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1. 发明授权

US07799704B2 Gas baffle and distributor for semiconductor processing chamber 有权
公开(公告)号：US07799704B2
公开(公告)日：2010-09-21
申请号：US12253687
申请日：2008-10-17
申请人： Soonam Park , Farhan Ahmad , Hemant P. Mungekar , Sanjay Kamath , Young S. Lee , Siqing Lu
发明人： Soonam Park , Farhan Ahmad , Hemant P. Mungekar , Sanjay Kamath , Young S. Lee , Siqing Lu
IPC分类号： H01L21/31 , H01L21/469
CPC分类号： C23C16/45563 , C23C16/4401 , C23C16/4404
摘要： Apparatus and methods for distributing gas in a semiconductor process chamber are provided. In an embodiment, a gas distributor for use in a gas processing chamber comprises a body. The body includes a baffle with a gas deflection surface to divert the flow of a gas from a first direction to a second direction. The gas deflection surface comprises a concave surface. The concave surface comprises at least about 75% of the surface area of the gas deflection surface. The concave surface substantially deflects the gas toward a chamber wall and provides decreased metal atom contamination from the baffle so that season times can be reduced.

2. 发明申请

US20090093129A1 Gas Baffle and Distributor for Semiconductor Processing Chamber 有权
标题翻译：半导体加工室的气体挡板和分配器
公开(公告)号：US20090093129A1
公开(公告)日：2009-04-09
申请号：US12253687
申请日：2008-10-17
申请人： Soonam Park , Farhan Ahmad , Hemant P. Mungekar , Sanjay Kamath , Young S. Lee , Siqing Lu
发明人： Soonam Park , Farhan Ahmad , Hemant P. Mungekar , Sanjay Kamath , Young S. Lee , Siqing Lu
IPC分类号： H01L21/31
CPC分类号： C23C16/45563 , C23C16/4401 , C23C16/4404
摘要： Apparatus and methods for distributing gas in a semiconductor process chamber are provided. In an embodiment, a gas distributor for use in a gas processing chamber comprises a body. The body includes a baffle with a gas deflection surface to divert the flow of a gas from a first direction to a second direction. The gas deflection surface comprises a concave surface. The concave surface comprises at least about 75% of the surface area of the gas deflection surface. The concave surface substantially deflects the gas toward a chamber wall and provides decreased metal atom contamination from the baffle so that season times can be reduced.
摘要翻译：提供了用于在半导体处理室中分配气体的装置和方法。在一个实施例中，用于气体处理室的气体分配器包括主体。主体包括具有气体偏转表面的挡板以将气体的流动从第一方向转移到第二方向。气体偏转表面包括凹面。凹面包括至少约75％的气体偏转表面的表面积。凹面大致使气体朝向室壁偏转，并且提供了来自挡板的减少的金属原子污染物，从而可以减少季节时间。

3. 发明申请

US20080121179A1 GAS BAFFLE AND DISTRIBUTOR FOR SEMICONDUCTOR PROCESSING CHAMBER 失效
标题翻译：用于半导体加工室的气体和分配器
公开(公告)号：US20080121179A1
公开(公告)日：2008-05-29
申请号：US11564150
申请日：2006-11-28
申请人： SOONAM PARK , Farhan Ahmad , Hemant P. Mungekar , Sanjay Kamath , Young S. Lee , Siqing Lu
发明人： SOONAM PARK , Farhan Ahmad , Hemant P. Mungekar , Sanjay Kamath , Young S. Lee , Siqing Lu
IPC分类号： C23C16/52 , C23C16/44
CPC分类号： C23C16/4405 , C23C16/45563 , C23C16/45591 , H01J37/3244 , H01J37/32449
摘要： Apparatus and methods for distributing gas in a semiconductor process chamber are provided. In an embodiment, a gas distributor for use in a gas processing chamber comprises a body. The body includes a baffle with a gas deflection surface to divert the flow of a gas from a first direction to a second direction. The gas deflection surface comprises a concave surface. The concave surface comprises at least about 75% of the surface area of the gas deflection surface. The concave surface substantially deflects the gas toward a chamber wall and provides decreased metal atom contamination from the baffle so that season times can be reduced.
摘要翻译：提供了用于在半导体处理室中分配气体的装置和方法。在一个实施例中，用于气体处理室的气体分配器包括主体。主体包括具有气体偏转表面的挡板以将气体的流动从第一方向转移到第二方向。气体偏转表面包括凹面。凹面包括至少约75％的气体偏转表面的表面积。凹面大致使气体朝向室壁偏转，并且提供了来自挡板的减少的金属原子污染物，从而可以减少季节时间。

