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    • 3. 发明专利
    • Treatment method with trivalent chromium, additive for trivalent chromium liquid, and member obtained through the treatment method
    • 通过处理方法获得的TRIVALENT CHROMIUM,TRIVALAL CHROMIUM LIQUID的添加剂和成分的处理方法
    • JP2007239002A
    • 2007-09-20
    • JP2006061484
    • 2006-03-07
    • Kanagawa PrefectureKanagawaken Mekki Kogyo Kumiai神奈川県神奈川県メッキ工業組合
    • KURIHARA TOSHIROKAWAGUCHI AKIHIRO
    • C23C22/53C23F11/00
    • C23C2222/10
    • PROBLEM TO BE SOLVED: To extend the life of a chromadizing liquid by inhibiting an iron materia such as the inner surface of a pipel which has not been galvanized from dissolving into the chromadizing liquid, when a corrosion resistant film is formed with the use of the chromadizing liquid after a galvanization step, and consequently by decreasing an accumulation rate of dissolved impurities.
      SOLUTION: The chromadizing liquid to be used for chromadizing treatment includes an organic compound having a cyclic structure, and/or an organic compound having an unsaturated compound, a nitrogen compound, a hydroxyl group and a carboxyl group, previously dissolved therein as a corrosion inhibitor. The dissolved corrosion inhibitor shows an effect of being adsorbed onto a metal surface and inhibiting the iron material such as the inner surface of the pipe which is not plated from dissolving into the chromadizing liquid.
      COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:为了通过抑制未被镀锌的管道的内表面的铁材料溶解到镀铬液中来延长镀铬液的寿命,当形成耐腐蚀膜时 在镀锌步骤后使用镀铬液,因此通过降低溶解的杂质的堆积速率。 解决方案:用于染色处理的铬化液包括具有环状结构的有机化合物和/或具有不饱和化合物,氮化合物,羟基和羧基的有机化合物,其预先溶解在其中 腐蚀抑制剂。 溶解的腐蚀抑制剂表现出吸附在金属表面上的作用,并且抑制未被电镀的管的内表面的铁材料溶解在镀铬液中。 版权所有(C)2007,JPO&INPIT
    • 5. 发明专利
    • PUNGENCY ELECTRODE AND ITS MANUFACTURE
    • JPH1010077A
    • 1998-01-16
    • JP16256396
    • 1996-06-24
    • KANAGAWA PREFECTURE
    • KAWAGUCHI AKIHIRO
    • G01N33/02A23L27/00A23L27/10A23L27/18G01N27/327G01N27/416
    • PROBLEM TO BE SOLVED: To easily judge the kind of pungency component by covering a support medium surface with the precipitate of a pungency component or the component contained in a plant containing the pungency component to form a pungency electrode. SOLUTION: A support medium for pungency component used as electrode is manufactured by coating the side surface of a copper wire having, for example, a diameter of 0.8mm and a length of 150mm with enamel, polishing one end with an emery paper, dipping it in a nitric acid having a concentration of 50%, using this as cathode and platinum as anode to carry a current thereto at a voltage of dc 2V, washing the electrolyzed end part with pure water, and then dipping the end part in glycerin for 30 seconds. A solution containing a pungency component is prepared by, for example, dissolving 0.01g of aryl isothiocyanate to 0.5ml of ethyl alcohol, and adding sulfuric acid so as to have a fixed pH value to 1ml in total. The treated copper wire end part is dipped in the solution and used as anode, a platinum wire is used as cathode to carry dc 1mA thereto for 1 minute, the end part is dipped in glutaraldehyde for 30 seconds after washing, and the resulting support medium surface is washed with pure water to form a pungency electrode.
    • 6. 发明专利
    • METHOD AND DEVICE FOR EVALUATING METAL WASHING PROCESS
    • JPH07234196A
    • 1995-09-05
    • JP4982694
    • 1994-02-23
    • KANAGAWA PREFECTURE
    • MAKAINO SHINICHIKAWAGUCHI AKIHIROYAMAZAKI RYUICHIMORI OSAMI
    • G01N27/02
    • PURPOSE:To continuously measure the residual amount of deposits during washing of metal by counterposing two metal plates including a metal plate with a deposite having a different conductivity from that of a washing liquid and then feeding a sinusoidal wave AC at a specific frequency for measuring impedance. CONSTITUTION:A substance to be eliminated (for example oil) is filled inside a clearance 5 which is formed by adhering two metal plates 3 to both sides of a plate 4 of a nearly U-shaped insulation material and a measurement cell 7 where areas other than the clearance 5 and an entrance 5a are covered with an insulation material 6 is laid out inside a washing liquid 2 inside a washing device 1. Then, a high-frequency sinusoidal wave AC 12 is fed to the cell 7 and current flowing to an electrical circuit 11 and voltage between the metal plates 3 are obtained by a microcomputer 23, and then a resistance Rs (impedance of the cell 7) of the substance inside the clearance 5 is calculated by a high-speed Fourier Transformation, etc. Then, by referring to the relationship between the amount of substance inside the clearance 5 obtained in advance and the resistance Rs, the remaining amount of substance (oil) can be measured continuously during washing and the metal washing process can be evaluated continuously.
    • 8. 发明专利
    • METHOD FOR DILUTING SAMPLE SOLUTION
    • JPH04262230A
    • 1992-09-17
    • JP2242691
    • 1991-02-16
    • KANAGAWA PREFECTURE
    • KAWAGUCHI AKIHIRO
    • G01N1/10G01N35/08
    • PURPOSE:To obtain sample solutions having the different concentrations continuously by repeating the circulation in a circulating circuit, the mixing dilution with diluent liquid and the liquid transportation into a detector. CONSTITUTION:A circulating circuit 1 is made to communicate with a sample solution tank 2 by the switching of a selector valve 3. A constant amount of the sample solution is supplied into the circuit 1 by the operation of a circulating pump. The valve 3 is switched, and the tank 2 is closed. The solution S in the circuit 1 is circulated as the primary step. A liquid sending pump 7 sends diluent liquid D in a diluent liquid tank 6 into the circuit 1 through a confluence point A with the flow rate being controlled. The solution S and the diluent liquid D are mixed, and the diluted sample solution is obtained by the primary dilution. A part of the solution which is obtained by splitting B is sent into a detector 9. The remaining part is taken into the circuit 1 with a pump 5. The concentration of a part undergoes the primary detection 9, and the liquid is drained 11. The remaining part undergoes the secondary circulation in the circuit 1 and further undergoes the secondary dilution with the pump 7. Thus, the diluted sample solution whose concentration is lower than that of the solution diluted before is obtained. A part of the solution undergoes the secondary detection 9, and the remaining part is taken into the circuit 1. In this way, the dilution, detection and recirculation are repeated, and the mixed liquids whose concentrations become lower are sequentially obtained.