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1. 发明授权

US09056333B2 Ultrasound probe and method of producing the same 有权
标题翻译：超声探头及其制作方法
公开(公告)号：US09056333B2
公开(公告)日：2015-06-16
申请号：US13584102
申请日：2012-08-13
申请人： Atsushi Osawa
发明人： Atsushi Osawa
IPC分类号： H01L41/09 , B06B1/06
CPC分类号： B06B1/064 , Y10T29/49005
摘要： An ultrasound probe includes a backing member, inorganic piezoelectric elements arranged on a top surface of the backing member, an acoustic matching layer disposed on and extending over the inorganic piezoelectric elements, and organic piezoelectric elements arranged on the acoustic matching layer.
摘要翻译：超声波探头包括背衬构件，布置在背衬构件的顶表面上的无机压电元件，设置在无机压电元件上并在无机压电元件上延伸的声匹配层以及布置在声匹配层上的有机压电元件。

2. 发明授权

US08930169B2 Capacitive ultrasonic transducer and endo cavity ultrasonic diagnosis system using the same 有权
标题翻译：电容式超声波换能器和内腔超声诊断系统使用相同
公开(公告)号：US08930169B2
公开(公告)日：2015-01-06
申请号：US13040922
申请日：2011-03-04
申请人： Hideo Adachi , Katsuhiro Wakabayashi , Akiko Mizunuma , Atsushi Osawa , Tatsuo Kaimai , Shinji Yasunaga , Kiyoshi Nemoto , Miyuki Murakami , Kousei Tamiya , Yu Kondo
发明人： Hideo Adachi , Katsuhiro Wakabayashi , Akiko Mizunuma , Atsushi Osawa , Tatsuo Kaimai , Shinji Yasunaga , Kiyoshi Nemoto , Miyuki Murakami , Kousei Tamiya , Yu Kondo
IPC分类号： G06F15/00 , A61B8/14 , A61B8/12 , A61B8/00 , B06B1/02 , G10K9/12
CPC分类号： A61B8/12 , A61B8/445 , B06B1/0292 , B06B2201/76 , G10K9/12 , Y10T29/49005
摘要： A capacitive ultrasonic transducer (c-MUT) comprising a silicon substrate and a transducer element which comprises transducer cells, each of which is constituted by a first electrode equipped on the top surface of the silicon substrate, a second electrode placed opposite to the first electrode with a predetermined gap therefrom and a membrane for supporting the second electrode, wherein a trench is equipped between the adjacent transducers and a conductive film is formed in the trench.
摘要翻译：一种包括硅衬底和换能器元件的电容式超声换能器（c-MUT），其包括换能器单元，每个换能器单元由设置在硅衬底的顶表面上的第一电极构成，与第一电极相对放置的第二电极具有预定的间隙，以及用于支撑第二电极的膜，其中在相邻的换能器之间配备有沟槽，并且在沟槽中形成导电膜。

3. 发明申请

US20120296211A1 ULTRASOUND DIAGNOSTIC APPARATUS 审中-公开
标题翻译：超声诊断装置
公开(公告)号：US20120296211A1
公开(公告)日：2012-11-22
申请号：US13473233
申请日：2012-05-16
申请人： Atsushi OSAWA
发明人： Atsushi OSAWA
IPC分类号： A61B8/14 , A61N5/06
CPC分类号： A61B8/58 , A61B5/0095 , A61B8/08 , A61B8/463 , A61N5/0625
摘要： An ultrasound diagnostic apparatus includes a light irradiator for irradiating a lattice point set in the region to be imaged with light converging to the lattice point, so as to impart heat locally to the point; an image for distortion amount calculation-generating section for generating an ultrasound image for distortion amount calculation based on a reception signal of ultrasound generated; and a distortion amount calculating section for calculating the difference between the position of the lattice point on an ultrasound image for distortion amount calculation and the absolute coordinates of the lattice point as the distortion amount. Such apparatus allows precise sound speed values in the living body to be obtained and, accordingly, an ultrasound image of high accuracy to be taken. In consequence, a more accurate diagnosis is conducted on the region to be diagnosed in a subject.
摘要翻译：超声波诊断装置包括光照射器，用于照射会聚在该格子点上的被成像区域中设置的格点，从而局部赋予该点; 用于根据产生的超声波的接收信号产生用于失真量计算的超声波图像的失真量计算产生部分的图像; 以及失真量计算部分，用于计算用于失真量计算的超声图像上的格点的位置与格点的绝对坐标之间的差作为失真量。这样的装置能够获得生物体中的精确声速值，因此可以获得高精度的超声波图像。因此，对受试者中待诊断的区域进行更准确的诊断。

