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1. 发明专利

JP2014115665A Resist composition and method for forming resist pattern 有权
标题翻译：用于形成电阻图案的耐蚀组合物和方法
公开(公告)号：JP2014115665A
公开(公告)日：2014-06-26
申请号：JP2014001274
申请日：2014-01-07
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： SESHIMO TAKEHIRO , UTSUMI YOSHIYUKI , KAWAKAMI AKINARI , HANEDA HIDEO , SHIMIZU HIROAKI , NAKAMURA TAKESHI
IPC分类号： G03F7/004 , C07D327/04 , C08F2/50 , C08F220/10 , C08F220/28 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0045 , C07D327/02 , C07D327/04 , C07D497/08 , C08K5/36 , C08K5/42 , G03F7/0046 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： PROBLEM TO BE SOLVED: To provide a novel compound useful as an acid generator for a resist composition, a compound useful as a precursor of the above compound, an acid generator, a resist composition, and a method for forming a resist pattern.SOLUTION: A compound expressed by a general formula (I), and a compound expressed by a general formula (b1-1) are disclosed. In the formulae, Qrepresents a divalent linkage group or a single bond; Yrepresents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; X represents a cyclic group having 3 to 30 carbon atoms which may have a substituent, and has a -SO- bond in the cyclic structure thereof; Mrepresents an alkali metal ion; and Arepresents an organic cation.
摘要翻译：要解决的问题：提供可用作抗蚀剂组合物的酸发生剂的新化合物，可用作上述化合物的前体的化合物，酸产生剂，抗蚀剂组合物和形成抗蚀剂图案的方法。解决方案：公开了由通式（I）表示的化合物和由通式（b1-1）表示的化合物。在该式中，Q表示二价连接基团或单键; Y表示可以具有取代基的亚烷基或可以具有取代基的氟化亚烷基; X表示可以具有取代基的具有3〜30个碳原子的环状基团，并且在其环状结构中具有-SO-键; M表示碱金属离子; 并表示有机阳离子。

2. 发明专利

JP2011162796A Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method 有权
标题翻译：聚合物化合物，包括聚合物化合物的光电组合物和耐蚀图案形成方法
公开(公告)号：JP2011162796A
公开(公告)日：2011-08-25
申请号：JP2011111661
申请日：2011-05-18
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： OGATA HISAYUKI , MATSUMARU SHOGO , KINOSHITA YOHEI , HANEDA HIDEO , SHIONO HIROHISA , SHIMIZU HIROAKI , KUBOTA NAOTAKA
IPC分类号： C08F220/10 , G03F7/039
摘要： PROBLEM TO BE SOLVED: To provide a polymer compound which can constitute a photoresist composition having an excellent resolution, forming a fine pattern with a good rectangularity, obtaining favorable resist characteristics even when acid strength of an acid generated from an acid generator is weak, and having favorable sensitivity, the photoresist composition using the polymer compound and a resist pattern formation method using the photoresist composition. SOLUTION: The polymer compound having alkali solubility changeable by the action of acid and contains a structural unit (a1) derived from a compound expressed by general formula (2) (in the formula, R 1 expresses a ≤20C aliphatic cyclic group, (n) expresses integers of 0 or 1-5, R 2 expresses hydrogen atom, fluorine atom or a ≤20C lower alkyl group or a ≤20C fluorinated lower alkyl group) and a structural unit (a3) derived from (meth)acrylic ester containing a lactone-containing single ring or polycyclic group. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：待解决的问题：为了提供可以构成具有优异分辨率的光致抗蚀剂组合物的高分子化合物，形成具有良好矩形性的精细图案，即使当由酸产生剂产生的酸的酸强度为弱，并且具有良好的灵敏度，使用高分子化合物的光致抗蚀剂组合物和使用光致抗蚀剂组合物的抗蚀剂图案形成方法。解决方案：具有碱溶解性的高分子化合物可以通过酸的作用而变化，并含有由通式（2）表示的化合物（式中，R 1 ）表示的结构单元（a1）表示≤20C脂族环状基团，（n）表示0或1-5的整数，R 2表示氢原子，氟原子或≤20C低级烷基或≤20C氟化低级烷基）和衍生自含有内酯单环或多环基团的（甲基）丙烯酸酯的结构单元（a3）。版权所有（C）2011，JPO＆INPIT

