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1. 发明申请

WO2012174273A1 LOW-NOISE FLUID GAUGES 审中-公开
标题翻译：低噪声流体计
公开(公告)号：WO2012174273A1
公开(公告)日：2012-12-20
申请号：PCT/US2012/042506
申请日：2012-06-14
申请人： NIKON CORPORATION , KHO, Leonard, Wai-fung , LEE, Sandy , COON, Derek , SOGARD, Michael
发明人： KHO, Leonard, Wai-fung , LEE, Sandy , COON, Derek , SOGARD, Michael
IPC分类号： G01B13/12 , G05D7/01
CPC分类号： G01B13/02 , G01B13/12 , G03F9/7034 , G03F9/7057
摘要： Fluid gauges are disclosed having first and second gas passageways each conducting a respective flow of gas. A third gas passageway is connected to the first and second gas passageways and conducts a respective flow of gas from the first and/or second gas passageways. The third gas passageway includes a gas sensor flanked in the third gas passageway by a first flow restrictor and a second flow restrictor to reduce noise in an electronic signal produced by the sensor.
摘要翻译：公开了具有第一和第二气体通道的流体计，每个气体通道各自传导各自的气体流。第三气体通道连接到第一和第二气体通道并且导引来自第一和/或第二气体通道的相应气体流。第三气体通道包括通过第一限流器在第三气体通道中侧翼的气体传感器和第二限流器，以减少由传感器产生的电子信号中的噪声。

2. 发明申请

WO2006091482A2 AUTOFOCUS METHODS AND DEVICES FOR LITHOGRAPHY 审中-公开
标题翻译： AUTOFOCUS方法和装置用于光刻
公开(公告)号：WO2006091482A2
公开(公告)日：2006-08-31
申请号：PCT/US2006/005623
申请日：2006-02-17
申请人： NIKON CORPORATION , SOGARD, Michael
发明人： SOGARD, Michael
IPC分类号： G03F9/00
CPC分类号： G03F9/7026 , G03F9/7049
摘要： Improved autofocusing ("AF") methods and devices for lithography are provided. Some embodiments of the invention provide an AF system that includes one or more interferometers for measuring a distance to a wafer surface or a reticle surface. The invention includes methods and devices for calibrating the interferometer(s) according to known distances to a target. According to some embodiments of the invention, a spatial filter reduces the amount of undesired signal coming from the wafer or reticle surface. In some such embodiments, higher orders of diffracted light from the wafer or reticle multilayer surfaces are eliminated with a pinhole filter oriented to reject light that is not vertically directed. Other embodiments include a spatial filtering system that passes a selected diffraction order, e.g., the first order of diffracted light, from the target. These spatial filters reduce variations in the signal and make further signal processing easier. By including a beam expander, the interferometer beam can sample a larger or smaller area on the wafer. In another embodiment a polarizer will help attenuate scattered or diffracted light received by the interferometer. In some embodiments, the wavelength of the light used by the AF system is selected to maximize the absorption or reflection of this light by part of the target, e.g., by the reticle multilayer or the absorber layer.
摘要翻译：提供了用于光刻的改进的自动聚焦（“AF”）方法和设备。本发明的一些实施例提供了一种AF系统，其包括用于测量到晶片表面或标线表面的距离的一个或多个干涉仪。本发明包括用于根据到目标的已知距离来校准干涉仪的方法和装置。根据本发明的一些实施例，空间滤波器减少来自晶片或标线表面的不希望信号的量。在一些这样的实施例中，来自晶片或标线片多层表面的衍射光的更高阶被消除，其中针孔过滤器被定向成拒绝不垂直定向的光。其他实施例包括空间滤波系统，其从目标传递选定衍射级，例如衍射光的第一级。这些空间滤波器可以减少信号的变化，并使信号处理更容易。通过包含光束扩展器，干涉仪光束可以在晶圆上采样更大或更小的区域。在另一个实施例中，偏振器将有助于衰减由干涉仪接收的散射或衍射光。在一些实施例中，AF系统使用的光的波长被选择为使得部分目标（例如，通过标线片多层或吸收层）对该光的吸收或反射最大化。

