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11. 发明授权

US09305814B2 Method of inspecting substrate processing apparatus and storage medium storing inspection program for executing the method 有权
标题翻译：检查基板处理装置的方法和存储用于执行该方法的检查程序的存储介质
公开(公告)号：US09305814B2
公开(公告)日：2016-04-05
申请号：US11311549
申请日：2005-12-20
申请人： Masahiro Numakura
发明人： Masahiro Numakura
IPC分类号： H01L21/67 , H01L21/677
CPC分类号： H01L21/67276 , H01L21/67167 , H01L21/67253 , H01L21/67745 , H01L21/67778
摘要： A method of inspecting a substrate processing apparatus, which is capable of preventing product substrates from being supplied to a substrate processing chamber to be inspected, and inspecting the substrate processing chamber in desired timing. Product wafers W (product substrates) are inhibited from being conveyed into a processing unit to be inspected (substrate processing chamber) according to a selection of a menu option “QC MODE” by an operator, or in response to instruction from a host computer. A QC wafer is permitted to be conveyed from a carrier connected to an associated load port 24 into the processing unit to be inspected, in response to a notification the fact that a wafer stored in the carrier connected to the associated load port 24 is the QC wafer.
摘要翻译：检查基板处理装置的方法，该基板处理装置能够防止将产品基板供给到要检查的基板处理室，并且以期望的时刻检查基板处理室。根据操作者的菜单选项“QC MODE”的选择，或响应于来自主计算机的指示，抑制产品晶片W（产品基板）被输送到要检查的处理单元（基板处理室）中。响应于通知存储在与相关联的负载端口24连接的载体中的晶片为QC的事实，允许QC晶片从连接到相关联的负载端口24的载体传送到待检查的处理单元晶圆。

12. 发明授权

US08731698B2 Substrate receiving method and controller 有权
标题翻译：基板接收方式和控制器
公开(公告)号：US08731698B2
公开(公告)日：2014-05-20
申请号：US12762426
申请日：2010-04-19
申请人： Shinobu Onodera , Masahiro Numakura
发明人： Shinobu Onodera , Masahiro Numakura
IPC分类号： G06F17/00
CPC分类号： H01L21/67778 , H01L21/67069 , H01L21/67196 , H01L21/67213
摘要： A substrate receiving method in a substrate processing system includes: a processing process of transferring a plurality of unprocessed substrates accommodated in a first substrate storage container to a substrate processing chamber in sequence and performing a plasma process on the unprocessed substrates in the substrate processing chamber; a retreating process of retreating the plasma-processed substrates temporarily to a second substrate storage container by transferring the plasma-processed substrates to the second substrate storage container in sequence; a determining process of determining whether or not the last unprocessed substrate is unloaded from the first substrate storage container; and a re-accommodating process of transferring and re-accommodating the plurality of the processed substrates accommodated in the second substrate storage container into the first substrate storage container in sequence when a substrate decided as the last unprocessed substrate is unloaded in the determining process.
摘要翻译：衬底处理系统中的衬底接收方法包括：依次将容纳在第一衬底存储容器中的多个未处理衬底转移到衬底处理室的处理过程，并对衬底处理室中的未处理衬底执行等离子体处理; 通过将等离子体处理的基板顺序地转印到第二基板存储容器，将等离子体处理的基板暂时退回到第二基板存储容器的后退处理; 确定最后未处理的基板是否从第一基板存储容器卸载的确定过程; 以及当确定为最后未处理的基板的基板在所述确定过程中被卸载时，将容纳在所述第二基板存储容器中的所述多个处理过的基板顺序地转移和再容纳到所述第一基板存储容器中的再容纳处理。

13. 发明授权

US08452455B2 Control device and control method of plasma processing system, and storage medium storing control program 有权
标题翻译：等离子体处理系统的控制装置和控制方法以及存储控制程序的存储介质
公开(公告)号：US08452455B2
公开(公告)日：2013-05-28
申请号：US12496117
申请日：2009-07-01
申请人： Hiroaki Mochizuki , Masahiro Numakura
发明人： Hiroaki Mochizuki , Masahiro Numakura
IPC分类号： G05B24/04
CPC分类号： G05B19/41865 , Y02P90/20
摘要： In a control device of a plasma processing system, a communication unit is configured to receive processing information related to a carrier of a next processing lot. A determination unit is configured to determine whether the processing information received by the communication unit has pre-treatment information related to one of the plasma processing devices. When it is determined that the processing information has the pre-treatment information by the determination unit, a generation unit is configured to generate an object for declaring execution of the pre-treatment for the carrier of a next processing lot if a desired condition of transferring of the carrier is satisfied. In addition, if the object is generated by the generation unit, a process executing control unit is configured to start the pre-treatment for the target object in the carrier of a next processing lot without any notification that the carrier reaches a destination plasma processing device.
摘要翻译：在等离子体处理系统的控制装置中，通信单元被配置为接收与下一个处理批次的载体有关的处理信息。确定单元被配置为确定由通信单元接收的处理信息是否具有与等离子体处理设备之一相关的预处理信息。当确定处理信息具有确定单元的预处理信息时，生成单元被配置为产生用于宣告执行下一个处理批次的载体的预处理的对象，如果期望的转移条件的承运人满意。此外，如果对象由生成单元生成，则处理执行控制单元被配置为开始对下一个处理批次的载体中的目标对象的预处理，而不通知载体到达目的地等离子体处理装置。

