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51. 发明申请

US20080157006A1 Debris mitigation system and lithographic apparatus 失效
标题翻译：碎片缓解系统和光刻设备
公开(公告)号：US20080157006A1
公开(公告)日：2008-07-03
申请号：US11645809
申请日：2006-12-27
申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Derk Jan Wilfred Klunder , Wouter Anthon Soer , Kurt Gielissen
发明人： Maarten Marinus Johannes Wilhelmus Van Herpen , Derk Jan Wilfred Klunder , Wouter Anthon Soer , Kurt Gielissen
IPC分类号： G21G5/00
CPC分类号： G03F7/70916 , G03F7/70858 , H05G2/003 , H05G2/005
摘要： A debris mitigation system for trapping contaminant material coming from a debris-generating radiation source. The system includes a contamination barrier constructed and arranged to rotate about an axis, and a magnet structure constructed and arranged to provide a magnetic field for deflecting charged debris from the radiation source. The magnet structure is constructed and arranged to provide a magnetic field through the contamination barrier. The magnetic field, when passing through the contamination barrier, is oriented along planes generally coinciding with the axis of rotation of the contamination barrier.
摘要翻译：用于捕集来自碎屑产生辐射源的污染物质的碎片缓解系统。该系统包括构造和布置成围绕轴线旋转的污染屏障，以及构造和布置成提供用于使来自辐射源的带电碎片偏转的磁场的磁体结构。磁体结构被构造和布置成通过污染屏障提供磁场。当通过污染屏障时，磁场沿着通常与污染屏障旋转轴线重合的平面定向。

52. 发明授权

US08120752B2 Lithographic apparatus 有权
标题翻译：平版印刷设备
公开(公告)号：US08120752B2
公开(公告)日：2012-02-21
申请号：US12466185
申请日：2009-05-14
申请人： Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen
发明人： Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen
IPC分类号： G03B27/72
CPC分类号： G02B27/44 , G02B5/1838 , G02B5/1876 , G02B27/4244 , G02F1/061 , G03F7/70191 , G21K1/06 , G21K2201/067
摘要： A zone plate includes a plurality of consecutively arranged, adjacent, and alternating first and second regions. The first regions are arranged to be substantially transparent to a first predetermined wavelength of radiation and a second predetermined wavelength of radiation that is different from the first predetermined wavelength of radiation. The second regions are arranged to be substantially opaque, diffractive, or reflective to the first predetermined wavelength of radiation and substantially transparent to the second predetermined wavelength of radiation.
摘要翻译：区域板包括多个连续布置的，相邻的和交替的第一和第二区域。第一区域被布置成对于辐射的第一预定波长和不同于第一预定波长辐射的第二预定波长的辐射基本上是透明的。第二区域被布置为基本上不透明，衍射或反射到第一预定波长的辐射并且对第二预定波长的辐射基本透明。

53. 发明申请

US20110149262A1 SPECTRAL PURITY FILTER AND LITHOGRAPHIC APPARATUS 有权
标题翻译：光谱滤光片和光刻设备
公开(公告)号：US20110149262A1
公开(公告)日：2011-06-23
申请号：US13060581
申请日：2009-07-29
申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer
发明人： Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer
IPC分类号： G03B27/72 , G02B5/28 , G21K1/00
CPC分类号： G03F7/70958 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F7/70191 , G03F7/70308 , G03F7/70575 , G21K1/062
摘要： A spectral purity filter is configured to reflect extreme ultraviolet radiation. The spectral purity filter includes a substrate, and an anti-reflective coating on a top surface of the substrate. The anti-reflective coating is configured to transmit infrared radiation. The filter also includes a multi-layer stack configured to reflect extreme ultraviolet radiation and to substantially transmit infrared radiation.
摘要翻译：光谱纯度滤光器被配置为反射极紫外辐射。光谱纯度滤光器包括基板和在基板顶表面上的抗反射涂层。抗反射涂层被配置为透射红外辐射。该滤波器还包括配置成反射极紫外辐射并基本上透射红外辐射的多层叠层。

