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41. 发明授权

US08697195B2 Method for forming a protective coating with enhanced adhesion between layers 有权
标题翻译：用于形成具有增强的层之间的粘合力的保护涂层的方法
公开(公告)号：US08697195B2
公开(公告)日：2014-04-15
申请号：US11307266
申请日：2006-01-30
申请人： David Bucci , Daniel A. Nowak , Paul S. Dimascio
发明人： David Bucci , Daniel A. Nowak , Paul S. Dimascio
IPC分类号： B05D3/04 , C23C14/02 , H05H1/00 , H05H1/32
CPC分类号： C23C10/60 , C23C10/06 , C23C10/48 , C23C26/00 , Y10T428/12472
摘要： A method for forming a protective coating on a substrate comprising, applying a bond coating to the substrate, the bond coating having a first surface roughness, ionizing an inert gas which flows into the surface of the bond coating so as to impart a second surface roughness to the bond coating greater than the first surface roughness, wherein the inert gas is ionized and caused to flow into the surface of the bond coating by a reverse polarity current supplied to an electrode which removes at least one electron from the inert gas, and applying a top coating to the bond coating. Additionally, a method for preparing a surface to receive and adhere to a coating comprising roughening the surface to create a micro-roughening network on the surface. In addition, a method of improving strain tolerance and cyclic spallation life of a protective coating.
摘要翻译：一种在基材上形成保护涂层的方法，包括：向所述基材施加粘合涂层，所述粘合涂层具有第一表面粗糙度，电离惰性气体，所述惰性气体流入所述粘结涂层的表面，以赋予第二表面粗糙度到大于第一表面粗糙度的粘结涂层，其中惰性气体被电离并通过提供给从惰性气体中除去至少一个电子的电极的反极性电流流入粘合涂层的表面，并施加粘合涂层的顶部涂层。另外，一种制备表面以接收和粘附到涂层上的方法，包括使表面变粗糙以在表面上产生微粗糙化网络。另外，提高保护涂层的耐应变性和循环剥落寿命的方法。

42. 发明授权

US08658259B2 Nanolayer deposition process 有权
标题翻译：纳米层沉积工艺
公开(公告)号：US08658259B2
公开(公告)日：2014-02-25
申请号：US12732825
申请日：2010-03-26
申请人： Tue Nguyen , Tai Dung Nguyen
发明人： Tue Nguyen , Tai Dung Nguyen
IPC分类号： C23C16/00 , H05H1/00
CPC分类号： C23C16/45525 , C23C16/56
摘要： A hybrid deposition process of CVD and ALD, called NanoLayer Deposition (NLD) is provided. The nanolayer deposition process is a cyclic sequential deposition process, comprising the first step of introducing a first plurality of precursors to deposit a thin film with the deposition process not self-limiting, then a second step of purging the first set of precursors and a third step of introducing a second plurality of precursors to modify the deposited thin film. The deposition step in the NLD process using the first set of precursors is not self limiting and is a function of substrate temperature and process time. The second set of precursors modifies the already deposited film characteristics. The second set of precursors can treat the deposited film such as a modification of film composition, a doping or a removal of impurities from the deposited film. The second set of precursors can also deposit another layer on the deposited film. The additional layer can react with the existing layer to form a compound layer, or can have minimum reaction to form a nanolaminate film.
摘要翻译：提供了称为NanoLayer沉积（NLD）的CVD和ALD的混合沉积工艺。纳米层沉积工艺是循环顺序沉积工艺，包括引入第一多个前体以沉积薄膜而不是自限制的沉积工艺的第一步骤，然后第二步骤是清洗第一组前体和第三步引入第二多个前体以修饰沉积的薄膜的步骤。使用第一组前体的NLD工艺中的沉积步骤不是自限制的，并且是衬底温度和处理时间的函数。第二组前体改变已沉积的膜特性。第二组前体可以处理沉积的膜，例如膜组成的改变，掺杂或从沉积膜去除杂质。第二组前体也可以在沉积膜上沉积另一层。附加层可以与现有层反应以形成化合物层，或者可以具有最小的反应以形成纳米层间膜。

43. 发明授权

US08626423B2 Control device for internal combustion engine 有权
标题翻译：内燃机控制装置
公开(公告)号：US08626423B2
公开(公告)日：2014-01-07
申请号：US13692271
申请日：2012-12-03
申请人： Imagineering, Inc.
发明人： Yuji Ikeda
IPC分类号： F02P23/04 , F02P3/01 , H05H1/00
CPC分类号： F02P23/04 , F02D19/087 , F02D37/02 , F02D41/0025 , F02D41/2422 , F02D2200/0611 , F02D2250/36 , F02M27/042 , F02M27/08 , F02P3/00 , F02P5/045 , F02P5/1527 , F02P9/002 , F02P9/007 , F02P23/045 , Y02T10/36 , Y02T10/46
摘要： To provide a control device for an internal combustion engine that can optimally control a plasma ignition operation independent of fuel type. In a control device 30 of an internal combustion engine 20, which controls plasma ignition operation for causing volume ignition of air fuel mixture by plasma in a combustion chamber 10, a fuel type detection part 40 detects a type of fuel to be supplied to the combustion chamber 10. According to the detected fuel type, a state of plasma or a state of air fuel mixture in the combustion chamber 10 is controlled.
摘要翻译：提供一种用于内燃机的控制装置，其能够独立于燃料类型最佳地控制等离子体点火操作。在内燃机20的控制装置30中，燃料型检测部40控制燃料类型检测部40检测供给燃烧的燃料的种类，根据检测到的燃料类型，控制燃烧室10中的等离子体状态或空气燃料混合物的状态。