4. 发明申请

US20120199555A1 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD 审中-公开
标题翻译：基板处理装置和基板处理方法
公开(公告)号：US20120199555A1
公开(公告)日：2012-08-09
申请号：US13452552
申请日：2012-04-20
申请人： Atsushi Osawa
发明人： Atsushi Osawa
IPC分类号： B44C1/22
CPC分类号： H01L21/6708 , H01L21/02052 , H01L21/67086
摘要： A substrate processing apparatus includes a high-speed supply system having a relatively small opening for ejecting a processing liquid through the relatively small opening to supply the processing liquid into a processing bath, and a low-speed supply system having a relatively large opening for ejecting the processing liquid through the relatively large opening to supply the processing liquid into the processing bath. While an etching process is in progress, the processing liquid is supplied through the high-speed supply system. This decreases a difference in concentration of a liquid chemical component in the processing liquid within the processing bath to improve the uniformity of the etching process. While the etching process is not in progress, on the other hand, the processing liquid is supplied through the low-speed supply system. This improves the efficiency of the replacement of the processing liquid within the processing bath.
摘要翻译：基板处理装置包括：具有相对小的开口的高速供应系统，用于通过相对小的开口喷射处理液体以将处理液体供应到处理槽;以及低速供应系统，其具有相对较大的喷射开口处理液通过相对较大的开口供应处理液进入加工槽。在进行蚀刻处理的同时，通过高速供给系统供给处理液。这降低了处理槽内的处理液中液体化学成分的浓度差，以提高蚀刻工艺的均匀性。另外，在不进行蚀刻处理的同时，通过低速供给系统供给处理液。这提高了处理槽内的处理液的更换效率。

5. 发明授权

US08169123B2 Multilayered piezoelectric element and method of manufacturing the same 有权
标题翻译：多层压电元件及其制造方法
公开(公告)号：US08169123B2
公开(公告)日：2012-05-01
申请号：US12410701
申请日：2009-03-25
申请人： Atsushi Osawa
发明人： Atsushi Osawa
IPC分类号： H01L41/08
CPC分类号： H01L41/0472 , H01L41/0831 , H01L41/293 , H01L41/338 , Y10T29/42
摘要： In a multilayered piezoelectric element, a side insulating film is accurately formed even on a thin multilayered structure. The element includes: a multilayered structure having a step formed on a side surface of the multilayered structure such that an end of an internal electrode is located on a projecting portion of either side surface; a side insulating film for covering the end of the internal electrode on the projecting portion of the side surface; a first flat electrode formed on one principal surface of the multilayered structure; a second flat electrode formed on the other principal surface of the multilayered structure; a first side electrode formed on a first side surface of the multilayered structure and connected to a first group of electrodes; and a second side electrode formed on a second side surface of the multilayered structure and connected to a second group of electrodes.
摘要翻译：在多层压电元件中，即使在薄的多层结构上也准确地形成侧绝缘膜。该元件包括：多层结构，其具有形成在多层结构的侧表面上的台阶，使得内部电极的端部位于任一侧表面的突出部分上; 侧面绝缘膜，用于在侧表面的突出部分上覆盖内部电极的端部; 形成在多层结构的一个主表面上的第一扁平电极; 形成在所述多层结构体的另一个主面上的第二扁平电极; 第一侧电极，形成在所述多层结构的第一侧表面上并连接到第一组电极; 以及形成在多层结构的第二侧表面上并连接到第二组电极的第二侧电极。