4. 发明授权

US07740706B2 Gas baffle and distributor for semiconductor processing chamber 失效
标题翻译：用于半导体处理室的气体挡板和分配器
公开(公告)号：US07740706B2
公开(公告)日：2010-06-22
申请号：US11564150
申请日：2006-11-28
申请人： Soonam Park , Farhan Ahmad , Hemant P. Mungekar , Sanjay Kamath , Young S. Lee , Siqing Lu
发明人： Soonam Park , Farhan Ahmad , Hemant P. Mungekar , Sanjay Kamath , Young S. Lee , Siqing Lu
IPC分类号： C23C16/455 , C23F1/00 , H01L21/306 , C23C16/06 , C23C16/22
CPC分类号： C23C16/4405 , C23C16/45563 , C23C16/45591 , H01J37/3244 , H01J37/32449
摘要： Apparatus and methods for distributing gas in a semiconductor process chamber are provided. In an embodiment, a gas distributor for use in a gas processing chamber comprises a body. The body includes a baffle with a gas deflection surface to divert the flow of a gas from a first direction to a second direction. The gas deflection surface comprises a concave surface. The concave surface comprises at least about 75% of the surface area of the gas deflection surface. The concave surface substantially deflects the gas toward a chamber wall and provides decreased metal atom contamination from the baffle so that season times can be reduced.
摘要翻译：提供了用于在半导体处理室中分配气体的装置和方法。在一个实施例中，用于气体处理室的气体分配器包括主体。主体包括具有气体偏转表面的挡板以将气体的流动从第一方向转移到第二方向。气体偏转表面包括凹面。凹面包括至少约75％的气体偏转表面的表面积。凹面大致使气体朝向室壁偏转，并且提供了来自挡板的减少的金属原子污染物，从而可以减少季节时间。

5. 发明申请

US20080124944A1 GAS BAFFLE AND DISTRIBUTOR FOR SEMICONDUCTOR PROCESSING CHAMBER 审中-公开
公开(公告)号：US20080124944A1
公开(公告)日：2008-05-29
申请号：US11564167
申请日：2006-11-28
申请人： Soonam Park , Farhan Ahmad , Hemant P. Mungekar , Sanjay Kamath , Young S. Lee , Siqing Lu
发明人： Soonam Park , Farhan Ahmad , Hemant P. Mungekar , Sanjay Kamath , Young S. Lee , Siqing Lu
IPC分类号： H01L21/31 , H01L21/469
CPC分类号： C23C16/45563 , C23C16/4401 , C23C16/4404
摘要： Apparatus and methods for distributing gas in a semiconductor process chamber are provided. In an embodiment, a gas distributor for use in a gas processing chamber comprises a body. The body includes a baffle with a gas deflection surface to divert the flow of a gas from a first direction to a second direction. The gas deflection surface comprises a concave surface. The concave surface comprises at least about 75% of the surface area of the gas deflection surface. The concave surface substantially deflects the gas toward a chamber wall and provides decreased metal atom contamination from the baffle so that season times can be reduced.

6. 发明申请

US20080029484A1 In-situ process diagnostics of in-film aluminum during plasma deposition 审中-公开
标题翻译：等离子体沉积期间膜内铝的原位工艺诊断
公开(公告)号：US20080029484A1
公开(公告)日：2008-02-07
申请号：US11492639
申请日：2006-07-25
申请人： Soonam Park , Farhan Ahmad , Hemant P. Mungekar , Young S. Lee
发明人： Soonam Park , Farhan Ahmad , Hemant P. Mungekar , Young S. Lee
IPC分类号： C23F1/00 , G06F19/00 , H01L21/306 , H05H1/24 , C23C16/00
CPC分类号： H01J37/32972 , C23C16/4401 , C23C16/52 , H01J37/32935
摘要： The concentration of various contaminants in a plasma can be monitored during processing of a substrate such as a silicon wafer, in order to prevent an unacceptable amount of contamination from being deposited on the substrate. The radiation emitted from the plasma through a window in the processing chamber during processing can be detected and measured by a tool such as an optical emission spectrograph (OES) and the relative intensity of peaks in the spectrum corresponding to various contaminants can be analyzed in order to determine contaminant concentration. In one embodiment, the concentration of aluminum in a plasma is monitored during a plasma chemical vapor deposition (CVD) process in order to ensure that the amount of aluminum in the produced device is lower than a maximum threshold amount.
摘要翻译：为了防止在衬底上沉积不可接受量的污染物，可以在诸如硅晶片的衬底的处理期间监测等离子体中各种污染物的浓度。可以通过诸如光发射光谱仪（OES）的工具来检测和测量从等离子体通过处理室中的处理室中的窗口发射的辐射，并且可以按顺序分析对应于各种污染物的光谱中的峰的相对强度以确定污染物浓度。在一个实施例中，在等离子体化学气相沉积（CVD）工艺期间监测等离子体中铝的浓度，以确保所生产的装置中的铝量低于最大阈值量。

