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1. 发明申请

WO2012029998A2 MICROCHANNEL-COOLED COILS OF ELECTROMAGNETIC ACTUATORS EXHIBITING REDUCED EDDY-CURRENT DRAG 审中-公开
标题翻译：电磁驱动器的微通道冷却线圈显示降低的涡流电流
公开(公告)号：WO2012029998A2
公开(公告)日：2012-03-08
申请号：PCT/JP2011070669
申请日：2011-09-05
申请人： NIPPON KOGAKU KK , BINNARD MICHAEL B , COAKLEY SCOTT , POON ALEX , TOTSU MASAHIRO , COON DEREK , KHO LEONARD , KESWANI GAURAV , COOPER ALEXANDER , PHARAND MICHEL , BJORK MATT
发明人： BINNARD MICHAEL B , COAKLEY SCOTT , POON ALEX , TOTSU MASAHIRO , COON DEREK , KHO LEONARD , KESWANI GAURAV , COOPER ALEXANDER , PHARAND MICHEL , BJORK MATT
IPC分类号： H02K3/24
CPC分类号： H02K9/22 , G03F7/70758 , G03F7/70875 , H02K9/19 , H02K41/031 , H02K2201/18
摘要： Linear and planar motors, as exemplary electromagnetic actuators, are disclosed that have at least one actively cooled coil assembly. An exemplary assembly includes a coil having first and second main surfaces. Also included is a respective thermally conductive cooling plate in thermal contact with at least one main surface of the coil. A coolant passageway is defined in or on each cooling plate, and a liquid coolant passes through the coolant passageway. The coolant passageway has a primary pattern that is coextensive with at least part of the main surface of the coil. The primary pattern can include a secondary pattern producing coolant flow through the coolant passageway in a manner that reduces eddy-current losses in the cooling plate. The coolant passageway desirably includes. An exemplary secondary pattern is serpentine. An exemplary primary pattern is radial or has a radial aspect, such as an X-shaped pattern. The devices provide more effective cooling, with better reliability and ease of maintenance, and reduced eddy-current drag than conventional actuators.
摘要翻译：作为示例性电磁致动器，公开了线性和平面电机，其具有至少一个主动冷却的线圈组件。示例性组件包括具有第一和第二主表面的线圈。还包括与线圈的至少一个主表面热接触的相应导热冷却板。冷却剂通路限定在每个冷却板中或上，并且液体冷却剂穿过冷却剂通路。冷却剂通道具有与线圈的主表面的至少一部分共同延伸的主要图案。主要模式可以包括次要模式，以减少冷却板中的涡流损失的方式产生通过冷却剂通道的冷却剂流。冷却剂通道理想地包括。示例性的次级模式是蛇形。示例性主要图案是径向或具有径向方面，诸如X形图案。该设备提供更有效的冷却，具有更好的可靠性和易于维护，并且比传统执行器减少了涡流阻力。

2. 发明申请

WO2007145725A2 IMMERSION LITHOGRAPHY SYSTEM AND METHOD HAVING AN IMMERSION FLUID CONFINEMENT PLATE FOR SUBMERGING THE SUBSTRATE TO BE IMAGED IN IMMERSION FLUID 审中-公开
标题翻译：具有渗透流体限制板的渗透层析系统和方法，用于将浸没流体中形成的基底
公开(公告)号：WO2007145725A2
公开(公告)日：2007-12-21
申请号：PCT/US2007/010791
申请日：2007-05-04
申请人： NIKON CORPORATION , POON, Alex, Ka, Tim , KHO, Leonard, Wai, Fung , KESWANI, Gaurav , COON, Derek
发明人： POON, Alex, Ka, Tim , KHO, Leonard, Wai, Fung , KESWANI, Gaurav , COON, Derek
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： A lithography apparatus having a fluid confinement plate, which completely submerges the imaging surface of a substrate, is disclosed. The apparatus includes an imaging element defining an image and a stage configured to support the substrate. A projection optical system is provided to project the image defined by the imaging element onto the imaging surface of the substrate. A gap, filled with immersion fluid, is provided between the imaging surface of the substrate and the last optical element of the projection optical system. The fluid confinement plate, which is positioned within the gap between the last optical element and the substrate, is sufficiently sized so that the imaging surface is completely submerged in the immersion fluid. The fluid confinement plate includes a first surface facing the gap and opposing the imaging surface of the substrate. The first surface includes a droplet control element to control the formation of droplets forming on the first surface. In one embodiment, the droplet control element is a porous surface formed on the first surface. A vacuum is used to pull any excess immersion fluid through the porous region to prevent the formation of droplets. In a second embodiment, the droplet control element is a sloped surface that causes any immersion fluid on the first surface to flow toward to main body of immersion fluid in the gap.
摘要翻译：公开了一种具有完全浸没衬底的成像表面的流体限制板的光刻设备。该装置包括限定图像的成像元件和被配置为支撑基板的台。提供投影光学系统以将由成像元件限定的图像投影到基板的成像表面上。在基板的成像表面和投影光学系统的最后一个光学元件之间提供填充有浸没流体的间隙。定位在最后一个光学元件和基底之间的间隙内的流体限制板的尺寸足够大，使得成像表面完全浸没在浸没流体中。流体限制板包括面对间隙的第一表面并与基底的成像表面相对。第一表面包括用于控制形成在第一表面上的液滴的液滴控制元件。在一个实施例中，液滴控制元件是形成在第一表面上的多孔表面。使用真空来吸引多余的浸渍流体通过多孔区域以防止形成液滴。在第二实施例中，液滴控制元件是使第一表面上的任何浸没流体朝着间隙中的浸没流体的主体流动的倾斜表面。

