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1. 发明授权

US07033647B2 Method of synthesising carbon nano tubes 失效
标题翻译：碳纳米管合成方法
公开(公告)号：US07033647B2
公开(公告)日：2006-04-25
申请号：US10301317
申请日：2002-11-20
申请人： Xinhe Tang , Klaus Mauthner , Ernst Hammel , Hans Löschner , Elmar Platzgummer , Gerhard Stengl
发明人： Xinhe Tang , Klaus Mauthner , Ernst Hammel , Hans Löschner , Elmar Platzgummer , Gerhard Stengl
IPC分类号： C23C16/26 , C23C16/48 , D01F9/127
CPC分类号： C30B23/00 , B82Y30/00 , B82Y40/00 , C01B32/162 , C30B29/02 , C30B29/605 , C30B33/00 , Y10S427/102
摘要： Method of synthesizing carbon nano tubes (CNTs) on a catalyst layer formed on a support member, by catalytic deposition of carbon from a gaseous phase, whereby an ion beam is used prior to, during, and/or after formation of the carbon nano tubes for modifying the physical, chemical, and/or conductive properties of the carbon nanotubes.
摘要翻译：在形成在支撑体上的催化剂层上合成碳纳米管（CNT）的方法，通过从气相中催化沉积碳，由此在形成碳纳米管之前，期间和/或之后使用离子束用于改变碳纳米管的物理，化学和/或导电性质。

2. 发明申请

US20060068096A1 METHOD OF SYNTHESISING CARBON NANO TUBES 失效
标题翻译：合成碳纳米管的方法
公开(公告)号：US20060068096A1
公开(公告)日：2006-03-30
申请号：US10301317
申请日：2002-11-20
申请人： Xinhe Tang , Klaus Mauthner , Ernst Hammel , Hans Loschner , Elmar Platzgummer , Gerhard Stengl
发明人： Xinhe Tang , Klaus Mauthner , Ernst Hammel , Hans Loschner , Elmar Platzgummer , Gerhard Stengl
IPC分类号： C23C16/00
CPC分类号： C30B23/00 , B82Y30/00 , B82Y40/00 , C01B32/162 , C30B29/02 , C30B29/605 , C30B33/00 , Y10S427/102
摘要： Method of synthesising carbon nano tubes (CNTs) on a catalyst layer formed on a support member, by catalytic deposition of carbon from a gaseous phase, whereby an ion beam is used prior to, during and/or after formation of said carbon nano tubes for modifying the physical, chemical and/or conductive properties of said carbon nano tubes.
摘要翻译：在形成在支撑构件上的催化剂层上合成碳纳米管（CNT）的方法，通过从气相中催化沉积碳，由此在形成所述碳纳米管之前，期间和/或之后使用离子束，改变所述碳纳米管的物理，化学和/或导电性质。

3. 发明授权

US06858118B2 Apparatus for enhancing the lifetime of stencil masks 有权
标题翻译：用于增加模板掩模寿命的装置
公开(公告)号：US06858118B2
公开(公告)日：2005-02-22
申请号：US10395572
申请日：2003-03-24
申请人： Elmar Platzgummer , Hans Löschner , Gerhard Stengl
发明人： Elmar Platzgummer , Hans Löschner , Gerhard Stengl
IPC分类号： C23C14/04 , C23C14/32 , C23C14/34 , C23C14/46 , C23C14/54 , G03F1/00 , H01J37/317 , H01L21/027
CPC分类号： C23C14/547 , B82Y10/00 , B82Y40/00 , G03F1/20 , G03F1/82 , H01J37/3174 , H01J2237/31755 , H01J2237/31788 , H01J2237/31794
摘要： An apparatus for masked ion-beam lithography comprises a mask maintenance module for prolongation of the lifetime of the stencil mask. The module comprises a deposition means for depositing material to the side of the mask irradiated by the lithography beam, with at least one deposition source being positioned in front of the mask, and further comprises a sputter means in which at least one sputter source, positioned in front of the mask holder means and outside the path of the lithography beam, produces a sputter ion beam directed to the mask in order to sputter off material from said mask in a scanning procedure and compensate for inhomogeneity of deposition.
摘要翻译：用于掩模离子束光刻的装置包括用于延长模板掩模寿命的掩模维护模块。该模块包括用于将材料沉积到由光刻光束照射的掩模侧面的沉积装置，其中至少一个沉积源位于掩模的前面，并且还包括溅射装置，其中定位至少一个溅射源在掩模保持器装置的前面并且在光刻光束的路径之外，产生指向掩模的溅射离子束，以便在扫描过程中从所述掩模溅射材料并补偿沉积的不均匀性。

