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1. 发明授权

US10061202B2 Methods and devices for driving micromirrors 有权
公开(公告)号：US10061202B2
公开(公告)日：2018-08-28
申请号：US13687887
申请日：2012-11-28
申请人： Carl Zeiss SMT GmbH
发明人： Jan Horn , Christian Kempter
IPC分类号： G03B27/54 , G03F7/20 , G02B26/08 , G02B27/00 , G03B27/72
CPC分类号： G03F7/70116 , G02B26/0841 , G02B27/0043 , G03B27/72 , G03F7/70075 , G03F7/702 , G03F7/70525
摘要： A micromirror of a micromirror array in an illumination system of a microlithographic projection exposure apparatus can be tilted through a respective tilt angle about two tilt axes. The micromirror is assigned three actuators which can respectively be driven by control signals in order to tilt the micromirror about the two tilt axes. Two control variables are specified, each of which is assigned to one tilt axis and which are both assigned to unperturbed tilt angles. For any desired combinations of the two control variables, as a function of the two control variables, one of the three actuators is selected and its control signal is set to a constant value, in particular zero. The control signals are determined so that, when the control signals are applied to the other two actuators, the micromirror adopts the unperturbed tilt angles as a function of the two control variables.

2. 发明授权

US09885811B2 Prism film and method and apparatus for manufacturing the same 有权
公开(公告)号：US09885811B2
公开(公告)日：2018-02-06
申请号：US13972142
申请日：2013-08-21
申请人： Beijing BOE Optoelectronics Technology Co., Ltd.
发明人： Rui Li , Junguo Liu
IPC分类号： G02B27/10 , G02B5/04 , G02B3/00 , G03F7/20 , G03B27/72 , G03F7/00
CPC分类号： G02B5/045 , G02B3/0043 , G03B27/72 , G03F7/001 , G03F7/70408
摘要： Embodiments of the present invention provide a prism film and a method and an apparatus for manufacturing the prism film. The prism film comprises a substrate which is provided with prism protrusions formed of photoresist; wherein at least two prism protrusions have different heights. The embodiments of the present invention adopt the laser interference lithography apparatus for forming the prism film, such that the prism film has adjustable prism period and modulation depths. Moreover, the depth of modulation is distributed randomly on the surface of the manufactured prism film, and a prism direction and a prism period can be adjusted conveniently.

3. 发明申请

US20170102622A1 POLARIZATION-MODULATING OPTICAL ELEMENT 审中-公开
公开(公告)号：US20170102622A1
公开(公告)日：2017-04-13
申请号：US15383136
申请日：2016-12-19
申请人： Carl Zeiss SMT GmbH
发明人： Damian Fiolka , Markus Deguenther
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G02B7/008 , G02B27/286 , G03B27/72 , G03F7/70341 , G03F7/70566 , G03F7/70891 , G03F7/70966
摘要： A microlithography optical system includes a projection objective and an illumination system that includes a temperature compensated polarization-modulating optical element. The temperature compensated polarization-modulating optical element includes a first polarization-modulating optical element of optically active material, the first polarization-modulating optical element having a first specific rotation with a sign. The temperature compensated polarization-modulating optical element includes also includes a second polarization-modulating optical element of optically active material, the second polarization-modulating optical element having a second specific rotation with a sign opposite to the sign of the first specific rotation.

4. 发明授权

US08773716B2 Print color predicting apparatus, print color predicting method, and recording medium 有权
标题翻译：打印颜色预测装置，打印颜色预测方法和记录介质
公开(公告)号：US08773716B2
公开(公告)日：2014-07-08
申请号：US13285770
申请日：2011-10-31
申请人： Shuhei Horita
发明人： Shuhei Horita
IPC分类号： H04N1/60 , G03F3/08 , H04N1/46 , H04N1/00 , G06F7/60 , B41J29/393
CPC分类号： G03B27/72 , H04N1/6033 , H04N1/6088 , H04N1/6097
摘要： A print color predicting apparatus, a print color predicting method, and a recording medium having a program recorded therein acquire a spectral reflectance of a print, estimate a plurality of sets of optical property values of a protective film that covers the print, depending on the spectral reflectance of the print, and predict a spectral reflectance of a protective-film-covered print, using the spectral reflectance of the print and the sets of optical property values of the protective film.
摘要翻译：打印颜色预测装置，打印颜色预测方法和其中记录有程序的记录介质获取打印的光谱反射率，根据所述打印颜色预测装置，打印颜色预测方法和记录介质获取覆盖打印的保护膜的多组光学特性值并且使用印刷的光谱反射率和保护膜的光学特性值的集合来预测保护膜覆盖的印刷品的光谱反射率。