3. 发明申请

WO2004093159A2 IMMERSION LITHOGRAPHY FLUID CONTROL SYSTEM 审中-公开
标题翻译：静态液相流体控制系统
公开(公告)号：WO2004093159A2
公开(公告)日：2004-10-28
申请号：PCT/US2004009911
申请日：2004-03-29
申请人： NIPPON KOGAKU KK , COON DEREK , HAZELTON ANDREW J
发明人： COON DEREK , HAZELTON ANDREW J
IPC分类号： G03F7/20 , H01L
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70808
摘要： A fluid control system for immersion lithography is formed with an optical member such as a lens, a workpiece such as a semiconductor wafer with a surface disposed opposite to the optical member with a gap in between, a fluid-supplying device for providing an immersion fluid such as water to a specified exposure area in the gap, and a fluid control device that activates a force on the fluid so that the immersion fluid is retained in the exposure area and its vicinity at least while the immersion lithography operation is being carried out. A pressured gas may be caused to apply a hydrodynamic force on the fluid to keep it in its place.
摘要翻译：用于浸没光刻的流体控制系统由诸如透镜的光学构件，诸如半导体晶片的工件形成，其中具有与光学构件相对的表面设置在其间的间隙，用于提供浸没流体的流体供应装置例如水到间隙中的指定曝光区域;以及流体控制装置，其至少在进行浸没光刻操作时，激活流体上的力，使得浸没流体保持在曝光区域及其附近。可能导致加压气体对流体施加流体动力以将其保持在其位置。

4. 发明申请

WO2012029998A3 MICROCHANNEL-COOLED COILS OF ELECTROMAGNETIC ACTUATORS EXHIBITING REDUCED EDDY-CURRENT DRAG 审中-公开
公开(公告)号：WO2012029998A3
公开(公告)日：2012-03-08
申请号：PCT/JP2011/070669
申请日：2011-09-05
申请人： NIKON CORPORATION , BINNARD Michael B. , COAKLEY Scott , POON Alex , TOTSU Masahiro , COON Derek , KHO Leonard , KESWANI Gaurav , COOPER Alexander , PHARAND Michel , BJORK Matt
发明人： BINNARD Michael B. , COAKLEY Scott , POON Alex , TOTSU Masahiro , COON Derek , KHO Leonard , KESWANI Gaurav , COOPER Alexander , PHARAND Michel , BJORK Matt
IPC分类号： H02K3/24
摘要： Linear and planar motors, as exemplary electromagnetic actuators, are disclosed that have at least one actively cooled coil assembly. An exemplary assembly includes a coil having first and second main surfaces. Also included is a respective thermally conductive cooling plate in thermal contact with at least one main surface of the coil. A coolant passageway is defined in or on each cooling plate, and a liquid coolant passes through the coolant passageway. The coolant passageway has a primary pattern that is coextensive with at least part of the main surface of the coil. The primary pattern can include a secondary pattern producing coolant flow through the coolant passageway in a manner that reduces eddy-current losses in the cooling plate. The coolant passageway desirably includes. An exemplary secondary pattern is serpentine. An exemplary primary pattern is radial or has a radial aspect, such as an X-shaped pattern. The devices provide more effective cooling, with better reliability and ease of maintenance, and reduced eddy-current drag than conventional actuators.

