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1. 发明授权

US07229543B2 Apparatus for controlling and/or measuring additive concentration in an electroplating bath 有权
标题翻译：用于控制和/或测量电镀浴中的添加剂浓度的装置
公开(公告)号：US07229543B2
公开(公告)日：2007-06-12
申请号：US10372955
申请日：2003-02-26
申请人： Lyndon W. Graham , Thomas C. Taylor , Thomas L. Ritzdorf , Fredrick A. Lindberg , Bradley C. Carpenter
发明人： Lyndon W. Graham , Thomas C. Taylor , Thomas L. Ritzdorf , Fredrick A. Lindberg , Bradley C. Carpenter
IPC分类号： C25D21/12 , G01F1/64 , G01N27/26 , G01N27/42
CPC分类号： G01N27/48 , G01N27/4161
摘要： A method for measuring a target constituent of an electroplating solution using an electroanalytical technique is set forth in which the electroplating solution includes one or more constituents whose by-products skew an initial electrical response to an energy input of the electroanalytical technique. The method comprises a first step in which an electroanalytical measurement cycle of the target constituent is initiated by providing an energy input to a pair of electrodes disposed in the electroplating solution. The energy input to the pair of electrodes is provided for at least a predetermined time period corresponding to a time period in which the electroanalytical measurement cycle reaches a steady-state condition. In a subsequent step, an electroanalytical measurement of the energy output of the electroanalytical technique is taken after the electroanalytical measurement cycle has reached the steady-state condition. The electroanalytical measurement is then used to determine an amount of the target constituent in the electroplating solution. An automatic dosing system that includes the foregoing method and/or one or more known electroanalytical techniques in a close-loop system is also set forth.
摘要翻译：提出了一种使用电分析技术测量电镀溶液的目标成分的方法，其中电镀溶液包括一种或多种成分，其中副产物偏置对电分析技术的能量输入的初始电响应。该方法包括第一步骤，其中通过向布置在电镀溶液中的一对电极提供能量输入来启动目标成分的电分析测量循环。输入到该对电极的能量被提供至少一个对应于电分析测量周期达到稳态条件的时间段的预定时间段。在随后的步骤中，在电分析测量循环达到稳态条件之后，进行电分析技术的能量输出的电分析测量。然后使用电分析测量来确定电镀溶液中的目标成分的量。还提出了一种包括前述方法和/或闭环系统中的一种或多种已知电分析技术的自动计量系统。

2. 再颁专利

USRE38931E1 Methods for controlling and/or measuring additive concentration in an electroplating bath 有权
标题翻译：用于控制和/或测量电镀浴中的添加剂浓度的方法
公开(公告)号：USRE38931E1
公开(公告)日：2006-01-10
申请号：US10266966
申请日：2003-02-27
申请人： Lyndon W. Graham , Thomas C. Taylor , Thomas L. Ritzdorf , Fredrick A. Lindberg , Bradley C. Carpenter
发明人： Lyndon W. Graham , Thomas C. Taylor , Thomas L. Ritzdorf , Fredrick A. Lindberg , Bradley C. Carpenter
IPC分类号： G01N27/48
CPC分类号： G01N27/4161 , G01N27/48
摘要： A method for measuring a target constituent of an electroplating solution using an electroanalytical technique is set forth in which the electroplating solution includes one or more constituents whose by-products skew an initial electrical response to an energy input of the electroanalytical technique. The method comprises a first step in which an electroanalytical measurement cycle of the target constituent is initiated by providing an energy input to a pair of electrodes disposed in the electroplating solution. The energy input to the pair of electrodes is provided for at least a predetermined time period corresponding to a time period in which the electroanalytical measurement cycle reaches a steady-state condition. In a subsequent step, an electroanalytical measurement of the energy output of the electroanalytical technique is taken after the electroanalytical measurement cycle has reached the steady-state condition. The electroanalytical measurement is then used to determine an amount of the target constituent in the electroplating solution. An automatic dosing system that includes the foregoing method and/or one or more known electroanalytical techniques in a close closed-loop system is also set forth.
摘要翻译：提出了一种使用电分析技术测量电镀溶液的目标成分的方法，其中电镀溶液包括一种或多种成分，其中副产物偏置对电分析技术的能量输入的初始电响应。该方法包括第一步骤，其中通过向布置在电镀溶液中的一对电极提供能量输入来启动目标成分的电分析测量循环。输入到该对电极的能量被提供至少一个对应于电分析测量周期达到稳态条件的时间段的预定时间段。在随后的步骤中，在电分析测量循环达到稳态条件之后，进行电分析技术的能量输出的电分析测量。然后使用电分析测量来确定电镀溶液中的目标成分的量。在<？delete-start id =“DEL-S-00001”date =“20060110”→> close <？delete-end id =“中包括上述方法和/或一个或多个已知的电分析技术的自动计量系统 DEL-S-00001“？> <？insert-start id =”INS-S-00001“date =”20060110“？> closed <？insert-end id =”INS-S-00001“？也阐述了。

