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1. 发明申请

US20180314164A1 RADIATION BEAM APPARATUS 审中-公开
公开(公告)号：US20180314164A1
公开(公告)日：2018-11-01
申请号：US15523938
申请日：2015-11-10
申请人： ASML NETHERLANDS B.V.
发明人： Jeroen DEKKERS , Han-Kwang NIENHUYS , Michael Jozef Mathijs RENKENS , Johannes Antonius Gerardus AKKERMANS , Gosse Charles DE VRIES , Erik Roelof LOOPSTRA
IPC分类号： G03F7/20 , G02B5/18 , G02B26/00
CPC分类号： G03F7/70158 , G02B5/1828 , G02B5/1838 , G02B5/1861 , G02B6/29314 , G02B26/004 , G03F7/70266 , G03F7/70308
摘要： An adjustable diffraction grating includes: an optical element and a distortion mechanism. The optical element has an optical surface to receive an input radiation beam. The optical element is provided with a plurality of closed channels below the optical surface, above each closed channel the optical surface being formed from a membrane of material. The distortion mechanism includes one or more actuators that are operable to distort the membranes over the closed channels so as to control the shape of the optical surface and to form a periodic structure on the optical surface which acts as a diffraction grating such that the input radiation beam is diffracted from the optical element to form a plurality of angularly separated sub-beams.

2. 发明授权

US09974298B2 Method for producing a bird protection device and bird protection device 有权
公开(公告)号：US09974298B2
公开(公告)日：2018-05-22
申请号：US15120793
申请日：2015-02-19
申请人： BORAIDENT GmbH , HUNSRUECKER GLASVEREDELUNG WAGENER GmbH & Co. KG
发明人： Hans-Joachim Arnold , Robert Bischoff , Steffen Kuerbitz , Andreas Luster , Thomas Rainer
IPC分类号： A01M29/08 , A01M29/06 , C03C21/00 , C03C23/00 , B23K26/00 , B23K26/082 , B32B17/10 , B23K26/53 , G02B5/18 , B23K26/361 , A01M29/00 , B23K103/16 , B23K103/00
CPC分类号： A01M29/08 , A01M29/00 , A01M29/06 , B23K26/0006 , B23K26/082 , B23K26/355 , B23K26/361 , B23K26/53 , B23K2103/166 , B23K2103/50 , B23K2103/54 , B32B17/10036 , B32B17/1022 , B32B17/10266 , B32B17/10761 , C03C21/008 , C03C23/0025 , C03C2218/328 , G02B5/1838
摘要： The invention relates to a method for producing a bird protection device and to a bird protection device. According to the invention, a method for producing a bird protection device is proposed, wherein the bird protection device is made of an at least partially transparent material and contains an optical structure visible to a bird's eye. Here, the method comprises a radiation input, wherein the radiation input is implemented on and/or in the partially transparent material for forming the optical structure. The radiation input is preferably laser radiation. Suitable lasers for the radiation input are, for example, CO2 lasers with a wavelength of 1064 nm, picosecond lasers with a wavelength of 532 nm or nanosecond lasers with a wavelength of 532 nm. In one embodiment of the invention, the bird protection device furthermore comprises an element for increasing the contrast, wherein, for forming the optical structure, the radiation input is implemented on and/or in the element for increasing the contrast.

3. 发明授权

US09594306B2 Lithographic apparatus, spectral purity filter and device manufacturing method 有权
标题翻译：平版印刷设备，光谱纯度滤光片和器件制造方法
公开(公告)号：US09594306B2
公开(公告)日：2017-03-14
申请号：US14002000
申请日：2011-12-21
申请人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
发明人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
IPC分类号： G03F7/20 , B82Y10/00 , G21K1/06 , H05G2/00
CPC分类号： G03F7/70191 , B82Y10/00 , G02B1/11 , G02B5/1838 , G02B5/281 , G02B5/283 , G03F7/70008 , G03F7/702 , G03F7/70308 , G03F7/70575 , G21K1/062 , G21K1/067 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
摘要翻译：一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度过滤器具有彼此不同的辐射过滤结构。