6. 发明申请

US20090243442A1 MULTILAYERED PIEZOELECTRIC ELEMENT AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译：多层压电元件及其制造方法
公开(公告)号：US20090243442A1
公开(公告)日：2009-10-01
申请号：US12410701
申请日：2009-03-25
申请人： Atsushi OSAWA
发明人： Atsushi OSAWA
IPC分类号： H01L41/047 , H01L41/24
CPC分类号： H01L41/0472 , H01L41/0831 , H01L41/293 , H01L41/338 , Y10T29/42
摘要： In a multilayered piezoelectric element, a side insulating film is accurately formed even on a thin multilayered structure. The element includes: a multilayered structure having a step formed on a side surface of the multilayered structure such that an end of an internal electrode is located on a convex portion of either side surface; a side insulating film for covering the end of the internal electrode on the convex portion of the side surface; a first flat electrode formed on one principal surface of the multilayered structure; a second flat electrode formed on the other principal surface of the multilayered structure; a first side electrode formed on a first side surface of the multilayered structure and connected to a first group of electrodes; and a second side electrode formed on a second side surface of the multilayered structure and connected to a second group of electrodes.
摘要翻译：在多层压电元件中，即使在薄的多层结构上也准确地形成侧绝缘膜。该元件包括：多层结构，其具有形成在多层结构的侧表面上的台阶，使得内部电极的端部位于任一侧面的凸部上; 侧面绝缘膜，用于覆盖侧表面的凸部上的内部电极的端部; 形成在多层结构的一个主表面上的第一扁平电极; 形成在所述多层结构体的另一个主面上的第二扁平电极; 第一侧电极，形成在所述多层结构的第一侧表面上并连接到第一组电极; 以及形成在多层结构的第二侧表面上并连接到第二组电极的第二侧电极。

7. 发明申请

US20090239384A1 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD 审中-公开
标题翻译：基板处理装置和基板处理方法
公开(公告)号：US20090239384A1
公开(公告)日：2009-09-24
申请号：US12369874
申请日：2009-02-12
申请人： Kunio Fujiwara , Akihiro Hosokawa , Kozo Terashima , Atsushi Osawa
发明人： Kunio Fujiwara , Akihiro Hosokawa , Kozo Terashima , Atsushi Osawa
IPC分类号： H01L21/306
CPC分类号： H01L21/67057
摘要： A discharge hole of a lower nozzle is directed at an angle of 5 degrees to 40 degrees slanting inward with respect to a normal to the upper surface of a bottom plate. Thus, the flow pressure of a processing solution discharged through the discharge hole is not excessively reduced. Further, a circulation area of the processing solution does not expand widely in an inner bath. As a result, the processing solution in the inner bath is effectively displaced while the processing solution smoothly flows into gaps between substrates.
摘要翻译：下喷嘴的排出孔相对于底板的上表面的法线向内倾斜5度至40度的角度。因此，通过排出孔排出的处理液的流量压力不会过度降低。此外，处理液的循环区域在内槽中不会广泛扩大。结果，内浴中的处理液有效地移位，同时处理溶液顺利地流入基板之间的间隙。

8. 发明申请

US20090234233A1 ULTRASONIC ENDOSCOPE 审中-公开
标题翻译：超声内镜
公开(公告)号：US20090234233A1
公开(公告)日：2009-09-17
申请号：US12401279
申请日：2009-03-10
申请人： Kazuhiko NAGANO , Hiroaki Hyuga , Atsushi Osawa
发明人： Kazuhiko NAGANO , Hiroaki Hyuga , Atsushi Osawa
IPC分类号： A61B8/14
CPC分类号： A61B8/4488 , A61B8/12 , A61B8/445
摘要： In an ultrasonic endoscope, excessive temperature rise due to heat generated from ultrasonic transducers and/or an image pickup device is prevented. The ultrasonic endoscope includes: an ultrasonic transducer part including plural ultrasonic transducers for transmitting and receiving ultrasonic waves, and a backing material provided on a back of the plural ultrasonic transducers and having plural signal terminals provided on a surface opposite to the plural ultrasonic transducers; a signal line holding part including a highly heat conducting filler filling a space holding a group of shield lines electrically connected to the ultrasonic transducers via the plural signal terminals, and coupled to the backing material; and a highly heat conducting layer provided in contact with the signal line holding part, and thereby coupled to the signal line holding part.
摘要翻译：在超声波内窥镜中，防止了由超声波换能器和/或图像拾取装置产生的热引起的过度的温度升高。超声波内窥镜包括：超声波换能器部，包括用于发送和接收超声波的多个超声波换能器;以及背衬材料，其设置在所述多个超声波换能器的背面，并且具有设置在与所述多个超声换能器相对的表面上的多个信号端子; 信号线保持部，包括高导热性填料，该多个信号端子通过多个信号端子填充保持与超声波换能器电连接的一组屏蔽线的空间，并且与背衬材料耦合; 以及设置成与信号线保持部分接触的高导热层，从而耦合到信号线保持部分。

