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41. 发明申请

US20080030152A1 Boron Nitride Thin-Film Emitter and Production Method Thereof, and Electron Emitting Method Using Boron Nitride Thin-Film Emitter 失效
标题翻译：氮化硼薄膜发射体及其制造方法以及使用氮化硼薄膜发射体的电子发射方法
公开(公告)号：US20080030152A1
公开(公告)日：2008-02-07
申请号：US11665250
申请日：2005-12-21
申请人： Shojiro Komatsu , Yusuke Moriyoshi , Katsuyuki Okada
发明人： Shojiro Komatsu , Yusuke Moriyoshi , Katsuyuki Okada
IPC分类号： H01J11/04 , C01B21/064 , H05H1/24 , C23C8/00
CPC分类号： H01J9/025 , H01J1/304 , H01J2201/30446
摘要： Based on designs concerning boron nitride thin-films each including boron nitride crystals in acute-ended shapes excellent in field electron emission properties, and designs of emitters adopting such thin-films, it is aimed at appropriately controlling a distribution state of such crystals to thereby provide an emitter having an excellent efficiency and thus requiring only a lower threshold electric field for electron emission. In a design of a boron nitride thin-film emitter comprising crystals that are each represented by a general formula BN, that each include sp3 bonded boron nitride, sp2 bonded boron nitride, or a mixture thereof, and that each exhibit an acute-ended shape excellent in field electron emission property; there is controlled an angle of a substrate relative to a reaction gas flow upon deposition of the emitter from a vapor phase, thereby controlling a distribution state of the crystals over a surface of the thin-film.
摘要翻译：基于关于氮化硼薄膜的设计，每个氮化硼薄膜包括场致发射性能优异的急端形状的氮化硼晶体，以及采用这种薄膜的发射体的设计，旨在适当地控制这种晶体的分布状态提供具有优异效率的发射极，因此仅需要较低的电子发射阈值电场。在包含各自由通式BN表示的晶体的氮化硼薄膜发射体的设计中，每一个都包括结合氮化硼的sp 3+，sp 2+结合的硼氮化物或其混合物，并且各自表现出场电子发射性优异的锐端形状; 当从气相沉积发射体时，控制衬底相对于反应气体流的角度，从而控制晶体在薄膜表面上的分布状态。

42. 发明申请

US20080023110A1 Metal article with high interstitial content 审中-公开
标题翻译：具有高间隙含量的金属制品
公开(公告)号：US20080023110A1
公开(公告)日：2008-01-31
申请号：US11880597
申请日：2007-07-23
申请人： Peter Williams , Sunniva Collins , Steven Marx
发明人： Peter Williams , Sunniva Collins , Steven Marx
IPC分类号： C23C8/00
CPC分类号： C23C8/22 , C23C8/00 , C23C8/20
摘要： A thin metal workpiece is subjected to a low temperature diffusion-based surface treatment to produce a thin metal product in which at least one property of the thin metal product, as a whole, is enhanced by at least 10% as compared with an otherwise identical product not subjected to such surface treatment.
摘要翻译：对薄金属工件进行低温扩散型表面处理，以制造薄金属制品，其中与其他相同的材料相比，薄金属制品整体的至少一种性能比其他相同增强了至少10％产品不经过这种表面处理。

43. 发明申请

US20070295427A1 Treated austenitic steel for vehicles 有权
标题翻译：用于车辆的奥氏体钢
公开(公告)号：US20070295427A1
公开(公告)日：2007-12-27
申请号：US11796417
申请日：2007-04-27
申请人： Thorsten Michler
发明人： Thorsten Michler
IPC分类号： C23C8/00 , C22C38/00 , C23C8/38
CPC分类号： C23C8/38 , C22C38/02 , C22C38/04 , C22C38/42 , C22C38/44 , C23C8/22
摘要： A treated austenitic steel and method for treating same includes an austenitic steel and a non-metal chemical element incorporated into a surface of the steel. The surface has a bi-layered structure of a compound layer at a top and an underlying diffusion layer, which protects said surface against hydrogen embrittlement.
摘要翻译：经处理的奥氏体钢及其处理方法包括奥氏体钢和结合到钢的表面中的非金属化学元素。表面具有在顶部的化合物层和下面的扩散层的双层结构，其保护所述表面免受氢脆化。