3. 发明专利

JP2011043749A Positive resist composition, resist pattern forming method and polymeric compound 有权
标题翻译：阳极电阻组合物，电阻形成方法和聚合物
公开(公告)号：JP2011043749A
公开(公告)日：2011-03-03
申请号：JP2009193155
申请日：2009-08-24
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： KOMURO YOSHITAKA , UTSUMI YOSHIYUKI , HANEDA HIDEO , IWASHITA ATSUSHI
IPC分类号： G03F7/039 , C08F212/08 , C08F220/30 , G03F7/004 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a polymeric compound useful for a positive resist composition, a positive resist composition including the polymeric compound, and a resist pattern-forming method using the positive resist composition. SOLUTION: The positive resist composition contains: a polymeric compound (A1) having a structural unit represented by general formula (a0-1) as a base component (A) whose solubility in an alkali developer increases by the action of an acid; and an acid generator component (B) which generates an acid upon exposure. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种可用于正性抗蚀剂组合物的聚合物，包含该聚合物的正性抗蚀剂组合物和使用该正性抗蚀剂组合物的抗蚀剂图案形成方法。解决方案：正型抗蚀剂组合物包含：具有由通式（a0-1）表示的结构单元作为基础组分（A）的聚合物（A1），其在碱显影剂中的溶解度通过酸的作用而增加 ; 和在曝光时产生酸的酸发生剂组分（B）。版权所有（C）2011，JPO＆INPIT

4. 发明专利

JP2010164980A Process for producing photoresist composition, filter, and coater 有权
标题翻译：生产光催化剂组合物，过滤器和涂料的方法
公开(公告)号：JP2010164980A
公开(公告)日：2010-07-29
申请号：JP2010030646
申请日：2010-02-15
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： MUROI MASAAKI , OZAKI HIROKAZU , IWAI TAKESHI , HANEDA HIDEO , TOMITA HIROAKI , SHIMAZAKI MASAAKI
IPC分类号： G03F7/26 , B01D61/14 , B01D61/58 , B01D71/26 , B01D71/36 , B01D71/56 , C08F20/18 , G03F7/039 , G03F7/16 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a technique to acquire a photoresist composition which can reduce occurrence of defects of a resist pattern after development, has excellent foreign-matter aging characteristics (storage stability), and preferably reduces the change of sensitivity and resist pattern size before and after treatment almost completely. SOLUTION: A process for producing such a photoresist composition includes a step of passing a photoresist composition containing a resin component (A), an acid generator component (B) for generating an acid under exposure, and an organic solvent (C) through a first filter 2a equipped with a first membrane having a critical surface tension of ≥70 dyne/cm, and a step of passing the photoresist composition through a second filter 4a equipped with a second membrane made of a polyolefin resin or a fluorocarbon resin before and/or after the step of passing through the first filter 2a. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：解决问题：为了提供一种能够减少显影后抗蚀剂图案的缺陷发生的光致抗蚀剂组合物的技术，具有优异的异物老化特性（保存稳定性），优选降低灵敏度的变化，抗蚀剂图案大小前后几乎完全完成。解决方案：制备这种光致抗蚀剂组合物的方法包括使含有树脂组分（A）的光致抗蚀剂组合物，用于产生暴露酸的酸产生剂组分（B）和有机溶剂（C）的步骤，通过装备有临界表面张力≥70达因/厘米的第一膜的第一过滤器2a和使光致抗蚀剂组合物通过装备有由聚烯烃树脂或氟碳树脂制成的第二膜的第二过滤器4a的步骤和/或在通过第一过滤器2a的步骤之后。版权所有（C）2010，JPO＆INPIT