3. 发明申请

WO2013063104A1 AIR GAUGES COMPRISING DUAL-RANGE DIFFERENTIAL PRESSURE SENSOR 审中-公开
标题翻译：包含双范围差压传感器的空气压力表
公开(公告)号：WO2013063104A1
公开(公告)日：2013-05-02
申请号：PCT/US2012/061675
申请日：2012-10-24
申请人： NIKON CORPORATION
发明人： SOGARD, Michael , LEE, Sandy
IPC分类号： G01B13/12 , G03F7/20
CPC分类号： G03F9/7026 , G01B13/12 , G03F7/70641 , G03F9/7057
摘要： Position-sensing devices include first and second gas passageways connectable to a source of pressurized gas. A gas-releasing probe is connected to the first passageway. The probe is positionable relative to a surface and configured to release a first flow of the gas, flowing through the first passageway, toward the surface while a second flow of the gas flows through the second passageway. A differential-pressure (DP) sensing device is connected between the first and second passageways. The DP-sensing device has first and second DP sensors connected in parallel. The first DP sensor produces a gas-pressure measurement within a first dynamic -pressure range, and the second DP sensor produces a gas-pressure measurement in a second dynamic-pressure range. The resulting position measurement has greater dynamic range and higher resolution than would otherwise be produced with either the first DP sensor or the second DP sensor alone.
摘要翻译：位置检测装置包括可连接到加压气体源的第一和第二气体通道。气体释放探针连接到第一通道。探针可相对于表面定位并且构造成释放流过第一通道的气体的第一流向表面，同时气体的第二流动流过第二通道。差压（DP）感测装置连接在第一和第二通道之间。 DP感测装置具有并联连接的第一和第二DP传感器。第一DP传感器在第一动态压力范围内产生气体压力测量，第二DP传感器在第二动态压力范围内产生气体压力测量。所产生的位置测量具有比用第一DP传感器或第二DP传感器单独产生的更大的动态范围和更高的分辨率。

4. 发明申请

WO2006130338A1 IMMERSION FLUID CONTAINMENT SYSTEM AND METHOD FOR IMMERSION LITHOGRAPHY 审中-公开
标题翻译：浸入式流体容纳系统及渗透层析方法
公开(公告)号：WO2006130338A1
公开(公告)日：2006-12-07
申请号：PCT/US2006/018859
申请日：2006-05-16
申请人： NIKON CORPORATION , SOGARD, Michael
发明人： SOGARD, Michael
IPC分类号： G03B27/32 , G03B27/52 , G03B27/72
CPC分类号： G03F7/2041 , G03F7/70341 , G03F7/70808 , G03F7/70858
摘要： A ferrofluid is provided adjacent to the immersion area between a projection optical system (PL) and substrate and receives a magnetic force so as to form a ferrofluidic seal (100) adjacent to the immersion area so as to inhibit immersion liquid from escaping from the gap between the projection optical system and substrate. The ferrofluid can be a fluid having a colloidal suspension of ferromagnetic particles in it.
摘要翻译：在投影光学系统（PL）和基板之间的浸没区域附近提供铁磁流体，并且接收磁力以形成与浸没区域相邻的铁磁流体密封件（100），以便抑制浸没液体从间隙逸出在投影光学系统和基板之间。铁磁流体可以是其中具有铁磁性颗粒的胶态悬浮液的流体。

5. 发明申请

WO2006012462A1 EXTREME ULTRAVIOLET RETICLE PROTECTION 审中-公开
标题翻译：极端超紫外线防护
公开(公告)号：WO2006012462A1
公开(公告)日：2006-02-02
申请号：PCT/US2005/025958
申请日：2005-07-21
申请人： NIKON CORPORATION , SOGARD, Michael
发明人： SOGARD, Michael
IPC分类号： G03B27/42
CPC分类号： G03F7/70875 , G03F7/70916 , G03F7/70933
摘要： Methods and apparatus for using a flow of a relatively cool gas to establish a temperature gradient between a reticle (916) and a reticle shield (920) to reduce particle contamination on the reticle are disclosed. According to one aspect of the present invention, an apparatus that reduces particle contamination on a surface of an object (928) includes a plate (920) and a gas supply (954). The plate is positioned in proximity to the object such that the plate, which has a second temperature, and the object, which has a first temperature, are substantially separated by a space. The gas supply supplies a gas flow into the space. The gas has a third temperature that is lower than both the first temperature and the second temperature. The gas cooperates with the plate and the object to create a temperature gradient and, hence, a thermophoretic force that conveys particles in the space away from the object.
摘要翻译：公开了使用相对较冷气体的流动来建立掩模版（916）和掩模版屏蔽（920）之间的温度梯度以减少掩模版上的颗粒污染的方法和装置。根据本发明的一个方面，减少物体表面上的颗粒污染的装置包括板（920）和气体供应（954）。板被定位在物体附近，使得具有第二温度的板和具有第一温度的物体基本上被空间隔开。气体供应气体供应到空间。气体具有低于第一温度和第二温度的第三温度。气体与板和物体配合以产生温度梯度，并因此产生将空间中的颗粒传送离开物体的热解压力。