14. 发明申请

US20100268364A1 SUBSTRATE RECEIVING METHOD AND CONTROLLER 有权
标题翻译：基板接收方法和控制器
公开(公告)号：US20100268364A1
公开(公告)日：2010-10-21
申请号：US12762426
申请日：2010-04-19
申请人： Shinobu Onodera , Masahiro Numakura
发明人： Shinobu Onodera , Masahiro Numakura
IPC分类号： G06F17/00
CPC分类号： H01L21/67778 , H01L21/67069 , H01L21/67196 , H01L21/67213
摘要： A substrate receiving method in a substrate processing system includes: a processing process of transferring a plurality of unprocessed substrates accommodated in a first substrate storage container to a substrate processing chamber in sequence and performing a plasma process on the unprocessed substrates in the substrate processing chamber; a retreating process of retreating the plasma-processed substrates temporarily to a second substrate storage container by transferring the plasma-processed substrates to the second substrate storage container in sequence; a determining process of determining whether or not the last unprocessed substrate is unloaded from the first substrate storage container; and a re-accommodating process of transferring and re-accommodating the plurality of the processed substrates accommodated in the second substrate storage container into the first substrate storage container in sequence when a substrate decided as the last unprocessed substrate is unloaded in the determining process.
摘要翻译：衬底处理系统中的衬底接收方法包括：依次将容纳在第一衬底存储容器中的多个未处理衬底转移到衬底处理室的处理过程，并对衬底处理室中的未处理衬底执行等离子体处理; 通过将等离子体处理的基板顺序地转印到第二基板存储容器，将等离子体处理的基板暂时退回到第二基板存储容器的后退处理; 确定最后未处理的基板是否从第一基板存储容器卸载的确定过程; 以及当确定为最后未处理的基板的基板在所述确定过程中被卸载时，将容纳在所述第二基板存储容器中的所述多个处理过的基板顺序地转移和再容纳到所述第一基板存储容器中的再容纳处理。

15. 发明申请

US20090269171A1 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE TRANSFER METHOD ADOPTED THEREIN 有权
标题翻译：基板处理装置和基板传输方法
公开(公告)号：US20090269171A1
公开(公告)日：2009-10-29
申请号：US12418869
申请日：2009-04-06
申请人： Kiyohito IIJIMA , Hiroaki Mochizuki , Masahiro Numakura
发明人： Kiyohito IIJIMA , Hiroaki Mochizuki , Masahiro Numakura
IPC分类号： H01L21/67
CPC分类号： H01L21/67748 , H01L21/67253 , H01L21/67754
摘要： As an interrupt start button is depressed while control, under which product wafers Wp and dummy wafers Wd are transferred in an order defined in a normal transfer pattern, is repeatedly executed, a decision is made based upon wafer transfer history as to whether or not the most recent transfer pattern cycle has ended. If the cycle is determined to have ended, the operation immediately proceeds to the subsequent cycle to transfer interrupt wafers Wf and Wd in an order defined in the interrupt transfer pattern achieved by replacing Wp in the normal transfer pattern with Wf, whereas if the cycle is determined to be incomplete, the wafer transfer based upon the normal transfer pattern is carried on until the cycle ends and then the operation proceeds to the next cycle to transfer Wf and Wd in the order defined in the interrupt transfer pattern.
摘要翻译：当按照正常传送模式中定义的顺序传送产品晶片Wp和虚拟晶片Wd的控制下按下中断启动按钮时，基于晶片传送历史来决定是否最近的转移模式周期已经结束。如果确定该周期已经结束，则操作立即进行到随后的周期，以按照以Wf代替正常转移模式中的Wp而实现的以中断转移模式中定义的顺序传送中断晶片Wf和Wd，而如果周期为确定为不完全，基于正常转移模式的晶片传送被继续进行，直到循环结束，然后操作进行到下一个周期，以按照中断传送模式中定义的顺序传送Wf和Wd。