5. 发明申请

WO2010048299A1 APPARATUS AND METHOD TO CONTROL VACUUM AT POROUS MATERIAL USING MULTIPLE POROUS MATERIALS 审中-公开
标题翻译：使用多孔材料控制多孔材料真空的装置和方法
公开(公告)号：WO2010048299A1
公开(公告)日：2010-04-29
申请号：PCT/US2009/061499
申请日：2009-10-21
申请人： NIKON CORPORATION , POON, Alex , KHO, Leonard , COON, Derek
发明人： POON, Alex , KHO, Leonard , COON, Derek
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03B27/52
摘要： An immersion liquid confinement apparatus confines an immersion liquid in an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system. The apparatus also recovers the immersion liquid from the immersion area. The apparatus includes a confinement member and first and second liquid-permeable members. The confinement member includes an outlet and an aperture through which a patterned image is projected onto the object. The first liquid-permeable member covers the outlet and has a first surface that faces the object and a second surface opposite the first surface, the second surface contacting a first chamber. The second liquid-permeable member has first and second oppositely-facing surfaces, the first surface of the second liquid-permeable member contacts the first chamber, the second surface of the second liquid-permeable member contacts a second chamber that is different from the first chamber.
摘要翻译：浸没液体限制装置将浸没液体限制在浸没式光刻系统中包括投影系统和曝光对象之间的间隙的浸没区域中。该设备还从浸没区域中恢复浸没液体。该装置包括限制构件和第一和第二液体可渗透构件。限制构件包括出口和孔，将图案化图像投射到物体上。第一透液性构件覆盖出口，并且具有面向物体的第一表面和与第一表面相对的第二表面，第二表面接触第一腔室。第二透液性构件具有第一和第二相对面的表面，第二透液性构件的第一表面接触第一腔室，第二透液构件的第二表面接触与第一液体可渗透构件不同的第二腔室室。

6. 发明申请

WO2006078292A1 OFFSET PARTIAL RING SEAL IN IMMERSION LITHOGRAPHIC SYSTEM 审中-公开
标题翻译：偏移光刻系统中的偏心环密封
公开(公告)号：WO2006078292A1
公开(公告)日：2006-07-27
申请号：PCT/US2005/017160
申请日：2005-05-18
申请人： NIKON CORPORATION , COON, Derek
发明人： COON, Derek
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70808 , G03F7/70341
摘要： A substrate processing apparatus includes a device for partially sealing a gap between a final optical element (22) of a projection lens (14) and an immersion nozzle (20). In one embodiment, the apparatus includes a table configured to support a substrate (16); a patterning element defining a pattern (12); a projection system configured to project the pattern onto the substrate (16), the projection system having a last optical element (22); a gap between the substrate and the last optical element; an immersion element configured to maintain immersion fluid in the gap; and a first seal (102) positioned between the projection system and the immersion element. The first seal (104) is configured to substantially prevent immersion fluid from exiting the space between the projection system and the immersion element.
摘要翻译：基板处理装置包括用于部分地密封投影透镜（14）的最终光学元件（22）与浸没喷嘴（20）之间的间隙的装置。在一个实施例中，该装置包括配置成支撑衬底（16）的工作台; 限定图案（12）的图案形成元件; 投影系统，被配置为将所述图案投影到所述基板（16）上，所述投影系统具有最后的光学元件（22）; 衬底和最后一个光学元件之间的间隙; 浸没元件，被配置为将浸没流体保持在间隙中; 以及位于投影系统和浸没元件之间的第一密封件（102）。第一密封件（104）构造成基本上防止浸没流体离开投影系统和浸没元件之间的空间。

7. 发明申请

WO2013090123A1 THERMAL PLATE FOR ENVIRONMENT AND TEMPERATURE CONTROL OF MOTORS USED TO MOVE STAGES IN LITHOGRAPHY TOOLS 审中-公开
标题翻译：电动工具用于移动电机的环境温度控制和温度控制
公开(公告)号：WO2013090123A1
公开(公告)日：2013-06-20
申请号：PCT/US2012/068294
申请日：2012-12-06
申请人： NIKON CORPORATION , BINNARD, Michael B. , PHARAND, Michel , MORIMOTO, Shigeru , POON, Alex Ka Tim , COON, Derek , KHO, Leonard Wai Fung , KESWANI, Gaurav
发明人： BINNARD, Michael B. , PHARAND, Michel , MORIMOTO, Shigeru , POON, Alex Ka Tim , COON, Derek , KHO, Leonard Wai Fung , KESWANI, Gaurav
IPC分类号： H02K9/22
CPC分类号： H02K9/22 , G03F7/70758 , G03F7/70858 , H02K41/031
摘要： A lithography tool having a stage for supporting and positioning a substrate, an array configured to move the stage, and a cover plate positioned between the stage and the array. In various embodiments, the array may be either a magnet or coil array. The cover plate acts as a thermal insulator that helps even out temperature variations across the array. Consequently, thermal disturbances to the array or other parts of the lithography tool are reduced, resulting in a minimization of positioning errors. In addition, the cover plate also protects the array and provides a smooth surface in the event of a "crash" of the substrate stage.
摘要翻译：一种光刻工具，具有用于支撑和定位基板的台架，配置成移动台架的阵列以及位于台架和阵列之间的盖板。在各种实施例中，阵列可以是磁体或线圈阵列。盖板用作有助于均匀排列阵列温度变化的绝热材料。因此，光刻工具的阵列或其他部分的热干扰减少，导致定位误差的最小化。此外，盖板还保护阵列，并且在衬底台的“碰撞”的情况下提供光滑的表面。

