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    • 71. 发明授权
    • Vehicle brake control device
    • 车辆制动控制装置
    • US07621603B2
    • 2009-11-24
    • US11709092
    • 2007-02-22
    • Takashi SatoHiroaki Niino
    • Takashi SatoHiroaki Niino
    • B60T13/20B60T8/42B60T8/60
    • B60T7/042B60T8/4059B60T8/4081
    • When the ABS control is executed by the ABS control portion, the vehicle brake control device calculates the first rotational speeds of the first and second motors necessary to achieve the corresponding pressure increase rates and calculates the second rotational speeds of the first and second motors as the upper limits caused by the unlocking pressure limits. Then the vehicle brake control device controls current values of the currents to be supplied to the first and second motors so that they are rotated in the rotational speeds obtained within a range from the first rotational speeds to the second rotational speeds.
    • 当由ABS控制部执行ABS控制时,车辆制动控制装置计算实现相应的增压率所需的第一和第二电动机的第一转速,并计算出第一和第二电动机的第二转速为 由解锁压力限制引起的上限。 然后,车辆制动控制装置控制要提供给第一和第二电动机的电流的电流值,使得它们以从第一转速到第二转速的范围内获得的转速旋转。
    • 72. 发明授权
    • Electro-optical device and electronic apparatus
    • 电光装置和电子设备
    • US07619256B2
    • 2009-11-17
    • US11730287
    • 2007-03-30
    • Yukiya HirabayashiTakashi Sato
    • Yukiya HirabayashiTakashi Sato
    • H01L27/14
    • G02F1/136213G02F2201/40G02F2202/103G02F2202/42H01L27/1255
    • An electro-optical device includes an element substrate having a plurality of pixel regions; thin-film transistors, arranged in the pixel regions, including gate electrodes, portions of a gate insulating layer, and semiconductor layers; pixel electrodes electrically connected to drain regions of the thin-film transistors; and storage capacitors including lower electrodes and upper electrodes that are opposed to the lower electrodes with insulating layers disposed therebetween, the insulating layers being made of the same material as that for forming the gate insulating layer. The upper electrodes overlap with some of end portions of the lower electrodes. The gate insulating layer has thin portions located in inner portions of regions overlapping with the lower and upper electrodes and thick portions which are located in regions overlapping with the upper electrodes and the end portions of the lower electrodes and which have a thickness greater than that of the thin portions.
    • 电光装置包括具有多个像素区域的元件基板; 布置在像素区域中的薄膜晶体管,包括栅电极,栅极绝缘层的部分和半导体层; 电连接到薄膜晶体管的漏极区域的像素电极; 以及包括与设置在其间的绝缘层相对的下电极的下电极和上电极的存储电容器,所述绝缘层由与用于形成栅极绝缘层的材料相同的材料制成。 上电极与下电极的一些端部重叠。 栅绝缘层具有位于与下电极和上电极重叠的区域的内部的薄部分和位于与上电极和下电极的端部重叠的区域中的厚部分,其厚度大于 薄的部分。
    • 75. 发明授权
    • Electro-optical device and electronic apparatus
    • 电光装置和电子设备
    • US07569885B2
    • 2009-08-04
    • US11785219
    • 2007-04-16
    • Yukiya HirabayashiTakashi SatoYutaka Sano
    • Yukiya HirabayashiTakashi SatoYutaka Sano
    • H01L27/01H01L27/12H01L31/0392
    • H01L27/124H01L27/1255
    • An electro-optical device includes pixel regions arranged at intersections of a plurality of data lines and a plurality of scanning lines on an element substrate. A sensor element, a sensor signal line for outputting a signal from the sensor element, a common wiring line, and a capacitive-coupling-operation bidirectional diode element are disposed at an end of a region on the element substrate in which the pixel regions are arranged. The capacitive-coupling-operation bidirectional diode element includes two capacitive-coupling-operation diode elements each including a semiconductor element including a source electrode, a drain electrode, a semiconductor layer having a channel region, and a gate electrode facing the channel region with a gate insulating film disposed therebetween, and a capacitor element arranged between one of the source electrode and the drain electrode and the gate electrode.
    • 电光装置包括配置在元件基板上的多条数据线和多条扫描线的交点处的像素区域。 传感器元件,用于输出来自传感器元件的信号的传感器信号线,公共布线和电容耦合操作双向二极管元件设置在元件基板上的像素区域为 安排。 电容耦合操作双向二极管元件包括两个电容耦合操作二极管元件,每个二极管元件包括半导体元件,该半导体元件包括源电极,漏电极,具有沟道区的半导体层,以及面向沟道区的栅电极, 设置在它们之间的栅极绝缘膜,以及布置在源极电极和漏极电极之间的电容器元件和栅电极。
    • 76. 发明申请
    • ADHESIVE FOR WIG, WIG USING THE SAME, AND METHODS OF MANUFACTURING THE BOTH
    • 用于WIG,使用它的粘合剂,以及制造两者的方法
    • US20090126753A1
    • 2009-05-21
    • US11577983
    • 2005-07-22
    • Katsuo SugaiTakashi SatoFumitaka SugawaraYoshie Ogawa
    • Katsuo SugaiTakashi SatoFumitaka SugawaraYoshie Ogawa
    • A41G3/00C09J175/04B05D3/10
    • A41G3/0025C08G18/10C08G18/4829C08G2190/00C08G18/36
    • An adhesive for a wig, a wig using the same, and methods of manufacturing the both are such that the adhesive for a wig has a single layer, is bondable unpeelably to the inner side of a wig base, and is bondable by pressure re-peelably to scalp, wherein the adhesive layer (4) is provided to fix needle foot portions of hair (3) penetrated to the inner side of the wig base (2). One side of the adhesive layer (4) is bondable by chemical reaction to the inner side of the wig base (2) during gelation reaction of the adhesive solution applied to the inner side of the wig base (2), while the other side is bondable by pressure re-peelably to scalp. One side of the adhesive layer (4) has the hair fixing function to fix the needle foot portion of hair (3A) planted penetrating the inner side of the wig base (2). Since the wig (1) is made as double layer structure with a single adhesive layer (4), it is light-weighted, and since the adhesive layer (4) has re-peelability, it can be used repeatedly, resulting in low cost.
