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1. 发明授权

US08338308B2 Method of plasma etching Ga-based compound semiconductors 有权
标题翻译：等离子体蚀刻方法Ga基化合物半导体
公开(公告)号：US08338308B2
公开(公告)日：2012-12-25
申请号：US12638741
申请日：2009-12-15
申请人： Weibin Qiu , Lynford L. Goddard
发明人： Weibin Qiu , Lynford L. Goddard
IPC分类号： H01L21/302
CPC分类号： H01L21/30621 , H01J37/32082 , H01J37/32165
摘要： A method of plasma etching Ga-based compound semiconductors includes providing a process chamber and a source electrode adjacent to the process chamber. The process chamber contains a sample comprising a Ga-based compound semiconductor. The sample is in contact with a platen which is electrically connected to a first power supply, and the source electrode is electrically connected to a second power supply. The method includes flowing SiCl4 gas into the chamber, flowing Ar gas into the chamber, and flowing H2 gas into the chamber. RF power is supplied independently to the source electrode and the platen. A plasma is generated based on the gases in the process chamber, and regions of a surface of the sample adjacent to one or more masked portions of the surface are etched to create a substantially smooth etched surface including features having substantially vertical walls beneath the masked portions.
摘要翻译：等离子体蚀刻Ga基化合物半导体的方法包括提供与处理室相邻的处理室和源电极。处理室含有包含Ga基化合物半导体的样品。样品与电连接到第一电源的压板接触，并且源极电连接到第二电源。该方法包括将SiCl 4气体流入室内，使Ar气流入室内，并将H 2气体流入室内。 RF功率独立地提供给源电极和压板。基于处理室中的气体产生等离子体，并蚀刻与表面的一个或多个掩模部分相邻的样品表面的区域，以形成基本平滑的蚀刻表面，其包括在掩模部分下方具有基本垂直壁的特征。

2. 发明授权

US08121245B2 Imaging system 有权
标题翻译：成像系统
公开(公告)号：US08121245B2
公开(公告)日：2012-02-21
申请号：US12930856
申请日：2011-01-19
申请人： Xiaochuan Pan , Yu Zou , Lifeng Yu , Chien-Min Kao , Martin King , Maryellen Giger , Dan Xia , Howard Halpern , Charles Pelizzari , Emil Y. Sidky , Seungryong Cho
发明人： Xiaochuan Pan , Yu Zou , Lifeng Yu , Chien-Min Kao , Martin King , Maryellen Giger , Dan Xia , Howard Halpern , Charles Pelizzari , Emil Y. Sidky , Seungryong Cho
IPC分类号： G01T1/00
CPC分类号： A61B6/5288 , A61B6/027 , A61B6/032 , A61B6/037 , A61B6/484 , A61B6/508 , A61B6/5264 , A61B6/583 , A61B6/587
摘要： A method and apparatus for reconstruction of a region of interest for an object is provided. The reconstruction of the object may be based on chords which may fill a part, all, or more than all of the region of interest. Using chords for reconstruction may allow for reducing data acquired and/or processing for reconstructing a substantially exact image of the ROI. Moreover, various methodologies may be used in reconstructing the image, such as backprojection-filtration, and modified filtration backprojection.
摘要翻译：提供了一种用于重建对象的感兴趣区域的方法和装置。对象的重建可以基于可以填充所有感兴趣区域的全部或全部的和弦。使用和弦进行重建可以允许减少获得的数据和/或用于重建ROI的基本上精确的图像的处理。此外，各种方法可用于重建图像，例如反投影过滤和修改过滤反投影。

3. 发明授权

US07996137B2 Method for production of a brake stand-by function 有权
标题翻译：制动器待机功能的生产方法
公开(公告)号：US07996137B2
公开(公告)日：2011-08-09
申请号：US11632986
申请日：2005-07-08
申请人： Stephan Groitzsch , Torsten Cress
发明人： Stephan Groitzsch , Torsten Cress
IPC分类号： B60T7/12
CPC分类号： B60T8/4854 , B60T7/12 , B60T8/3275 , B60T8/4077 , B60T2201/12
摘要： In a method of changing the trigger threshold of a brake stand-by function of a vehicle brake, the brake stand-by function generates brake pressure in wheel brakes without application of a brake pedal. The trigger threshold value for the brake stand-by function is determined by the following steps: a) determining an average return speed of an accelerator pedal; b) changing the trigger threshold value for the brake stand-by function depending on the determined average return speed of the accelerator pedal. The method allows reducing the number of spurious releases of the brake stand-by function, which a sportive driving style brings about.In another embodiment of the method, the position of the accelerator pedal is used to change the trigger threshold value for the brake stand-by function.
摘要翻译：在改变车辆制动器的制动待机功能的触发阈值的方法中，制动待机功能在不施加制动踏板的情况下产生车轮制动器中的制动压力。制动待机功能的触发阈值由以下步骤决定：a）确定加速踏板的平均回程速度; b）根据确定的加速踏板的平均回程速度，改变制动待机功能的触发阈值。该方法允许减少制动待机功能的杂散释放次数，这是运动型驾驶风格带来的。在该方法的另一实施例中，加速踏板的位置用于改变制动待机功能的触发阈值。

4. 发明授权

US07934909B2 Device for axially conveying fluids 有权
标题翻译：用于轴向输送流体的装置
公开(公告)号：US07934909B2
公开(公告)日：2011-05-03
申请号：US11931053
申请日：2007-10-31
申请人： Peter Nuesser , Johannes Mueller , Hans-Erhard Peters , Joerg Mueller , Werner Neumann , Kurt Graichen , Andreas Arndt
发明人： Peter Nuesser , Johannes Mueller , Hans-Erhard Peters , Joerg Mueller , Werner Neumann , Kurt Graichen , Andreas Arndt
IPC分类号： F04D3/00 , F04D29/057 , F04D29/058
CPC分类号： F04D29/047 , A61M1/101 , A61M1/1012 , A61M1/1015 , A61M1/1017 , A61M1/1031 , A61M1/12 , A61M1/122 , F04D3/02 , F04D13/0633 , F04D29/048
摘要： A device for axially conveying fluids, wherein the conveyor part thereof is entirely magnetically borne and the radial bearing thereof is provided with sufficient rigidity and efficiently dampened, whereby problems encountered when passing through critical speeds and the disadvantageous effects of hydrodynamic and mechanical imbalance of the rotor are avoided. The magnetic bearing is combined with a hydrodynamic bearing.
摘要翻译：用于轴向输送流体的装置，其中其输送部分完全是磁性的，并且其径向轴承具有足够的刚性并被有效地抑制，由此在经过临界速度时遇到的问题以及转子的流体动力学和机械不平衡的不利影响被避免。磁轴承与流体动力轴承组合。

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