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    • 13. 发明授权
    • Light emitting device and methods for forming the same
    • 发光装置及其形成方法
    • US08659045B2
    • 2014-02-25
    • US11848458
    • 2007-08-31
    • Tzong-Liang TsaiYu-Chu LiChiung-Chi Tsai
    • Tzong-Liang TsaiYu-Chu LiChiung-Chi Tsai
    • H01L33/00
    • H01L33/62H01L33/14H01L33/22H01L33/32H01L33/42H01L2924/0002H01L2924/00
    • The present invention provides a light emitting device, which includes a transparent substrate, an epitaxial stack structure having a first portion and a second portion on the transparent substrate, a II/V group compound contact layer on the first portion of the epitaxial stack structure, a nitride-crystallized layer on the II/V group compound contact layer, a transparent conductive layer covering the nitride-crystallized layer, a first electrode on a portion of the transparent conductive layer, and a second electrode on the second portion of the epitaxial stack structure and structurally separated from the structure on the first portion of the epitaxial stack structure. The nitride-crystallized layer may help increase the external quantum efficiency of the light emitting device, thereby the light emitting efficiency of the light emitting device may also be improved.
    • 本发明提供了一种发光器件,其包括透明衬底,在透明衬底上具有第一部分和第二部分的外延堆叠结构,在外延堆叠结构的第一部分上的II / V族化合物接触层, II / V族化合物接触层上的氮化物结晶层,覆盖氮化物结晶层的透明导电层,透明导电层的一部分上的第一电极和外延层的第二部分上的第二电极 结构和结构上与外延堆叠结构的第一部分上的结构分离。 氮化物结晶层可以有助于增加发光器件的外部量子效率,从而也可以提高发光器件的发光效率。
    • 15. 发明授权
    • Light emitting diode structure
    • 发光二极管结构
    • US07737453B2
    • 2010-06-15
    • US11744226
    • 2007-05-04
    • Tzong-Liang TsaiChi-Shen LeeTing-Kai Huang
    • Tzong-Liang TsaiChi-Shen LeeTing-Kai Huang
    • H01L29/205
    • H01L33/14H01L29/2003H01L33/02H01L33/32
    • Disclosed is a light emitting diode structure including a Constructive Oxide Contact Structure contact layer. The light emitting diode structure comprises a substrate, a buffer layer formed on the substrate, a lower confinement layer formed on the buffer layer, a light emitting layer formed on the lower confinement layer, an upper confinement layer formed on the light emitting layer, a Constructive Oxide Contact Structure contact layer formed on the upper confinement layer whose conducting type can be P-type, N-type, or I-type, a first electrode, and a second electrode (transparent electrode). The transparent electrode is formed on the Constructive Oxide Contact Structure contact layer as an anode of the light emitting diode. The first electrode is formed on the lower confinement layer and is spaced apart from the light emitting layer, the upper confinement layer, the contact layer, and the transparent electrode. The first electrode is used as a cathode of the light emitting diode.
    • 公开了包括构造氧化物接触结构接触层的发光二极管结构。 发光二极管结构包括衬底,形成在衬底上的缓冲层,形成在缓冲层上的下限制层,形成在下限制层上的发光层,形成在发光层上的上约束层, 形成在导电型可以是P型,N型或I型的上部限制层上的构造性氧化物接触结构接触层,第一电极和第二电极(透明电极)。 透明电极形成在作为发光二极管的阳极的构造氧化物接触结构接触层上。 第一电极形成在下限制层上并与发光层,上约束层,接触层和透明电极间隔开。 第一电极用作发光二极管的阴极。
    • 16. 发明申请
    • WAFER CARRIER AND EPITAXY MACHINE USING THE SAME
    • 使用它的波浪载体和外延机
    • US20100101496A1
    • 2010-04-29
    • US12648849
    • 2009-12-29
    • CHIH CHING CHENGTZONG-LIANG TSAI
    • CHIH CHING CHENGTZONG-LIANG TSAI
    • C23C16/00
    • C23C16/4585C30B25/12
    • A wafer carrier comprises a base and a shielding plate positioned on the top surface of the base in a disassembled manner. The top surface of the base is configured to retain a plurality of wafers, and the shielding plate has a plurality of openings exposing the wafers. In particular, the shielding plate shields one portion of the base other than the other portions occupied by the wafers to prevent the reaction gases from conducting the chemical reaction to generate the reactant directly on the surface of the base. Consequently, the base is isolated from the chemical reaction, and it is not necessary to replace the base before conducting the next fabrication process or to clean the reactants on the surface of the base by thermal baking or etching.
    • 晶片载体包括基部和屏蔽板,其以拆卸的方式定位在基部的顶表面上。 基座的顶表面构造成保持多个晶片,并且屏蔽板具有暴露晶片的多个开口。 特别地,屏蔽板屏蔽除了晶片占据的其它部分之外的基底的一部分,以防止反应气体进行化学反应,直接在基底的表面上产生反应物。 因此,基底与化学反应隔离,在进行下一个制造工艺之前不需要更换基底,也不需要通过热烘烤或蚀刻来清洁基底表面上的反应物。
    • 19. 发明申请
    • Optoelectronic device
    • 光电器件
    • US20090008626A1
    • 2009-01-08
    • US12000610
    • 2007-12-14
    • Tzong-Liang TsaiYu-Chu Li
    • Tzong-Liang TsaiYu-Chu Li
    • H01L29/06H01L33/00
    • H01L33/24H01L33/007H01L33/02H01L33/26
    • The present invention provides an optoelectronic device which includes a first electrode, a substrate on the first electrode; a buffer layer on the substrate, in which the buffer layer includes a first gallium nitride based compound layer on the substrate, a second gallium nitride based compound layer, and a II-V group compound layer between the first gallium nitride based compound layer and the second gallium nitride based compound layer; a first semiconductor conductive layer on the buffer layer; an active layer on the first semiconductor conductive layer, in which the active layer is an uneven Multi-Quantum Well; a semiconductor conductive layer on the active layer; a transparent layer on the second semiconductor conductive layer; and a second electrode on the transparent layer.
    • 本发明提供一种光电器件,其包括第一电极,第一电极上的衬底; 所述衬底上的缓冲层,其中所述缓冲层在所述衬底上包括第一氮化镓基化合物层,所述第二氮化镓基化合物层和所述第一氮化镓基化合物层和所述第一氮化镓基化合物层之间的II-V族化合物层 第二氮化镓基化合物层; 在缓冲层上的第一半导体导电层; 在第一半导体导电层上的有源层,其中有源层是不均匀的多量子阱; 有源层上的半导体导电层; 第二半导体层上的透明层; 和透明层上的第二电极。