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21. 发明授权

US10798781B2 Horizontal modular heater 有权
公开(公告)号：US10798781B2
公开(公告)日：2020-10-06
申请号：US15154905
申请日：2016-05-13
申请人： Arsalan Emami
发明人： Arsalan Emami
IPC分类号： H05B1/02 , F27D11/02 , F27B17/00 , H05B3/14
摘要： The invention disclosed is methods, apparatus, and systems of a horizontal modular heater. Whereas the prior art, being heater of a single zone and singular structure, may not be able to provide the desired temperature profile nor efficient downtime during parts breakage is accordingly insufficient for the needs of the industry. The present invention then may be a furnace used in semiconductor manufacturing, of which may be a horizontal heater with multiple modules, of which may be connected in an ingenious method or structure to limit leakage and of which improves efficiency over previous heater designs heaters in the art.

22. 发明授权

US10788266B2 Kiln 有权
公开(公告)号：US10788266B2
公开(公告)日：2020-09-29
申请号：US16121479
申请日：2018-09-04
申请人： NATIONAL CHUNG-SHAN INSTITUTE OF SCIENCE & TECHNOLOGY , TEN WING SCIENTIFIC CO., LTD.
发明人： Hsi-Ming Tseng , Li-Chih Liao
IPC分类号： F27B17/00 , F24B1/24 , A21B1/02 , A21B1/28 , F27D7/00 , F27D1/00
摘要： A kiln including a stove and a heat source wherein the stove includes a chamber, an air guide structure, an exhaust pipe and a heat storage member. The chamber includes a cavity, an entry, and an air outlet. The air outlet is located between a top of the front section of the cavity and the entry. The air guide structure communicates with the air outlet and includes a guide plate. The exhaust pipe is disposed above the guide plate, and an exhaust channel is formed by the guide plate of the air guide structure and the exhaust pipe. The heat storage member covers an exterior of the cavity which is corresponding to the top of the front section of the cavity, and contacts the air guide structure. The heat source is disposed in the stove and adapted to heat the cavity.

23. 发明授权

US10774398B2 Far-infrared radiation multi-stage type heating furnace for steel sheets for hot stamping 有权
公开(公告)号：US10774398B2
公开(公告)日：2020-09-15
申请号：US15316266
申请日：2015-05-28
申请人： NIPPON STEEL & SUMIKIN TEXENG. CO., LTD. , SHOWA MANUFACTURING CO., LTD.
发明人： Shinjiro Kuwayama
IPC分类号： C21D9/46 , C21D1/34 , C21D9/00 , C21D1/00 , H05B3/62 , B21D22/02 , H05B3/00 , H05B3/06 , H05B3/66 , F27B17/00 , B21D37/16 , F27D11/12
摘要： A far-infrared radiation multi-stage type heating furnace for steel sheets for hot stamping, the furnace including far-infrared radiation heaters having flexibility that are prevented from deflecting even during heating at temperatures ranging from the Ac3 transformation temperature to 950° C. The furnace includes: multiple-staged heating units that accommodate steel sheets, each heating unit formed by thermal insulation materials disposed around the periphery; and far-infrared radiation heaters positioned above and below the heating units. A far-infrared radiation heater is received by first metal strips. The first metal strips are disposed so that their strong axis direction approximately corresponds to the direction of gravity and supported by support pieces so as to be expandable and contractible in a longitudinal direction by thermal expansion or thermal contraction. The support pieces are disposed outside the thermal insulation materials in the heating units and a ceiling unit.

24. 发明授权

US10770309B2 Features for improving process uniformity in a millisecond anneal system 有权
公开(公告)号：US10770309B2
公开(公告)日：2020-09-08
申请号：US15378580
申请日：2016-12-14
申请人： Mattson Technology, Inc. , Beijing E-Town Semiconductor Technology Co., Ltd.
发明人： Alexandr Cosceev , Markus Hagedorn , Christian Pfahler
IPC分类号： H01L21/324 , F27B5/04 , F27B5/16 , F27B5/18 , H01L21/67 , H01L21/687 , H01L21/268 , H05B3/00 , F27B17/00
摘要： Systems and methods for improving process uniformity in a millisecond anneal system are provided. In some implementations, a process for thermally treating a substrate in a millisecond anneal system can include obtaining data indicative of a temperature profile associated with one or more substrates during processing in a millisecond anneal system. The process can include one or more of (1) changing the pressure inside the processing chamber of the millisecond anneal system; (2) manipulating the irradiation distribution by way of the refracting effect of a water window in the millisecond anneal system; (3) adjusting the angular positioning of the substrate; and/or (4) configuring the shape of the reflectors used in the millisecond anneal system.

