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    • 42. 发明授权
    • Laminate circuit board with a multi-layer circuit structure
    • 层压电路板具有多层电路结构
    • US08754328B2
    • 2014-06-17
    • US13663141
    • 2012-10-29
    • Kinsus Interconnect Technology Corp.
    • Jun-Chung HsuChi-Ming LinTso-Hung YehYa-Hsiang Chen
    • H02G15/00H05K1/11
    • H05K3/28H05K3/243H05K3/4644H05K2201/0347
    • A laminate circuit board with a multi-layer circuit structure which includes a substrate, a first circuit metal layer, a second circuit metal layer, a first nanometer plating layer, a second nanometer plating layer and a cover layer is disclosed. The first circuit metal layer is embedded in the substrate or formed on at least one surface of the substrate which is smooth. The first nanometer plating layer with a smooth surface covers the first circuit metal layer. The second nanometer plating layer is formed on the other surface of the substrate and fills up the opening in the cover layer to electrically connect the first circuit metal layer. The junction adhesion is improved by the chemical bonding between the nanometer plating layer and the cover layer/the substrate. Therefore, the circuit metal layer does not need to be roughened and the density of the circuit increases.
    • 公开了一种具有多层电路结构的叠层电路板,其包括基板,第一电路金属层,第二电路金属层,第一纳米镀层,第二纳米镀层和覆盖层。 第一电路金属层嵌入衬底中或形成在衬底的平滑的至少一个表面上。 具有光滑表面的第一纳米镀层覆盖第一电路金属层。 第二纳米镀层形成在基板的另一个表面上,并填满覆盖层中的开口以电连接第一电路金属层。 通过纳米电镀层和覆盖层/基板之间的化学键合来改善连接粘附。 因此,电路金属层不需要粗糙化,电路密度增加。
    • 47. 发明授权
    • Method for manufacturing carrier substrate
    • 制造载体基板的方法
    • US07662662B2
    • 2010-02-16
    • US11685751
    • 2007-03-13
    • Jun-Chung HsuBing-Kuen LinChao-Lung Wang
    • Jun-Chung HsuBing-Kuen LinChao-Lung Wang
    • H01L21/00H01L21/44
    • H05K3/421H05K1/116H05K3/108H05K3/426H05K2201/09545H05K2201/09563Y10T29/49162
    • A carrier substrate and a method for manufacturing the carrier substrate are disclosed herein. The method includes the steps of: providing a core substrate; forming a build-up material layer on the core substrate; forming a via in the build-up material layer; forming a patterned photoresist layer on the build-up material layer covering a portion of the via and exposing an opening from uncovered portion of the via, and a wiring slot connected to the opening; and forming a metal-electroplated layer on the via and the wiring slot. In forming a trace according to the present invention, the metal-electroplated layer is formed as the trace and directly connected to the via, striding or not striding over the via. Additionally, in the carrier substrate structure, there is no need an annular ring to connect the trace to the via, and thus the wiring space is increased.
    • 本文公开了载体基板和用于制造载体基板的方法。 该方法包括以下步骤:提供芯基板; 在所述芯基板上形成积层材料层; 在积层材料层中形成通孔; 在所述积层材料层上形成图案化的光致抗蚀剂层,所述图案化的光致抗蚀剂层覆盖所述通孔的一部分,并且从所述通孔的未覆盖部分露出开口,以及连接到所述开口的布线槽; 以及在通孔和布线槽上形成金属电镀层。 在形成根据本发明的迹线的情况下,金属电镀层形成为迹线,并且直接连接到通孔,跨越通道或跨过通孔。 此外,在载体基板结构中,不需要环形环来将迹线连接到通孔,因此布线空间增加。
    • 48. 发明授权
    • Method for fabricating IC board without ring structure
    • 制造没有环形结构的IC板的方法
    • US07488675B2
    • 2009-02-10
    • US11684583
    • 2007-03-09
    • Ting-Hao Lin
    • Ting-Hao Lin
    • H01L21/44
    • H05K1/116H05K3/064H05K3/427H05K2201/09545H05K2201/09563H05K2201/09736Y10T29/41Y10T29/49155Y10T29/49165
    • A method for fabricating an IC board without a ring structure is provided. In the method, after the completion of the core board (including the core through hole), the second pattern photoresist layer is used to mask over the first deposited metal layer, and a portion of the second deposited metal layer (this portion of the second deposited metal layer is to electrically couple to the conductive circuit of the core through hole). Later, the second deposited metal layer, the first deposited metal layer, the metal layer, and the substrate at the innermost layer which are not masked by the second pattern photoresist layer are removed. As a result, the substrate is exposed to form the ringless structure, and to couple a conductive line to the core board through hole.
    • 提供一种制造没有环形结构的IC板的方法。 在该方法中,在芯板(包括芯通孔)完成之后,第二图案光致抗蚀剂层用于掩蔽第一沉积金属层,并且第二沉积金属层的一部分(第二次 沉积的金属层电连接到芯通孔的导电电路)。 然后,去除未被第二图案光刻胶层掩蔽的第二沉积金属层,第一沉积金属层,金属层和最内层的基板。 结果,基板被暴露以形成无环结构,并且将导电线耦合到芯板通孔。