4. 发明授权

US08368015B2 Particle-optical system 有权
标题翻译：粒子光学系统
公开(公告)号：US08368015B2
公开(公告)日：2013-02-05
申请号：US11990067
申请日：2006-08-08
申请人： Elmar Platzgummer , Gerhard Stengl , Helmut Falkner
发明人： Elmar Platzgummer , Gerhard Stengl , Helmut Falkner
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： H01J37/12 , B82Y10/00 , B82Y40/00 , H01J37/3177
摘要： The present invention relates to a multi-beamlet multi-column particle-optical system comprising a plurality of columns which are disposed in an array for simultaneously exposing a substrate, each column having an optical axis and comprising: a beamlet generating arrangement comprising at least one multi-aperture plate for generating a pattern of multiple beamlets of charged particles, and an electrostatic lens arrangement comprising at least one electrode element; the at least one electrode element having an aperture defined by an inner peripheral edge facing the optical axis, the aperture having a center and a predetermined shape in a plane orthogonal to the optical axis; wherein in at least one of the plurality of columns, the predetermined shape of the aperture is a non-circular shape with at least one of a protrusion and an indentation from an ideal circle about the center of the aperture.
摘要翻译：多子束多列粒子光学系统技术领域本发明涉及一种多子束多列粒子光学系统，该多子束多列粒子光学系统包括多个列，其被布置成阵列以同时暴露衬底，每个列具有光轴，并且包括：子束产生装置，其包括至少一个用于产生多个带电粒子束的图案的多孔板，以及包括至少一个电极元件的静电透镜装置; 所述至少一个电极元件具有由面向光轴的内周边缘限定的孔，所述孔在与所述光轴正交的平面中具有中心和预定形状; 其中在所述多个列中的至少一个列中，所述孔的预定形状是非圆形形状，其具有围绕所述孔的中心的来自理想圆的突起和凹陷中的至少一个。

5. 发明申请

US20050201246A1 Particle-optical projection system 审中-公开
标题翻译：粒子投影系统
公开(公告)号：US20050201246A1
公开(公告)日：2005-09-15
申请号：US11080578
申请日：2005-03-15
申请人： Herbert Buschbeck , Gertraud Lammer , Alfred Chalupka , Robert Nowak , Elmar Platzgummer , Gerhard Stengl
发明人： Herbert Buschbeck , Gertraud Lammer , Alfred Chalupka , Robert Nowak , Elmar Platzgummer , Gerhard Stengl
IPC分类号： H01L21/027 , G03F7/20 , G11B7/09 , H01J37/02 , H01J37/147 , H01J37/15 , H01J37/20 , H01J37/21 , H01J37/304 , H01J37/317
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/21 , H01J37/304 , H01J2237/024 , H01J2237/10 , H01J2237/216 , H01J2237/30455
摘要： In a particle-optical projection system (32) a pattern (B) is imaged onto a target (tp) by means of energetic electrically charged particles. The pattern is represented in a patterned beam (pb) of said charged particles emerging from the object plane through at least one cross-over (c); it is imaged into an image (S) with a given size and distortion. To compensate for the Z-deviation of the image (S) position from the actual positioning of the target (tp) (Z denotes an axial coordinate substantially parallel to the optical axis cx), without changing the size of the image (S), the system comprises a position detection means (ZD) for measuring the Z-position of several locations of the target (tp), a control means (33) for calculating modifications (cr) of selected lens parameters of the final particle-optical lens (L2) and controlling said lens parameters according to said modifications.
摘要翻译：在粒子光学投影系统（32）中，通过能量带电粒子将图案（B）成像到目标（tp）上。所述图案通过至少一个交叉（c）从所述物体平面出射的所述带电粒子的图案化束（pb）中表示; 它被成像为具有给定大小和失真的图像（S）。为了补偿图像（S）位置与目标的实际定位（tp）（Z表示基本上平行于光轴cx的轴向坐标）的Z偏差，而不改变图像（S）的尺寸，该系统包括用于测量目标（tp）的若干位置的Z位置的位置检测装置（ZD），用于计算最终粒子光学透镜的选定透镜参数的修改（cr）的控制装置（33） L 2），并根据所述修改来控制所述透镜参数。