44. 发明申请

US20070202253A1 Thin organic alignment layers with a batch process for liquid crystal displays 有权
标题翻译：薄的有机取向层与液晶显示器的批处理
公开(公告)号：US20070202253A1
公开(公告)日：2007-08-30
申请号：US11607246
申请日：2006-12-01
申请人： Hiap Ong
发明人： Hiap Ong
IPC分类号： C23C16/00 , C23C8/00
CPC分类号： C23C16/0209 , C23C16/4408 , G02F1/1303 , G02F1/1337 , G02F1/133707 , G02F1/133788 , G02F2001/1316 , G02F2001/13712
摘要： A method to form alignment layers on a substrate of an LCD is disclosed. The substrate is placed in a vacuum chamber and undergoes a purging process. The purging process heats the substrates and removes water vapor from the vacuum chamber. Specifically, the vacuum chamber is evacuated to a low pressure and refilled with a preheated inert gas. Evacuation of the vacuum chamber and refilling of the vacuum chamber is repeated several times. The alignment layer is then deposited using vapor deposition. Alternatively, plasma enhanced vapor deposition can be used for depositing the alignment layer. Furthermore, plasma cleaning prior to the deposition of the alignment layer can used clean the substrate.
摘要翻译：公开了一种在LCD的衬底上形成取向层的方法。将基板放置在真空室中并进行清洗处理。清洗过程加热基板并从真空室中除去水蒸气。具体地说，将真空室抽成低压并用预热的惰性气体再填充。真空室的抽真空和真空室的再填充重复数次。然后使用气相沉积沉积取向层。或者，可以使用等离子体增强气相沉积来沉积取向层。此外，在沉积取向层之前的等离子体清洁可以用于清洁基板。

45. 发明申请

US20070172601A1 System and method for vaporizing powders 审中-公开
标题翻译：蒸发粉末的系统和方法
公开(公告)号：US20070172601A1
公开(公告)日：2007-07-26
申请号：US11336580
申请日：2006-01-20
申请人： Sergei Putvinski , Michael Meekins , Oleg Feygenson , Karl Umstadter
发明人： Sergei Putvinski , Michael Meekins , Oleg Feygenson , Karl Umstadter
IPC分类号： C23C8/00 , B05D3/00
CPC分类号： B05D7/00
摘要： A system for vaporizing a powder material incorporates a laser source with an optical arrangement for generating and focusing a laser beam to a focal point. The beam is characterized by having a region with a converging/diverging angle (α), respectively upstream/downstream from the focal point. It also has a power density above a predetermined value within the region. A conduit is provided with a channel, and the laser beam is focused to conform to the region in the channel. A nozzle then directs powdered material into the laser beam at a location upstream from the region for vaporization of the powder material by the laser beam during its transit through the region.
摘要翻译：用于蒸发粉末材料的系统包括具有用于产生和聚焦激光束到焦点的光学装置的激光源。光束的特征在于具有分别在焦点的上游/下游的具有会聚/发散角（α）的区域。在区域内也具有高于预定值的功率密度。导管设置有通道，并且激光束被聚焦以符合通道中的区域。然后，喷嘴然后将粉末材料引导到激光束在该区域上游的位置处，用于在穿过该区域的过程中激光束使粉末材料蒸发。

46. 发明申请

US20070169850A1 Rolling bearing and heat treatment method for steel 失效
标题翻译：钢的滚动轴承和热处理方法
公开(公告)号：US20070169850A1
公开(公告)日：2007-07-26
申请号：US10586299
申请日：2005-01-11
申请人： Chikara Ohki , Kohei Fujita
发明人： Chikara Ohki , Kohei Fujita
IPC分类号： C23C8/00 , C23C22/00
CPC分类号： C22C38/18 , C21D1/18 , C21D1/78 , C21D9/36 , C21D9/40 , C22C38/02 , C22C38/04 , C23C8/26 , F16C33/30 , F16C33/62 , F16C33/64 , F16C2240/90
摘要： There is provided a rolling bearing which has long life against rolling fatigue and exhibits no decrease in fracture strength and no increase in rate of dimensional change over time, even if the part size thereof is large, and which can obtain higher strength by crystal grains being further refined, if it has a size equal to or smaller than a prescribed size. The rolling bearing according to the present invention includes a race and a rolling element. At least one member of the race and the rolling element has a nitrogen-enriched layer in its surface layer, and a surface layer portion contains austenite crystal grains having a grain size number of at least 11. The member has hardenability allowing a position exhibiting HRC50 in a hardenability test method for steel to be apart from a quenched end by a distance of at least 12.7 mm ( 8/16 inch).
摘要翻译：提供了一种滚动轴承，其寿命长于滚动疲劳，即使部件尺寸大，断裂强度也不降低，尺寸变化率也没有增加，并且可以通过晶粒获得更高的强度进一步细化，如果其尺寸等于或小于规定尺寸。根据本发明的滚动轴承包括座圈和滚动元件。该种族和滚动体的至少一个构件在其表面层中具有富氮层，表层部分含有晶粒数至少为11的奥氏体晶粒。该构件具有淬透性，允许显示HRC50的位置在淬硬性试验方法中，钢的淬火端距离至少12.7mm（8/16英寸）。