5. 发明授权

US08446565B2 Methods of optical proximity correction in manufacturing semiconductor devices 有权
标题翻译：制造半导体器件的光学邻近校正方法
公开(公告)号：US08446565B2
公开(公告)日：2013-05-21
申请号：US12685440
申请日：2010-01-11
申请人： Chung Te Hsuan , Tzong-Hsien Wu
发明人： Chung Te Hsuan , Tzong-Hsien Wu
IPC分类号： G03B27/54
CPC分类号： G03B27/54 , G03B27/72 , G03F1/36 , G03F7/70125 , G03F7/70441
摘要： A method of optical proximity correction for a photolithographic progress in manufacturing semiconductor devices is disclosed. The method includes providing an illumination source in an optical system, dividing the illumination source into a number of segments in the form of concentric rings, and assigning a first intensity level to a first ring of a first radius and assigning a second intensity level to a second ring of a second radius, wherein the first intensity level is smaller than or equal to the second intensity level when the first radius is smaller than or equal to the second radius.
摘要翻译：公开了一种用于制造半导体器件的光刻进程的光学邻近校正方法。该方法包括在光学系统中提供照明源，将照明源分成许多以同心环形式的段，并将第一强度水平分配给第一半径的第一环，并将第二强度等级分配给第二半径的第二环，其中当所述第一半径小于或等于所述第二半径时，所述第一强度水平小于或等于所述第二强度水平。

6. 发明申请

US20130114055A1 MASK AND OPTICAL FILTER MANUFACTURING APPARATUS INCLUDING THE SAME 有权
标题翻译：掩模和光学滤波器制造设备，包括它们
公开(公告)号：US20130114055A1
公开(公告)日：2013-05-09
申请号：US13393522
申请日：2011-07-26
申请人： Sin Young Kim , Kyung Ki Hong , Hyuk Yoon , Won Cheul Ju , Yong II Cho , Moon Soo Park , Dong Ho Ko , Su Young Ryu
发明人： Sin Young Kim , Kyung Ki Hong , Hyuk Yoon , Won Cheul Ju , Yong II Cho , Moon Soo Park , Dong Ho Ko , Su Young Ryu
IPC分类号： G03F1/42 , G03B27/72
CPC分类号： G03F1/42 , G02B5/201 , G02F1/1303 , G02F1/133753 , G02F1/133788 , G03B27/72 , G03F7/0007 , G03F7/24
摘要： A mask and an optical filter manufacturing apparatus having the same are provided. The optical filter manufacturing apparatus includes a roll used in a roll-to-roll process, a base film wound around the roll, a light source that generates light for exposure, a polarizing plate that is installed at an emission side of the light source and polarizes light generated from the light source, and a mask that causes a pattern to be formed on the base film and includes a plurality of guide slits that are opened to have a predetermined thickness and a predetermined width. According to the present invention, the entire surface of the base film can be irradiated with a uniform light quantity. Thus, a pattern can be uniformly formed on the base film, the quality of a product can be improved, and the characteristics of the base film can be accurately realized.
摘要翻译：提供了一种掩模和具有该掩模的滤光器制造装置。光学滤波器制造装置包括卷绕处理中使用的卷，卷绕在卷上的基膜，产生用于曝光的光的光源，安装在光源的发射侧的偏光板和使从光源产生的光偏振，以及在基膜上形成图案的掩模，并且包括打开以具有预定厚度和预定宽度的多个引导狭缝。根据本发明，可以以均匀的光量照射基膜的整个表面。因此，可以在基膜上均匀地形成图案，可以提高产品的质量，并且可以准确地实现基膜的特性。

7. 发明授权

US08432533B2 Method and system for photolithographic fabrication with resolution far below the diffraction limit 有权
$Method and system for photolithographic fabrication with resolution far below the diffraction limit$
标题翻译：分辨率远低于衍射极限的光刻制造方法和系统
公开(公告)号：US08432533B2
公开(公告)日：2013-04-30
申请号：US12652410
申请日：2010-01-05
申请人： John T. Fourkas , Erez H. Gershgoren , Linjie Li , Hana Hwang
发明人： John T. Fourkas , Erez H. Gershgoren , Linjie Li , Hana Hwang
IPC分类号： G03B27/72 , G03F7/00
CPC分类号： G03B27/72 , G03F7/2022 , G03F7/2053 , G03F7/70375
摘要： A method and system for photolithography is provided. The system includes a photoresist comprising a photoinitiator and a prepolymer resin. The system further includes a first light source operable to generate at least a first beam of light which is focused on a first area of the photoresist. The first beam of light is configured to excite the photoinitiator. The system further includes a second light source operable to generate at least a second beam of light which is focused on a second area of the photoresist, the second beam of light configured to deactivate at least temporarily the photoinitiator excited by the first beam of light. The first area and second area overlap at least partially. A time difference of at least 10 ns exists between the photoinitiator being excited by the first beam of light and the photoinitiator initiating polymerization.
摘要翻译：提供了一种用于光刻的方法和系统。该系统包括包含光引发剂和预聚物树脂的光致抗蚀剂。该系统还包括第一光源，其可操作以产生聚焦在光致抗蚀剂的第一区域上的至少第一光束。第一光束被配置为激发光引发剂。该系统还包括第二光源，其可操作以产生聚焦在光致抗蚀剂的第二区域上的至少第二光束，第二光束被配置为至少暂时停用由第一光束激发的光引发剂。第一区域和第二区域至少部分重叠。在由第一光束激发的光引发剂和光引发剂引发聚合之间存在至少10ns的时间差。