4. 发明授权

US09529128B2 Non-uniform grating 有权
标题翻译：不均匀光栅
公开(公告)号：US09529128B2
公开(公告)日：2016-12-27
申请号：US13640420
申请日：2010-04-26
申请人： Charles M. Santori , David A. Fattal
发明人： Charles M. Santori , David A. Fattal
IPC分类号： G02B5/18 , G01N21/64 , G02B27/09 , G02B19/00 , G01N21/63 , G01N21/87
CPC分类号： G02B5/1866 , G01N21/636 , G01N21/6456 , G01N21/87 , G01N2021/646 , G01N2201/0635 , G02B5/18 , G02B5/1838 , G02B19/0009 , G02B19/0052 , G02B27/0944
摘要： A system includes a non-uniform grating having a first region with a first refractive index and second regions with a second refractive index. A pattern of the second regions varies with an angular coordinate such that phase shifts of an incident beam created by the grating cause destructive interference that creates an intensity minimum within an output beam from the grating.
摘要翻译：一种系统包括具有第一折射率的第一区域和具有第二折射率的第二区域的非均匀光栅。第二区域的图案随着角度坐标而变化，使得由光栅产生的入射光束的相移引起相消干涉，其在来自光栅的输出光束内产生强度最小值。

5. 发明授权

US09439613B2 System and method for phase-contrast X-ray imaging 有权
标题翻译：用于相位对比X射线成像的系统和方法
公开(公告)号：US09439613B2
公开(公告)日：2016-09-13
申请号：US14174830
申请日：2014-02-06
申请人： THE JOHNS HOPKINS UNIVERSITY
发明人： Dan Stutman , Michael Finkenthal
IPC分类号： G01N23/207 , G06K9/20 , G02B5/18 , A61B6/00 , G01N23/20 , G01N23/04 , G02B6/02 , G01N15/14 , G01N21/41
CPC分类号： A61B6/484 , A61B6/4035 , G01N23/046 , G01N23/20008 , G01N23/20075 , G01N23/207 , G01N2015/1454 , G01N2021/4186 , G01N2223/419 , G02B5/1814 , G02B5/1819 , G02B5/1838 , G02B5/1842 , G02B5/1871 , G02B6/02085 , G06K9/2036 , G21K2207/005
摘要： A differential phase contrast X-ray imaging system includes an X-ray illumination system, a beam splitter arranged in a radiation path of the X-ray illumination system, and a detection system arranged in a radiation path to detect X-rays after passing through the beam splitter.
摘要翻译：差分相位差X射线成像系统包括X射线照射系统，布置在X射线照射系统的辐射路径中的分束器和布置在辐射路径中的检测系统，以在穿过X射线照射系统之后检测X射线分束器。

6. 发明申请

US20160128665A1 CORRECTION IN SLIT-SCANNING PHASE CONTRAST IMAGING 有权
标题翻译：在扫描相位对比成像中的校正
公开(公告)号：US20160128665A1
公开(公告)日：2016-05-12
申请号：US14896783
申请日：2014-06-27
申请人： KONINKLIJKE PHILIPS N.V.
发明人： Ewald ROESSL , Gerhard MARTENS
IPC分类号： A61B6/00 , G01N23/20 , G21K1/10
CPC分类号： A61B6/582 , A61B6/484 , A61B6/5258 , A61B6/583 , G01N23/20075 , G01N2223/303 , G02B5/1838 , G21K1/06 , G21K1/10 , G21K2207/005
摘要： The present invention relates to calibration in X-ray phase contrast imaging. In order to remove the disturbance due to individual gain factors, a calibration filter grating (10) for a slit-scanning X-ray phase contrast imaging arrangement is provided that comprises a first plurality of filter segments (11) comprising a filter material (12) and a second plurality of opening segments (13). The filter segments and the opening segments are arranged alternating as a filter pattern (15). The filter material is made from a material with structural elements (14) comprising structural parameters in the micrometer region. The filter grating is movably arranged between an X-ray source grating (54) and an analyzer grating (60) of an interferometer unit in a slit-scanning system of a phase contrast imaging arrangement. The slit-scanning system is provided with a pre-collimator (55) comprising a plurality of bars (57) and slits (59). The filter pattern is aligned with the pre-collimator pattern (61).
摘要翻译：本发明涉及X射线相位成像中的校准。为了消除由于各种增益因素引起的干扰，提供了一种用于狭缝扫描X射线相位成像装置的校准滤光器光栅（10），其包括第一多个过滤器段（11），其包括过滤材料（12 ）和第二多个开口段（13）。过滤器段和开口段作为过滤器图案交替排列（15）。过滤材料由具有包括微米区域中的结构参数的结构元件（14）的材料制成。滤光器光栅可移动地布置在相位成像装置的狭缝扫描系统中的干涉仪单元的X射线源光栅（54）和分析器光栅（60）之间。狭缝扫描系统设置有包括多个杆（57）和狭缝（59）的预准直器（55）。滤光片图案与预准直图案（61）对准。