9. 发明申请

US20090104350A1 NOZZLE DEVICE, FILM FORMING APPARATUS AND METHOD USING THE SAME, INORGANIC ELECTROLUMINESCENCE DEVICE, INKJET HEAD, AND ULTRASONIC TRANSDUCER ARRAY 审中-公开
标题翻译：喷嘴装置，成膜装置和使用其的方法，无机电致发光器件，喷墨头和超声波传感器阵列
公开(公告)号：US20090104350A1
公开(公告)日：2009-04-23
申请号：US12339962
申请日：2008-12-19
申请人： Atsushi OSAWA
发明人： Atsushi OSAWA
IPC分类号： C23C16/44
CPC分类号： B05B7/1422 , B05B1/14 , B05B3/028 , B05B12/082 , B05B13/0228 , B05B13/04 , B05B13/0421 , B05D1/12 , B05D3/12 , C23C4/123 , C23C24/04
摘要： A film forming apparatus by which uniform and large area films can be formed according to the AD method. The film forming apparatus includes: a film forming chamber; a substrate holder located in the film forming chamber, for holding a substrate on which a structure is to be formed; an exhaust pump for exhausting an interior of the film forming chamber; an aerosol generating unit for generating an aerosol by blowing up a raw material powder placed in a container with a gas; a carrier pipe for introducing the generated aerosol into the film forming chamber; a nozzle for spraying the aerosol introduced via the carrier pipe toward the substrate; and a control unit for chaotically changing a relative position of the substrate held by the substrate holder and the nozzle.
摘要翻译：根据AD方法可以形成均匀且大面积的膜的成膜装置。成膜装置包括：成膜室; 位于成膜室中的用于保持要在其上形成结构的基板的基板保持件; 用于排出成膜室内部的排气泵; 气溶胶发生单元，用于通过用气体吹入放置在容器中的原料粉末来产生气溶胶; 用于将产生的气溶胶引入成膜室的载体管; 用于将经由所述载体管引入的所述气溶胶喷射到所述基板的喷嘴; 以及用于使由所述基板保持器和所述喷嘴保持的所述基板的相对位置发生混沌变化的控制单元。

10. 发明授权

US07482042B2 Film forming method and film forming apparatus 失效
标题翻译：成膜方法和成膜装置
公开(公告)号：US07482042B2
公开(公告)日：2009-01-27
申请号：US11235140
申请日：2005-09-27
申请人： Atsushi Osawa
发明人： Atsushi Osawa
IPC分类号： B29C35/08
CPC分类号： C30B30/04 , B05D1/12 , C23C24/04 , H01F41/20
摘要： A film forming apparatus by which property values in a film formed by the AD method can be improved. The film forming apparatus includes: a chamber having a substrate stage for holding a substrate on which a film is to be formed; an aerosol generating unit for generating an aerosol by dispersing a raw material powder into a gas; a magnetic field applying device for applying a magnetic field to a flow path of the aerosol generated by the aerosol generating unit so as to orient crystal orientation in the raw material powder in an aerosol state; and an injection nozzle for spraying the aerosol applied with the magnetic field by the magnetic field applying device to the substrate so as to deposit the raw material powder, in which the crystal orientation is oriented, on the substrate.
摘要翻译：可以提高通过AD方法形成的膜中的特性值的成膜装置。成膜装置包括：具有用于保持要在其上形成膜的基板的基板台的室; 气溶胶发生单元，用于通过将原料粉末分散在气体中产生气溶胶; 磁场施加装置，用于对由气溶胶发生单元产生的气溶胶的流路施加磁场，以使原料粉末中的结晶取向呈气溶胶状态; 以及喷射喷嘴，用于将通过磁场施加装置施加有磁场的气溶胶喷射到基板，以将沉积取向晶体取向的原料粉末沉积在基板上。

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