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    • 3. 发明授权
    • Piperazine compounds as inhibitors of MMP or TNF
    • 哌嗪化合物作为MMP或TNF的抑制剂
    • US06489324B2
    • 2002-12-03
    • US09982869
    • 2001-10-22
    • Masahiro NeyaHitoshi YamazakiNatsuko KayakiriKentaro SatoTeruo Oku
    • Masahiro NeyaHitoshi YamazakiNatsuko KayakiriKentaro SatoTeruo Oku
    • C07D24104
    • C07D405/12C07D241/04C07D405/14C07D409/12C07D409/14C07D413/14C07D417/12C07D417/14
    • A compound of formula (I) wherein A is a sulfonyl or a carbonyl; R1 is an optionally substituted aryl, an optionally substituted heterocyclic group, an optionally substituted lower alkyl or an optionally substituted lower alkenyl; R2 is a hydrogen, an optionally substituted lower alkyl, an optionally substituted aryl or an optionally substituted heterocyclic group; R3 is an optionally substituted lower alkyl, an optionally substituted lower alkoxy, an optionally substituted aryloxy, an optionally substituted lower alkenyl, an optionally substituted aryl, an optionally substituted heterocyclic group or an optionally substituted amino; R4 is a hydrogen, an optionally substituted lower alkyl, an optionally substituted aryl or an optionally substituted heterocyclic group; R5 is a hydrogen, an optionally substituted lower alkyl, an optionally substituted aryl or an optionally substituted heterocyclic group; and R10 is a hydroxy or a protected hydroxy, and a pharmaceutically acceptable salt thereof. The compound of the present invention is useful as a medicament for prophylactic and therapeutic treatment of MMP-or TNF&agr;-medicated diseases.
    • 式(I)的化合物,其中A是磺酰基或羰基; R1是任选取代的芳基,任选取代的杂环基,任选取代的低级烷基或任选取代的低级烯基; R2是氢,任选取代的低级烷基,任选取代的芳基或任选取代的杂环基; R3是任选取代的低级烷基,任选取代的低级烷氧基,任选取代的芳氧基,任选取代的低级烯基,任选取代的芳基,任选取代的杂环基或任选取代的氨基; R4是氢,任选取代的低级烷基,任选取代的芳基或任选取代的杂环基; R5是氢,任选取代的低级烷基,任选取代的芳基或任选取代的杂环基; R 10为羟基或被保护的羟基及其药学上可接受的盐。 本发明的化合物可用作用于预防和治疗MMP或TNFα药物疾病的药物。
    • 4. 发明授权
    • Piperazine compounds as inhibitors of MMP or TNF
    • 哌嗪化合物作为MMP或TNF的抑制剂
    • US06333324B1
    • 2001-12-25
    • US09319928
    • 1999-07-26
    • Masahiro NeyaHitoshi YamazakiNatsuko KayakiriKentaro SatoTeruo Oku
    • Masahiro NeyaHitoshi YamazakiNatsuko KayakiriKentaro SatoTeruo Oku
    • C07D24104
    • C07D405/12C07D241/04C07D405/14C07D409/12C07D409/14C07D413/14C07D417/12C07D417/14
    • A compound of formula (I) wherein A is a sulfonyl or a carbonyl; R1 is an optionally substituted aryl, an optionally substituted heterocyclic group, an optionally substituted lower alkyl or an optionally substituted lower alkenyl; R2 is a hydrogen, an optionally substituted lower alkyl, an optionally substituted aryl or an optionally substituted heterocyclic group; R3 is an optionally substituted lower alkyl, an optionally substituted lower alkoxy, an optionally substituted aryloxy, an optionally substitued lower alkenyl, an optionally substituted aryl, an optionally substituted heterocyclic group or an optionally substitued amino; R4 is a hydrogen, an optionally substituted lower alkyl, an optionally substituted aryl or an optionally substituted heterocyclic group; R5 is a hydrogen, an optionally substituted lower alkyl, an optionally substituted aryl or an optionally substituted heterocyclic group; and R10 is a hydroxy or a protected hydroxy, and a pharmaceutically acceptable salt thereof. The compound of the present invention is useful as a medicament for prophylactic and therapeutic treatment of MMP- or TNF&agr;-mediated diseases.
    • 式(I)的化合物,其中A是磺酰基或羰基; R1是任选取代的芳基,任选取代的杂环基,任选取代的低级烷基或任选取代的低级烯基; R2是氢,任选取代的低级烷基,任选取代的芳基或任选取代的杂环基; R 3是任选取代的低级烷基,任选取代的低级烷氧基,任选取代的芳氧基,任选取代的低级烯基,任选取代的芳基,任选取代的杂环基或任选取代的氨基; R4是氢,任选取代的低级烷基,任选取代的芳基或任选取代的杂环基; R5是氢,任选取代的低级烷基,任选取代的芳基或任选取代的杂环基; R 10为羟基或被保护的羟基及其药学上可接受的盐。 本发明的化合物可用作用于预防和治疗MMP或TNFα介导的疾病的药物。
    • 7. 发明授权
    • Pyrazole derivatives
    • 吡唑衍生物
    • US5670503A
    • 1997-09-23
    • US505284
    • 1995-08-21
    • Yoshio KawaiHitoshi YamazakiHirokazu TanakaTeruo Oku
    • Yoshio KawaiHitoshi YamazakiHirokazu TanakaTeruo Oku
    • A61K31/4196A61K31/53A61P35/00A61P43/00C07D487/04C07D251/72C07D253/10
    • C07D487/04
    • New heterocyclic derivatives of the formula: ##STR1## wherein R.sup.1 is aryl which may have suitable substituent(s) or heterocyclic group which may have suitable substituent(s), R.sup.2 is aryl which may have suitable substituent(s) or heterocyclic group which may have suitable substituent(s), R.sup.3 is hydrogen or acyl, R.sup.4 is hydrogen, lower alkyl, cyclo(lower)alkyl, cyclo(lower)alkyl-(lower)alkyl, carboxy(lower)alkyl, protected carboxy(lower)alkyl, ar(lower)alkyl which may have suitable substituent(s), ar(lower)alkenyl, bridged tricyclicalkyl, heterocyclic group which may have suitable substituent(s), acyl, or a group of the formula ##STR2## (in which A is lower alkylene), and R.sup.5 is hydrogen or lower alkyl, and a pharmaceutically acceptable salt thereof which are useful as a medicament.
    • PCT No.PCT / JP94 / 00213 Sec。 371日期1995年8月21日 102(e)日期1995年8月21日PCT 1994年2月9日PCT PCT。 公开号WO94 / 19350 PCT 日期1994年9月1日新的具有下式的杂环衍生物:可以具有合适取代基的可能的取代基或杂环基,R 2可以具有合适的取代基的芳基或可具有合适取代基的杂环基 ),R 3是氢或酰基,R 4是氢,低级烷基,环(低级)烷基,环(低级)烷基 - (低级)烷基,羧基(低级)烷基,被保护的羧基 其可以具有合适的取代基,芳(低级)烯基,桥连三环烷基,可具有合适取代基的杂环基,酰基或式(IMAGE)(其中A是低级亚烷基)的基团,以及 R5是可用作药物的氢或低级烷基及其药学上可接受的盐。