47. 发明授权

US07195801B2 Manufacturing process for storing and transferring evaporation material 有权
标题翻译：储存和转移蒸发材料的制造过程
公开(公告)号：US07195801B2
公开(公告)日：2007-03-27
申请号：US10356722
申请日：2003-02-03
申请人： Masakazu Murakami , Hisashi Ohtani , Shunpei Yamazaki , Hideaki Kuwabara
发明人： Masakazu Murakami , Hisashi Ohtani , Shunpei Yamazaki , Hideaki Kuwabara
IPC分类号： C23C8/00 , C23C16/00
CPC分类号： C23C14/564 , C23C14/12 , C23C14/246 , C23C14/56 , H01L51/001 , H01L51/005 , H01L51/0059 , H01L51/0078 , H01L51/0081 , H01L51/0084 , H01L51/56
摘要： A manufacturing system capable of enhancing reliability and luminance of a light emitting element is provided which uses an EL material of very high purity in evaporation. The system is also capable of using an EL material efficiently. Instead of a glass jar, a container (first container 11a) to be set in an evaporation apparatus is employed and a material maker (18) stores an EL material (12), or refines it by sublimation and stores, directly in the container. The container is then transferred to a light emitting device maker (19) for evaporation. With a manufacturing system as such, impurities are prevented from contaminating a highly pure EL material. This system also eliminates the trouble of transferring an EL material from a glass jar to a container. The container may be recovered by the material maker and the EL material remaining in the container may be collected for reuse by the manufacturing system.
摘要翻译：提供一种能够提高发光元件的可靠性和亮度的制造系统，其使用蒸发中具有非常高纯度的EL材料。该系统还能够有效地使用EL材料。代替玻璃罐，使用要置于蒸发装置中的容器（第一容器11a），并且制造商（18）存储EL材料（12），或通过升华进行精炼并直接存储在容器。然后将容器转移到发光装置制造商（19）以进行蒸发。通过制造系统，防止杂质污染高纯度的EL材料。该系统还消除了将EL材料从玻璃罐转移到容器的麻烦。容器可以由材料制造商回收，并且可以收集留在容器中的EL材料以供制造系统重新使用。

48. 发明申请

US20070020953A1 Method for forming a high density dielectric film by chemical vapor deposition 有权
标题翻译：通过化学气相沉积法形成高密度电介质膜的方法
公开(公告)号：US20070020953A1
公开(公告)日：2007-01-25
申请号：US11186353
申请日：2005-07-21
申请人： Cheng-Yuan Tsai , Chih-Lung Lin , You-Hua Chou
发明人： Cheng-Yuan Tsai , Chih-Lung Lin , You-Hua Chou
IPC分类号： H01L21/31 , C23C8/00 , H01L21/469
CPC分类号： H01L21/31612 , C23C16/45523 , C23C16/45557 , C23C16/50 , H01L21/02164 , H01L21/02274 , H01L21/0228 , H01L21/76801
摘要： A method for forming a high density dielectric film by chemical vapor deposition. The method comprises: (a) a substrate is provided in a processing chamber; (b) a first gas is introduced into the processing chamber with a first pressure and adsorbed on the substrate, wherein the first gas comprises silicon-containing or carbon-containing gas; (c) the first gas is stopped, and the first pressure is lowered to a second pressure; (d) a second gas is introduced into the processing chamber with a third pressure, and forced to react with the first gas absorbed on the substrate and remained in the processing chamber, wherein the second gas comprises oxidizer or reduction agent; (e) the steps (b)˜(d) are repeated until a high density dielectric film is formed on the substrate.
摘要翻译：一种通过化学气相沉积法形成高密度电介质膜的方法。该方法包括：（a）在处理室中设置基板; （b）第一气体以第一压力被引入处理室并吸附在衬底上，其中第一气体包含含硅或含碳气体; （c）第一气体停止，第一压力降低到第二压力; （d）第二气体以第三压力被引入处理室，并被迫与吸收在基板上的第一气体反应并保留在处理室中，其中第二气体包括氧化剂或还原剂; （e）重复步骤（b）〜（d），直到在基板上形成高密度电介质膜。

