFACTURING METHOD
    • 表面位置检测装置,曝光装置,表面位置检测方法和装置制造方法
    • WO2009157576A1
    • 2009-12-30
    • PCT/JP2009/061798
    • 2009-06-22
    • NIKON CORPORATIONHIDAKA, YasuhiroISHIKAWA, Motofusa
    • HIDAKA, YasuhiroISHIKAWA, Motofusa
    • G03F9/00
    • G03F9/7049G03F9/7026G03F9/7034
    • An apparatus is provided with a light-sending optical system (4-10) which makes first light from a first pattern and second light from a second pattern incident to a predetermined surface (Wa) to project intermediate images of the first and second patterns onto the predetermined surface respectively; a light-receiving optical system (30-24) which guides the first and second light reflected on the predetermined surface, to first and second observation surfaces (23Aa, 23Ba) to form observation images of the first and second patterns, respectively; and a detecting section (23-21, PR) which detects position information of the observation images of the first and second patterns on the first and second observation surfaces respectively and which calculates a surface position of the predetermined surface, based on the position information. The light-sending optical system projects the intermediate image of the second pattern as an inverted image in a predetermined direction relative to the intermediate image of the first pattern.
    • 一种装置设置有发光光学系统(4-10),其使来自第一图案的第一光和从第二图案入射到预定表面(Wa)的第二光将第一和第二图案的中间图像投影到 预定表面; 将预定表面上反射的第一和第二光引导到第一和第二观察表面(23Aa,23Ba)的光接收光学系统(30-24),分别形成第一和第二图案的观察图像; 以及检测部分,其检测第一和第二观察表面上的第一和第二图案的观察图像的位置信息,并基于位置信息来计算预定表面的表面位置。 发光光学系统相对于第一图案的中间图像将预定方向的第二图案的中间图像投影为反转图像。