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    • 5. 发明申请
    • Method for Directed DNA Evolution using Combinatorial DNA Libraries
    • 使用组合DNA文库进行定向DNA进化的方法
    • US20160319272A1
    • 2016-11-03
    • US15140408
    • 2016-04-27
    • Zhen KangJian ChenGuocheng DuPeng Jin
    • Zhen KangJian ChenGuocheng DuPeng Jin
    • C12N15/10
    • C12N15/1058C12N15/1031C12Q2521/101C12Q2521/501C12Q2531/113C12Q2533/101C12Q2563/179
    • The present invention provides a method of rapid directed DNA evolution based on single-stranded combinatorial DNA mutant library. The single- and double-stranded mutant library are constructed either separately or simultaneously using editing primers that contain mutated nucleotides and are targeted to different regions of the parent DNA sequence. The mutant library is then inserted into expression vectors and mutants with desired property are obtained by high throughput screening. Evolution of promoters, enzymes and metabolic pathways were successfully achieved using this method and mutants with excellent properties were obtained. The method of the present invention is simple, rapid, and efficient. It can be used for directed evolution of regulatory sequence such as promoters and ribosome binding sites, and is especially suitable for introducing diverse mutations into protein encoding genes, leading to rapid directed evolution of gene of interest.
    • 本发明提供了基于单链组合DNA突变体文库的快速定向DNA进化的方法。 使用含有突变核苷酸的编辑引物单独或同时构建单链和双链突变体文库,并且靶向母DNA序列的不同区域。 然后将突变型文库插入表达载体中,并通过高通量筛选获得具有所需性质的突变体。 使用该方法成功实现了启动子,酶和代谢途径的进化,获得了具有优异性能的突变体。 本发明的方法简单,快速,高效。 它可以用于调节序列的定向进化,如启动子和核糖体结合位点,特别适用于将多种突变引入到蛋白质编码基因中,导致感兴趣的基因的快速定向进化。
    • 7. 发明授权
    • Lithographic process
    • 平版印刷工艺
    • US07910292B2
    • 2011-03-22
    • US10582033
    • 2004-12-01
    • Kyle JiangPeng Jin
    • Kyle JiangPeng Jin
    • G03F7/00
    • G03F7/2008G03F7/20
    • The present invention provides a lithographic process for producing high aspect ratio parts from an epoxy-type negative photoresist comprising the steps of: (i) irradiating a prebaked masked epoxy-type negative photoresist on a substrate with light at a total energy density of from 18,000 to 35,000 mJ/cm2, (ii) post-baking the exposed photoresist at elevated temperature, and (iii) developing the exposed photoresist in a solvent, wherein no more than 15% of the energy density is contributed by light having a wavelength of 400 nm or less. The invention also discloses a reciprocating microengine (10) comprising a cylinder (14), piston (12) and crankshaft made by the process.
    • 本发明提供了一种用于从环氧型负型光致抗蚀剂制造高纵横比部件的光刻工艺,其特征在于包括以下步骤:(i)在总能量密度为18,000的光照射基底上的预焙掩膜的环氧型负性光致抗蚀剂 (iii)在升高的温度下对曝光的光致抗蚀剂进行后烘烤,以及(iii)在溶剂中显影曝光的光致抗蚀剂,其中不超过15%的能量密度由波长为400的光 nm以下。 本发明还公开了一种往复式微发动机(10),其包括由该过程制成的气缸(14),活塞(12)和曲轴。