44. 发明授权

US08557350B2 Method for bonding a layer of silicone to a substrate of methacrylate polymer 有权
标题翻译：将硅氧烷层与甲基丙烯酸酯聚合物的基材接合的方法
公开(公告)号：US08557350B2
公开(公告)日：2013-10-15
申请号：US12673273
申请日：2008-08-13
申请人： Giuseppina Simone , Gerado Perozziello , Gianni Medoro
发明人： Giuseppina Simone , Gerado Perozziello , Gianni Medoro
IPC分类号： H05H1/00 , B05D5/10 , B05D3/00 , B29C65/00 , B32B37/00
CPC分类号： C09J5/02 , C09J2400/228 , C09J2433/008 , C09J2483/00
摘要： Method of bonding a layer (S) of silicone to a substrate (4′) of methacrylic polymer; the method involves positioning between the methacrylate polymer and the silicone a layer (9) of an organosilane having the formula R1Si(R2)3, in which R2 is OH and R1 is a methacrylic residue.
摘要翻译：将硅氧烷层（S）与甲基丙烯酸系聚合物的基材（4'）接合的方法; 该方法包括在甲基丙烯酸酯聚合物和硅氧烷之间定位具有式R 1 Si（R 2）3的有机硅烷的层（9），其中R 2是OH，R 1是甲基丙烯酸残基。

45. 发明授权

US08530004B2 Polymeric electret film and method of manufacturing the same 有权
标题翻译：聚合物驻极体膜及其制造方法
公开(公告)号：US08530004B2
公开(公告)日：2013-09-10
申请号：US12732571
申请日：2010-03-26
申请人： James Huang , Sean Chen , Radium Huang
发明人： James Huang , Sean Chen , Radium Huang
IPC分类号： H05H1/00 , H05H1/32 , C08J7/18
CPC分类号： C25D5/18
摘要： Disclosed is a polymeric electret film as well as the method of manufacturing the same. The polymeric electret film comprises a polytetrafluoroethylene film and an electrode layer. The polytetrafluoroethylene film includes a porous layer, which has a porous structure. The porous structure has a pore diameter ranging between 0.01 μm and 5.0 μm and has a porosity ranging between 20% and 95%. The polytetrafluoroethylene film has a thickness ranging between 1 μm and 50 μm, and is preferably made of expanded porous polytetrafluoroethylene. The polymeric electret film has a surface potential ranging between 0.1 V and 1000 V.
摘要翻译：公开了一种聚合物驻极体膜及其制造方法。聚合物驻极体膜包括聚四氟乙烯膜和电极层。聚四氟乙烯膜包括具有多孔结构的多孔层。多孔结构的孔径在0.01μm和5.0μm之间，孔隙率在20％和95％之间。聚四氟乙烯膜的厚度范围在1〜50μm之间，优选由膨胀的多孔聚四氟乙烯制成。聚合物驻极体膜的表面电位范围为0.1V至1000V。

46. 发明授权

US08500909B2 Apparatus for flattening coating material and evaporation deposition device having same 失效
标题翻译：用于使涂层材料变平的装置和具有该材料的蒸发沉积装置
公开(公告)号：US08500909B2
公开(公告)日：2013-08-06
申请号：US12943941
申请日：2010-11-11
申请人： Shao-Kai Pei
发明人： Shao-Kai Pei
IPC分类号： C23C16/00 , B05C11/00 , H05H1/00 , C21C7/10
CPC分类号： C23C14/243
摘要： An apparatus for processing coating material includes a crucible having a cylindrical receptacle for receiving coating material, a drive member having a drive shaft, and a cover coupled to the drive shaft. The cover has a flat surface. The drive shaft is configured to drive the cover to rotate thereabout between a closed position where the cover covers the receptacle and the flat surface presses against the coating material to flatten the coating material, and an open position where the cover is moved away from the receptacle.
摘要翻译：一种用于处理涂料的设备包括具有用于接收涂层材料的圆柱形容器的坩埚，具有驱动轴的驱动构件和联接到驱动轴的盖。盖子有一个平坦的表面。所述驱动轴被构造成驱动所述盖在所述盖覆盖所述容器的封闭位置与所述平坦表面之间在所述盖子上方旋转，从而使所述涂层材料平坦化，并且所述盖从所述容器移开的打开位置。