3. 发明授权

US06551479B1 Apparatus for controlling and/or measuring additive concentration in an electroplating bath 有权
公开(公告)号：US06551479B1
公开(公告)日：2003-04-22
申请号：US09572603
申请日：2000-05-17
申请人： Lyndon W. Graham , Thomas C. Taylor , Thomas L. Ritzdorf , Fredrick A. Lindberg , Bradley C. Carpenter
发明人： Lyndon W. Graham , Thomas C. Taylor , Thomas L. Ritzdorf , Fredrick A. Lindberg , Bradley C. Carpenter
IPC分类号： G01N2748
CPC分类号： G01N27/48 , G01N27/4161
摘要： A method for measuring a target constituent of an electroplating solution using an electroanalytical technique is set forth in which the electroplating solution includes one or more constituents whose by-products skew an initial electrical response to an energy input of the electroanalytical technique. The method comprises a first step in which an electroanalytical measurement cycle of the target constituent is initiated by providing an energy input to a pair of electrodes disposed in the electroplating solution. The energy input to the pair of electrodes is provided for at least a predetermined time period corresponding to a time period in which the electroanalytical measurement cycle reaches a steady-state condition. In a subsequent step, an electroanalytical measurement of the energy output of the electroanalytical technique is taken after the electroanalytical measurement cycle has reached the steady-state condition. The electroanalytical measurement is then used to determine an amount of the target constituent in the electroplating solution. An automatic dosing system that includes the foregoing method and/or one or more known electroanalytical techniques in a close-loop system is also set forth.

4. 发明授权

US06365033B1 Methods for controlling and/or measuring additive concentration in an electroplating bath 有权
标题翻译：用于控制和/或测量电镀浴中的添加剂浓度的方法
公开(公告)号：US06365033B1
公开(公告)日：2002-04-02
申请号：US09387084
申请日：1999-08-31
申请人： Lyndon W. Graham , Thomas C. Taylor , Thomas L. Ritzdorf , Fredrick A. Lindberg , Bradley C. Carpenter
发明人： Lyndon W. Graham , Thomas C. Taylor , Thomas L. Ritzdorf , Fredrick A. Lindberg , Bradley C. Carpenter
IPC分类号： G01N2748
CPC分类号： G01N27/48 , G01N27/4161
摘要： A method for measuring a target constituent of an electroplating solution using an electroanalytical technique is set forth in which the electroplating solution includes one or more constituents whose by-products skew an initial electrical response to an energy input of the electroanalytical technique. The method comprises a first step in which an electroanalytical measurement cycle of the target constituent is initiated by providing an energy input to a pair of electrodes disposed in the electroplating solution. The energy input to the pair of electrodes is provided for at least a predetermined time period corresponding to a time period in which the electroanalytical measurement cycle reaches a steady-state condition. In a subsequent step, an electroanalytical measurement of the energy output of the electroanalytical technique is taken after the electroanalytical measurement cycle has reached the steady-state condition. The electroanalytical measurement is then used to determine an amount of the target constituent in the electroplating solution. An automatic dosing system that includes the foregoing method and/or one or more known electroanalytical techniques in a close-loop system is also set forth.
摘要翻译：提出了一种使用电分析技术测量电镀溶液的目标成分的方法，其中电镀溶液包括一种或多种成分，其中副产物偏置对电分析技术的能量输入的初始电响应。该方法包括第一步骤，其中通过向布置在电镀溶液中的一对电极提供能量输入来启动目标成分的电分析测量循环。输入到该对电极的能量被提供至少一个对应于电分析测量周期达到稳态条件的时间段的预定时间段。在随后的步骤中，在电分析测量循环达到稳态条件之后，进行电分析技术的能量输出的电分析测量。然后使用电分析测量来确定电镀溶液中的目标成分的量。还提出了一种包括前述方法和/或闭环系统中的一种或多种已知电分析技术的自动计量系统。

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