49. 发明申请

US20070020951A1 Fluorocarbon film and method for forming same 失效
标题翻译：氟碳膜及其形成方法
公开(公告)号：US20070020951A1
公开(公告)日：2007-01-25
申请号：US10536774
申请日：2004-11-09
申请人： Tatsuru Shirafuji , Kunihide Tachibana
发明人： Tatsuru Shirafuji , Kunihide Tachibana
IPC分类号： H01L21/31 , C23C8/00 , H01L21/469
CPC分类号： H01L21/0212 , B05D1/62 , B05D3/107 , B05D5/083 , B05D2506/10 , C23C16/26 , H01L21/3146
摘要： The major objective is to provide a fluorocarbon film wherein fine voids are formed by a step (SA1) for introducing a mixed gas containing a first carbon fluoride gas and a second carbon fluoride gas on a substrate placed inside a chamber, and depositing a fluorocarbon film on the substrate; and a step (SA2) for forming voids in the fluorocarbon film by selectively removing volatile components contained in the fluorocarbon film are included and especially in the step (SA2) for forming voids, it is preferable to include a step for cleaning the fluorocarbon film with a supercritical fluid.
摘要翻译：主要目的是提供一种碳氟化合物膜，其中通过步骤（SA1）形成细小空隙，用于将含有第一氟化碳气体和第二氟化碳气体的混合气体引入放置在室内的基板上，并沉积氟碳膜在基材上并且包括用于通过选择性地除去氟碳膜中所含的挥发性成分而在氟碳膜中形成空隙的步骤（SA2），特别是在用于形成空隙的步骤（SA2）中，优选包括用于清洗碳氟化合物膜的步骤超临界流体

50. 发明申请

US20060286410A1 Cemented carbide insert for toughness demanding short hole drilling operations 审中-公开
标题翻译：硬质合金刀片，用于韧性要求短孔钻孔作业
公开(公告)号：US20060286410A1
公开(公告)日：2006-12-21
申请号：US11343202
申请日：2006-01-31
申请人： Mats Ahlgren , Jan Kjellgren , Torbjorn Agren
发明人： Mats Ahlgren , Jan Kjellgren , Torbjorn Agren
IPC分类号： B32B9/00 , B05D3/00 , C23C8/00
CPC分类号： C23C14/0641 , C23C30/005
摘要： The present invention relates to a coated cutting insert with excellent toughness properties particularly useful for toughness demanding short hole drilling in low alloy and stainless steels and a method of making the same. The inserts comprise a substrate and a coating. The substrate comprises WC, from about 8 to about 11 wt-% Co and from about 0.2 to about 0.5 wt-% Cr with an average WC-grain size of from about 0.5 to about 1.5 μm and a CW-ratio of from about 0.80 to about 0.90. The coating comprises a laminar, multilayered structure of TiN+Ti1-xAlxN+TiN+Ti1-xAlxN+TiN . . . in polycrystalline, non-repetitive form, with x being from about 0.4 to about 0.6 with a thickness of the individual TiN—or Ti1-xAlxN-layers of from about 1 to about 30 nm varying essentially at random and with a total thickness of the multilayered coating of from about 1 to about 5 μm. The layers are deposited using arc evaporation technique.
摘要翻译：本发明涉及一种具有优异韧性的涂层切削刀片及其制造方法，特别适用于要求在低合金和不锈钢中短孔钻削的韧性。刀片包括基底和涂层。基体包括WC，约8至约11重量％的Co和约0.2至约0.5重量％的Cr，平均WC晶粒尺寸为约0.5至约1.5微米，CW比为约0.80 至约0.90。该涂层包括TiN + Ti 1-x Al x N + TiN + Ti 1-x Al 2 O 3的层状多层结构 x N + TiN。。。多晶，非重复形式，其中x为约0.4至约0.6，单个TiN-或Ti 1-x Al 2 N层的厚度为约1至约30nm，基本上随机变化，多层涂层的总厚度为约1至约5μm。使用电弧蒸发技术沉积这些层。

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