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    • 2. 发明专利
    • Pre-treatment method of substrate in organic el element manufacturing method
    • 有机EL元件制造方法中的基板预处理方法
    • JP2008293914A
    • 2008-12-04
    • JP2007140769
    • 2007-05-28
    • Toyota Industries Corp株式会社豊田自動織機
    • SONE HIROTAKAOMURO WATARUMUTA MITSUHARUYAMAMOTO KATSUYA
    • H05B33/10H01L51/50H05B33/02
    • H01L51/5206H01L51/5237
    • PROBLEM TO BE SOLVED: To provide a pre-treatment method of a substrate in the organic EL element manufacturing method in which an appropriate surface treatment to a transparent electrode of metal oxide formed on the substrate can be carried out as well as removal of moisture. SOLUTION: In the organic EL element manufacturing method to laminate and form a layer to constitute an organic EL element on a substrate formed with a transparent electrode of ITO in the order, the substrate P is housed in a baking chamber 15 provided with a heater 22. Then, while introducing a mixed gas of oxygen and nitrogen so as to replace a gas in the baking chamber 15, heating treatment of the substrate P is performed, and the introduction speed of the mixed gas is established to be a speed in which the introduction amount to the baking chamber 15 per one minute is 1/60 or more and 1/15 or less of the total volume of the baking chamber 15. The ratio of oxygen and nitrogen in the mixed gas is in a volume ratio of oxygen:inert gas, 1.8:8.2-3.0:7.0. COPYRIGHT: (C)2009,JPO&INPIT
    • 要解决的问题:提供一种有机EL元件制造方法中的基板的预处理方法,其中可以对形成在基板上的金属氧化物的透明电极进行适当的表面处理以及去除 的水分。 解决方案:在有机EL元件制造方法中,在形成有ITO的透明电极的基板上层叠形成有机EL元件的层,将基板P容纳在设置有 加热器22.然后,在引入氧和氮的混合气体以替代烘烤室15中的气体的同时,进行基板P的加热处理,并将混合气体的引入速度确定为速度 其中每一分钟对烘烤室15的引入量为烘焙室15的总体积的1/60以上且1/15以下。混合气体中的氧和氮的比例为体积比 的氧气:惰性气体,1.8:8.2-3.0:7.0。 版权所有(C)2009,JPO&INPIT