25. 发明授权

US10704836B2 Refractory article and method of forming 有权
$Refractory article and method of forming$
公开(公告)号：US10704836B2
公开(公告)日：2020-07-07
申请号：US15877480
申请日：2018-01-23
申请人： SAINT-GOBAIN CERAMICS & PLASTICS, INC.
发明人： Evgeniy E. Esjunin
IPC分类号： F27D1/14 , C04B37/02 , C04B37/00 , F27B17/00
摘要： A refractory article can include a socket including a cavity that is configured to receive a post, a particulate material, and a binder. The binder is configured to bond the post to the socket. The refractory article can include a sleeve coupled to the socket and configured to bond the post to the socket. In an embodiment, the sleeve can bond to the binder. In another embodiment, a collar can be placed between the sleeve and the binder. The collar can be configured to bond the post to the socket. A method of forming a refractory article can include disposing a particulate material within a cavity of a socket and placing a binder material overlying the particulate material.

26. 发明授权

US10662509B2 Method for making metal-carbon composites and compositions 有权
公开(公告)号：US10662509B2
公开(公告)日：2020-05-26
申请号：US15261205
申请日：2016-09-09
申请人： UCHICAGO ARGONNE, LLC
发明人： Uthamalingam Balachandran , Beihai Ma , Stephen E. Dorris
IPC分类号： C22C32/00 , B22D21/00 , B22D23/06 , B22D29/00 , B22D30/00 , F27D11/12 , F27D13/00 , F27B17/00 , F27D7/06 , B22D27/15 , C22C1/05 , C22C26/00 , C22C1/02 , C22C1/10
摘要： A method for making covetic metal-carbon composites or compositions by electron beam melt heating under vacuum (pressure

27. 发明申请

US20200056259A1 Triple chamber furnace for scrap segregation and melting 审中-公开
公开(公告)号：US20200056259A1
公开(公告)日：2020-02-20
申请号：US15999007
申请日：2018-08-20
申请人： Baha Elsayed Abulnaga
发明人： Baha Elsayed Abulnaga
IPC分类号： C22B1/00 , F27B17/00 , F23G5/027
摘要： The invention is a continuation of U.S. Pat. No. 9,617,610 issued on Apr. 11, 2017. It consists of a process to treat comingled and co-mixed ferrous and non-ferrous scrap by heat from flue gases generated in the hearth of the furnace, charging and melting the treated ferrous scrap after removing contaminants and non-ferrous elements of the scrap through a three step process in a triple chamber furnace (FIGS. 1 and 4). The furnace consists of a first chamber (4) where the scrap is loaded, and treated in an oxygen deficient flue gas atmosphere downstream of a heat recuperator (3), at high temperature to cause the peeling and melting of zinc from galvanized scrap, the melting of non-ferrous components of the scrap and their collection at the bottom of the chamber at a dedicated spout (23) to a crucible (24), the pyrolysis of paints, plastic and used tire contaminants of the scrap. Upstream of the recuperator flue gas from the second stage, or charging and melting chamber (2) rise to exchange heat in the recuperator (3) and pre-heat combustion air on its way to the primary burner of the furnace (11). Ferrous scrap after being separated from non ferrous elements is charged into the second stage or charging and melting chamber (2); the chamber having a floor sloped at an angle less than the angle of repose of steel in a solid form, so that the molten iron and steel can flow to the third stage or hearth (1) where carbon is added at the carburizer (5), alloying elements at the charging spout (6) and oxygen carrying gases, gaseous, liquid and pulverized solid fuel are applied at the burner (11) to complete the refining of the scrap and their discharge for castings. To achieve the pyrolysis needed to eliminate coating, paint, rubber tires, plastic scrap, the combustion in the hearth is completed at stoichometric ratio to deplete the flue gases from oxygen. Flue gases on the discharge of the triple chamber Cokeless furnace are treated by conventional methods to extract dust, condense and separate hydrocarbons that resulted from the pyrolysis in the scrap in the treatment chamber prior to discharge to the environment (27). Condensed hydrocarbons are burned in the hearth (1) for additional heat. Non-ferrous molten metals collected in a crucible or channel furnace (24) are further processed outside the triple chamber furnace. In a different embodiment of the invention, containers full of scrap tires, scrap plastics and non-ferrous scrap (34) are charged closed in the scrap processing chamber, heated externally by flue gases and the containers vented directly to auxiliary burners (36) at the hearth without passing through a condenser or flue gas treatment unit.

