会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明申请
    • LIGHT-EMITTING DIODE WITH HIGH LIGHTING EFFICIENCY
    • 具有高照明效率的发光二极管
    • US20100176408A1
    • 2010-07-15
    • US12421869
    • 2009-04-10
    • Su-Hui LINSheng-Hsien HsuJing-Jie DaiTzong Liang Tsai
    • Su-Hui LINSheng-Hsien HsuJing-Jie DaiTzong Liang Tsai
    • H01L33/00
    • H01L33/46H01L33/387H01L2933/0083
    • The invention discloses a light-emitting diode, including a substrate, a first conductive type semiconductor layer, a second conductive type semiconductor layer, a light-emitting layer and plural laminated structures. The first conductive type semiconductor layer, the light-emitting layer and the second conductive type semiconductor layer are formed on the substrate in sequence. The plural laminated structures are formed on the upper surface of the second conductive type semiconductor layer such that the upper surface is partially exposed. Each laminated structure consists of at least one first insulated layer with a high refractive index and at least one second insulated layer with a low refractive index, where the at least one first insulated layer and the at least one second insulated layer are alternately formed to obtain said each laminated structure. Thereby, light emitted from the light-emitting layer can be reflected by the laminated structures to enhance the light-extraction efficiency.
    • 本发明公开了一种发光二极管,包括基板,第一导电型半导体层,第二导电型半导体层,发光层和多层叠结构。 依次在基板上形成第一导电型半导体层,发光层和第二导电型半导体层。 在第二导电型半导体层的上表面上形成多个叠层结构,使得上表面部分露出。 每个层压结构由至少一个具有高折射率的第一绝缘层和至少一个具有低折射率的第二绝缘层组成,其中至少一个第一绝缘层和至少一个第二绝缘层交替地形成以获得 说每个层压结构。 由此,从发光层发出的光可以被叠层结构反射,以提高光提取效率。
    • 2. 发明授权
    • Semiconductor light-emitting device with high light-extraction efficiency and method for fabricating the same
    • 具有高光提取效率的半导体发光器件及其制造方法
    • US07745837B2
    • 2010-06-29
    • US12000064
    • 2007-12-07
    • Tzong-Liang Tsai
    • Tzong-Liang Tsai
    • H01L29/167
    • H01L33/10H01L33/02H01L33/22
    • The invention discloses a semiconductor light-emitting device and a method of fabricating the same. The semiconductor light-emitting device according to the invention includes a substrate, a first semiconductor material layer, a multi-layer structure and an ohmic electrode structure. The substrate has a first upper surface and a plurality of recesses formed on the first upper surface. The first semiconductor material layer is formed on the first upper surface of the substrate and has a second upper surface. The multi-layer structure is formed on the second upper surface of the first semiconductor material layer and includes a light-emitting region. The ohmic electrode structure is formed on the multi-layer structure. In particular, the first semiconductor material layer has a refractive index different from those of the substrate and a bottom-most layer of the multi-layer structure.
    • 本发明公开了一种半导体发光器件及其制造方法。 根据本发明的半导体发光器件包括衬底,第一半导体材料层,多层结构和欧姆电极结构。 基板具有形成在第一上表面上的第一上表面和多个凹部。 第一半导体材料层形成在基板的第一上表面上并具有第二上表面。 多层结构形成在第一半导体材料层的第二上表面上并且包括发光区域。 欧姆电极结构形成在多层结构上。 特别地,第一半导体材料层的折射率与基板和多层结构的最底层的折射率不同。
    • 4. 发明申请
    • WAFER CARRIER AND EPITAXY MACHINE USING THE SAME
    • 使用它的波浪载体和外延机
    • US20090308319A1
    • 2009-12-17
    • US12194013
    • 2008-08-19
    • CHIH CHING CHENGTZONG-LIANG TSAI
    • CHIH CHING CHENGTZONG-LIANG TSAI
    • C23C16/00
    • C23C16/4585C30B25/12
    • A wafer carrier comprises a base and a shielding plate positioned on the top surface of the base in a disassembled manner. The top surface of the base is configured to retain a plurality of wafers, and the shielding plate has a plurality of openings exposing the wafers. In particular, the shielding plate shields one portion of the base other than the other portions occupied by the wafers to prevent the reaction gases from conducting the chemical reaction to generate the reactant directly on the surface of the base. Consequently, the base is isolated from the chemical reaction, and it is not necessary to replace the base before conducting the next fabrication process or to clean the reactants on the surface of the base by thermal baking or etching.