7. 发明授权

US09151881B2 Phase grating for mask inspection system 有权
标题翻译：掩模检测系统相位光栅
公开(公告)号：US09151881B2
公开(公告)日：2015-10-06
申请号：US13786049
申请日：2013-03-05
申请人： KLA-Tencor Corporation
发明人： Daimian Wang , Oleg Khodykin , Daniel Wack , Li Wang , Yanwei Liu
IPC分类号： G01J1/42 , G02B5/18 , G01J3/18 , G01N21/956 , G03F1/00 , G02B5/20
CPC分类号： G02B5/1838 , G01J3/18 , G01N21/956 , G01N2021/95676 , G02B5/203 , G03F1/0092 , G03F1/84
摘要： Spectral Purity Filters, or SPFs, are disclosed. Such SPFs are designed to block out the 1030 nm drive laser and other undesired out of band light in a EUV mask inspection system. Different phase grating configurations for near normal incidence and grazing incidence are provided in the present disclosure and are configured specifically for EUV mask inspection.
摘要翻译：公开了光谱纯化过滤器或SPF。这样的SPF被设计为在EUV掩模检查系统中阻挡1030nm驱动激光器和其它不期望的带外光。在本公开内容中提供了用于近似法向入射和掠入射的不同相位光栅配置，并且被专门用于EUV掩模检查。

8. 发明授权

US09046466B2 X-ray imaging apparatus 有权
标题翻译： X射线成像装置
公开(公告)号：US09046466B2
公开(公告)日：2015-06-02
申请号：US13641966
申请日：2011-05-20
申请人： Chidane Ouchi
发明人： Chidane Ouchi
IPC分类号： G03H5/00 , G01N23/20 , G01B9/021 , G03H1/10 , G01N23/04 , G01J9/02 , A61B6/00 , G02B5/18 , G01J9/00 , G21K1/06 , G01B11/25
CPC分类号： G01N23/04 , A61B6/4291 , A61B6/484 , G01B11/2527 , G01J9/00 , G01J9/0215 , G01N2223/1016 , G01N2223/32 , G02B5/18 , G02B5/1814 , G02B5/1838 , G02B5/1842 , G02B5/1871 , G02B5/189 , G21K1/06 , G21K2201/06 , G21K2207/005
摘要： Provided is an X-ray imaging apparatus having simple configuration and obtaining differential phase contrast images in two directions crossing each other without rotating the diffraction grating and the masking grating. The apparatus including: a diffraction grating diffracting X-rays; a masking grating masking portions rays and transmitting portions are two-dimensionally arranged to partially mask bright zones of the interference pattern; a moving device changing the relative position between the interference pattern and the masking grating; a detector detecting the intensity distribution of the X-rays transmitted through the masking grating; and a calculator calculating a differential phase contrast image or a phase contrast image of a subject, the calculator being configured to calculate the differential phase contrast image or the phase contrast image in each of two mutually crossing directions on the basis of results of detection performed a plurality of times by the detector.
摘要翻译：本发明提供一种具有简单结构的X射线成像设备，并且在不旋转衍射光栅和掩蔽光栅的情况下彼此交叉的两个方向获得差分相位差图像。该装置包括衍射光栅衍射X射线; 屏蔽光栅遮蔽部分光线和透射部分被二维布置以部分地掩蔽干涉图案的亮区; 移动装置改变干涉图案和掩蔽光栅之间的相对位置; 检测器，其检测透过所述掩蔽光栅的X射线的强度分布; 以及计算器，其计算对象的差分相位差图像或相位对比图像，所述计算器被配置为基于检测结果a计算两个相互交叉方向中的每一个中的差分相位对比图像或相位对比图像多次由检测器。