47. 发明申请

US20130134855A1 System for Attachment of an Electrode into an Inductively Coupled Plasma Source 有权
标题翻译：将电极连接到电感耦合等离子体源的系统
公开(公告)号：US20130134855A1
公开(公告)日：2013-05-30
申请号：US13307830
申请日：2011-11-30
申请人： Sean Kellogg , Anthony Graupera , N. William Parker , Andrew B. Wells , Mark W. Utlaut , Walter Skoczylas , Gregory A. Schwind , Shouyin Zhang , Noel Smith
发明人： Sean Kellogg , Anthony Graupera , N. William Parker , Andrew B. Wells , Mark W. Utlaut , Walter Skoczylas , Gregory A. Schwind , Shouyin Zhang , Noel Smith
IPC分类号： H01J1/02 , H05H1/00
CPC分类号： H01J37/32605 , H01J9/02 , H01J27/16 , H01J37/04 , H01J37/08 , H01J2237/032
摘要： An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.
摘要翻译：用于聚焦离子束系统的电感耦合等离子体带电粒子源包括具有可拆卸地附接的源电极的等离子体反应室。紧固机构将源电极与等离子体反应室连接，并形成导热的真空密封。使用可移动的源电极，现在可以提高等离子体源管的可用性和再利用。

48. 发明授权

US08368032B2 Radiation source, lithographic apparatus, and device manufacturing method 失效
标题翻译：辐射源，光刻设备和器件制造方法
公开(公告)号：US08368032B2
公开(公告)日：2013-02-05
申请号：US12712545
申请日：2010-02-25
申请人： Dzmitry Labetski , Erik Roelof Loopstra , Gerardus Hubertus Petrus Maria Swinkels , Tom Van Zutphen
发明人： Dzmitry Labetski , Erik Roelof Loopstra , Gerardus Hubertus Petrus Maria Swinkels , Tom Van Zutphen
IPC分类号： H05H1/42 , H05H1/00 , H01J61/28 , H01J37/08
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005
摘要： A plasma radiation source includes a vessel configured to catch a source material transmitted along a trajectory, and a decelerator configured to reduce a speed of the source material in a section of the trajectory downstream of a plasma initiation site.
摘要翻译：等离子体辐射源包括构造成捕获沿着轨迹传输的源材料的容器，以及减速器，其构造成在等离子体起始位置下游的轨迹的一部分中降低源材料的速度。

49. 发明授权

US08361565B2 Method for plasma treatment and painting of a surface 有权
标题翻译：等离子体处理和表面喷涂方法
公开(公告)号：US08361565B2
公开(公告)日：2013-01-29
申请号：US12705020
申请日：2010-02-12
申请人： Birgit Kuhlenschmidt , Daniel Lahidjanian , Dirk Bausen , Karl Hausmann , Bettina Kroeger-Kallies
发明人： Birgit Kuhlenschmidt , Daniel Lahidjanian , Dirk Bausen , Karl Hausmann , Bettina Kroeger-Kallies
IPC分类号： H05H1/00 , C23C14/02
CPC分类号： B05D3/142 , B05D3/12 , B05D3/145
摘要： A method for plasma treatment and painting of a surface, the surface including a plurality of different materials includes blasting the surface with a carbon dioxide snow so as to activate the surface to improve an adhesive strength; and treating the surface with a plasma treatment using at least one plasma nozzle following the blasting step, the treating including guiding the at least one plasma nozzle at a distance of not more than 15 mm from the surface at a feed rate of not more than 50 m/min.
摘要翻译：一种用于等离子体处理和表面喷涂的方法，包括多种不同材料的表面包括用二氧化碳雪喷射表面以激活表面以提高粘合强度; 以及在所述喷砂步骤之后使用至少一个等离子体喷嘴用等离子体处理来处理所述表面，所述处理包括以不大于50的进给速率从所述表面引导所述至少一个等离子体喷嘴的距离不超过15mm m / min。

50. 发明授权

US08318266B2 Enhanced copper growth with ultrathin barrier layer for high performance interconnects 有权
公开(公告)号：US08318266B2
公开(公告)日：2012-11-27
申请号：US11470922
申请日：2006-09-07
申请人： Ling Chen , Hua Chung , Barry L. Chin , Hong Zhang
发明人： Ling Chen , Hua Chung , Barry L. Chin , Hong Zhang
IPC分类号： C23C16/00 , C23C14/02 , H05H1/00
CPC分类号： H01L21/28562 , C23C16/34 , C23C16/4411 , C23C16/4412 , C23C16/45504 , C23C16/45508 , C23C16/45512 , C23C16/45525 , C23C16/45544 , C23C16/45563 , C23C16/45582 , H01L21/76843 , H01L21/76846 , H01L21/76871
摘要： A method for depositing a refractory metal nitride barrier layer having a thickness of about 20 angstroms or less is provided. In one aspect, the refractory metal nitride layer is formed by introducing a pulse of a metal-containing compound followed by a pulse of a nitrogen-containing compound. The refractory metal nitride barrier layer provides adequate barrier properties and allows the grain growth of the first metal layer to continue across the barrier layer into the second metal layer thereby enhancing the electrical performance of the interconnect.

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