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    • 10. 发明授权
    • Apparatus and method for inspecting a mask
    • 用于检查面罩的装置和方法
    • US4958074A
    • 1990-09-18
    • US218822
    • 1988-07-13
    • Edward WolfErnst HammelChristian Traher
    • Edward WolfErnst HammelChristian Traher
    • H05G1/00G01N23/225G03F1/20G03F1/22G03F1/86H01L21/027
    • G03F1/86G03F1/20G03F1/22
    • An apparatus and method for inspecting X-ray and corpuscular beam, e.g., electron or ion beam, lithography masks for defects. The apparatus includes a stage to support the mask in the path of a corpuscular inspection beam projected from a beam source above the stage, an emitter surface below the stage for emitting secondary radiation resulting from the impingement of the inspection beam that has passed through the mask onto the emitter surface, a detector arranged to receive the secondary radiation to generate image signals corresponding to this secondary radiation, and an image storage device to receive and store the image signals. The stage is moved in a stepwise fashion to bring individual mask fields that can be scanned by the beam in a single step into the beam path until all of the fields of a given mask have been scanned. The image signal of the actual mask is compared to a stored reference to detect defects which may also be repaired by the same apparatus according to preferred embodiments.
    • 用于检查X射线和粒子束的设备和方法,例如电子或离子束,用于缺陷的光刻掩模。 该装置包括一个台架,用于在从舞台上方的光束源投影的粒子检查光束的路径中支撑掩模,在该台下方的发射器表面,用于发射由穿过掩模的检查光束的撞击而产生的二次辐射 发射器表面上的检测器,布置成接收次级辐射以产生对应于该次级辐射的图像信号的检测器,以及用于接收和存储图像信号的图像存储装置。 舞台以逐步的方式移动,以将可以由光束扫描的单个遮罩场一步进入光束路径,直到已经扫描给定掩码的所有场。 将实际掩模的图像信号与存储的参考值进行比较,以检测根据优选实施例也可由相同装置修复的缺陷。