    • 用于假发的粘合剂,使用该假发的假发以及制造这两者的方法使得用于假发的粘合剂具有单层,可与假发基底的内侧不可剥离地接合,并且可通过压力重新粘结, 剥离到头皮上,其中粘合层(4)设置成固定穿过假发基底(2)内侧的毛发(3)的针脚部分。 粘合剂层(4)的一面可通过化学反应与假发基体(2)的内侧粘结,在凝胶化反应期间施加于假发基体(2)的内侧,而另一侧为 可通过压力重新剥离到头皮上。 粘合剂层(4)的一侧具有头发定影功能,以固定穿过假发基体(2)的内侧的头发(3A)的针脚部分。 由于将假发(1)制成具有单层粘合剂层(4)的双层结构,所以其重量轻,由于粘合剂层(4)具有再剥离性,因此可以重复使用,导致成本低 。
    • 77. 发明授权
    • Finishing machine
    • 整理机
    • US07534077B2
    • 2009-05-19
    • US11204225
    • 2005-08-16
    • Kazunori BanTakashi SatoKokoro Hatanaka
    • Kazunori BanTakashi SatoKokoro Hatanaka
    • B23C1/00
    • G05B19/4163Y02P90/265Y10T409/30084Y10T409/301792Y10T409/303472Y10T409/304256
    • A surface of a workpiece is traced when a machining tool is pressed onto the surface of the workpiece under force control so as to find the positional data of the surface shape. This positional data is corrected by an error caused by a bend of a robot. The positional data is compared with the target shape of the surface, from which the burr is removed. A shift of the surface shape in the normal line direction is found. The burr generation start position, the burr generation end position and the height of the burr are found by the shift start position, the shift end position and the shift size. A machining program is made which is composed of a pass connecting the burr end position with the burr start position and also composed of a cutting pass for removing the burr, and the thus made machining program is executed. As the burr position is found and the burr is removed when the machining tool is moved to the burr position, the burr can be effectively removed.
    • 当在力控制下将加工工具按压到工件的表面上时,跟踪工件的表面,以找到表面形状的位置数据。 该位置数据由机器人的弯曲引起的误差进行校正。 将位置数据与表面的目标形状进行比较,从中去除毛刺。 发现表面形状在法线方向的移动。 毛刺生成开始位置,毛刺生成结束位置和毛刺的高度由换档开始位置,换档结束位置和换档尺寸确定。 进行加工程序,该加工程序由将毛刺末端位置与毛刺起始位置连接起来的通路构成,并且还包括用于去除毛刺的切割道,并且由此制造的加工程序被执行。 当加工刀具移动到毛刺位置时,当发现毛刺位置并除去毛刺时,可以有效地去除毛刺。
    • 79. 发明申请
    • Photomask, method of lithography, and method for manufacturing the photomask
    • 光掩模,光刻方法和制造光掩模的方法
    • US20090098473A1
    • 2009-04-16
    • US12314404
    • 2008-12-10
    • Takashi SatoTakashi Sakamoto
    • Takashi SatoTakashi Sakamoto
    • G03F7/20
    • G03F7/70641B64D47/08G03F1/32
    • A photomask has a monitoring pattern configured to obtain information required for adjusting optical system of a projection lithography tool. The monitoring pattern encompasses a mask substrate and an asymmetrical diffraction grating delineated on the mask substrate, configured to generate a positive first order diffracted light and a negative first order diffracted light in different diffraction efficiencies. The asymmetrical diffraction grating includes a plurality of probing-phase shifters, disposed periodically on the mask substrate in parallel, and a plurality of opaque strips disposed on light-shielding faces of the probing-phase shifters. An asymmetrically recessed ridge implements each of the probing-phase shifters.
    • 光掩模具有被配置为获得调整投影光刻工具的光学系统所需的信息的监视图案。 监测图案包括掩模基板和掩模基板上描绘的非对称衍射光栅,被配置为产生不同衍射效率的正一级衍射光和负一级衍射光。 不对称衍射光栅包括平行地周期性地设置在掩模基板上的多个探测移相器,以及设置在探测移相器的光屏蔽面上的多个不透明条。 不对称凹入的脊部实现每个探测移相器。