5. 发明专利

JP2010066772A Positive resist composition 有权
标题翻译：积极抵抗组成
公开(公告)号：JP2010066772A
公开(公告)日：2010-03-25
申请号：JP2009239779
申请日：2009-10-16
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： HIRAYAMA HIROSHI , HANEDA HIDEO , FUJIMURA SATOSHI , IWAI TAKESHI , SATO MITSURU , TAKASU RYOICHI , TACHIKAWA TOSHIKAZU , IWASHITA ATSUSHI , ISHIZUKA KEITA , YAMADA TOMOTAKA , TAKAYAMA JUICHI , YOSHIDA MASAAKI
IPC分类号： G03F7/039 , G03F7/26 , C08F220/18 , G03F7/038 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist composition which is stable relative to solvents used in immersion lithography processes and displays excellent sensitivity and resist pattern profile, and a method of forming a resist pattern that uses such a resist composition. SOLUTION: The resist composition is a positive resist composition comprising a resin component (A) which displays increased alkali solubility under the action of an acid, an acid generator component (B) which generates an acid upon exposure, an organic solvent (C) which dissolves the components (A) and (B), and a nitrogen-containing organic compound (D), wherein the resin component (A) has (a1) a constituent unit derived from a (meth)acrylate ester having an acid dissociable, dissolution inhibiting group, (a2) a constituent unit derived from a (meth)acrylate ester having a lactone unit, and (a4) a constituent unit derived from a (meth)acrylate ester having a polycyclic group, but has (a0) (a0-1) no constituent unit containing an anhydride of a dicarboxylic acid and (a0-2) no constituent unit containing a phenolic hydroxyl group. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种相对于在浸没式光刻工艺中使用的溶剂是稳定的并且显示出优异的灵敏度和抗蚀剂图案轮廓的抗蚀剂组合物，以及形成使用这种抗蚀剂组合物的抗蚀剂图案的方法。抗蚀剂组合物是一种正型抗蚀剂组合物，其包含在酸的作用下显示增加的碱溶性的树脂组分（A），暴露时产生酸的酸产生剂组分（B），有机溶剂（（A）和（B）的组分单元和含有有机化合物（D）的含氮有机化合物（D），其中树脂组分（A）具有（a1）衍生自具有酸的（甲基）丙烯酸酯的结构单元（a2）衍生自具有内酯单元的（甲基）丙烯酸酯的结构单元，和（a4）衍生自具有多环基的（甲基）丙烯酸酯，但具有（a0）（a0-1）不含有二羧酸的酸酐的组成单元和（a0-2）不含酚羟基的构成单元。版权所有（C）2010，JPO＆INPIT

6. 发明专利

JP2009244859A Resist composition and method of forming resist pattern 有权
标题翻译：耐蚀组合物和形成耐力图案的方法
公开(公告)号：JP2009244859A
公开(公告)日：2009-10-22
申请号：JP2009046064
申请日：2009-02-27
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： SHIMIZU HIROAKI , YOSHII YASUHIRO , UTSUMI YOSHIYUKI , HANEDA HIDEO
IPC分类号： G03F7/004 , C08F220/18 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： PROBLEM TO BE SOLVED: To provide a resist composition and a method of forming a resist pattern, capable of forming a resist pattern having a satisfactory shape, and exhibiting excellent lithographic characteristics. SOLUTION: The resist composition includes a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid, and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1): X-Q 1 -Y 1 -SO 3 - A + (wherein Q 1 represents a divalent linkage group containing an oxygen atom; Y 1 represents a 1-4C fluorinated alkylene group which may have a substituent, with the proviso that the carbon atom adjacent to the sulfur atom within the -SO 3 - group has a fluorine atom bonded thereto; X represents a 3-30C hydrocarbon group which may have a substituent; and A + represents an organic cation). The resist composition further includes an organic compound (C) which generates an acid exhibiting a weaker acid strength than the acid generated from the acid generator (B1) upon exposure. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供能够形成具有令人满意的形状并具有优异的光刻特性的抗蚀剂图案的抗蚀剂组合物和形成抗蚀剂图案的方法。解决方案：抗蚀剂组合物包括在酸的作用下在碱性显影液中表现出改变的溶解度的基础组分（A）和暴露时产生酸的酸产生剂组分（B），酸产生剂组分 B）包括由通式（b1）表示的化合物组成的酸产生剂（B1）：XQ 1 -Y 1 - A + （其中Q 1 表示含有氧原子的二价连接基团; Y 1表示1 可以具有取代基的-4C氟化亚烷基，条件是与-SO 3 - 中的硫原子相邻的碳原子与其键合的氟原子 ; X表示可具有取代基的3-30C烃基; A