6. 发明授权

US08049189B2 Charged particle system 有权
标题翻译：带电粒子系统
公开(公告)号：US08049189B2
公开(公告)日：2011-11-01
申请号：US12090636
申请日：2006-10-20
申请人： Herbert Buschbeck , Elmar Platzgummer , Gerhard Stengl , Herbert Vonach
发明人： Herbert Buschbeck , Elmar Platzgummer , Gerhard Stengl , Herbert Vonach
IPC分类号： G21K1/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/147 , H01J37/21 , H01J2237/0492 , H01J2237/24578
摘要： A charged particle system comprises a particle source for generating a beam of charged particles and a particle-optical projection system. The particle-optical projection system comprises a focusing first magnetic lens (403) comprising an outer pole piece (411) having a radial inner end (411′), and an inner pole piece (412) having a lowermost end (412′) disposed closest to the radial inner end of the outer pole piece, a gap being formed by those; a focusing electrostatic lens (450) having at least a first electrode (451) and a second electrode (450) disposed in a region of the gap; and a controller (C) configured to control a focusing power of the first electrostatic lens based on a signal indicative of a distance of a surface of a substrate from a portion of the first magnetic lens disposed closest to the substrate.
摘要翻译：带电粒子系统包括用于产生带电粒子束的粒子源和粒子光学投影系统。粒子光学投影系统包括聚焦第一磁性透镜（403），其包括具有径向内端（411'）的外极片（411）和设置有最下端（412'）的内极片（412）最靠近外极片的径向内端的间隙由它们形成; 具有至少设置在所述间隙的区域中的第一电极（451）和第二电极（450）的聚焦静电透镜（450）以及控制器（C），被配置为基于表示基板的表面距离最靠近基板设置的第一磁性透镜的部分的距离的信号来控制第一静电透镜的聚焦能力。

7. 发明申请

US20100270474A1 Particle-Optical System 有权
标题翻译：粒子光学系统
公开(公告)号：US20100270474A1
公开(公告)日：2010-10-28
申请号：US11990067
申请日：2006-08-08
申请人： Elmar Platzgummer , Gerhard Stengl , Helmut Falkner
发明人： Elmar Platzgummer , Gerhard Stengl , Helmut Falkner
IPC分类号： H01J37/12 , H01J3/18
CPC分类号： H01J37/12 , B82Y10/00 , B82Y40/00 , H01J37/3177
摘要： The present invention relates to a multi-beamlet multi-column particle-optical system comprising a plurality of columns which are disposed in an array for simultaneously exposing a substrate, each column having an optical axis and comprising: a beamlet generating arrangement comprising at least one multi-aperture plate for generating a pattern of multiple beamlets of charged particles, and an electrostatic lens arrangement comprising at least one electrode element; the at least one electrode element having an aperture defined by an inner peripheral edge facing the optical axis, the aperture having a center and a predetermined shape in a plane orthogonal to the optical axis; wherein in at least one of the plurality of columns, the predetermined shape of the aperture is a non-circular shape with at least one of a protrusion and an indentation from an ideal circle about the center of the aperture.
摘要翻译：多子束多列粒子光学系统技术领域本发明涉及一种多子束多列粒子光学系统，该多子束多列粒子光学系统包括多个列，其被布置成阵列以同时暴露衬底，每个列具有光轴，并且包括：子束产生装置，其包括至少一个用于产生多个带电粒子束的图案的多孔板，以及包括至少一个电极元件的静电透镜装置; 所述至少一个电极元件具有由面向光轴的内周边缘限定的孔，所述孔在与所述光轴正交的平面中具有中心和预定形状; 其中在所述多个列中的至少一个列中，所述孔的预定形状是非圆形形状，其具有围绕所述孔的中心的来自理想圆的突起和凹陷中的至少一个。