9. 发明申请

US20140021367A1 POLARIZED LIGHT SPLITTING ELEMENT 有权
标题翻译：极化分光元件
公开(公告)号：US20140021367A1
公开(公告)日：2014-01-23
申请号：US14039924
申请日：2013-09-27
申请人： LG CHEM, LTD.
发明人： Tae Su KIM , Jeong Ho PARK , Bu Gon SHIN , Jae Jin KIM , Jong Byung LEE , Jin Mi JUNG
IPC分类号： G02B5/30 , B29D11/00 , B01J19/12
CPC分类号： G02B5/3091 , B01J19/12 , B29D11/00 , B29D11/00644 , G02B5/1838 , G02B5/3058 , G02B5/3075 , G02B27/283
摘要： Provided are a polarized light splitting element, a method of manufacturing the same, a light radiating device, a method of radiating light, and a method of manufacturing an ordered photo-alignment film. The polarized light splitting element has excellent durability with respect to UV rays and heat, and low pitch dependence of polarization characteristics, so that it is easily manufactured. In addition, the polarized light splitting element may realize a high polarization degree and extinction ratio even in a short wavelength region.
摘要翻译：本发明提供一种偏振光分离元件及其制造方法，发光装置，照明方法以及有序光取向膜的制造方法。偏振光分离元件相对于紫外线和热量具有优异的耐久性，以及极化特性的低音调依赖性，因此易于制造。此外，偏振光分离元件即使在短波长区域中也可实现高偏振度和消光比。

10. 发明申请

US20130335816A1 METHOD FOR PRODUCING A REFLECTIVE OPTICAL COMPONENT FOR AN EUV PROJECTION EXPOSURE APPARATUS AND COMPONENT OF THIS TYPE 有权
标题翻译：用于生产EUV投影曝光装置的反射光学元件的方法和该类型的组件
公开(公告)号：US20130335816A1
公开(公告)日：2013-12-19
申请号：US13971031
申请日：2013-08-20
申请人： Carl Zeiss SMT GmbH , Carl Zeiss Laser Optics GmbH
发明人： Holger Kierey , Heiko Siekmann , Andre Bresan
IPC分类号： G02B5/20
CPC分类号： G02B5/208 , B24B13/00 , G02B1/10 , G02B5/0891 , G02B5/10 , G02B5/1838 , G02B5/1852 , G02B5/1857 , G03F7/70316 , G21K2201/064 , G21K2201/065 , G21K2201/067
摘要： A method for producing a reflective optical component for an EUV projection exposure apparatus, the component having a substrate having a base body, and a reflective layer arranged on the substrate, wherein the substrate has an optically operative microstructuring, comprises the following steps: working the microstructuring into the substrate, polishing the substrate after the microstructuring has been worked into the substrate, applying the reflective layer to the substrate. A reflective optical component for an EUV projection exposure apparatus correspondingly has a polished surface between the microstructuring and the reflective layer.
摘要翻译：一种用于制造用于EUV投影曝光装置的反射型光学部件的方法，具有基体的部件和设置在基板上的反射层的部件，其中基板具有光学上的微结构化，包括以下步骤：微结构化到衬底中，在微结构化已经加工到衬底中之后对衬底进行抛光，将反射层施加到衬底上。用于EUV投影曝光装置的反射型光学部件对应地具有在微结构化和反射层之间的抛光表面。

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