7. 发明专利

JP2009193036A Resist composition and a method of forming a resist pattern 有权
标题翻译：电阻组合和电阻形成方法
公开(公告)号：JP2009193036A
公开(公告)日：2009-08-27
申请号：JP2008036733
申请日：2008-02-18
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： SESHIMO TAKEHIRO , UTSUMI YOSHIYUKI , KAWAKAMI AKINARI , HANEDA HIDEO
IPC分类号： G03F7/039 , G03F7/004 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist composition which suppresses variation in optimum exposure energy in the formation of a predetermined resist pattern due to the influence of elapsed time, and a resist pattern forming method using the same. SOLUTION: The resist composition comprises a base component (A) whose solubility in an alkali developer changes by the action of an acid, an acid generator component (B) comprising a compound (B1) represented by general formula (b1-1) (wherein Q 1 is a divalent linking group containing an ester bond; Y 1 is a 1-4C alkylene group or fluorinated alkylene group; X is a 3-30C hydrocarbon group; and A + is an organic cation), and a nitrogen-containing organic compound (D1) prepared by substituting at least one hydrogen atom of ammonia NH 3 by -R 1 -O-R 2 (wherein R 1 is a 1-10C alkylene group; and R 2 is a 1-10C alkyl group which may have a carbonyl group, an ester bond or an ether bond). COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：解决的问题：提供抑制由于经过时间的影响而形成预定抗蚀剂图案的最佳曝光能量的变化的抗蚀剂组合物和使用其的抗蚀剂图案形成方法。解决方案：抗蚀剂组合物包含其在碱性显影剂中的溶解度由酸的作用而变化的碱性组分（A），包含通式（b1-1）表示的化合物（B1）的酸产生剂组分（B））（其中Q 1 是含有酯键的二价连接基团; Y 1是1-4C亚烷基或氟化亚烷基; X是3-30C烃基团; A + 是有机阳离子）和通过用NH取代氨基NH 3的至少一个氢原子制备的含氮有机化合物（D1）-R （其中R 1 是1-10C亚烷基; R 2 是1 可以具有羰基，酯键或醚键的-10C烷基）。版权所有（C）2009，JPO＆INPIT

8. 发明专利

JP2009167156A New compound and its production method, acid-generating agent, resist composition and resist pattern-forming method 有权
标题翻译：新化合物及其生产方法，生产剂，耐蚀组合物和抗蚀剂图案形成方法
公开(公告)号：JP2009167156A
公开(公告)日：2009-07-30
申请号：JP2008056880
申请日：2008-03-06
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： HANEDA HIDEO , UTSUMI YOSHIYUKI , ISHIZUKA KEITA , MATSUZAWA KENSUKE , KANEKO FUMITAKE , OSHITA KYOKO , SHIMIZU HIROAKI , YOSHII YASUHIRO
IPC分类号： C07C309/17 , C07C381/12 , C07D333/46 , G03F7/004 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a new compound useful as an acid-generating agent for a resist composition, its production method, an acid-generating agent, a resist composition and a resist pattern-forming method. SOLUTION: The resist composition comprises a base material component (A) which changes solubility in an alkaline developing liquid by an action of an acid and an acid-generating agent component (B) generating an acid on exposure to light, where the acid-generating agent component (B) comprises an acid-generating agent (B1) composed of a compound represented by general formula (b1-1). In the formula, R X is an aliphatic group optionally bearing a substituent group (provided that a nitrogen atom is excluded); R 1 is an alkylene group; Y 1 is an alkylene or fluorinated alkylene group having 1-4 carbon atoms; and Z + is an organic cation (provided that an ion represented by general formula (w-1) is excluded). COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供可用作抗蚀剂组合物的酸发生剂的新化合物，其制备方法，酸产生剂，抗蚀剂组合物和抗蚀剂图案形成方法。抗蚀剂组合物包含通过酸和在曝光时产生酸的酸产生剂组分（B）的作用改变在碱性显影液中的溶解性的基材成分（A），其中酸产生剂组分（B）包含由通式（b1-1）表示的化合物组成的酸发生剂（B1）。在该式中，R X 是任选带有取代基的脂族基团（条件是排除氮原子）; R SP 1是亚烷基; Y 1是具有1-4个碳原子的亚烷基或氟化亚烷基; Z + 是有机阳离子（排除由通式（w-1）表示的离子）。版权所有（C）2009，JPO＆INPIT