8. 发明申请

US20080258084A1 Charged-Particle Exposure Apparatus 有权
标题翻译：带电粒子曝光装置
公开(公告)号：US20080258084A1
公开(公告)日：2008-10-23
申请号：US11816353
申请日：2006-02-16
申请人： Elmar Platzgummer , Stefan Cernusca , Gerhard Stengl
发明人： Elmar Platzgummer , Stefan Cernusca , Gerhard Stengl
IPC分类号： G21K5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3175 , H01J2237/31788 , H01J2237/31793
摘要： A particle-beam projection processing apparatus for irradiating a target, with an illumination system for forming a wide-area illuminating beam of energetic electrically charged particles; a pattern definition means for positioning an aperture pattern in the path of the illuminating beam; and a projection system for projecting the beam thus patterned onto a target to be positioned after the projection system. A foil located across the path of the patterned beam is positioned between the pattern definition means and the position of the target at a location close to an image of the aperture pattern formed by the projection system.
摘要翻译：一种用于照射目标的粒子束投影处理装置，具有用于形成能量带电粒子的广域照明光束的照明系统; 用于将光圈图案定位在照明光束的路径中的图案定义装置; 以及投影系统，用于将如此图案化的光束投影到待投影系统上的待定位的靶上。位于图案化光束的路径上的箔位于图案定义装置之间并且位于靠近由投影系统形成的孔径图案的图像的位置处的目标的位置。

9. 发明申请

US20070125956A1 Particle-optical projection system 有权
标题翻译：粒子投影系统
公开(公告)号：US20070125956A1
公开(公告)日：2007-06-07
申请号：US11700468
申请日：2007-01-31
申请人： Herbert Buschbeck , Gertraud Lammer , Alfred Chalupka , Robert Nowak , Elmar Platzgummer , Gerhard Stengl
发明人： Herbert Buschbeck , Gertraud Lammer , Alfred Chalupka , Robert Nowak , Elmar Platzgummer , Gerhard Stengl
IPC分类号： H01J3/14 , G21K1/08
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/21 , H01J37/304 , H01J2237/024 , H01J2237/10 , H01J2237/216 , H01J2237/30455
摘要： In a particle-optical projection system a pattern is imaged onto a target by means of energetic electrically charged particles. The pattern is represented in a patterned beam of said charged particles emerging from the object plane through at least one cross-over; it is imaged into an image with a given size and distortion. To compensate for the Z-deviation of the image position from the actual positioning of the target (Z denotes an axial coordinate substantially parallel to the optical axis), without changing the size of the image, the system includes a position detector for measuring the Z-position of several locations of the target, and a controller for calculating modifications of selected lens parameters of the final particle-optical lens and controlling said lens parameters according to said modifications.
摘要翻译：在粒子光学投影系统中，通过能量带电粒子将图案成像到靶上。所述图案表示在所述带电粒子的图案化束中，所述带电粒子通过至少一个交叉从对象平面出射; 它被成像为具有给定尺寸和失真的图像。为了补偿图像位置的Z偏差与目标的实际定位（Z表示基本上平行于光轴的轴向坐标），而不改变图像的尺寸，系统包括用于测量Z的位置检测器 - 位置，以及用于计算最终粒子 - 光学透镜的所选透镜参数的修改并根据所述修改来控制所述透镜参数的控制器。

10. 发明授权

US08368030B2 Charged particle beam exposure system and beam manipulating arrangement 有权
公开(公告)号：US08368030B2
公开(公告)日：2013-02-05
申请号：US11988922
申请日：2006-07-20
申请人： Elmar Platzgummer , Gerhard Stengl
发明人： Elmar Platzgummer , Gerhard Stengl
IPC分类号： G21K5/04
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/0435
摘要： A beam manipulating arrangement for a multi beam application using charged particles comprises a multi-aperture plate having plural apertures traversed by beams of charged particles. A frame portion of the multi-aperture plate is heated to reduce temperature gradients within the multi-aperture plate. Further, a heat emissivity of a surface of the multi-aperture plate may be higher in some regions as compared to other regions in view of also reducing temperature gradients.

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