7. 发明授权

US09940619B2 Processing non-traditional transactions on a traditional payment network 有权
公开(公告)号：US09940619B2
公开(公告)日：2018-04-10
申请号：US12835517
申请日：2010-07-13
申请人： Farhan Ahmad , Meeri Siljamaki
发明人： Farhan Ahmad , Meeri Siljamaki
IPC分类号： G06Q40/00 , G06Q20/40 , G06Q20/04 , G06Q20/10 , G06Q20/12 , G06Q30/02
CPC分类号： G06Q20/40 , G06Q20/04 , G06Q20/10 , G06Q20/12 , G06Q30/0222 , G06Q40/12
摘要： A system for and methods of processing non-traditional payment transactions on a traditional payment network is disclosed. More specifically, a payments system includes one or more payment program managers (PPMs), which are the providers of alternative payment products, in combination with one or more payment program processors (PPPs), which serve as processors for the PPMs. The PPMs and PPPs operate on a payment network, such as a traditional payment network. The payments system includes the utilization of traditional bank identification numbers (BINS) in order to process non-traditional transactions on a traditional payment network. Surrogate numbers are issued on BIN ranges to the non-traditional transactions in order to process them on the traditional payment network. Additionally, the payments system includes pricing structures that are associated with alternative payment products. These pricing structures are implemented and processed on the payment network, alongside the pricing structures of traditional payment products.

8. 发明申请

US20110258117A1 MODIFICATION OF PAYMENT TRANSACTIONS IN REAL-TIME BASED UPON EXTERNAL DATA SOURCE 审中-公开
标题翻译：基于外部数据源实时付款交易的修改
公开(公告)号：US20110258117A1
公开(公告)日：2011-10-20
申请号：US12760319
申请日：2010-04-14
申请人： Farhan Ahmad , Meeri Siljamaki , Min Koo Lee , Chia-Lin Chen
发明人： Farhan Ahmad , Meeri Siljamaki , Min Koo Lee , Chia-Lin Chen
IPC分类号： G06Q20/00 , G06F17/30 , G06Q30/00
CPC分类号： G06Q20/3224 , G06Q20/202 , G06Q30/016 , G06Q30/0207 , G06Q30/06 , G06Q40/02
摘要： A system for, and method of using multiple data flows, both transactional and non-transactional, in real time to modify a transaction is disclosed. Further the use of transaction information in real time as a decision factor to trigger a different, non-transactional response, and the combination of the two approaches is disclosed. In particular, a network comprised of a plurality of software modules and databases is capable of combining current POS/POP transaction data, with a variety of other outside data sources to provide improved information for adjusting responses to transactions in real time. More specifically, the network utilizes payer facing systems to analyze the data in combination with well-known POS/POP transaction data and a variety of internal and external systems to combine information and provide modified transactions, related discounts and offers, and other relevant messaging to the payer. In addition, a specific method for analyzing for fraud within hybrid information transactions is disclosed and several examples to illustrate the invention are included.
摘要翻译：公开了实时修改事务的用于事务和非事务的多个数据流的系统和方法。此外，实时地使用交易信息作为触发不同的非交易响应的决定因素，并且公开了这两种方法的组合。特别地，由多个软件模块和数据库组成的网络能够将当前的POS / POP交易数据与各种其他外部数据源组合，以提供用于实时调整对交易的响应的改进信息。更具体地说，网络利用面向付费者的系统来与众所周知的POS / POP交易数据和各种内部和外部系统结合来分析数据，以组合信息并提供经修改的交易，相关的折扣和优惠以及其他相关消息传递付款人。此外，公开了用于分析混合信息事务中的欺诈的具体方法，并且包括说明本发明的几个示例。

9. 外观设计

USD680168S1 Transaction card with glowing indicator 有权
公开(公告)号：USD680168S1
公开(公告)日：2013-04-16
申请号：US29396880
申请日：2011-07-08
申请人： Farhan Ahmad , Troy Bernard , Ed O'Sullivan , Ryan Julian
设计人： Farhan Ahmad , Troy Bernard , Ed O'Sullivan , Ryan Julian

10. 外观设计

USD642614S1 Transaction card with glowing indicator 有权
标题翻译：交易卡与发光指示器
公开(公告)号：USD642614S1
公开(公告)日：2011-08-02
申请号：US29358968
申请日：2010-04-02
申请人： Farhan Ahmad , Troy Bernard , Ed O'Sullivan , Ryan Julian
设计人： Farhan Ahmad , Troy Bernard , Ed O'Sullivan , Ryan Julian

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