16. 发明申请

US20080228311A1 SUBSTRATE PROCESSING APPARATUS, CONTROL METHOD FOR THE APPARATUS, AND PROGRAM FOR IMPLEMENTING THE METHOD 有权
标题翻译：基板处理装置，装置的控制方法和实现方法的程序
公开(公告)号：US20080228311A1
公开(公告)日：2008-09-18
申请号：US12125959
申请日：2008-05-23
申请人： Noriaki SHIMIZU , Masahiro Numakura
发明人： Noriaki SHIMIZU , Masahiro Numakura
IPC分类号： H01L21/02 , G06F19/00 , H01L21/677
CPC分类号： H01L21/67294 , H01L21/67276 , Y10S414/135
摘要： A substrate processing apparatus, according to which inspection of various devices in the substrate processing apparatus can be carried out with improved reliability, while reducing the burden on a user. A processing chamber processes semiconductor wafers therein. A transfer chamber transfers the semiconductor wafers. A FOUP (front opening unified pod) houses a plurality of dummy wafers for inspection of the processing chamber or the transfer chamber. A CPU causes an HDD (hard disk drive) to store a housing state relating to the arrangement of the dummy wafers in the FOUP before replacement of dummy wafers in the FOUP and that after the replacement as dummy wafer setup information.
摘要翻译：一种基板处理装置，根据该基板处理装置，可以在提高可靠性的同时进行基板处理装置中的各种装置的检查，同时减轻用户的负担。处理室在其中处理半导体晶片。传送室传送半导体晶片。 FOUP（前开口统一吊舱）容纳多个用于检查处理室或传送室的虚拟晶片。在更换FOUP中的虚拟晶片之前，CPU将硬盘（硬盘驱动器）存储与FOUP中的虚设晶片的布置相关的壳体状态，以及在替换之后的虚拟晶片设置信息。

17. 发明申请

US20060181699A1 Method of inspecting substrate processing apparatus and storage medium storing inspection program for executing the method 有权
标题翻译：检查基板处理装置的方法和存储用于执行该方法的检查程序的存储介质
公开(公告)号：US20060181699A1
公开(公告)日：2006-08-17
申请号：US11311549
申请日：2005-12-20
申请人： Masahiro Numakura
发明人： Masahiro Numakura
IPC分类号： G01N21/00
CPC分类号： H01L21/67276 , H01L21/67167 , H01L21/67253 , H01L21/67745 , H01L21/67778
摘要： A method of inspecting a substrate processing apparatus, which is capable of preventing product substrates from being supplied to a substrate processing chamber to be inspected, and inspecting the substrate processing chamber in desired timing. Product wafers W (product substrates) are inhibited from being conveyed into a processing unit to be inspected (substrate processing chamber) according to a selection of a menu option “QC MODE” by an operator, or in response to instruction from a host computer. A QC wafer is permitted to be conveyed from a carrier connected to an associated load port 24 into the processing unit to be inspected, in response to a notification the fact that a wafer stored in the carrier connected to the associated load port 24 is the QC wafer.
摘要翻译：检查基板处理装置的方法，该基板处理装置能够防止将产品基板供给到要检查的基板处理室，并且以期望的时刻检查基板处理室。根据操作者的菜单选项“QC MODE”的选择，或响应于来自主计算机的指示，抑制产品晶片W（产品基板）被输送到要检查的处理单元（基板处理室）中。响应于通知存储在与相关联的负载端口24连接的载体中的晶片为QC的事实，允许QC晶片从连接到相关联的负载端口24的载体传送到待检查的处理单元晶圆。

18. 发明申请

US20050129839A1 Substrate processing apparatus and substrate processing method 审中-公开
标题翻译：基板加工装置及基板处理方法
公开(公告)号：US20050129839A1
公开(公告)日：2005-06-16
申请号：US10987035
申请日：2004-11-15
申请人： Masahiro Numakura
发明人： Masahiro Numakura
IPC分类号： H01L21/00 , B05D5/12
CPC分类号： H01L21/67276 , G05B2219/31041 , Y02P90/04
摘要： In a controller MC, information on a process room (PM) (last process PM) which carried out a process last for the previous lot is stored. When starting processing for the current lot, the semiconductor wafers Ware loaded in process rooms, beginning with the process room next to the last process PM (for example, a process room (PM2) when the last process PM is a process room (PM1)). This allows the processing sections to be used evenly and minimizes variations in maintenance cycles and in the wearing of parts in the processing sections.
摘要翻译：在控制器MC中，存储执行了前一批次的处理的处理室（PM）（最后处理PM）的信息。当开始处理当前批次时，半导体晶圆零件装载在处理室中，从最后一个过程PM旁边的过程室开始（例如，最后一个过程PM为处理室的过程室（PM 2）（PM 1））。这允许处理部分被均匀地使用并且最小化维护周期的变化以及处理部件中部件的磨损。

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