9. 发明专利

JP2008290947A Compound, acid generator, resist composition, and method of forming resist pattern 有权
标题翻译：化合物，酸生成剂，抗蚀剂组合物和形成耐火图案的方法
公开(公告)号：JP2008290947A
公开(公告)日：2008-12-04
申请号：JP2007135427
申请日：2007-05-22
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： IWAI TAKESHI , HANEDA HIDEO , ISHIZUKA KEITA , KAWAKAMI AKINARI , SHIMIZU HIROAKI , OSHITA KYOKO , NAKAMURA TAKESHI , HIRAHARA KOMEI , SUZUKI YUICHI
IPC分类号： C07D333/76 , C09K3/00 , G03F7/004 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a compound suitable as an acid generator for a resist composition, the acid generator comprising the compound, the resist composition containing the acid generator and a method for forming a resist pattern by using the resist composition. SOLUTION: The compound is represented by general formula (b1-9) [wherein R 41 to R 43 are each independently a halogen atom, a halogenated alkyl group, an alkyl group, an acetyl group, an alkoxy group, a carboxy group or a hydroxyalkyl group; R 402 and R 403 are each independently an alkyl group or a halogenated alkyl group; R 404 is an alkyl group or a halogenated alkyl group; R 403 and R 404 may be bonded to each other to form a ring structure; n 0 is an integer of 1-3; n 1 to n 3 are each independently an integer of 0-3; with the proviso that n 0 +n 1 is ≤5; and X - is an anion]. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了提供适合作为抗蚀剂组合物的酸发生剂的化合物，包含该化合物的酸产生剂，含有酸产生剂的抗蚀剂组合物和通过使用抗蚀剂组合物形成抗蚀剂图案的方法。解决方案：该化合物由通式（b1-9）表示[其中R 41和R 34各自独立地为卤素原子，卤代烷基，烷基，乙酰基，烷氧基，羧基或羟烷基; R＆lt; SP＆gt; 402＆lt; SP＆gt; 403＆lt; SP＆gt;各自独立地为烷基或卤代烷基; R 404是烷基或卤代烷基; R 403 和R 404 可以彼此键合以形成环结构; 0 是1-3的整数; n 1 至n 3 各自独立地为0-3的整数; 条件是n 0 + n 1 ≤5; 并且X - 是阴离子]。版权所有（C）2009，JPO＆INPIT

10. 发明专利

JP2008275942A Resist composition and resist pattern forming method 有权
标题翻译：电阻组合和电阻形成方法
公开(公告)号：JP2008275942A
公开(公告)日：2008-11-13
申请号：JP2007120244
申请日：2007-04-27
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： KAWAKAMI AKINARI , UCHIUMI YOSHIYUKI , HANEDA HIDEO
IPC分类号： G03F7/039 , G03F7/004 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a new resist composition and a new resist pattern forming method. SOLUTION: The resist composition comprises a base material component (A) of which the solubility in an alkali developer changes by the action of an acid, and an acid generator component (B) which generates an acid upon exposure, wherein the acid generator component (B) comprises a compound (I) represented by general formula (I), wherein R 1 is an organic group other than a (meth)acryloyl group; R 2 is an alkylene group or a fluorinated alkylene group; R 3 is a substituted or unsubstituted aryl group; and R 4 is a halogenated alkyl group. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供新的抗蚀剂组合物和新的抗蚀剂图案形成方法。解决方案：抗蚀剂组合物包含其中在碱性显影剂中的溶解度随着酸的作用而变化的基材组分（A）和暴露时产生酸的酸产生剂组分（B），其中酸发生剂组分（B）包含由通式（I）表示的化合物（I），其中R 1是（甲基）丙烯酰基以外的有机基团; R 2是亚烷基或氟化亚烷基; R 3是取代或未取代的芳基; R 4是卤代烷基。版权所有（C）2009，JPO＆INPIT

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