6. 发明申请

WO2006083754A2 RADIANTLY HEATED CATHODE FOR AN ELECTRON GUN AND HEATING ASSEMBLY 审中-公开
标题翻译：用于电子枪和加热组件的辐射加热阴极
公开(公告)号：WO2006083754A2
公开(公告)日：2006-08-10
申请号：PCT/US2006/003175
申请日：2006-01-27
申请人： NIKON CORPORATION , SOGARD, Michael , TAKITA, Mark
发明人： SOGARD, Michael , TAKITA, Mark
IPC分类号： H01J37/317 , H01J37/073
CPC分类号： H01J37/242 , H01J2237/3175
摘要： A heating assembly (36) for heating a cathode (38) of an electron gun (30) of an exposure apparatus (10) includes a radiation source (42) and a beam shaper (44). The radiation source (42) generates a source beam (46). The beam shaper (44) receives the source beam (46) and selectively shapes the source beam (46) into a shaped beam (48) that is directed to the cathode (38). In certain embodiments, the beam shaper (44) can readily change the shape and intensity profile of the shaped beam (48) to achieve a desired electron beam (32) from the electron gun (30). In one embodiment, the radiation source (42) generates a pulsed source beam (46).
摘要翻译：用于加热曝光装置（10）的电子枪（30）的阴极（38）的加热组件（36）包括辐射源（42）和光束整形器（44）。辐射源（42）产生源光束（46）。光束整形器（44）接收源光束（46）并且选择性地将源光束（46）成形为被引导到阴极（38）的成形光束（48）。在某些实施例中，光束整形器（44）可以容易地改变成形光束（48）的形状和强度分布，以实现来自电子枪（30）的期望的电子束（32）。在一个实施例中，辐射源（42）产生脉冲源光束（46）。

7. 发明申请

WO2006007111A3 A DYNAMIC FLUID CONTROL SYSTEM FOR IMMERSION LITHOGRAPHY 审中-公开
公开(公告)号：WO2006007111A3
公开(公告)日：2006-01-19
申请号：PCT/US2005/017161
申请日：2005-05-18
申请人： NIKON CORPORATION , SOGARD, Michael
发明人： SOGARD, Michael
IPC分类号： G03B27/42 , G03B27/58 , G21G5/00
摘要： A dynamic fluid control system and method capable of reducing dynamic forces from the fluid on the last optical element (20) and substrate stage (14) caused by the motion of the immersion fluid. The system includes an imaging element (12) that defines an image and a stage (14) configured to support a substrate (16). An optical system (18) is provided to project the image defined by the imaging element onto the substrate. The optical system (18) includes a last optical element (20). A gap (22) filled with immersion fluid is provided between the substrate (16) and the last optical element (20). A dynamic force control system (34) is provided to maintain a substantially constant force on the last optical element and the stage (14) by compensating for dynamic changes of the immersion fluid caused by the motion of the immersion fluid through the gap and/or movement of the stage.