28. 发明授权

US10455680B2 Method and apparatus for purifying target material for EUV light source 有权
公开(公告)号：US10455680B2
公开(公告)日：2019-10-22
申请号：US15057086
申请日：2016-02-29
申请人： ASML Netherlands B.V.
发明人： Georgiy Vaschenko , Peter Baumgart , Chirag Rajyaguru , Benjamin Sams , Armin Ridinger , Janine Kardokus
IPC分类号： C22B3/00 , H05G2/00 , C22B9/04 , C22B25/08 , F27B17/00 , F27B17/02
摘要： A deoxidation system for purifying target material for an EUV light source includes a furnace having a central region and a heater for heating the central region in a uniform manner. A vessel is inserted in the central region of the furnace, and a crucible is disposed within the vessel. A closure device covers an open end of the vessel to form a seal having vacuum and pressure capability. The system also includes a gas input tube, a gas exhaust tube, and a vacuum port. A gas supply network is coupled in flow communication with an end of the gas input tube and a gas supply network is coupled in flow communication with an end of the gas exhaust tube. A vacuum network is coupled in flow communication with one end of the vacuum port. A method and apparatus for purifying target material also are described.

29. 发明授权

US10455642B2 Rapid thermal processing chamber with linear control lamps 有权
公开(公告)号：US10455642B2
公开(公告)日：2019-10-22
申请号：US15012885
申请日：2016-02-02
申请人： Applied Materials, Inc.
发明人： Preetham Rao , Abhilash J. Mayur
IPC分类号： H05B3/00 , F27B17/00 , F27D5/00 , H01L21/67
摘要： A lamphead for thermal processing of a substrate is provided. The lamphead includes a housing having a first edge surrounding a first plane. The lamphead further includes a plurality of segmented lamps disposed within the housing, each segmented lamp aligned substantially parallel to the first plane. Each segmented lamp includes a first end connected to a location on the housing; a first wire segment connected to the first end; a first filament connected to the first wire segment; an intermediate wire segment connected to the first filament; a second filament connected to intermediate wire segment; a second wire segment connected to the second filament; and a second end connected to the second wire segment; where the second end is connected to an opposing location on the housing.

30. 发明申请

US20190206687A1 HEAT TREATMENT METHOD AND HEAT TREATMENT APPARATUS FOR HEATING SUBSTRATE BY IRRADIATING SUBSTRATE WITH LIGHT 审中-公开
公开(公告)号：US20190206687A1
公开(公告)日：2019-07-04
申请号：US16298260
申请日：2019-03-11
申请人： SCREEN Holdings Co., Ltd.
发明人： Kazuhiko FUSE , Shinichi KATO , Kenichi YOKOUCHI
IPC分类号： H01L21/225 , H01L21/324 , H01L21/02 , F27B17/00 , H01L21/687 , H01L21/265 , H01L21/67 , H01L21/268
CPC分类号： H01L21/2253 , F27B17/0025 , H01L21/02694 , H01L21/26513 , H01L21/2686 , H01L21/324 , H01L21/67115 , H01L21/67248 , H01L21/68707 , H01L21/68742
摘要： First irradiation which causes an emission output from a flash lamp to reach its maximum value over a time period in the range of 1 to 20 milliseconds is performed to increase the temperature of a front surface of a semiconductor wafer from a preheating temperature to a target temperature for a time period in the range of 1 to 20 milliseconds. This achieves the activation of the impurities. Subsequently, second irradiation which gradually decreases the emission output from the maximum value over a time period in the range of 3 to 50 milliseconds is performed to maintain the temperature of the front surface within a ±25° C. range around the target temperature for a time period in the range of 3 to 50 milliseconds. This prevents the occurrence of process-induced damage while suppressing the diffusion of the impurities.

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