8. 发明授权

US08432530B2 Device, method, and system for measuring image profiles produced by an optical lithography system 有权
标题翻译：用于测量由光学光刻系统产生的图像轮廓的装置，方法和系统
公开(公告)号：US08432530B2
公开(公告)日：2013-04-30
申请号：US12177845
申请日：2008-07-22
申请人： Yasuyuki Unno
发明人： Yasuyuki Unno
IPC分类号： G03B27/42
CPC分类号： G03B27/72 , G03F7/70566 , G03F7/70666 , G03F7/7085
摘要： Measuring an aerial image with an aerial image measuring device having a light detector and a light blocking layer for separating polarization components of light incident thereon. The light blocking layer has first and second apertures structured differently from each other, wherein the different structures transmit at least one of the polarization components differently. The detector provides separate samples for light transmitted through the first and second apertures. Separate image profiles for each polarization component of the aerial image are generated using the samples provided by the detector. Image recovery for each of the generated image profiles is performed to generate estimated image profiles for each polarization component of the aerial image that exclude the effects of transmission through the first and second apertures of the aerial image measuring device.
摘要翻译：用具有光检测器和遮光层的空间图像测量装置测量空间图像，用于分离入射在其上的光的偏振分量。遮光层具有彼此不同的结构的第一和第二孔，其中不同的结构不同地透射至少一个偏振分量。检测器为透过第一和第二孔的光提供分开的样品。使用由检测器提供的样本来生成空间图像的每个偏振分量的分离图像。执行每个所生成的图像轮廓的图像恢复，以生成空中图像的每个偏振分量的估计图像轮廓，排除通过空间图像测量装置的第一和第二孔的传输的影响。

9. 发明授权

US08279403B2 Exposure apparatus and image forming apparatus 有权
标题翻译：曝光装置和图像形成装置
公开(公告)号：US08279403B2
公开(公告)日：2012-10-02
申请号：US12555930
申请日：2009-09-09
申请人： Ryo Mikami
发明人： Ryo Mikami
IPC分类号： G03B27/54 , G03B27/72
CPC分类号： G03B27/72
摘要： An exposure apparatus has a first board on which a light-emitting element is mounted and a second board on which is mounted a driving IC for causing the light-emitting element to emit light. A second current path is extended from the driving IC, which is mounted on the second board, to the first board. The second current path is arranged so as to be adjacent to a first current path.
摘要翻译：曝光装置具有其上安装有发光元件的第一板和安装有用于使发光元件发光的驱动IC的第二板。第二电流路径从安装在第二板上的驱动IC延伸到第一板。第二电流路径被布置成与第一电流路径相邻。

10. 发明授权

US08149386B2 Illumination optical system, exposure apparatus using the same and device manufacturing method 有权
标题翻译：照明光学系统，使用相同的曝光装置和装置制造方法
公开(公告)号：US08149386B2
公开(公告)日：2012-04-03
申请号：US12390315
申请日：2009-02-20
申请人： Kazuhiko Kajiyama
发明人： Kazuhiko Kajiyama
IPC分类号： G03B27/70
CPC分类号： G03B27/72 , G03F7/70075
摘要： An illumination optical system includes a pair of fly-eye mirrors configured to receive light from a light source, a first condenser configured to condense light from the pair of fly-eye mirrors, a reflection type integrator configured to receive light from the first condenser, the reflection type integrator including a plurality of cylindrical reflective surfaces having parallel generating line directions, an aperture stop arranged perpendicular to the generating line direction, and a second condenser configured to superpose on an illuminated surface luminous fluxes from a plurality of cylindrical reflective surfaces of the reflection type integrator.
摘要翻译：一种照明光学系统，包括配置成从光源接收光的一对飞眼镜，被配置为使来自该一对飞眼镜的光聚光的第一聚光镜，被配置为接收来自第一冷凝器的光的反射型积分器，所述反射型积分器包括具有平行的生成线方向的多个圆柱形反射表面，垂直于所述生成线方向布置的孔径光阑;以及第二聚光器，被配置为在照射表面上叠加来自所述发光线方向的多个圆柱形反射表面的光通量反射型积分器。

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