    • 晶片载体包括以分解的方式定位在基座的顶表面上的基座和屏蔽板。 基座的顶表面构造成保持多个晶片,并且屏蔽板具有暴露晶片的多个开口。 特别地,屏蔽板屏蔽除了晶片占据的其它部分之外的基底的一部分,以防止反应气体进行化学反应,直接在基底的表面上产生反应物。 因此,基底与化学反应隔离,在进行下一个制造工艺之前不需要更换基底,也不需要通过热烘烤或蚀刻来清洁基底表面上的反应物。
    • 6. 发明申请
    • LIGHT OPTOELECTRONIC DEVICE AND FORMING METHOD THEREOF
    • 光电光学装置及其形成方法
    • US20090057694A1
    • 2009-03-05
    • US12061623
    • 2008-04-02
    • Tzong-Liang TSAI
    • Tzong-Liang TSAI
    • H01L33/00
    • H01L33/12H01L33/04H01L33/10H01L33/105H01L33/32
    • The present invention provides an optoelectronic device with an epi-stacked structure, which includes a substrate, a buffer layer that is formed on the substrate, in which the buffer layer includes a first nitrogen-containing compound layer, an II/V group compound layer is provided on the first nitrogen-containing compound layer, a second nitrogen-containing compound layer is provided on the II/V group compound layer, and a third nitrogen-containing compound layer is provided on the second nitrogen-containing compound layer, an epi-stacked stricture with a multi-layer structure is formed on the buffer layer, which includes a first semiconductor conductive layer is formed on the buffer layer, an active layer is formed on the first semiconductor conductive layer, a multi-layer structure is formed between the first semiconductor conductive layer and the active layer, and a second semiconductor conductive layer is formed on the active layer.
    • 本发明提供具有外延叠层结构的光电器件,其包括衬底,形成在衬底上的缓冲层,其中缓冲层包括第一含氮化合物层,II / V族化合物层 设置在第一含氮化合物层上,在II / V族化合物层上设置第二含氮化合物层,在第二含氮化合物层上设置第三含氮化合物层, 在缓冲层上形成具有多层结构的叠层结构,其包括在缓冲层上形成第一半导体导电层,在第一半导体导电层上形成有源层,在第一半导体层之间形成多层结构, 第一半导体导电层和有源层,以及在有源层上形成第二半导体导电层。
    • 8. 发明申请
    • Optoelectronic device
    • 光电器件
    • US20090008624A1
    • 2009-01-08
    • US11984062
    • 2007-11-13
    • Tzong-Liang TsaiYu-Chu Li
    • Tzong-Liang TsaiYu-Chu Li
    • H01L33/00
    • H01L33/12H01L21/0237H01L21/0242H01L21/02439H01L21/02458H01L21/02505H01L21/0254H01L33/24H01L33/32
    • The present invention provides an optoelectronic device, which includes a first electrode, a substrate on the first electrode, and a buffer layer on the substrate. The buffer layer further includes a first gallium nitride based compound layer on the substrate, a II-V group compound layer on the first gallium nitride based compound layer, a second gallium nitride based compound layer on the II-V group compound layer, and a third gallium nitride based compound layer on the second gallium nitride based compound layer. Then, a first semiconductor conductive layer is formed on the buffer layer; an active layer is formed on the first semiconductor conductive layer, in which the active layer is an uneven Multi-Quantum Well; a second semiconductor conductive layer on the active layer; a transparent conductive layer on the second semiconductor conductive layer; and a second electrode on the transparent conductive layer.
    • 本发明提供一种光电器件,其包括第一电极,第一电极上的衬底和衬底上的缓冲层。 缓冲层还包括在基板上的第一氮化镓基化合物层,第一氮化镓基化合物层上的II-V族化合物层,II-V族化合物层上的第二氮化镓基化合物层和 第二氮化镓基化合物层上的第三氮化镓基化合物层。 然后,在缓冲层上形成第一半导体导电层; 在第一半导体导电层上形成有源层,其中有源层是不均匀的多量子阱; 在所述有源层上的第二半导体导电层; 第二半导体层上的透明导电层; 和在透明导电层上的第二电极。
    • 10. 发明申请
    • Light emitting device and method for making the same
    • 发光装置及其制造方法
    • US20080277678A1
    • 2008-11-13
    • US11801155
    • 2007-05-08
    • Yu-Chu LiChiung-Chi TsaiTzong-Liang TsaiSu-Hui Lin
    • Yu-Chu LiChiung-Chi TsaiTzong-Liang TsaiSu-Hui Lin
    • H01L29/22H01L21/00H01L27/15
    • H01L33/22H01L33/38
    • A method for making a light emitting device includes: forming a multi-layer structure on a substrate; forming a patterned mask material on one side of the multi-layer structure such that the patterned mask material covers an etch region of the multi-layer structure; forming a roughened layer on the multi-layer structure; removing the patterned mask material from the multi-layer structure so as to expose the etch region of the multi-layer structure; forming an etch mask material on the roughened layer; dry etching the multi-layer structure at the exposed etch region so as to define an electrode-forming region on the first semiconductor layer that corresponds to the etch region of the multi-layer structure; and forming an electrode on the electrode-forming region of the first semiconductor layer.
    • 一种制造发光器件的方法包括:在衬底上形成多层结构; 在所述多层结构的一侧上形成图案化掩模材料,使得所述图案化掩模材料覆盖所述多层结构的蚀刻区域; 在多层结构上形成粗糙层; 从所述多层结构中去除所述图案化掩模材料,以暴露所述多层结构的蚀刻区域; 在粗糙层上形成蚀刻掩模材料; 在暴露的蚀刻区域干蚀刻多层结构,以便在对应于多层结构的蚀刻区域的第一半导体层上限定电极形成区域; 以及在所述第一半导体层的电极形成区上形成电极。