8. 发明申请

WO2004090634A2 ENVIRONMENTAL SYSTEM INCLUDING VACCUM SCAVANGE FOR AN IMMERSION LITHOGRAPHY APPARATUS 审中-公开
标题翻译：环境系统，包括用于浸没式光刻设备的真空SCAVANGE
公开(公告)号：WO2004090634A2
公开(公告)日：2004-10-21
申请号：PCT/IB2004/002704
申请日：2004-03-29
申请人： NIKON CORPORATION , HAZELTON, Andrew, J. , SOGARD, Michael
发明人： HAZELTON, Andrew, J. , SOGARD, Michael
IPC分类号： G03F
CPC分类号： G03F7/70875 , G03F7/2041 , G03F7/70341 , G03F7/70775 , G03F7/70816 , G03F7/70866 , G03F7/709
摘要： An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254) and an immersion fluid system (252). The fluid barrier (254) is positioned near the device (30). The immersion fluid system (252) delivers an immersion fluid (248) that fills the gap (246). The immersion fluid system (252) collects the immersion fluid (248) that is directly between the fluid barrier (254) and the device (30). The fluid barrier (254) can include a scavenge inlet (286) that is positioned near the device (30), and the immersion fluid system (252) can include a low pressure source (392A) that is in fluid communication with the scavenge inlet (286). The fluid barrier (254) confines any vapor (249) of the immersion fluid (248) and prevents it from perturbing a measurement system (22). Additionally, the environmental system (26) can include a bearing fluid source (290B) that directs a bearing fluid (290C) between the fluid barrier (254) and the device (30) to support the fluid barrier (254) relative to the device (30).
摘要翻译：用于控制光学组件（16）和装置（30）之间的间隙（246）中的环境的环境系统（26）包括流体屏障（254）和浸没流体系统（252）。流体屏障（254）位于装置（30）附近。浸没流体系统（252）输送填充间隙（246）的浸没流体（248）。浸没流体系统（252）收集直接在流体屏障（254）和装置（30）之间的浸没流体（248）。流体屏障（254）可以包括位于装置（30）附近的扫气入口（286），并且浸没流体系统（252）可包括低压源（392A），该低压源与扫气入口（286）。流体屏障（254）限制浸没流体（248）的任何蒸气（249）并防止其扰动测量系统（22）。另外，环境系统（26）可以包括轴承流体源（290B），该轴承流体源引导在流体屏障（254）和装置（30）之间的轴承流体（290C）相对于装置支撑流体屏障（254）（30）。

9. 发明授权

EP1611485B1 Environmental system including vacuum scavenge for an immersion lithography apparatus 有权
公开(公告)号：EP1611485B1
公开(公告)日：2015-06-03
申请号：EP04758599.7
申请日：2004-03-29
申请人： NIKON CORPORATION
发明人： HAZELTON, Andrew, J. , SOGARD, Michael
IPC分类号： G03F7/20 , G03B27/32 , G03B27/42
CPC分类号： G03F7/70875 , G03F7/2041 , G03F7/70341 , G03F7/70775 , G03F7/70816 , G03F7/70866 , G03F7/709
摘要： An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254) and an immersion fluid system (252). The fluid barrier (254) is positioned near the device (30). The immersion fluid system (252) delivers an immersion fluid (248) that fills the gap (246). The immersion fluid system (252) collects the immersion fluid (248) that is directly between the fluid barrier (254) and the device (30). The fluid barrier (254) can include a scavenge inlet (286) that is positioned near the device (30), and the immersion fluid system (252) can include a low pressure source (392A) that is in fluid communication with the scavenge inlet (286). The fluid barrier (254) confines any vapor (249) of the immersion fluid (248) and prevents it from perturbing a measurement system (22). Additionally, the environmental system (26) can include a bearing fluid source (290B) that directs a bearing fluid (290C) between the fluid barrier (254) and the device (30) to support the fluid barrier (254) relative to the device (30).

10. 发明公开

EP1761822A2 A DYNAMIC FLUID CONTROL SYSTEM FOR IMMERSION LITHOGRAPHY 审中-公开
标题翻译：动态流体控制系统的浸液光刻
公开(公告)号：EP1761822A2
公开(公告)日：2007-03-14
申请号：EP05749274.6
申请日：2005-05-18
申请人： NIKON CORPORATION
发明人： SOGARD, Michael
IPC分类号： G03B27/42 , G03B27/58 , G21G5/00
CPC分类号： G03D3/02 , C07K14/005 , C12N2740/15022 , G01N33/56983 , G01N2333/155 , G01N2469/20 , G03F7/70341 , G03F7/70725 , G03F7/7085 , G03F7/709
摘要： An apparatus includes a stage that supports a substrate, an optical system having a last optical element, that projects an image onto the substrate that is positioned spaced apart from the last optical element by a gap at least partly filled with an immersion liquid, and a pressure control system having an actuator, that controls pressure of the immersion liquid in the gap using the actuator.

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