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    • 65. 发明申请
    • High-Voltage BJT Formed Using CMOS HV Processes
    • 使用CMOS HV工艺形成高压BJT
    • US20100301453A1
    • 2010-12-02
    • US12750503
    • 2010-03-30
    • Tao Wen ChungPo-Yao KeWei-Yang LinShine Chung
    • Tao Wen ChungPo-Yao KeWei-Yang LinShine Chung
    • H01L27/082
    • H01L27/0823H01L29/0692H01L29/0821H01L29/7322H01L29/735
    • An integrated circuit device includes a semiconductor substrate having a top surface; at least one insulation region extending from the top surface into the semiconductor substrate; a plurality of base contacts of a first conductivity type electrically interconnected to each other; and a plurality of emitters and a plurality of collectors of a second conductivity type opposite the first conductivity type. Each of the plurality of emitters, the plurality of collectors, and the plurality of base contacts is laterally spaced apart from each other by the at least one insulation region. The integrated circuit device further includes a buried layer of the second conductivity type in the semiconductor substrate, wherein the buried layer has an upper surface adjoining bottom surfaces of the plurality of collectors.
    • 集成电路器件包括具有顶表面的半导体衬底; 至少一个绝缘区域,从所述顶表面延伸到所述半导体衬底中; 多个彼此电互连的第一导电类型的基座触头; 以及与第一导电类型相反的第二导电类型的多个发射极和多个集电极。 多个发射器,多个集光器和多个基座触点中的每一个通过至少一个绝缘区域彼此横向间隔开。 集成电路装置还包括在半导体衬底中的第二导电类型的掩埋层,其中掩埋层具有邻接多个集电极的底表面的上表面。
    • 67. 发明授权
    • Selective and non-selective epitaxy for base intergration in a BiCMOS process
    • 选择性和非选择性外延,用于BiCMOS工艺中的基础整合
    • US07795703B1
    • 2010-09-14
    • US12290987
    • 2008-11-05
    • Greg D. U'Ren
    • Greg D. U'Ren
    • H01L27/082
    • H01L29/732H01L21/8249H01L29/1004H01L29/66287
    • According to one exemplary embodiment, a bipolar transistor includes an active area situated between first and second isolation regions in a substrate. The bipolar transistor further includes an epitaxial extension layer situated on the active area, where the epitaxial extension layer extends over the first and second isolation regions. The bipolar transistor further includes a base layer situated on the epitaxial extension layer, where the base layer includes an epitaxial base, and where the epitaxial base includes a usable emitter formation area. The active area has a first width and the usable emitter formation area has a second width, where the second width is at least as large as the first width.
    • 根据一个示例性实施例,双极晶体管包括位于衬底中的第一和第二隔离区之间的有源区。 双极晶体管还包括位于有源区上的外延延伸层,其中外延延伸层在第一和第二隔离区上延伸。 双极晶体管还包括位于外延延伸层上的基极层,其中基极层包括外延基极,并且其中外延基底包括可用的发射极形成区域。 有源区域具有第一宽度,并且可用的发射体形成区域具有第二宽度,其中第二宽度至少与第一宽度一样大。
    • 70. 发明授权
    • Semiconductor apparatus and method of manufacturing the same
    • 半导体装置及其制造方法
    • US07732896B2
    • 2010-06-08
    • US11480428
    • 2006-07-05
    • Kouzi Hayasi
    • Kouzi Hayasi
    • H01L27/082
    • H01L29/7304
    • A semiconductor apparatus comprises a plurality of transistor devices including a control terminal being inputted with a control signal and a first and a second terminals that a current flows therein according to the control signal, and a plurality of substrate conductive portions each formed in a region different from a region where the plurality of transistor devices are formed therein, wherein the transistor devices are connected to the substrate conductive portions, and each of the substrate conductive portion includes a semiconductor layer separated from other substrate conductive portions.
    • 一种半导体装置,包括多个晶体管器件,包括输入控制信号的控制端子和电流根据控制信号流入其中的第一和第二端子,以及多个衬底导电部件,每个衬底导电部件形成在不同的区域中 从其中形成有多个晶体管器件的区域,其中晶体管器件连接到衬底导电部分,并且每个衬底导电部分包括与其它衬底导电部分分离的半导体层。