8. 发明申请

WO2012174273A1 LOW-NOISE FLUID GAUGES 审中-公开
标题翻译：低噪声流体计
公开(公告)号：WO2012174273A1
公开(公告)日：2012-12-20
申请号：PCT/US2012/042506
申请日：2012-06-14
申请人： NIKON CORPORATION , KHO, Leonard, Wai-fung , LEE, Sandy , COON, Derek , SOGARD, Michael
发明人： KHO, Leonard, Wai-fung , LEE, Sandy , COON, Derek , SOGARD, Michael
IPC分类号： G01B13/12 , G05D7/01
CPC分类号： G01B13/02 , G01B13/12 , G03F9/7034 , G03F9/7057
摘要： Fluid gauges are disclosed having first and second gas passageways each conducting a respective flow of gas. A third gas passageway is connected to the first and second gas passageways and conducts a respective flow of gas from the first and/or second gas passageways. The third gas passageway includes a gas sensor flanked in the third gas passageway by a first flow restrictor and a second flow restrictor to reduce noise in an electronic signal produced by the sensor.
摘要翻译：公开了具有第一和第二气体通道的流体计，每个气体通道各自传导各自的气体流。第三气体通道连接到第一和第二气体通道并且导引来自第一和/或第二气体通道的相应气体流。第三气体通道包括通过第一限流器在第三气体通道中侧翼的气体传感器和第二限流器，以减少由传感器产生的电子信号中的噪声。

9. 发明申请

WO2008115372A1 APPARATUS AND METHODS FOR KEEPING IMMERSION FLUID ADJACENT TO AN OPTICAL ASSEMBLY DURING WAFER EXCHANGE IN AN IMMERSION LITHOGRAPHY MACHINE 审中-公开
标题翻译：用于在浸没式切割机中的波形交换期间保持与光学组件相关的流体流体的装置和方法
公开(公告)号：WO2008115372A1
公开(公告)日：2008-09-25
申请号：PCT/US2008003224
申请日：2008-03-12
申请人： NIPPON KOGAKU KK , POON ALEX KA TIM , KHO LEONARD WAI FUNG , KESWANI GAURAV , COON DEREK
发明人： POON ALEX KA TIM , KHO LEONARD WAI FUNG , KESWANI GAURAV , COON DEREK
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70733
摘要： Apparatus and methods keep immersion liquid in a space adjacent to an optical assembly. An optical assembly projects an image onto a substrate supported adjacent to the optical assembly by a substrate table. An insertion member insertable into the space between the optical assembly and the substrate, the substrate table, or both, divides the immersion liquid into a first portion and a second portion, the first portion disposed between the optical assembly and the insertion member, and the second portion disposed between the insertion member and the substrate, the substrate table, or both. The insertion member keeps the optical assembly in contact with the first portion when the substrate is moved away from being disposed adjacent to the optical assembly.
摘要翻译：装置和方法将浸没液体保持在与光学组件相邻的空间中。光学组件通过衬底台将图像投影到靠近光学组件支撑的衬底上。可插入到光学组件和衬底之间的空间，衬底台或两者中的插入构件将浸没液体分成第一部分和第二部分，第一部分设置在光学组件和插入构件之间，第二部分设置在插入构件和衬底之间，衬底台或两者。当基板移动远离邻近光学组件时，插入构件保持光学组件与第一部分接触。

10. 发明申请

WO2008115372A8 APPARATUS AND METHODS FOR KEEPING IMMERSION FLUID ADJACENT TO AN OPTICAL ASSEMBLY DURING WAFER EXCHANGE IN AN IMMERSION LITHOGRAPHY MACHINE 审中-公开
公开(公告)号：WO2008115372A8
公开(公告)日：2008-09-25
申请号：PCT/US2008/003224
申请日：2008-03-12
申请人： NIKON CORPORATION , POON, Alex, Ka, Tim , KHO, Leonard, Wai, Fung , KESWANI, Gaurav , COON, Derek
发明人： POON, Alex, Ka, Tim , KHO, Leonard, Wai, Fung , KESWANI, Gaurav , COON, Derek
IPC分类号： G03F7/20
摘要： Apparatus and methods keep immersion liquid in a space adjacent to an optical assembly. An optical assembly projects an image onto a substrate supported adjacent to the optical assembly by a substrate table. An insertion member insertable into the space between the optical assembly and the substrate, the substrate table, or both, divides the immersion liquid into a first portion and a second portion, the first portion disposed between the optical assembly and the insertion member, and the second portion disposed between the insertion member and the substrate, the substrate table, or both. The insertion member keeps the optical assembly in contact with the first portion when the substrate is moved away from being disposed adjacent to the optical assembly.

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