54. 发明申请

US20110007292A1 LITHOGRAPHIC APPARATUS, PLASMA SOURCE, AND REFLECTING METHOD 失效
标题翻译：光刻设备，等离子体源和反射方法
公开(公告)号：US20110007292A1
公开(公告)日：2011-01-13
申请号：US12920417
申请日：2009-03-03
申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer
发明人： Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer
IPC分类号： G03B27/54 , G21G1/00 , G21K1/00
CPC分类号： G03F7/70958 , G03F7/70033 , G03F7/70916 , G03F7/70983
摘要： A lithographic apparatus includes a plasma source that includes a vessel configured to enclose a plasma formation site, an optical device configured to transfer optical radiation to or from the vessel, and a reflector arranged in an optical path between the optical device and the plasma formation site source. The reflector is configured to reflect the optical radiation between the optical device and the plasma formation site. The reflector is formed, in operation, as a molten metal mirror.
摘要翻译：光刻设备包括等离子体源，其包括构造成包围等离子体形成位置的容器，被配置为向容器转移光辐射的光学器件和布置在光学器件与等离子体形成部位之间的光路中的反射器资源。反射器被配置为反射光学装置和等离子体形成部位之间的光辐射。反射器在操作中形成为熔融金属镜。

55. 发明申请

US20100181502A1 SELF-SHADING ELECTRODES FOR DEBRIS SUPPRESSION IN AN EUV SOURCE 失效
标题翻译：用于在EUV源中进行抑制的自抛光电极
公开(公告)号：US20100181502A1
公开(公告)日：2010-07-22
申请号：US11634385
申请日：2006-12-06
申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer
发明人： Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer
IPC分类号： G21K5/02
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70175 , H05G2/003 , H05G2/005
摘要： A radiation source having self-shading electrodes is disclosed. Debris originating from the electrodes is reduced. The path from the electrodes to the EUV optics is blocked by part of the electrodes themselves (termed self-shading). This may significantly reduce the amount of electrode-generated debris.
摘要翻译：公开了具有自阴影电极的辐射源。源自电极的碎片减少。从电极到EUV光学器件的路径被部分电极自身阻挡（称为自阴影）。这可能会显着减少电极产生的碎片的数量。

56. 发明授权

US08665420B2 Spectral purity filter and lithographic apparatus 有权
标题翻译：光谱纯度滤光片和光刻设备
公开(公告)号：US08665420B2
公开(公告)日：2014-03-04
申请号：US13060581
申请日：2009-07-29
申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer
发明人： Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/70958 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F7/70191 , G03F7/70308 , G03F7/70575 , G21K1/062
摘要： A spectral purity filter is configured to reflect extreme ultraviolet radiation. The spectral purity filter includes a substrate, and an anti-reflective coating on a top surface of the substrate. The anti-reflective coating is configured to transmit infrared radiation. The filter also includes a multi-layer stack configured to reflect extreme ultraviolet radiation and to substantially transmit infrared radiation.
摘要翻译：光谱纯度滤光器被配置为反射极紫外辐射。光谱纯度滤光器包括基板和在基板顶表面上的抗反射涂层。抗反射涂层被配置为透射红外辐射。该滤波器还包括配置成反射极紫外辐射并基本上透射红外辐射的多层叠层。

57. 发明授权

US08289499B2 Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby 有权
标题翻译：光学元件，包括这种光学元件的光刻设备，器件制造方法以及由此制造的器件
公开(公告)号：US08289499B2
公开(公告)日：2012-10-16
申请号：US12495043
申请日：2009-06-30
申请人： Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen
发明人： Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen
IPC分类号： G02B5/26 , F21V9/08 , G03B27/72
CPC分类号： G03F7/70958 , G03F7/70575
摘要： Spectral purity of a radiation beam of a first wavelength may be improved by providing an optical element that includes a structure having at least first layer including a first material, which structure is configured to be substantially reflective for a radiation of the first wavelength and substantially transparent or absorptive for a radiation of a second wavelength, a second layer including a second material, the second layer being configured to be substantially reflective, absorptive or scattering for the radiation of the second wavelength, and vacuum between the first layer and the second layer, wherein the first layer is located upstream in the optical path of incoming radiation with respect to the second layer.
摘要翻译：可以通过提供一种光学元件来改善第一波长的辐射束的光谱纯度，所述光学元件包括具有至少包括第一材料的第一层的结构，该结构被配置为对于第一波长的辐射基本上是反射的，并且基本上透明或吸收第二波长的辐射，第二层包括第二材料，第二层被配置为对于第二波长的辐射是基本反射的，吸收的或散射的，以及第一层和第二层之间的真空，其中所述第一层位于相对于所述第二层的入射辐射的光路中的上游。

58. 发明授权

US08263950B2 Radiation source 有权
标题翻译：辐射源
公开(公告)号：US08263950B2
公开(公告)日：2012-09-11
申请号：US12788903
申请日：2010-05-27
申请人： Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen , Kurt Gielissen , Martin Jacobus Johan Jak
发明人： Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen , Kurt Gielissen , Martin Jacobus Johan Jak
IPC分类号： G03B27/54 , G21K5/00
CPC分类号： H05G2/001 , G03F7/70033 , G03F7/70858 , G21K2201/06
摘要： A radiation source may include a radiation emitter for emitting radiation, a collector for collecting radiation emitted by the radiation emitter, and an outlet configured, in use, to introduce a cooled gas into the radiation source.
摘要翻译：辐射源可以包括用于发射辐射的辐射发射器，用于收集由辐射发射器发射的辐射的收集器以及在使用中被配置成将冷却的气体引入到辐射源中的出口。

59. 发明授权

US08071963B2 Debris mitigation system and lithographic apparatus 失效
标题翻译：碎片缓解系统和光刻设备
公开(公告)号：US08071963B2
公开(公告)日：2011-12-06
申请号：US11645809
申请日：2006-12-27
申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Derk Jan Wilfred Klunder , Wouter Anthon Soer , Kurt Gielissen
发明人： Maarten Marinus Johannes Wilhelmus Van Herpen , Derk Jan Wilfred Klunder , Wouter Anthon Soer , Kurt Gielissen
IPC分类号： G21G5/00
CPC分类号： G03F7/70916 , G03F7/70858 , H05G2/003 , H05G2/005
摘要： A debris mitigation system for trapping contaminant material coming from a debris-generating radiation source. The system includes a contamination barrier constructed and arranged to rotate about an axis, and a magnet structure constructed and arranged to provide a magnetic field for deflecting charged debris from the radiation source. The magnet structure is constructed and arranged to provide a magnetic field through the contamination barrier. The magnetic field, when passing through the contamination barrier, is oriented along planes generally coinciding with the axis of rotation of the contamination barrier.
摘要翻译：用于捕集来自碎屑产生辐射源的污染物质的碎片缓解系统。该系统包括构造和布置成围绕轴线旋转的污染屏障，以及构造和布置成提供用于使来自辐射源的带电碎片偏转的磁场的磁体结构。磁体结构被构造和布置成通过污染屏障提供磁场。当通过污染屏障时，磁场沿着通常与污染屏障旋转轴线重合的平面定向。

60. 发明申请

US20110092956A1 CATHETER WITH SEPARABLE SECTIONS 审中-公开
标题翻译：具有可分段的导管
公开(公告)号：US20110092956A1
公开(公告)日：2011-04-21
申请号：US12999394
申请日：2009-06-24
申请人： Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen
发明人： Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen
IPC分类号： A61M25/00
CPC分类号： A61B1/0051 , A61B1/00094 , A61B1/00156 , A61M25/0069 , A61M25/0105 , A61M2025/0175
摘要： The present invention relates to a catheter comprising a catheter body section (1) and at least one catheter tip section (2). The catheter body section (1) can extend in a longitudinal direction. The at least one catheter tip section (2) may be located on a distal side of the catheter body section (1). In a first operation mode of the catheter usable during insertion thereof, the catheter body section (1) and the at least one catheter tip section (2) can be commonly moved substantially in the longitudinal direction. In a second operation mode of the catheter usable when the catheter has reached a position where it should not be advanced any further, the catheter body section (1) and the at least one catheter tip section (2) may be moved relative to each other, so that the at least one catheter tip section (2) can be separated from the catheter body section (1).
摘要翻译：本发明涉及包括导管主体部分（1）和至少一个导管末端部分（2）的导管。导管主体部分（1）可沿纵向方向延伸。至少一个导管末端部分（2）可以位于导管主体部分（1）的远侧。在可插入其中的导管的第一操作模式中，导管主体部分（1）和至少一个导管末端部分（2）可以基本上在纵向上移动。在导管可到达不再进一步推进的位置的导管的第二操作模式中，导管主体部分（1）和至少一个导管末梢部分（2）可相对于彼此移动，使得至少一个导管末端部分（2）可以与导管主体部分（1）分离。

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